Lithography and Electrodeposition
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Transcript of Lithography and Electrodeposition
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Lithography and Electrodeposition
2010 Nano Education Institute at UMass Amherst (Mark Tuominen)
bnl
manchester
ibm
UMass
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How do we control the shape and size of nanostructures?
Lithography(designed by humans)
Self Assembly(inspired by nature)
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Nanostructure
width
depth height (thickness)
Using conventional methods, controlling the thickness (deposition) at the nanoscale is much easier than controlling the width or depth (lithography)
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ComputerMicroprocessor"Heart of the computer"
Does the "thinking"
Uses transistors to create "logic" (computational units)
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Moore's Law
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Making Small SmallerComputer Microprocessors
ibm.com
macroscale microscale nanoscale
The very small features on a computer's microprocessor and memory (RAM) are patterned with photolithography
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Lithography(controlling lateral dimensions,
by using stencils, masks, & templates)
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Lithography
NanoscienceRocks
NanoscienceRocks
NanoscienceRocks!
(Using a stencil or mask)
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Lithography: Basic concepts
Some possible desired features
narrow line narrow trench
modified substrate
•Photolithography•Electron-Beam Lithography•X-ray Lithography•Focused Ion-Beam Lithography•Block Copolymer Lithography
•Nano Imprint Lithography•Dip Pen Lithography•Interference Lithography•Contact Lithography•EUV Lithography
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Positive and Negative Resists
resist
expose
develop
Positive Resist
resist
expose
develop
Negative Resist
scission cross-linking
deposit & liftoff deposit & liftoff
exposed region results in presence of structure exposed region results in absence of structure (generally poorer resolution)
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Resolution Limit of PhotolithographyHow low can you go?
minimum linewidth minimum pitch
There are actually many contributing factors that limit the minimum linewidth:• optical diffraction ()• purity of light source• resist sensitivity• depth of focus• numerical aperture of lens
Using smaller wavelength enables smaller featuresVisible light > UV > DUV > EUV > X-rays
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Electron-Beam Lithography
Silicon crystal
Polymer film
Electron Beam
Nanoscopic Mask ! Down to 10 nm
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Nanosphere Lithography
opticalproteomics.orgitrc.org.tw
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Diblock CopolymerLithography(Uses self assembly)
DepositionTemplate
EtchingMask
NanoporousMembrane
Remove polymerblock within cylinders(expose and develop)
(physical orelectrochemical)
Down to 3 nm
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Diblock Copolymer Lithography
U. Wisconsin UMass-Seagate
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Density Multiplication using Diblock Copolymers (MIT)
I. Bita, J.K.W. Yang, Y.S. Jung, C.A. Ross, E.L. Thomas, and K.K. BerggrenScience 321, 939 (2008).
Also Hitachi/UW work:R. Ruiz, H. Kang, F.A. Detcheverry, E. Dobisz, D.S. Kercher, T.R. Albrecht, J.J. de Pablo, and P.F. NealeyScience 321, 936 (2008)
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Next....
....Electrodeposition...
....another convenient way to make
nanofilms
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Nanofilm by Electrodeposition
VI
Cu2+ + 2e- –> Cu(0)
"reduction"
CuSO4 dissolved in water
Cu(0) –> Cu2+ + 2e-
"oxidation"
anodecathode
If using an inert Pt electrode:
2 H2O –> O2 + 4H+ + 4e-
WorkingElectrode(WE)
CounterElectrode(CE)
("electroplating")
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Electrodeposition into a Nanoscale Lithographic Template
nanoporous template
nanowiresin a polycarbonatefilter
nanowiresin a diblockcopolymer template
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Electrochemical DepositionCHM video module at:
http://www.umassk12.net/nanodev/NanoEd/Electrochemical_Deposition/index.html