Ic fab
Ischia, 21-23 giugno 2006Riunione Annuale GE 2006 Integrated Optical Microsensors Based On Porous Silicon Technology For Vapours And Liquids Identification.
Process Flow Steps Steps –Choose a substrate Add epitaxial layers if needed –Form n and p regions –Deposit contacts and local interconnects –Deposit.
Photoresist layer
1. A clean single crystal silicon (Si) wafer which is doped n-type (ColumnV elements of the periodic table). MOS devices are typically fabricated on a,
Process Flow
