8/23-25/05ELEC5970-001/6970-001 Lecture 21 ELEC 5970-001/6970-001(Fall 2005) Special Topics in...
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Transcript of 8/23-25/05ELEC5970-001/6970-001 Lecture 21 ELEC 5970-001/6970-001(Fall 2005) Special Topics in...
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 1
ELEC 5970-001/6970-001(Fall 2005)Special Topics in Electrical EngineeringLow-Power Design of Electronic Circuits
Power Consumption in a CMOS Circuit
Vishwani D. AgrawalJames J. Danaher Professor
Department of Electrical and Computer EngineeringAuburn University
http://www.eng.auburn.edu/[email protected]
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 2
Class Projects• Study of leakage dynamic power in nanometer devices• Low leakage technologies• Charge recovery and adiabatic switching circuits• Simulation-based power estimation tool• Transistor-sizing for low power• Logic and flip-flop design for low power• Low power clock distribution• Low power arithmetic circuits• Low power memory design• Benchmarking of low power microprocessors• Low power system design
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 3
Components of Power• Dynamic
– Signal transitions• Logic activity• Glitches
– Short-circuit
• Static– Leakage Ptotal = Pdyn + Pstat
Ptran + Psc + Pstat
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 4
Power of a Transition: Ptran
VVDDDD
GroundGround
CL
Ron
R=large
vi (t) vo(t) ic(t)
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 5
Charging of a Capacitor
V C
R
i(t) v(t)
Charge on capacitor, q(t) = C v(t)
Current, i(t) = dq(t)/dt = C dv(t)/dt
t = 0
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 6
i(t) = C dv(t)/dt = [V – v(t)] /R dv(t) V – v(t) ─── = ───── dt RC
dv(t) dt∫ ───── = ∫───── V – v(t) RC
-t ln [V – v(t)] = ── + A
RC
Initial condition, t = 0, v(t) = 0 → A = ln V -t
v(t) = V [1 – exp(───)]
RC
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 7
-t v(t) = V [1 – exp( ── )]
RC
dv(t) V -ti(t) = C ─── = ── exp( ── )
dt R RC
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 8
Total Energy Per Charging Transition from Power Supply
∞ ∞ V2 -tEtrans = ∫ V i(t) dt = ∫ ── exp( ── ) dt
0 0 R RC
= CV2
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 9
Energy Dissipated per Transition in Resistance
∞ V2 ∞ -2tR ∫ i2(t) dt = R ── ∫ exp( ── ) dt 0 R2 0 RC
1= ─ CV2
2
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 10
Energy Stored in Charged Capacitor
∞ ∞ -t V -t∫ v(t) i(t) dt = ∫ V [1-exp( ── )] ─ exp( ── ) dt0 0 RC R RC
1= ─ CV2
2
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 11
Transition Power• Gate output rising transition
– Energy dissipated in pMOS transistor = CV2/2– Energy stored in capacitor = CV2/2
• Gate output falling transition– Energy dissipated in nMOS transistor = CV2/2
• Energy dissipated per transition = CV2/2• Power dissipation:
Ptrans = Etrans α fck = α fck CV2/2
α = activity factor
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 12
Short Circuit Current, isc(t)
Time (ns)0 1
Amp
Volt
VDD
isc(t)
0
Vi(t)Vo(t)
VDD - VTp
VTn
tB tE
Iscmaxf
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 13
Peak Short Circuit Current
• Increases with the size (or gain, β) of transistors
• Decreases with load capacitance, CL
• Largest when CL= 0
• Reference: M. A. Ortega and J. Figueras, “Short Circuit Power Modeling in Submicron CMOS,” PATMOS’96, Aug. 1996, pp. 147-166.
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 14
Short-Circuit Energy per Transition
• Escf =∫tB
tE VDD isc(t)dt = (tE – tB) IscmaxfVDD /2
• Escf = tf (VDD- |VTp| -VTn) Iscmaxf /2
• Escr = tr (VDD- |VTp| -VTn) Iscmaxr /2
• Escf = 0, when VDD = |VTp| + VTn
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 15
Short-Circuit Energy
• Increases with rise and fall times of input
• Decreases for larger output load capacitance
• Decreases and eventually becomes zero when VDD is scaled down but the threshold
voltages are not scaled down
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 16
Short-Circuit Power Calculation
• Assume equal rise and fall times
• Model input-output capacitive coupling (Miller capacitance)
• Use a spice model for transistors– T. Sakurai and A. Newton, “Alpha-power Law
MOSFET model and Its Application to a CMOS Inverter,” IEEE J. Solid State Circuits, vol. 25, April 1990, pp. 584-594.
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 17
Short Circuit Power
Psc = α fck Esc
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 18
Psc vs. C
C (fF)
Decreasing Input rise time3ns
0%
45%
0.5ns
Psc
/Pto
tal
0.7μ CMOS
35 75
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 19
Psc, Rise Time and Capacitance
VVDDDD
GroundGround
CL
Ron
R=large
vi (t) vo(t) ic(t)+isc(t)
tftr vo(t)───
R↑
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 20
isc, Rise Time and Capacitance
-tVDD[1- exp(─────)]
vo(t) R↓tf (t)CIsc(t) = ──── = ──────────────
R↑tf (t) R↑tf (t)
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 21
iscmax, Rise Time and Capacitance
Small C Large C
tf
1────R↑tf (t)
iscmax
vo(t) vo(t)
i
t
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 22
Psc, Rise Times, Capacitance
• For given input rise and fall times short circuit power decreases as output capacitance increases.
• Short circuit power increases with increase of input rise and fall times.
• Short circuit power is reduced if output rise and fall times are smaller than the input rise and fall times.
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 23
Technology Scaling
• Scale down by factors of 2 and 4, i.e., model 0.7, 0.35 and 0.17 micron technologies
• Constant electric field assumed
• Capacitance scaled down by the technology scale down factor
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 24
Bulk nMOSFET
n+
p-type body (bulk)
n+
L
W
SiO2
Thickness = tox
Gate
SourceDrain
Polysilicon
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 25
Scaling Factor, α• Constant electric field• L = L / α• W = W / α• tox = tox / α• VDD = VDD/α• Capacitance → 1/α• Gate delay → 1/α• Area → 1/α2
• Power dissipation → 1/α2
• Power density constant• Doping → α
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 26
Technology Scaling Results
Input tr or tf (ns)1%
70%
Psc
/Pto
tal
L=0.7μ, C=40fF
0.4 1.6
12%
L=0.35μ, C=20fF
L=0.17μ, C=10fF
60%
4%
16%
37%
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 27
Effects of Scaling Down
• 1-16% short-circuit power at 0.7 micron
• 4-37% at 0.35 micron
• 12-60% at 0.17 micron
• Reference: S. R. Vemuru and N. Steinberg, “Short Circuit Power Dissipation Estimation for CMOS Logic Gates,” IEEE Trans. on Circuits and Systems I, vol. 41, Nov. 1994, pp. 762-765.
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 28
Summary: Short-Circuit Power
• Short-circuit power is consumed by each transition (increases with input transition time).
• Reduction requires that gate output transition should not be faster than the input transition (faster gates can consume more short-circuit power).
• Increasing the output load capacitance reduces short-circuit power.
• Scaling down of supply voltage with respect to threshold voltages reduces short-circuit power.
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 29
Components of Power
• Dynamic– Signal transitions
• Logic activity• Glitches
– Short-circuit
• Static– Leakage
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 30
Leakage Power
IG
ID
Isub
IPT
IGIDL
n+ n+
GroundVDD
R
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 31
Leakage Current Components
• Subthreshold conduction, Isub
• Reverse bias pn junction conduction, ID
• Gate induced drain leakage, IGIDL due to
tunneling at the gate-drain overlap
• Drain source punchthrough, IPT due to short
channel and high drain-source voltage
• Gate tunneling, IG through thin oxide
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 32
Subthreshold Current
Isub = μ0 Cox (W/L) Vt2 exp{(VGS-VTH)/nVt}
μ0: carrier surface mobility
Cox: gate oxide capacitance per unit area
L: channel lengthW: gate widthVt = kT/q: thermal voltage
n: a technology parameter
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 33
IDS for Short Channel Device
Isub = μ0 Cox (W/L) Vt2 exp{(VGS-VTH+ηVDS)/nVt}
VDS = drain to source voltage
η: a proportionality factor
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 34
Increased Subthreshold Leakage
0 VTH’ VTH
Lo
g I
sub
Gate voltage
Scaled device
Ic
8/23-25/05 ELEC5970-001/6970-001 Lecture 2 35
Summary: Leakage Power
• Leakage power as a fraction of the total power increases as clock frequency drops. Turning supply off in unused parts can save power.
• For a gate it is a small fraction of the total power; it can be significant for very large circuits.
• Scaling down features requires lowering the threshold voltage, which increases leakage power; roughly doubles with each shrinking.
• Multiple-threshold devices are used to reduce leakage power.