AMD Mainstream Desktop Platform Media Presentations
TRI-GATE Transistor
22nm tri-gate technology
Development of Deep Submicron CMOS Process for Fabrication of Hig
Characterization and Fabrication of 90nm_using_tcad
Network on Chip - Architectures and Design Methodology Natt Thepayasuwan Rohit Pai.
July 10, 2011MtM WG - ITRS ERD - San Francisco1 “ More-than-Moore ” ERD M. Brillouët – U-In Chung – S. Das – A. Ionescu + H. Bennett – Y. Obeng.
Internal Thermoelectric Effects and Scanning Probe Techniques for Inorganic and Organic Devices Kevin Pipe Department of Mechanical Engineering University.
Technology Development for InGaAs/InP-channel MOSFETs [email protected] 805-893-3244, 805-893-5705 fax MRS Spring Symposium, Tutorial: Advanced CMOS—Substrates,
Cadence’s Signoff Summit Teething Signoff – You have to own it
ECE 730: Fabrication in the nanoscale : principles, technology and applications
Package Technology Trends and Lead Free Challenges C. Michael Garner, Fay Hua, Nagesh Vodrahalli, Ashay Dani, Tom Debonis, Raiyo Aspandiar, and Gary Brist.
