Shamil Baldeosingh Dasney Joseph Walter McKinley March 4 th, 2010 EML 4905 Senior Design Project Advisor: Dr. K. H. Wu March 24, 2010 1.
Technology Thin films ZnO:Al were prepared by RF diode sputtering from ZnO + 2wt % Al 2 O 3 target. It is a plasma assisted deposition method which involves.
