Ram MICRO Keynote rev3 - Ohio State University
Transcript of Ram MICRO Keynote rev3 - Ohio State University
High Performance Energy Efficient Near Threshold Circuits: Challenges and
Opportunities
2012 MICRONear Threshold Computing Workshop Keynote
December 2012
Ram K. KrishnamurthySenior Principal Engineer
Circuits Research Lab, Circuits & Systems Research, Intel Labs
Intel Corporation, Hillsboro, OR 97124, [email protected]
Acknowledgements: Intel Circuits Research Lab, Vivek De, Rick Forand, Wen-Hann Wang,
Shekhar Borkar, Greg Taylor, IPR Bangalore Design Lab, Stefan Rusu, Jim Held
2
Era of Tera-scale ComputingTeraflops of performance operating on Terabytes of data
Terabytes
TIPS
Gigabytes
MIPS
Megabytes
GIPS
Perform
ance
Dataset SizeKilobytes
KIPS
Mult-Media
3D &Video
Text
ModelsPersonal Media Creation and Management
Entertainment, learningand virtual travel
Health
Terascale
Multi-core
Single-core
Financial Analytics
Model-based AppsRecognition
MiningSynthesis
3
Tera-scale Platform Vision
Scalable On-die Interconnect FabricScalable On-die Interconnect Fabric
SpecialPurposeEngines
Integrated IOdevices
IntegratedMemory
Controllers
High BandwidthMemory
Off Die interconnect
IOSocketInter-
Connect
Cache Cache Cache
Last LevelCache
Last LevelCache
Last LevelCache
4
Silicon Process Technology Innovation
14nm
2013*10nm
2015*7nm
2017* 2019+MANUFACTURING DEVELOPMENT
45nm
200732nm
200922nm
2011RESEARCH
65nm
2005
*projected
Process innovation leads to energy efficient performance
and predictable 2-year technology cycles
Hi-K Tri-Gate
5
22nm Performance and Energy Scaling
M. Bohr, Intel Developer Forum 2012
Silicon Integration Providing
Greater End-User Value
Silicon Integration Providing
Greater End-User Value
• More transistors/area: enables substantial system-on-chip integration opportunities
• More transistors/area: enables substantial system-on-chip integration opportunities
Extreme Scale (Exa-Scale) Computing Research2W – 100 GigaFLOPS 20MW - ExaFLOPS
10 year goal: ~300X Improvement in energy efficiency Equal to 20 pJ/FLOP at the system level
J. Rattner, ISCA 2012 Keynote
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Ultra Low Power Graphics/Video & Security Circuits
Ultra Low Power Graphics/Video & Security Circuits
� DSP functions highly throughput-oriented: Amenable for parallelism/pipelining
⇒ Better power-performance optimization
⇒ Optimal partitioning of tasks between GP processor and dedicated engines
� DSP functions highly throughput-oriented: Amenable for parallelism/pipelining
⇒ Better power-performance optimization
⇒ Optimal partitioning of tasks between GP processor and dedicated engines
GO
PS
/W
PPC
PPC1-SOI
Sparc
Sparc2
PPC2-SOI
Sparc1 P4
x86
PPC770
Alpha
PPC970
Alpha
PPC
Itan
ium
SA-DSP
Hitachi-DSP
Fuj-DSP
Fuj-DSP
Cell-SPE
KAIST-DSP
NEC-DSP
Fuj-Multi
MPEG2
Encryp
t
MUD
MPEG2
802.11a
Microprocessors
DSPs
DedicatedHW
10x
100x
10-100X higher performance/watt vs. GP cores
Flexibility vs. energy-e
fficiency
More flexible…More flexible…
More efficient…
Source: ISSCC
Video
ME
SIMD Vector
SIMD Permutation
AES Encryp
tion
Intel ISSCC, VLSI 2008-2012
9
Specialized HW Accelerators for Specialized HW Accelerators for Specialized HW Accelerators for Specialized HW Accelerators for ExaExaExaExa----ScaleScaleScaleScale
General purpose cores, special-purpose accelerators, interconnect fabricEfficient, adaptive, reconfigurable, resilient
LowLowLowLow----power generalpower generalpower generalpower general----purpose corepurpose corepurpose corepurpose core
SP HW acceleratorsSP HW acceleratorsSP HW acceleratorsSP HW accelerators
Fixed function vs. limited programmabilityOperation over wide supply voltage range (near-threshold to nominal)
NTV Operation & Energy Efficiency
10
10-2
10-1
1
101
0
75
150
225
300
375
450
0.2 0.4 0.6 0.8 1.0 1.2 1.4Supply Voltage (V)
Ac
tive
Lea
kag
e P
ow
er
(mW
)
En
erg
y-E
ffic
ien
cy
(GO
PS
/Watt
)
320mV
9.6X
65nm CMOS, 50°C
Su
bth
res
ho
ld
1
101
103
104
102
10-2
10-1
1
101
102
0.2 0.4 0.6 0.8 1.0 1.2 1.4
65nm CMOS, 50°C
Max
imu
m F
req
ue
nc
y (
MH
z)
To
tal
Po
we
r (m
W)
Supply Voltage (V)
Frequency reduces almost linearly first, then exponentially
Total power reduces by three to four orders of magnitude
Energy efficiency improves by one order of magnitude at NTV
Energy efficiency reduces in subthreshold operation
Leakage power reduces by two to three orders of magnitude
H. Kaul, R. Krishnamurthy et al, ISSCC 2008
NTV Across Technology Generations
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0
0.5
1.0
1.5
2.0
2.5
3.0
0.2 0.4 0.6 0.8 1.0 1.2 1.4Supply Voltage (V)
Energy Efficiency (TOPS/W)
10-3
10-2
10-1
1
10
Active Leakage Power (mW)
Reconfigurable Fabric, 32nm CMOS, 50°C
340mV
0.8mW5.7x
Su
b-t
hre
sh
old
Re
gio
n
0.2 0.4 0.6 0.8 1.0 1.2
Energy Efficiency (GOPS/W)
Supply Voltage (V)
Leakage Power (mW)
103
102
10
10-2
1
10-3
103
102
10
1
10-1
Sub-threshold
Region
22nm CMOS, 50°C
9x
9x
Register FilePermute Crossbar
0
1
2
3
4
5
6
7
8
9
0.15 0.40 0.65 0.90 1.15 1.40No
rma
lized
En
erg
y E
ffic
ien
cy
Supply Voltage (V)
300mV
8X
45nm CMOS 50°C
32b Multiply
16b SIMD Multiply
72b Add 1.1V
0.980.870.740.590.370.15VhiVlo
H. Kaul, et. al., ISSCC 2009
A. Agarwal, et. al., ISSCC 2010
S. K. Hsu, et. al., ISSCC 2012
NTV operation improves energy efficiency across 45nm-22nm CMOS
NTV Opportunities for Wide Dynamic Range
T. Thakkar, Intel Developer Forum 2012
ATOM™ 32nm SOC V/F Islands
SoC integration of many unrelated functions in their own power ‘islands’.
CPU
audiosouth
complex
security
2D/3D
graphics
Image Signal
Processor display
video
NCPLLs
GPIO
MIPI DDRGPIODDR
DDR
DDR
EMMC
GPIO D
DR
DDR
clocks
HDMI
• On-die voltage regulation leading to power ‘islands’ that
can have different voltage levels.
• Power management that shuts functional units off.
• Voltage-Frequency pairs; CPU’s can be run in several
operating points where its power supply is adjusted to
reduce power while keeping various functional blocks at
constant voltage:
– lowest frequency: 100 - 600MHz
– medium frequency: 700 - 1500MHz
– burst frequency: 1600 – 2500MHz
• OFF chip drivers have to support various voltage levels
whereas the controller logic is powered by a lower
voltage :
– LPDDR: 1.25V
– MIPI-display: 1.25V
– HDMI-display 3.3V
– SD cards: 2.85V
– GPIO: 1.25V, 1.80V
T. Thakkar, Medfield, Intel Developer Forum 2012
NTV Opportunities for Converged Core
14
T. Piazza, Intel Developer Forum 2012
Impact of Variation on NTV
15
0%
10%
20%
30%
40%
50%
60%
0.0
0.2
0.4
0.6
0.8
1.0
0.0 0.2 0.4 0.6 0.8 1.0
Fre
q (
Re
lative
)
Vdd (Relative)
Frequency
Spread
+/- 5% Variation in Vdd or Vt
0
1
2
3
4
5
6
1.0 0.9 0.8 0.8 0.7 0.6 0.5 0.4 0.3 0.2 0.1
Cir
cuit
vu
lne
rab
ilit
y t
o 5
% n
ois
e
Vdd scaling towards threshold ���� Threshold����
5% variation in Vt or Vdd results in up to 50% variation in circuit performance
dd
tdd
V
VVfrequency
α
)( −∝
Variation Modeling & Measurements
16
1
101
103
104
102
0.2 0.4 0.6 0.8 1.0 1.2 1.4
Supply Voltage (V)
65nm CMOSTypical Die Measurements
Maxim
um
Fre
qu
en
cy (
MH
z)
±2X
±5%
50°C
320mV
Frequency variation across 0-110°C
0.5 1.0 1.5 2.0
No
rmali
zed
Dis
trib
uti
on
65nm CMOS, 50°C
1.2V
320mV
0
1
Frequency variation across fast – slow dies
±18%
±2X
Normalized Frequency
Monte-Carlo Simulations
18% nominal frequency spread
2X spread at NTV
65nm CMOS measurements
5% nominal spread due to temperature
2X spread at NTV
H. Kaul, R. Krishnamurthy et al, ISSCC 2008
Using Vdd to Compensate for Variation
• Adaptive Voltage Compensation for variation tolerance
• Adjust supply voltage to maintain constant performance
• ±50mV adjustment about 320mV:
ð Nominal 23MHz performance sustained across 0-110°C and fast-slow skews
Intel Confidential17
65nm CMOS, 320mV Typical Die
23
MH
z
Temperature (C)
Fre
qu
en
cy (
MH
z)
Fre
qu
en
cy (
MH
z)
23
MH
z
65nm CMOS, 320mV, 50C
Process SkewSlow Typical Fast
0
14
28
42
56
0 50 110
0
14
28
42
56
Subthreshold Leakage at NTV
18
0%
10%
20%
30%
40%
50%
60%
45nm 32nm 22nm 14nm 10nm 7nm 5nm
SD
Leakag
e P
ow
er
100% Vdd
75% Vdd
50% Vdd
40% Vdd Increasing Variations
NTV operation reduces total power, improves energy efficiency
Subthreshold leakage power is substantial portion of the total
Low Voltage SRAM and Register File
19
6T SRAM suffers stability and yield at NTV
6T SRAM cell with larger transistors
8T/10T SRAM for improved stability and yield
wrbl
wrbl#
rdbl
wrbl
wrbl#
rdbl
Conventional dual-ended (DE) write cell(Write failure due to strong P and weak N)
Dual-ended transmission gate (DETG) write cell
Variation tolerant register file for NTV
S. Hsu, R. Krishnamurthy et al, ISSCC 2012
Low Voltage Latches and Flip-flops
20
Upsized
Non-minimum Channel Length
Ck
Ck
Ck
Ck
Ck
Ck
Ck
Ck
D
Q
“1”“0”
Designing flip-flops for NTV Averaging with vector flip-flops
Shared min-sized clock drivers
Vmin improves by 175 mVHold time margin by 7 to 30%
Low Voltage Logic: Multiplexers & Gates
21
“1”
“0”
“0”
“0”
“1”
One-hot 4:1
“1”
“0”
“0”
“0”
“1”
“0”
Encoded 4:1
Designing multiplexers for NTV
Up to 3X reduction in worst case
static droop
Avoid series connected
transmission gates
Logic fan in limited to 3 stack
Transmission gates, logic gatesIssue:
Large off-current paths
Weak on-current pathsBody effect
Low Voltage Level Converters
22
Low Voltage
Circuit Block
High Voltage
Circuit Block
CVSL Level ConverterSignificant energy
consumed in contention currents
Two-stage cascaded split-output level shifter
Ultra-low voltage split-output level shifter
IN
MIDVCCLOW
VCCMID
VCCMID
VCCHIGH
OUTVCCLOW
0
0
VCCHIGHCVSL Stage
CVSL Stage
CVSL split into two stages to reduce contention current
Decoupled output for smaller CVSL
20% energy reduction
Decoupled output from CVSL
Interrupts contention devices
Vmin improved by 125 mV
H. Kaul, R. Krishnamurthy et al, ISSCC 2009
Soft Errors and Reliability
23
0
0.2
0.4
0.6
0.8
1
0.5 1 1.5 2Voltage (V)
n-S
ER
/ce
ll (
se
a-l
ev
el)
65nm
90nm
130nm
180nm
250nm
Soft error/bit reduces each generation
Impact of NTV on soft error rate
1
10
180 130 90 65 45 32
Technology (nm)
Rela
tive t
o 1
30n
m
Memory
Latch
Assuming 2X bit/latch
count increase per generation
Soft error at the system level will
continue to increase
Positive impact of NTV on reliability
Low V � lower E fields, low power � lower temperature
Device aging effects mitigated
Lower electro-migration related defects
NTV SIMD Permutation Engine
•SIMD permutation operations are key for maximizing vector datapath utilization in multimedia, graphics, and signal processing workloads
•SIMD vector permutation engine with 2-dimensional shuffle consists of register file for vertical shuffle and permutation crossbar for horizontal shuffle
32x8b
3R1Wx16
Register File Permute
Crossbar
RdData0x
RdData1x
RdData2x
x16
32x8b
3R1W
Register File
PermOutx16
RdAdd2x
32x128b 3R1W Register File BankVertical Shuffle
32 entries
RdAdd1x
RdAdd0x
WrAdd0x
RdData0x
WrData0x
a0
256b Permute Crossbar (32 x 32:1)Horizontal Shuffle
RdData1x
5:32 Decoder
8b
b1
d3
a0
5:32 Decoder
b1
8b
5:32 Decoder
8b
c2
5:32 Decoder
d3
8b
a0
b1
c2
d3
h7
a0
d3
e4
x32
x32
x32
x32
mode
RdData0x
Bank0
Bank1
Bank14Bank15
2:1
e4
x16
f5g6
h7
c2
f5g6
b1
2:1
PAdd0x
2:1
x16x16X16 x16
RdData0x RdData0y
RdData0y
RdData1y
RdData2y
RdAdd0y
RdAdd1y
RdAdd2y
WrAdd0y
WrData0y
128
128
128
128
RdData2x
PAdd0y
2:1
RdData1y
5 5
16x5 16x5
16x5
16x5256
RdAdd0x
RdAdd1x
RdAdd2x
WrAdd0x
WrData0x
c2
mode
Process 22nm CMOS
Nominal Vcc
0.9V
Permute Xbar
256b byte-wise any-to-any
Register File
32x256b 3R/1W
Die Area 0.048mm2
Pad Count 30
256b Permutation Engine Organization
22nm CMOS Chip Micrograph
Logic and Memory VMIN Circuit Optimizations
•Register file and logic VMIN circuit optimizations enable NTV operation
•Register file VMIN techniques: (i) clock-less static CMOS reads, (ii) dual-ended transmission gate (DETG) writes with shared P/N
•Logic VMIN techniques: (i) vector flip-flops, (ii) stacked min-delay buffers, (iii) shared gates to average min-sized transistor variation,
(iv) ultra low voltage split-output level shifters
RdLBL
DQ
C FF
WrBl
WrBl#
Vccx
Vssx
Vccx
Vssx
RdLBL
PLBL
DQ
C FF
x128
x128
LS
sel#
32:1 MUX
DQ
C FF
pout
32x256b 3R/1W Register File Circuits
256b Permute Crossbar Circuits
22nm Simulations/Measurements
•VMIN improvement: register file VMIN by 250mV and logic VMIN by 150mV
•Nominal: 1.8GHz, 0.9V, 50°C down to sub-threshold: 16.8MHz, 280mV
•Wide voltage supply scalability across 280mV - 1.1V increasing energy efficiency by 9x: Industry’s first Tri-Gate NTV Logic + Memory circuits
0.2 0.4 0.6 0.8 1.0 1.2
Maximum Frequency (MHz)
Supply Voltage (V)
Total Power (mW)
104
103
102
10
10-1
1
104
103
102
10
10-1
1
10-2
0.2 0.4 0.6 0.8 1.0 1.2
Energy Efficiency (GOPS/W)
Supply Voltage (V)
Leakage Power (mW)
103
102
10
10-2
1
10-3
103
102
10
1
10-1
22nm CMOS, 50°C
Sub-threshold Region
Register FilePermute Crossbar
Sub-threshold Region
22nm CMOS, 50°C
9x
9x
Register FilePermute Crossbar
Register File VMINSimulations
Permutation Engine VMINSimulations
Maximum Frequency and Total Power
Measurements vs. Supply Voltage
Energy Efficiency and Active Leakage Measurements vs.
Supply Voltage
22nm VMIN simulations performed at 0°C -85°C,
3σ systematic, 6σ random variation
585GOPS/W
154GOPS/W
S. Hsu, R. Krishnamurthy et al, ISSCC 2012 & JSSC January 2013
27
H. Kaul, R. Krishnamurthy et al, ISSCC 2012
NTV Variable Precision FPU
Experimental NTV Processor
28
Technology 32nm High-K Metal Gate
Interconnect 1 Poly, 9 Metal (Cu)
Transistors 6 Million (Core)
Core Area 2mm2
IA-32 CoreLogic
Scan
RO
M
L1$-I L1$-D
Level Shifters + clk spine
1.1 mm
1.8
mm
Custom Interposer951 Pin FCBGA Package
Legacy Socket-7 MotherboardS. Jain, et al, “A 280mV-to-1.2V Wide-Operating-Range IA-32 Processor in 32nm CMOS”, ISSCC 2012
NTV Design Methodology
29
Normalized Delay Slowdown Due to Random Variations (6σ)
Logic Vcc (V)
1
2
3
4
5
6
7
0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1 1.1
Nominal Vt High Vt
76%
Nominal Versus High Vt Devices
0
2
4
6
8
10
12
1X 2X 3X 4X 5X
Device Width
0.5V
130%
Minimum/Small Sized Devices
Subth
reshold
Power & Performance
30
915MHz
500MHz
100MHz
3MHz
737mW
174mW
17mW2mW
0
100
200
300
400
500
600
700
800
1
10
100
1000
0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1 1.1 1.2
0.55 0.55 0.55 0.55 0.6 0.7 0.8 0.9 1 1.1 1.2
To
tal P
ow
er (m
W)F
req
uen
cy (
MH
z)
32nm CMOS, 25oC
Logic Vcc / Memory Vcc (V)
4%
33%
62%
1%
53%
27%
15%
5%81%
11%
3%
5%
Logic dynamicMemory leakage
Logic leakage
Subthreshold NTV Super-threshold
Wide Dynamic Range
31
NTV
EN
ER
GY
E
FF
ICE
NC
Y
HIGH
LOW
VOLTAGEZERO MAX
~5x Demonstrated
Normal operating range Subthreshold
Ultra-low Power Energy Efficient High Performance
280 mV 0.45 V 1.2 V
3 MHz 60 MHz 915 MHz
2 mW 10 mW 737 mW
1500 Mips/W 5830 Mips/W 1240 Mips/W
NTV Parallelism: On-chip Interconnect
32
0
0.2
0.4
0.6
0.8
1
1.2
45 32 22 14 10 7
Re
lati
ve
Technology (nm)
Compute Energy
Interconnect Energy
6X
1.6X
Compute energy reduces faster than global interconnect energy
For constant throughput, NTV demands more parallelism
Increases data movement at the system level
System level optimization is required to determine NTV
operating point
ComputeGlobal Interconnect
Supply Voltage
Energ
y
33
Circuit-Switched On-Chip Interconnects
M. Anders, R. Krishnamurthy et al, ISSCC 2010
Reconfigurable Fabric Array (RFA)
Reconfigurable fabric tightly
coupled to processor pipeline
Reconfigurable fabric directly
interfaced with memory
Core0
Core1
Memory
RFA
Core0
Core1
Memory
RFA
RFA
Core
Core
RFA
Memory
Core
Core
RFA
Memory
Fine-grain Reconfigurable Fabrics
35
4
1Y2 Y0[0]
2:14
x4
3-Input LUT
XY
Out
X2
X0
4
Z4
4 & 5 Input LUT Merge
3C
2
1LUT4
LUT5
4b Adder4
X0
4Y0
4
4b Adder
4X1
4Y1
Sum0
Cout0
4b Adder
4X2
4Y2
Cout1
Output MUX
4
OutX
4
OutY
4
OutZ
3
OutC
4
Sum2
Cout2
4
Sum1
4
LUT3
4X0
4Y0
Y0[1]
Y0[2]
Y0[3]
Hybrid
CLBOutY
OutZ
OutC
X0
C
4Y04
OutX
4X1
33
Y1
X2
4
Y2
4
4
4
4
4
Cin01
Cin11
Cin21
32nm Hybrid CLB Design
● Optimized for arithmetic with support for random logic● Four 3-input Look-Up Tables (LUTs)● Three 4b adders
● 27 inputs, 15 outputs, 43 configuration bits
A. Agarwal, R. Krishnamurthy et al, ISSCC 2010
36
32nm High-K/Metal-Gate CMOS Die Micrograph
Process32nm High-K
Metal-Gate CMOS
Nominal Supply 1.0V
Interconnect 9 metal Cu
Number of CLBs 6
Register File Array 64-entry x 32b
Die Area 0.076mm2
Number of Transistors 110K
Pad Count 30
Clo
ckI/OControl I/O
Reconfigurable Fabric
255mV (Sub-threshold) operation in 32nm CMOS technologyIndustry’s first ultra-low-voltage reconfigurable accelerator
A. Agarwal, R. Krishnamurthy et al, ISSCC 2010
38
1.5mm3 Intraocular Pressure Monitor
● Continuous IOP monitoring
● Wireless communication
● Energy-autonomy
● Device components
● Solar cell
● Wireless transceiver
● Cap to digital converter
● Processor and memory
● Power delivery
● Thin-film Li battery
● MEMS capacitive sensor
● Biocompatible housing Courtesy: Gregory Chen, U. Michigan
39
Summary• Moore’s Law has fueled the worldwide technology revolution for
over 40 years and will continue for at least another decade
– 0.7x transistor dimension scaling every two years
– Hi-K MG & Tri-Gate devices: significant energy-efficiency benefits
• Key challenges for Sub-22nm 1-100TOPS/Watt SOC platforms
– Special-purpose accelerators for graphics/video/media DSP
– Ultra-low-voltage/NTV operation with wide dynamic voltage range
– On-die reconfigurable logic fabrics/accelerators for flexible SOCs
• Energy-efficient SOC graphics/media processing:
– Reconfigurable SIMD vector permutation processor in 22nm
– NTV processor with wide dynamic range in 32nm CMOS
– Fine-grain reconfigurable logic array fabric in 32nm CMOS
• Ultra-low voltage (NTV) circuit design challenges & opportunities
– 5-10X higher energy efficiency (GOPS/W) vs. nominal supply operation
40
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• Intel Virtualization Technology requires a computer system with a processor, chipset, BIOS, virtual machine monitor (VMM) and applications enabled for virtualization technology. Functionality, performance or other virtualization technology benefits will vary depending on hardware and software configurations. Virtualization technology-enabled BIOS and VMM applications are currently in development.
• Intel® Turbo Boost Technology requires a Platform with a processor with Intel Turbo Boost Technology capability. Intel Turbo Boost Technology performance varies depending on hardware, software and overall system configuration. Check with your platform manufacturer on whether your system delivers Intel Turbo Boost Technology. For more information, see http://www.intel.com/technology/turboboost.
• No computer system can provide absolute security under all conditions. Intel® Trusted Execution Technology (Intel® TXT) is a security technology under development by Intel and requires for operation a computer system with Intel® Virtualization Technology, a Intel® Trusted Execution Technology-enabled Intel processor, chipset, BIOS, Authenticated Code Modules, and an Intel or other Intel® Trusted Execution Technology compatible measured virtual machine monitor. In addition, Intel® Trusted Execution Technology requires the system to contain a TPMv1.2 as defined by the Trusted Computing Group and specific software for some uses. 64-bit computing on Intel architecture requires a computer system with a processor, chipset, BIOS, operating system, device drivers and applications enabled for Intel® 64 architecture. Performance will vary depending on your hardware and software configurations. Consult with your system vendor for more information.
• Intel, Intel Xeon, Intel Core microarchitecture, and the Intel logo are trademarks or registered trademarks of Intel Corporation or its subsidiaries in the United States and other countries. © 2008 Standard Performance Evaluation Corporation (SPEC) logo is reprinted with permission.
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