Engine overhaul
ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner.
WAFER EDGE EFFECTS CONSIDERING ION INERTIA IN CAPACITIVELY COUPLED DISCHARGES* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department.
EDGE EFFECTS IN REACTIVE ION ETCHING: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department of Electrical.
LAB #7 Reassembly. Get Check Off Sheet Before you start, make sure you get a reassembly packet from Mrs. Winegar. If you do not have her check your work.
ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS:
