Lithography and Electrodeposition 2010 Nano Education Institute at UMass Amherst (Mark Tuominen) bnl manchester ibm UMass.
Lithography (and briefly, Electrodeposition) July 10, 2008: Nano Education Institute at UMass Amherst bnl manchester ibm UMass.
IC Processing. Initial Steps: Forming an active region Si 3 N 4 is etched away using an F-plasma: Si3dN4 + 12F → 3SiF 4 + 2N 2 Or removed in hot.
INTRO TO TDM AND BUM TDM – Top Down Manufacturing BUM – Bottom Up Manufacturing.
Microarray Technology and Data Analysis (November 28, 2007) slides assembled by Dong-Guk Shin and J Peter Gogarten.
Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating.
Nanoimprint II. NIL Technology sells stamps for nanoimprint lithography (NIL) and provides imprint services. Stamps made in Siliocn, Quartz, and Nickel.
Genomics Complete Genomes in The Public DataBases >100 Non-Eukaryotes Eukaryotes: Leishmania 257 Kb 79 orfs Plasmodium falciparum I 947 Kb 205.
Gene Expression BMI 731 week 5 Catalin Barbacioru Department of Biomedical Informatics Ohio State University.
1 Micro-fabrication Process. 2 Clean Room 3 Clean room classifications and applications.
Microelectronics & Device Fabrication. Vacuum Tube Devices Thermionic valve Two (di) Electrodes (ode)
DNA-based information technologies Understand use of polymorphisms DNA fingerprinting Understand use of proteome to determine protein function Understand.
