81270005 the VLSI Handbook
Sem and tem
Solid State Lab
schuler_imaps_ibm
NUMERICAL INVESTIGATION OF WAVE EFFECTS IN HIGH-FREQUENCY CAPACITIVELY COUPLED PLASMAS* Yang Yang and Mark J. Kushner Department of Electrical and Computer.
SiO 2 ETCH PROPERTY CONTROL USING PULSE POWER IN CAPACITIVELY COUPLED PLASMAS* Sang-Heon Song a) and Mark J. Kushner b) a) Department of Nuclear Engineering.
WAVE AND ELECTROSTATIC COUPLING IN 2-FREQUENCY CAPACITIVELY COUPLED PLASMAS UTILIZING A FULL MAXWELL SOLVER* Yang Yang a) and Mark J. Kushner b) a) Department.
ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner.
WAFER EDGE EFFECTS CONSIDERING ION INERTIA IN CAPACITIVELY COUPLED DISCHARGES* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department.
MAGNETICALLY ENHANCED MULTIPLE FREQUENCY CAPACITIVELY COUPLED PLASMAS: DYNAMICS AND STRATEGIES Yang Yang and Mark J. Kushner Iowa State University Department.
EDGE EFFECTS IN REACTIVE ION ETCHING: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department of Electrical.
INVESTIGATIONS OF MAGNETICALLY ENHANCED RIE REACTORS WITH ROTATING (NON-UNIFORM) MAGNETIC FIELDS Natalia Yu. Babaeva and Mark J. Kushner University of.
