PACKAGE-ON-PACKAGE INTERCONNECT FOR FAN-OUT WAFER … · 1 PACKAGE-ON-PACKAGE INTERCONNECT FOR...

39
1 PACKAGE-ON-PACKAGE INTERCONNECT FOR FAN-OUT WAFER LEVEL PACKAGES Min Tao, Ph. D, Ashok Prabhu, Akash Agrawal, Ilyas Mohammed, Ph. D, Bel Haba, Ph. D Oct 18-20 2016, IWLPC

Transcript of PACKAGE-ON-PACKAGE INTERCONNECT FOR FAN-OUT WAFER … · 1 PACKAGE-ON-PACKAGE INTERCONNECT FOR...

1

PACKAGE-ON-PACKAGE INTERCONNECT

FOR FAN-OUT WAFER LEVEL PACKAGESMin Tao, Ph. D, Ashok Prabhu, Akash Agrawal,

Ilyas Mohammed, Ph. D, Bel Haba, Ph. D

Oct 18-20 2016, IWLPC

2 Oct 18-20, 2016 IWLPC

Laminate to Fan-Out WLP Transition

FOWLP POP Key Elements

POP Interconnect Features

Conclusion

Outline

3 Oct 18-20, 2016 IWLPC

Laminate to Fan-Out WLP Transition

FOWLP POP Key Elements

POP Interconnect Features

Conclusion

Outline

4 Oct 18-20, 2016 IWLPC

Fan-Out Evolution

Evolving

10100um 10um

~ 8 – 2um

2um

Substrate design Rule

OSAT / wafer foundries

Opportunity area for

wafer/panel level Fan-Out

solutions

5 Oct 18-20, 2016 IWLPC

Package Stacking Transitioning

PIP

Redistributed

bonding pads

2.5D stacking with

mostly wirebond

based approach

6 Oct 18-20, 2016 IWLPC

Package Stacking Transitioning

Laminate POP

Solder only

BVA

TMVWarpage control

Finer POP pitch

1st Gen POP

PIP

Redistributed

bonding pads

2.5D stacking with

mostly wirebond

based approach

7 Oct 18-20, 2016 IWLPC

Package Stacking Transitioning

Laminate POP

Solder only

BVA

TMVWarpage control

Finer POP pitch

1st Gen POP

FOWLP POP

Chip lastWafer Level process

replacing laminate substrate

with thinner RDLs

Chip firstAchieving lowest stack

profile with improved

performance with RDLs

built directly on chip

PIP

Redistributed

bonding pads

2.5D stacking with

mostly wirebond

based approach

8 Oct 18-20, 2016 IWLPC

POP Driving FOWLP Growth

POP is the major application to drive FOWLP market 4~5 X growth to $2.5B in 2020

Source: www.i-micronews.com

9 Oct 18-20, 2016 IWLPC

Laminate to Fan-Out WLP Transition

FOWLP POP Key Elements

POP Interconnect Features

Conclusion

Outline

10 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

11 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

12 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

waferChip: First

(face up OR

face down) OR

Last

13 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

Vias: Formed

post mold OR

Preformed

Chip: First

(face up OR

face down) OR

Last

14 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

1st side

RDL(s): after

molding OR

before molding

on a carrier

2nd side

RDL:

if needed

Vias: Formed

post mold OR

Preformed

Chip: First

(face up OR

face down) OR

Last

15 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

1st side

RDL(s): after

molding OR

before molding

on a carrier

2nd side

RDL:

if needed

Vias: Formed

post mold OR

Preformed

Chip: First

(face up OR

face down) OR

Last

Molding

16 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

1st side

RDL(s): after

molding OR

before molding

on a carrier

2nd side

RDL:

if needed

Vias: Formed

post mold OR

Preformed

Chip: First

(face up OR

face down) OR

Last

Molding

Reliability: copper bumped

die OR thick

dielectric added

17 Oct 18-20, 2016 IWLPC

FOWLP POP Key Ingredients

FOWLP

Manufacturing

: Panel OR

wafer

1st side

RDL(s): after

molding OR

before molding

on a carrier

2nd side

RDL:

if needed

Vias: Formed

post mold OR

Preformed

Chip: First

(face up OR

face down) OR

Last

Molding

Reliability: copper bumped

die OR thick

dielectric added

eWLB POP

SLIM/SWIFT

BEOL/RDL

18 Oct 18-20, 2016 IWLPC

Chip First Facing Down: eWLB POP

Source: S. W. Yoon et. al., IWLPC, 2011

19 Oct 18-20, 2016 IWLPC

Chip First Facing Down: eWLB POP

eWLBPOP

Manufacturing

: wafer

1st side

RDL(s): after

molding

2nd side

RDL:

No

Vias:

preformed

(embedded PCB

vias)

Chip: First

face down)

Molding

Reliability: thick dielectric

added

Source: S. W. Yoon et. al., IWLPC, 2011

20 Oct 18-20, 2016 IWLPC

Chip First Facing Down: eWLB POP

eWLBPOP

Manufacturing

: wafer

1st side

RDL(s): after

molding

2nd side

RDL:

No

Vias:

preformed

(embedded PCB

vias)

Chip: First

face down)

Molding

Reliability: thick dielectric

added

Source: S. W. Yoon et. al., IWLPC, 2011

eWLB POP:

• Chip first, face down; RDL L/S 10/10um;

• Preformed vias by embedding laminate PCB with through-vias;

• Min via pitch ~ 0.27mm

21 Oct 18-20, 2016 IWLPC

Chip First Facing Up : InFO POP

Source: C.F. Tseng, et. al., ECTC 2016

Source: System Plus Consulting

22 Oct 18-20, 2016 IWLPC

Chip First Facing Up : InFO POP

Source: C.F. Tseng, et. al., ECTC 2016

Source: System Plus Consulting

InFOPOP

Manufacturing

: wafer

1st side

RDL(s): after

molding

2nd side

RDL:

PI only

Vias: preformed

(plated Cu pillars)

Chip: First

face Up)

Molding

Reliability: Tall Cu pads

and thick

dielectric added

23 Oct 18-20, 2016 IWLPC

Chip First Facing Up : InFO POP

Source: C.F. Tseng, et. al., ECTC 2016

Source: System Plus Consulting

InFOPOP

Manufacturing

: wafer

1st side

RDL(s): after

molding

2nd side

RDL:

PI only

Vias: preformed

(plated Cu pillars)

Chip: First

face Up)

Molding

Reliability: Tall Cu pads

and thick

dielectric added

InFO POP:

• Chip first, face up; 1 Fan-in RDL + 3 Fan-out RDL;

• Preformed vias by plated Cu pillars;

• Via pitch 300um (could be as low as 60um)

24 Oct 18-20, 2016 IWLPC

Chip Last: SWIFT and SLIM

Source: Amkor White Paper

25 Oct 18-20, 2016 IWLPC

Chip Last: SWIFT and SLIM

Source: Amkor White Paper

SWIFT/SLIM

Manufacturing

: wafer

1st side

RDL(s): before

molding

2nd side

RDL:

No

Vias: Postformed

(TMV)

Chip: Last

(flip chip)

Molding

Reliability: Flip chip

26 Oct 18-20, 2016 IWLPC

Chip Last: SWIFT and SLIM

Source: Amkor White Paper

SWIFT/SLIM

Manufacturing

: wafer

1st side

RDL(s): before

molding

2nd side

RDL:

No

Vias: Postformed

(TMV)

Chip: Last

(flip chip)

Molding

Reliability: Flip chip

SLIM and SWIFT:

• Chip last with a flip chip reflow step; Finer L/S with SLIM BEOL layers;

• TMV like via by laser opening; Min Via pitch ~ 0.30mm

27 Oct 18-20, 2016 IWLPC

Laminate to Fan-Out WLP Transition

FOWLP POP Key Elements

POP Interconnect Features

Conclusion

Outline

28 Oct 18-20, 2016 IWLPC

Chip Last Process Flow with Preformed Vias

1, Carrier wafer/panel with release tape

Release tape

RDL Passivation UBMC4 PadPOP Pad

2, Build up RDL (second level UBM

-> RDL -> C4 & POP pads)

4, Flip chip attach dies with solder on

pads, reflow to make joints

Die SoD

Preformed Vias (BVA or etched)

3, Preform POP Vias on the

wafer/panel (wire bond, etched, etc.)

5, Overmold to cover die and POP Vias

6, Grind back the mold to reveal the

Via pads; optional 2nd side RDL

7-9, Remove carrier wafer/panel;

Ball attach; singulation

Final Package – with 2nd side RDL

Fan-in RDL pads for POP connectivity

29 Oct 18-20, 2016 IWLPC

Preformed Vias – Etched Cu uPILR ®

uPILR® is a scalable Fine Pitch Interconnect

Technology with etched Cu post, suitable for

POP, flip chip and BGA

Etched Cu

uPILR®

Pillar on Substrate After stacking

uPILR POP:

- Batch process fine pitch interconnect, min Pitch 150~200um

- Good wetting and self-alignment capability for solder reflow

- Superior drop and T/C performance compared to BGA

An earlier uPILR

POP implementation

30 Oct 18-20, 2016 IWLPC

Preformed Vias – BVA®

BVA® is a Very Fine Pitch Vertical Wirebond

Interconnect Technology, ideal for POPBVA® Vertical

Interconnects

BVA POP:

- Utilize existing wire bond facilities

- Fine pitch capability of 150um

- Validated HVM feasibility with a Tier 1 OSAT

31 Oct 18-20, 2016 IWLPC

BVA on RDL Bondability Study

JEDEC Requirement

All test legs passed JEDEC ball shear requirement with high margin

BVA shows good bondability on RDL

Ack: Tong Hsing Electronics

TV: 10um PI with 5um Cu pad on 4” wafer

32 Oct 18-20, 2016 IWLPC

Cost Comparison

Sequential process has cost advantage up to ~800 IOs per package (15x15mm WLP on 12 inch wafer, all with 200um tall interconnect)

Ack: Savansys Solutions

0

0.5

1

1.5

2

2.5

3

200 400 600 800 1000 1200

Co

st P

er

Inte

rco

nn

ect

(N

orm

aliz

ed

)

Estimated # of POP IO per 15X15mm WLP

Plated Cu Pillar

BVA Wire

Laser Drilled TMV

Pitch

~0.16mm

Pitch

~0.2mm

Pitch

~0.3mm

33 Oct 18-20, 2016 IWLPC

Interconnect Technology Comparison

Chip first,

face up

Chip first,

face downChip last

Backside

RDL

BVA Wires/ Etched

Cu postsX X X 0.15mm

Plated Cu Pillars X X X 0.06mm-

Through Mold Lased

ViasX 0.30mm

Solder balls X 0.4mm+

PCB Through-Vias X X X 0.27mm

Compatibility ("X" for compatible)

POP Interconnect Min Pitch

34 Oct 18-20, 2016 IWLPC

eWLB POP InFO SLIM/SWIFT uPILR/BVA

Process flow Chip (face down)

Interconnect (PCB

through-Vias)

RDL

Interconnect (Plated Cu

pillar)

Chip (face up)

RDL

BEOL/RDL

Chip (flip chip)

Interconnect (TMV)

RDL/ Laminate

Interconnect (etched Cu

pillar, vertical BVA)

Chip (flip chip)

Features - Mature FOWLP

process;

- Thinnest POP in

market;

- Finest POP pitch

- Fine L/S (BEOL);

- Chip last

- Preformed POP Vias at

fine pitch;

- Process yield and

reliability

Limitations - Coarse POP pitch;

- Process/material

complexity

- Package cost

- Warpage

- Package cost

- Thickness

- BVA Sequential

process;

- Infrastructure

compatibility

FOWLP POP Comparison

35 Oct 18-20, 2016 IWLPC

Conclusion

• Laminate to Fan-Out WLP Transition

POP SoC requirement of IO density, thickness, and L/S drives transition

to FOWLP

36 Oct 18-20, 2016 IWLPC

Conclusion

• Laminate to Fan-Out WLP Transition

POP SoC requirement of IO density, thickness, and L/S drives transition

to FOWLP

• FOWLP POP Key Elements

Main distinguishing feature among FOWLP approaches is Chip first or

Chip last, which impacts cost and yield

37 Oct 18-20, 2016 IWLPC

Conclusion

• Laminate to Fan-Out WLP Transition

POP SoC requirement of IO density, thickness, and L/S drives transition

to FOWLP

• FOWLP POP Key Elements

Main distinguishing feature among FOWLP approaches is Chip first or

Chip last, which impacts cost and yield

• POP Interconnect Features

Cu post offers finest pitch and thinnest package

BVA and uPILR are fine pitch alternatives utilizing existing assembly

infrastructure

38 Oct 18-20, 2016 IWLPC

• Tong Hsing Electronics for bondability study

• Savansys Solutions for BVA cost analysis

• Hala Shaba and Rajesh Katkar from Invensas team for FA support

Acknowledgement

39

Contact Info: Min TaoTel: 408-324-5152Email: [email protected]

Thank you!

Q&A