The 0.15µm GaN Hemt process...GaN TECHNOLOGY GH15 GaN process is optimized up to 35GHz for high...

2
GaN TECHNOLOGY GH15 GaN process is optimized up to 35GHz for high power, high PAE and high linearity. The Gallium Nitride power density combined with a thermal dissipative SiC substrate brings to 3.5W/mm at 30GHz. This MMIC process includes MIM capacitors, inductors, air bridges, metallic resistors, via through the substrate and two metal layers for interconnections. GH15 is the ideal process to design: • High power and high PAE amplifiers up to Ka-band • Robust LNA • High Power switches Build your own solution with UMS www.ums-gaas.com The 0.15µm GaN Hemt process >>>

Transcript of The 0.15µm GaN Hemt process...GaN TECHNOLOGY GH15 GaN process is optimized up to 35GHz for high...

Page 1: The 0.15µm GaN Hemt process...GaN TECHNOLOGY GH15 GaN process is optimized up to 35GHz for high power, high PAE and high linearity. The Gallium Nitride power density combined with

GaN TECHNOLOGY

GH15 GaN process is optimized up to 35GHz for high power, high PAE and high linearity. The Gallium Nitride power density combined with a thermal dissipative SiC substrate brings to 3.5W/mm at 30GHz. This MMIC process includes MIM capacitors, inductors, air bridges, metallic resistors, via through the substrate and two metal layers for interconnections.

GH15 is the ideal process to design:• High power and high PAE amplifiers

up to Ka-band• Robust LNA• High Power switches

Build your own solution with UMSwww.ums-gaas.com

The 0.15µm GaN Hemt process

>>>

Page 2: The 0.15µm GaN Hemt process...GaN TECHNOLOGY GH15 GaN process is optimized up to 35GHz for high power, high PAE and high linearity. The Gallium Nitride power density combined with

UM

S 2

019

/ 202

0 - P

rinte

d on

PE

FC p

aper

- S

mith

Cor

pora

te :

01 6

9 59

11

30 -

ww

w.s

mith

corp

orat

e.fr

Contact us:

Worldwide distributor: Richardson RFPDwww.richardsonrfpd.com

UMS SAS – EMEA,Ph: +33 1 69 86 32 [email protected]

UMS USA, Inc. - America,Ph: +1 781 791 [email protected]

UMS - Asia, Ph: +86 21 6103 1703 [email protected]

www.ums-gaas.com

Process Design Kit (PDK) includes non-linear electro-thermal models, noise model, diodes & switches models, passive models, all with associated library elements.

Applications targeted with GH15:• Pt to Pt radio• 5G• Satcom• Radar• Broadband amplification• Hi-Rel products

Element Typical Value

Vt -3,2 V

Idss 1.2 A/mm

Ids+ 1.4 A/mm

Gm 390 mS/mm

VdsDC 20 V

Ft > 35 GHz

Fmax > 100 GHz

MIM density 175 pF/mm2

Metallic resistors 30 and 1000 Ohms/sq

Via-holes available on 70-µm substrate thickness

Process main features