CAE tools and technology challenges in making deep sub-micron IC designs Kostas Kloukinas CERN,...
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Transcript of CAE tools and technology challenges in making deep sub-micron IC designs Kostas Kloukinas CERN,...
CAE tools and technology challenges in making deep sub-micron IC designs
Kostas KloukinasCERN, PH-ESE dept.
CH1211, Geneve 23
Switzerland
ESE Group seminar 30/3/2010
Overview
Technology Challenges
Modern CAE Tools
IC design CAE tools at CERN
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What drives CAE tools Innovation
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CAE tools have to coop with:
Deep Submicron effects “Black List” Numerous and Complicated Design Manufacturing Rules Leakage currents of devices Interconnect parasitics Process Variations Process Fault modes and Design For Manufacturability (DFM)
Design Challenges System On Chips (SOC) and IP Reuse Low Power Design techniques Formal Design Methodologies
Digital design flows Analog and Mixed Signal flows Hierarchical Implementation flows
Advanced Verification Techniques
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Complicated Design Rules Design Manual page count:
250nm: 170 pages 130nm: 600 pages + numerous application notes
Design Rule Check deck files: 250nm: 5,300 lines 130nm: 13,500 lines 90nm: 38,400 lines 65nm: 89,300 lines
One single verification tool is not capable any more to detect all DRC violations! Foundries require design sign-off verification using independently two
verification tools from two different vendors.
Tools make use of parameterized cells (Pcells) and automated “analog routers” to assist layout work and increase design productivity.
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Parameterized cell
Full Custom IC Assembly Router
Features and Benefits Device, cell, block and top-level chip
assembly routing support. Design constraint and process rule driven Interactive signal routing Multi-net/bus routing support On the fly Design Rule checking Variable Width and Spacing rules Automated signal routing Automated special net shielding
Requirements: Support from foundry PDK with
technology specific design rules andconstraints.
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Tool: Cadence Virtuoso Chip Assembly Router to augment design productivity.
Leakage currents affecting Power Digital Circuit Power Dissipation
Dynamic Power dissipation Short circuit power Switching power P = C * f * V2
dd
Static Power due to leakage currents
Leakage currents in deep submicron technologies: Gate tunneling leakage (a) Sub-threshold leakage (b) Reversed biased PN junction leakage (c) Gate Induced Drain Leakage (b)
Leakage Power is a significant component of the total power dissipationin 90nm technologies and below.
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Multiple VT standard cell libraries Multiple VT standard cell libraries.
High VT cells for low power
Low VT cells for high performance
Nominal VT cells for general purpose.
Logic synthesis High performance strategy
Synthesize with Low VT libraries and then optimize with High and Nominal.
Low power strategy Synthesize with High VT libraries
and then optimize with Low and Nominal.
Integrated strategy Synthesize with all libraries concurrently. State-of-the-art synthesis tools, like Synopsys “Design
Compiler” or Cadence “RTL Compiler”, support multi VT synthesis. Efficient synthesis is obtained when it is implemented at a cell level (not block level).
CAE tools have to deal with: Multiple libraries of 1,000s of cells Highly customized design flows.
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Low Power Design (1/6)
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Multi Voltage Libraries Different fixed supply voltages
depending performance requirements. Requires standard cell libraries
characterized at different supply voltages
Level Shifter cells Each power domain receives the voltage swing it expects.
Power Gating Power down idle blocks to reduce leakage currents. Requires special power control cells (switches) as well as isolation and state retention cells.
Dynamic Voltage and Frequency scaling. Voltage and frequency dynamically adjusted in response to changing workloads. Applicable to processors and microcontrollers.
CAE tools are required to handle: Multiple standard cell libraries characterized at different
power supply voltages. Floorplanning and special power rooting. Multi modes, Multi Voltage of operation.
High-Low Level Shifter
Low-HighLevel Shifter
Floorplanning with Level Shifters
Low Power Design (2/6) Power Switch cells
In a power gating design, sleep transistors are used as switches to shut off power supplies to parts of a design in standby mode
Power Grid floorplanning Better IR drop management & area optimization. Complexity in Physical Synthesis and Power Routing.
Ring Style floorplanning Less complex P&R especially for existing hard IP blocks For large blocks the IR drop in the center can be high.
Isolation & State Retention cells Isolation logic is typically used at the output of
a powered-down block to prevent floating, unpowered signals (represented by unknown or X in simulation) from propagating from powered-down blocks.
To speed power-up recovery, state retention power gating flops can be used to retain their state while the power is off.
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Power grid distribution Ring style distribution
Low Power Design (3/6) Control of the substrate voltage
Basic Principle: Increase the back gate voltage to increase VT and thus
decrease leakage. Decrease the back gate voltage to decrease VT and thus
increase performance at the expense of leakage power consumption. (Difficult & risky approach)
Special Tap cells (fill cells) Back or forward biasing for
performance/leakage optimization N-well voltage different from VDD Substrate or P-well (triple well process) voltage different
from VSS Bias voltage routed as signal pin or special power net
Correct well/substrate voltages in case of on-chip power gating Well pins connect wells to always-on power supplies
Keep wells “alive” when island is power down VNW must connect to always-on power when using
“header” power switches. VPW must connect to always-on power when using
“footer” power switches.
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Low Power Design (4/6)
Clock Gating Useful when data only loaded infrequently. No dynamic power when clock is stopped. Transformation to the 2nd implementation can be
done automatically by the CAE synthesis tool. Integrated Clock Gating cells (ICG) are special
standard cells that ensure a predictable clock gating behavior.
Controlled with tool specific settings. Can use normal standard cells but timing issues
are always a hazard.
Clock Gating: Cloning & Decloning You can even reduce the power some more by
moving the clock gating cells to higher levels in the hierarchy and combining them as much as possible.
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Low Power Design (5/6)
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Operand Isolation (Data Gating) Holding inputs to combinatorial blocks constant when
their outputs are not required. Reduces power by preventing switching activity
Gate level power optimizations Cell sizing Buffering Pin swapping Factoring
Implementation choices for Data Paths Multipliers Adders Bus Encoding Pipelining
Asynchronous Logic Design Extremely hard work with practically no support
from CAE tools!
Low Power Design (6/6)
Power intend description languages Universal Power Format (Synopsys) Common Power Format (Cadence)
Power aware simulation Power aware synthesis Power aware verification Power aware implementation Power aware logic equivalence check Power aware sign-off
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Interconnect Parasitics Increased number of metal layers at finer pitch.
The wire interconnect dominates timing Gate delay equals to interconnect delay at 130nm.
Metal interconnects have smaller widths, taller heights, shorter intra-layer spacing. In 350nm, wire to substrate capacitance was dominant. In 90nm, wire to wire capacitance is dominant.
Increased complexity of interconnect parasitic device extraction: Copper wire distortions caused primarily due to
CMP (Chemical Mechanical Polishing) results in irregular trapezoid conductors.
Below 90nm wireline variations require (min/typ/max) extraction.
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Signal Integrity issues Crosstalk in Deep Submicron
Smaller geometries increase coupling Technologies have gotten faster.
Edge rates are much higher, increasing the likelihood of crosstalk and worsen power/ground bounce.
Chips are much more complex, increasing the likelihood of long parallel wires.
Crosstalk induced Noise The aggressor net causes glitching on the victim net. If the glitches coincide with clock edges
then errors occur.
Crosstalk induced Delay Causing signal to speed up or slow down.
CAE Tools involved: Interconnect parasitic extraction engines. Static Timing Analysis engines Timing Optimization engines (buffer resizing) Place & Route engines (net reordering, wire spreading)
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Evolution of Digital Libraries
More accurate Timing Libraries Above 90nm NLDM is good enough
NLDM (Non Linear Device Model) “liberty” files (.lib)
Below 90nm Current Source models in use Interconnect capacitance > cell drive impedance. Non linear switching waveforms. Input pin capacitance becomes a function slope. Current sources are more effective at tracking
non-linear switching waveforms. Timing, Noise and Power calculations. ECSM (Effective Current Source Model) by Cadence CCS (Composite Current Source model) by Synopsys
More Libraries due to: Multi-VT options Multi-voltage options Multi-corners due to process parameters:
Tox, VTh variations Interconnect variations
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MMMC analysis & optimization Static Timing Analysis & Optimization
Many Modes of operation Functional modes Low Power design techniques
Process Variations Interconnect corners Device VT corners
Range of Voltage & Temperature conditions.
Traditional method Single mode/corner analysis Design for worst case conditions Still good for 90nm Overdesign or non-converging solution for < 65nm.
MMMC: Multi Mode Multi Corner “Scenario” (PVT+Mode+Parasitics) based approach. Optimization runs concurrently on all “scenarios” . Tools identify “dominant scenarios” performing
automated “scenario” reductions.
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Design for Variability Process Variations
Random dopant fluctuations affecting VTH Lithography (metalization) Intra-die variations Wafer- level, wafer-to-wafer, lot-to-lot variations
Traditional Static Timing Analysis Difficult to meet timimg Too pessimistic => overdesign.
Statistical Static Timing Analysis (SSTA) RC extraction with sensitivites Uses sensitivities to find correlations among
delays. Uses these correlations when computing how to
add statistical distributions of delays. Needs libraries supporting statistical timing
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Design for Reliability IR drop refers to fluctuations of the supply
voltage over the length of the supply line.
For IC design we consider both static & dynamic IR drop.
Electromigration EM problems occur when the power grid is not
sufficient to handle the current densities required by the design.
On the signal nets driven by high drive strength cells if the wires are too narrow,
On the power grid when several large current hungry cells are placed near to each other and are fed by inadequate power grid routing.
CAE Tools Synopsys: PrimeRail Cadence: VoltageStorm
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Animated voltage drop maps
Automated Power Grid Design PNA: Power Network Analysis
Manual Power Planning Provides early estimation of the final sign-off
analysis. “Virtual rails” that are not simulated,
only higher metal layers are considered. “What if” analysis varying number of straps,
width of straps, placement of pads, etc. Iterations to achieve target constraints.
PNS: Power Network Synthesis Attempt to eliminate the manual work! PN constraints describe the design targets like
total IR drop, as well as provide guidelines for the layout of the grid.
PNS is quite often an iterative process. Once the IR-drop and EM maps look ok the
power plan can be committed and the physical straps and rings can actually be laid down.
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Power Network Analysis
Power Network Synthesis
Flip Chip Solutions
RDL flow Wirebond pads placed at the periphery. Redistribution wiring layer to connect to ball pads.
Area Array flow Special C4 IO pads placed in designated “sites” inside the chip area. Special short signal routing. Special concerns for the placement of ESD structures
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Design For Manufacturability Antenna Violations
To prevent damage caused by charge build-up on MOS gates (during plasma etch processing steps), which causes damage to the MOS gate oxides
If you fail to fix antenna violations, you will end up with plasma induced gate oxide damage.
Max Metal Width Rules To prevent large areas of metal from lifting off during
processing due to differences in thermal co-efficient (metal and substrate will expand by different amounts)
Reduces the effects of Electro-migration. Slotting/Cheesing wide wires
or Splitting wide wires into multiple smaller wires.
Pattern Density Rules To reduce dishing and erosion of the inter-level dielectrics,
requires metal lines to be at a certain minimum distance from each other (metal density). This leads to the so called metal fills (dummy metal)
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The cause of many design Tape Out delays! Early consideration of pattern density rules is essential.
Layout Sign-Off Tools
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© IDESA 2007 |
Sign-off Evolution: Growing Importance of Sign-off
Example
1X
Complexity
30-40X
complexity
180nm
130nm
90nm
65nm
Design Schedule Design Schedule Variability Due to Sign-off
Future Project – 40 32nm ?
Should be predictable
Conservative design
Analog & Mixed Signal Flows
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The Concept
The use of the workflows may vary depending on the design requirements and organization of design teams.
Top-Down Functional Design Early chip level verification strategy has to be in place and validated with correct partitioning between analog and digital. As the project is proceeding toward completion, the same top-level validation is done by replacing the behavioural model with a transistor-level description (including RC parasitic if required).
Top-Down Physical Design Early floorplanning (including pad placement) even with rough estimation of block (area, aspect ratio, pin location) will enable to plan for special nets routing (buses, clocks, power network, sensitive nets ...). As the project is proceeding toward completion, the same floorplanning could be refined and adapted.
Bottom-up Block Function & Physical Design Analog and Digital block circuit level implementation (transistors & gates)
Advanced CAE tools platform. Full-Custom Analog design
Cadence Virtuoso platform “Front End design flow”
Standard-cell Digital design Cadence SOC Encounter platform “Back End design flow”
Key Technology: Open Access database A common database to save & restore designs
from Virtuoso and SOC_Encounter platforms. Significantly reduces data translations and
associated errors. Open standard. (http://openeda.org)
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“Analog on Top” Design Flow
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SOC_EncounterDigital block creation
SOC_EncounterDigital block creation
VirtuosoChip assembly
VirtuosoChip assembly
For big ‘A’ small ‘D’ designs.For big ‘A’ small ‘D’ designs.
BeginBegin
FinishFinish
Virtuoso Floorplanning Generate Physical Hierarchy.
Early in design phase: from soft-block (abstract) to hard-block (layout)
Helps avoid late-in-cycle block resizing, reshaping, pin-shuffling.
Cut down design cycle time with continuous and iterative floorplanning.
Accurate area estimation.
Full connectivity view (instances, connectivity, pins & prboundary)
Partial layout view generation (abstract like)
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AMS Designer Simulator
Mixed-signal, mixed-language, mixed-level simulator. Verilog¨, Verilog-A, Verilog-AMS, VHDL, VHDL-AMS,
System-C, System-Verilog, SPICE, and Spectre languages
Component-level schematics, netlists, behavioral models, structural models
A single-executable simulator incorporating the fastest in digital simulation (NCSim) with a choice of analog solvers (Spectre and UltraSim¨). UltraSim provide FastSPICE simulation capability.
Built on the INCA (Interleaved Native Compiled Architecture) platform.
High performance Fewer interfaces between tools Small, efficient memory footprint
Unified Debugging environment
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Constraint driven Analog design
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“Digital on Top” Design Flow
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SOC_EncounterChip Design
SOC_EncounterChip Design
VirtuosoAnalog Block Creation
VirtuosoAnalog Block Creation
For big ‘D’ small ‘A’ designs.For big ‘D’ small ‘A’ designs.
RTL synthesis
Floorplanning& power routing
Placement
Congestion analysis
Logical Equivalence
Checking
Timing optimization
SignoffRC extraction
Timing analysis
DRC
DFM
LVS
Logical Equivalence
CheckingClock tree synthesis
Routing
Timing optimization
Timing optimization
Tape-out
Automated taskUser task
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Objectives At present, Support for two advanced technology nodes:
Development of: “CMOS8RF Mixed Signal Design Kit” “Analog & Mixed Signal Methodologies (Workflows)”
Provide: Maintenance Training Support
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CMOS 8RF-LM
Low cost technology forLarge Digital designs
CMOS 8RF-LM
Low cost technology forLarge Digital designs
CMOS 8RF-DM
Low cost technology for Analog & RF designs
CMOS 8RF-DM
Low cost technology for Analog & RF designs
BiCMOS 8WL
Cost effective technology for Low Power RF designs
BiCMOS 8WL
Cost effective technology for Low Power RF designs
BiCMOS 8HP
High Performance technology for demanding RF designs
BiCMOS 8HP
High Performance technology for demanding RF designs
CMOS 9SF LP/RF
High performance technology for dense designs
CMOS 9SF LP/RF
High performance technology for dense designs
130nm CMOS130nm CMOS 90nm CMOS90nm CMOS
CAE Tools & Technology support
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FoundryFoundry Physical IPvendors
Physical IPvendors
CAE Toolsvendors
CAE Toolsvendors
CERN CAE tools &
technology support
CERN CAE tools &
technology support
Cadence VCAD
design services
Cadence VCAD
design services
CERN designersCERN designers External designersExternal designers
CMOS8RF Mixed Signal design kit
30/3/10 [email protected]
IBM Standard
cell libraries
IBM Standard
cell libraries
IBM PDKIBM PDK
Mixed Signal Design
Kit
Mixed Signal Design
Kit
CAE Tool
s
CAE Tool
s
Key Features: IBM PDK V1.6 IBM Standard cell and IO pad libraries
Physical Layout views available. Access to standard cell libraries is legally
covered by already established IBM CDAs
New versions of CAE Tools Open Access database support.
Interoperability of Virtuoso and SOC-Encounter platforms.
Compatible with the “Europractice” distributions.
Support for LINUX Platform (qualified on RHEL4)
Two design kits available: CMOS8RF-DM (3-2-3 BEOL) CMOS8RF-LM (6-2 BEOL)
38
CMOS8RF Mixed Signal Workflows
30/3/10 [email protected]
Analog & Mixed Signal (AMS) Workflows. Formalize the design work by employing
standardized and validated Design Workflows. Formalize the design work
across design teams in common projects. Provide a repository with reference design examples.
Development work subcontracted to Cadence, VCAD design services.
Close collaboration of CERN - VCAD - IBM VCAD brought in their invaluable expertise on the CAE tools IBM provided the physical IP blocks and important technical assistance CERN assisted the development and validated the design kit functionality.
39
Analog & Mixed Signal Workflows
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Prepared bySandro BonaciniCERN PH/[email protected]
“I2C slave” serial interface IP block employing Triple Module Redundancyfor enhanced SEU protection.
30/3/10 [email protected] 42
RTL synthesis
Floorplanning& power routing
Placement
Congestion analysis
Logical Equivalence
Checking
Timing optimization
SignoffRC extraction
Timing analysis
DRC
DFM
LVS
Logical Equivalence
CheckingClock tree synthesis
Routing
Timing optimization
Timing optimization
Tape-out
Automated task
User task
Digital Design Flow
Synthesis
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RTL compilerscript [.tcl]
Abstract layoutDefinition [.lef]
Capacitancetables [.CapTbl]
Max timingLiberty libraries
[.lib]
RTL synthesis
RTL description[.v] / [.vhd]
Timingconstraints
[.sdc]
Mapped netlist[.v]
Conformal script[.lec]
Synthesis,mapping andtiming reports
Logic Equivalent Checking (LEC)
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Tool: Conformal
Logical Equivalence
Checking
Max timingLiberty libraries
[.lib]
Mapped netlist[.v]
Conformal script[.lec]
RTL description[.v] / [.vhd]
LECreport
Floorplanning & Power Routing
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Define Chip/core size target area utilization I/O placement module placement in
case of TMR or other special constraints
Power planning/routing Core/block rings and
stripes
Placement
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Encounter command file
Placement
Scan-chain reorder
Open AccessFloorplannedDesign [.oa]
Connect cells power/ground
Add tap cells
Open AccessPlaced
Design [.oa]
Reports
Placement
30/3/10 [email protected] 47Sandro Bonacini - PH/ESE - [email protected]
Power/ground connections
Tap cellsStandard cells
Congestion analysis
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Use Encounter Trialroute to estimate congested areas
Manually add placement partial blockage
Change position of I/Os or blocks
…or increase number of routing metals
Open AccessPlaced
Design [.oa]
Congestion analysis
Placement optimization
Open AccessPlaced
Design [.oa]
Design For Manufacturing
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SignoffRC extraction
Cells & metal fill
Open AccessRouted
Design [.oa]
Antenna fix
Via optimization
Timing analysis
Open AccessFinal
Design [.oa]
Signoff timingreport
Delay file[.sdf]
Final netlist[.v]
Signal integrity analysis
Back to Virtuoso !
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OA design is present in Virtuoso Easily included in a
mixed-signal chip
Training: AMS Workshops
Workshop Targets: Present the IBM CMOS8RF (130nm) Mixed Signal Kit. Present Workflows for Analog, Digital and Mixed Signal designs. Introduce the new Platform of Cadence CAE Tools.
This is NOT: A course on analog or digital designing. An advanced course targeted to a specific Cadence Tool.
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Example Design
The workshop modules are based on a realistic Mixed Signal ASIC: Analog IP block: DAC Digital IP block: SRAM Digital block: I2C slave
synthesizable RTL code Triple Module Redundancy
Digital Flow Scripts
Top level Behavioral Modeling
Design verification
Final chip Physical verification
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AMS Workshop Contents Day 1 (Lead by Maxime Barbe)
- Introduction to AMS kit Workshop - Functional Verification : Digital Simulation Flow - Functional Verification : AMS Simulation from command-line - Functional Verification : AMS Simulation from DFII
Day 2 (Lead by Maxime Barbe)- Analog IP Characterization : ADEXL - Overview of IC6.13 (ADEXL and VSE) - Analog Block Creation: Constraints
Day 3 (Lead by Vincent Cao Van Phu) - Hierarchical Floorplaning (Virtuoso based) - CDB IP Import to OA database for IC61 Methodology
Day 4 (Lead by Vincent Cao Van Phu)- Digital Block Implementation- Block IP Characterization Back End- Digital IP Characterization Front-End
Day 5 (Lead by Vincent Cao Van Phu)- Constraint Driven Analog Block Creation Back-End- DRC (Calibre + Assura workflows)- LVS (Callibre + Assura workflows)- Extraction- Round table discussion and workshop evaluation (30min).
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Analog &
Mixed Signal
Digital
Physical Verification
AMS Workshops Workshop sessions
1st session: 26/10 – 30/10, 2009 (CERN internal engineers, “pilot” run) 2nd session: 16/11 – 20/11, 2009 (CERN, open to external engineers) 3rd session: 30/11 – 4/12, 2009 (IPHC, Strasbourg, France) 4th session: 1/2 – 5/2, 2010 (CERN, with fees) 5th session: 15/2 – 19/2, 2010 (CERN, with fees) 6th session: 1/3 – 5/3, 2010 (CERN, with fees) 7th session: 12/4 – 16/4, 2010 (CERN, with fees)
Statistics 10 engineers/session. 70 engineers in total.
Support Technical: Bert Van Koningsveld Secretarial: Evelyne Dho
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Future Plans
Extend the functionalities of the CMOS8RF (130nm) kit. Next PDK release scheduled for 3Q 2010
Integrates PDK V1.7.0 Implements bug fixes as reported by users.
Development of a Design Kit for the CMOS9LP/RF (90nm) Standard cell libraries. Design Workflows similar to those in the CMOS8RF Design Kit.
IP Block Packaging Solution
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IP packaging solution (VCAD)
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DECM tool in use at CERN Design Environment Configuration Management
Workflow management tool Design environment configuration
(environment variables, startup files, tool paths, etc) CAE tools rely heavily on UNIX environment variables for their
configuration.
Centralized management: Customized design environment for each project Consistency of setup within the design team Stability Project versioning
Flexibility Easy Graphical User Interface for the users and administrators. Different GUIs for different user roles Multiple sessions with different design environment configurations Built in project access control mechanism
VCAD Productivity IP solution.
Administrator: Bert Van Koningsveld
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PDKs &LibrariesPDKs &Libraries
EDA ToolsEDA Tools ProjectsProjectsWorkflowsWorkflows
Admin editorAdmin editor Project editorProject editor Project usersProject users
DECM serverDECM server
RAID ServerRAID ServerCAE Server #1CAE Server #1
Users Workstations (LINUX PCs)
lnxmic2SUNC. Paillard
lnxmic3SUNK. Kloukinas
lnxmic4SUNS. Marchioro
lnxmic5SUNA. Rivetti
lnxmic6CogestraL. Pierobon
lnxmic7CogestraW. Bialas
lnxmics1DELL1 TB RAID 1 Disc Storage
lnxmic8Cogestra P. Aspell
Tivoli serverTivoli serverCERN ITCERN ESE
lnxmic9SUNP. MoreiraS. Bonacini
lnxmic10SUNW. Snoeys
DAS serverDELL7 TB RAID 6 Disc Storage
LINUX CAE platform for IC design STATUS: Feb. 15, 2010
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lnxmic11CogestraM. Marra
lnxmic12SUNG. Venturini
lnxmic13SUNJ. Kaplon
lnxmic14SUNK. Poltorak
lnxmic15SUNF. Faccio
lnxmic16SUNS. Michelis
lnxmic17SUNS. Orlandi
lnxmic18SUNF. Anghinolfi
lnxmic19SUNW. Snoeys
lnxmic20CogestraR. De Oliveira
lnxmic21HP L. Perktold
lnxmic22SUNX. Llopart
lnxmicjbSUNT.S. Poikela
File Backup serverAdministrators: Bert Van Koningsveld Wojciech Bialas
The CERN ASIC support website
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http://cern.ch/asic-support
Download Design Kits and access technical documents(restricted access)
Information about MPW runs and foundry access services.
Communicate news and User support feedback formsand access request forms.
This website replaces our ‘afs’ based download facility.
Wrap Up
A message to Industry
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A message to industry:“ The present situation of IC design, which has high levels of flexibility in implementation is not sustainable by small and medium scale design groupsand a highly structured design flow and methodologies will need to be established”
Foundry Foundry
130 nm
90 nm
65 nm
45 nm
Third party IP vendorsThird party IP vendors
MethodologiesMethodologies
CAE VendorsCAE Vendors
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Acknowledgements• IDESA training EU 7th Framework Program (http://www.idesa-training.org/) for material presented in slides.• Cadence & VCAD services group in Paris for material presented in slides.• IBM for technology data presented in slides.• Sandro [email protected], for his work on the customized digital design flow.• [email protected], [email protected], for their efforts in the CAE tools support services.
Sign-Off Formal Equivalence
Verify that the final netlist is functionally equivalent to the original RTL code.
Using formal methods to compare logic. Two representations:
Reference (Golden) RTL code, the “correct” reference design Implementation (unknown) the design being verified.
Give a pass/fail result with information to help diagnosis.
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