'International Display Workshops ; 9 (Hiroshima) : 2002.12 ... · Displays 21 Y. Takiguchl, H....

22
IDW '02 Proceedings of The Ninth International Display Workshops Workshops on LC Science and Technologies Active Matrix Displays FPD Materials and Components •CRTs Plasma Displays EL Displays, LEDs and Phosphors Field Emission Display Organic EL Displays 3D/Hyper-Realistic Displays and Systems Applied Vision and Human Factors Topical Session on Electronic Paper Sponsored by The Institute of Image Information and Television Engineers ITE) Kikai-Shinko-Kaikan, 3-5-8 Shiba-Koen, Minato-ku, Tokyo 105-0011, Japan The Society for Information Display 61 OS. 2nd Street, San Jose, CA 95112, USA ^yTi^Qannover SID SOCETYfOR IVOKMJttSON DISPLAY

Transcript of 'International Display Workshops ; 9 (Hiroshima) : 2002.12 ... · Displays 21 Y. Takiguchl, H....

Page 1: 'International Display Workshops ; 9 (Hiroshima) : 2002.12 ... · Displays 21 Y. Takiguchl, H. Sugimoto, Y. Matsuki, I. Katoh, T. Tokita Ricoh,Japan LCT1-3 Electro-OpticCharacteristics

IDW '02Proceedings

of

The Ninth International Display Workshops

Workshops on

• LC Science and Technologies• Active Matrix Displays• FPD Materials and Components

•CRTs

• Plasma Displays• EL Displays, LEDs and Phosphors• Field Emission Display• Organic EL Displays• 3D/Hyper-Realistic Displays

and Systems• Applied Vision and Human Factors

Topical Session on

• Electronic Paper

Sponsored byThe Institute of Image Information and Television Engineers

ITE) Kikai-Shinko-Kaikan, 3-5-8 Shiba-Koen, Minato-ku, Tokyo 105-0011, Japan

The Society for Information Display61 OS. 2nd Street, San Jose, CA 95112, USA ^yTi^Qannover

SIDSOCETYfOR IVOKMJttSON DISPLAY

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IDW '02

TABLE OF CONTENTS

IDW '02

Wednesday, December 4

9:20-9:35 Phoenix Hall

Opening

Master of Ceremony: Y. Nagae, Executive Chair

9:20

Opening Remarks

S. Naemura, General Chair

Y. Shlmodaira, Program Chair

9:35-10:20 Phoenix Hall

Keynote Address

Keynote Address -1

Paradigm Shift in the Display World 3

M. HijikigawaSharp, Japan

Thursday, December 5

18:00-19:10 Himawari

Invited Addresses

Invited Address -1

Image Capturing for Ultrahigh Definition

andWide Screen Video System 7

K. Mitanl, M. Sugawara, F. Okano

NHK, Japan

Invited Address - 2

ConceptandTechnologies of Natural Vision

Project 11

N. OhyamaTokyo Inst, of Tech., Japan

Workshop on

LC Science and Technologies

Wednesday, December 4

10:40-12:10 Dahlial

LCT1:FLC

LCT1 -1: Invited Electro-Optical Switching and

Storage Effects in Liquid Crystals of Bent-

Shape Molecules 17

A. Jakli, G. G. Nalr* S. Rauch**, D. Kruerke**,

H. Sawade**, G. Heppke**KentState Univ., USA

*Ctr. for Liquid Crystal Res., India

**Tech. Univ., Germany

LCT1 - 2: Invited Resolution-Enhancing Device Based

on Vertically Aligned FLC for Projection

Displays 21

Y. Takiguchl, H. Sugimoto, Y. Matsuki, I. Katoh,

T. Tokita

Ricoh, Japan

LCT1 - 3 Electro-Optic Characteristics of the Intrinsic

Half-V-Mode Ferroelectric Liquid Crystal

Display and the Polymer-Stabilized V-Mode

Ferroelectric Liquid Crystal Displays 25

J. Xu, S. Kobayashi

Tokyo Univ. ofSci., Yamaguchi, Japan

LCT1 - 4 Flexible Ferroelectric Liquid Crystal Device

Using Thin Film Substrates Supported by

Polymer Walls and Networks 29

H. Sato, hi. Fujikake, Y. Fujlsaki, M. Kawaktta,

H. Kikuchi, T. Kurita

NHK, Japan

14:00-15:20 Dahlia 1

LCT2-2

LCT2-3

LCT2: LC Mode

LCT2 -1 (Polymer/Liquid Crystals) Composites for

Simple-MatrixDisplays 33

H. Kikuchi, T. Gunjima*. K. Rajesh*, H. Yang*,

R. Kimura*. H. Hasuo**, N. Kaiya***,

N. Amaya***, K. Izumi, Q. Niu, T. Kajlyama

Kyushu Univ., Japan'Fukuoka Ind. Scl. & Tech. Foundation, Japan**Fukuoka Ind. Tech. Ctr., Japan

***NOF, Japan

Design Optimization of Liquid CrystalAchromatic Linear Polarization Rotators

.37

T. X. Wu, Y. Huang, S. T. Wu

Univ. ofCentralFlorida, USA

A Comparison with Electro-OpticalPerformances Using TwoTypes of

Reflective LC Mode in LCOS Microdisplay.41

S. G. Kim, J. H. Kim, S. S. Lee, C. S. Cho

Samsung SDI, Korea

IDW '02 V

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LCT2 - 4 A Projection System Using Vertically AlignedNematic Liquid Crystal on Silicon Panels

45

D. Cuypers, G. Van Doorselaer, J. Van Den Steen,H. De Smet* A. Van Calster*IMEC vzw, Belgium*Ghent Univ., Belgium

10:40-11:20 Dahlia 1

15:40-16:55

LCT3: Display TechnologyDahlia 1

LCT3 -1 A Measurement of Hyperfine Cell Parameter

Distributions of Each Pixel in the Full-Color

LCD Panel by Using Near-InfraredStokes

Parameters 49

M. Kawamura, S. Sato

Akita Univ., Japan

LCT3 - 2 Analysis of Tolerance for Fabrication of

Large Area TFT LCD 53

B. G. Rho, B. K. Yang, J. S. Kim*Seslm Photonics Tech., Korea

*Chonbuk Nat. Univ., Korea

LCT3 - 3 Chemical and Tribological Nature of

Contamination in Rubbing Process 57

H. Tabira, T. Inoue, Y. Yahagi, H. Imayama*,M. Morimoto*

Hitachi, Japan*Hitachi Displays, Japan

See Late-News

Thursday, December 5

9:20-10:25 Dahlia 1

LCT4:LC Alignment (1)

LCT4-1: Invited Electrically Commanded Surfaces:

The New Liquid Crystal Display Concept.61

LCT4-2

L. Komitov*'**

'Chalmers Univ. ofTech., Sweden

**Goteborg Univ., Sweden

A New Single-Exposure Method to Induce

Pretilt Angle on Photo-Alignment Films

.65

LCT4-3

M. Klmura, S. Nakata, Y. Makita,Y. Matsukl, A. Kumano*. Y. Takeuchi*.

H. Yokoyama**JSR, Japan*lnt. Ctr. forMaterials Fles., Japan**Nat. Inst, ofAdvanced Ind. Sci. & Tech.,

Japan

Domain Walls in Photo-Aligned Double-

Domain Twisted-Nematic Liquid Crystal

Displays 69

D. K. G. de Boer, A. C. Nieuwkerk, R. Cortie,F. A. Fernandez*, S. E. Day*. R. James*

Philips Res. Labs., The Netherlands

*Unlv. College London, UK

LCT5:LC Alignment (2)

LCT5 -1 Patterning Method of LC Alignment on the

Rubbed Photo-Reactive Polymer Surface

.73

R. Yamaguchi, Y. Goto, S. Sato

Akita Univ., Japan

LCT5 - 2 Microstructured Film of Columnar

Mesophaseby Molecular Alignment Control

with Polarized Infrared Laser Incidence

77

Y. Shimlzu, H. Monobe, K. Kiyohara, M. Heya*K. Awazu*

Nat. Inst, ofAdvanced Ind. Sci. & Tech., Japan*0saka Univ., Japan

Friday, December 6

14:00-15:20 Himawari

LCT6: Wide Viewing Angle Technology

LCT6 -1 Influence of Change in the OpticalParameters of the WV Film on the ViewingAngle Characteristics of TN-LCDs 81

M. Yamahara, I. Inoue, T. Nakai, Y. Yamada,S. Mlzushima, Y. Ishli, M. HijlkigawaSharp, Japan

LCT6 - 2 Improvement of Display Performance of

HighTransmittance Photo-Aligned Multi-

Domain Vertical Alignment LCDs UsingCircular Polarizers 85

Y. Iwamoto*1**, Y. Toko**, Y. limura*

*Tokyo Univ. ofA&T, Japan**Stan!ey Elec, Japan

LCT6 - 3 Gamma Correction for Liquid Crystal TV andMonitor by Dual Tone Reproduction Curves

89

H. Sasaki, T. Taguchi, I. Kurosu

Toshiba Semiconductor, Japan

LCT6 - 4 Advanced Liquid Crystal Materials with

Negative Dielectric Anisotropy for Monitor

andTV Applications 93

M. Klasen-Memmer, M. Bremer, K. Tarumi

Merck KGaA, Germany

15:40-17:00 HimawariLCT7: Reflective LCD

LCT7 -1: Invited Electro-Optical Characteristics of

Mobile Fine Particle Display with LiquidCrystal 97

Y. Toko, Y. Iwakura, K. Kobayashi*,T. Akahane*, M. Ogawa**, S. Tsuchida**,T. Takahashi**

Stanley Elec, Japan

*Nagaoka Univ. of Tech., Japan

**Kogakuin Univ., Japan

LCT7 - 2 Single Polarizer Reflective BTN with Inner

Retardation Compensation 101

J. Osterman, J. Birgerson, K. SkarpDalarna Univ., Sweden

VI IDW '02

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LCT7 - 3 Measurement Method for Cell Gap and Twist

Angleof Reflective LCD ......105

D. Tanooka, S. Itoh*, I. Hirosawa**

Nippon LaserA Elect. Lab., Japan

*NEC, Japan**Japan Synchrotron Radiation Res.

Inst, Japan

See Late-News

Thursday, December 5

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)

Poster LCTpl: Fundamental Properties

LCTpl -1 The Novel Liquid Crystal Materials for AM

LCDs 109

S. Kibe, N. Hattori, M. Ushioda, H. Yamamoto,

S. Matsui

Chlsso Petrochem., Japan

LCTpl - 2 Study of Order Parameter of Liquid CrystalMixtureand Influence to Dichroic Ratio of

Guest-HostSystem 113

H. Ichinose, H. Sato, S. Naemura

Merck, Japan

LCTpl - 3 Study on the Frank Elastic Constants of

Nematic LC Mixtures 117

H. Sato, H. Ichinose, A. Sawada, S. Naemura

Merck, Japan

LCTpl - 4 Anchoring Strength of Thin Aligned-Polymer

Films Formed by Liquid CrystallineMonomer 121

T. Murashige, H. Fujikake*, S. Ikehata, F. Sato*

Tokyo Univ. of Sci., Japan

*NHK, Japan

LCTpl - 5 Electro-Optic Response ofTNLC

(E7-CANCE) Cells on Driving Voltage

Amplitudeand Frequency 125

M. F. Estonactoc, P. J. Rodrigo, N, Hermosa

Univ. ofthe Philippines, Philippines

LCTpl - 6 Isolation of a Pixel in LCD Using Multi-

Domain Alignment by Ion Beam Exposure129

K.-H. Park, D.-C. Jeong, J. S. Gwag, S. H. Lee,

T.-H. Yoon, J. C. Kim

Pusan Nat. Univ., Korea

LCTpl - 7 Dynamically Controllable Micro-LC Cell

Associated with Surface ModificationUsingAFM 133

W. C. Kim, S. Song, I. C. Jeon, J.-H. Kim*,

M.-H. Lee, S. H. Lee

Chonbuk Nat. Univ., Korea

*lnje Univ., Korea

LCTpl - 8 Anchoring Properties of Nematic Liquid

Crystalson Anisotropic Cellulose Derivative

Films 137

J. G. Fonseca*, M. H. Godinho**,

A. C. Ribelro****

*CFMC-UL, Portugal**FCT-UNL, Portugal***lnst. Superior Tech., Portugal

See Late-News

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster LCTp2: Simulation

LCTp2 -1 Analytical Solution for Light Reflection of LC

Cell for the Measurement of the Fabrication

Parameters 141

C. ft Ou

ITRI/OES, Taiwan

LCTp2 - 2 Simulation and Optimization Issues for

CurrentFlow in Liquid Crystal 145

C. ft Ou

ITRI/OES, Taiwan

LCTp2 - 3 Study of Liquid Crystal Bistabilities by

Catastrophic Theory 149

C. ft Ou

ITRI/OES, Taiwan

.153LCTp2 - 4 Director Distortion Around Spacer in

Liquid Crystal Devices

H. Nakamura

IBM Res., Japan

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster LCTp3: LC Modes

LCTp3 -1 Fabrication of Reflective Holograhic Polymer

Dispersed Liquid Crystal Based on

Polyurethane Acrylate (PUA) 157

J. Y. Woo, M. S. Park, B. K. Kim

Pusan Nat. Univ., Korea

LCTp3 - 2 Property of Polarization DependentHolographic Polymer Dispersed Liquid

Crystal Device and its Application for

Information Display 161

A. Oglwara, M. Takeda

Takamatsu Nat. College ofTech., Japan

LCTp3 - 3 Hybrid Alignment of Intrinsic Half-V-FLCD

Exhibiting High Contrast Ratio and High

Reliability without Applying DC Voltage to

Remove Layer Degeneracy 165

Y. Murakami, Y. Kawasaki, J. Xu, H. Endoh*,

H. Fukuro* S. KobayashiTokyo Univ. of Sci., Yamaguchi, Japan*Nlssan Chem. Ind., Japan

LCTp3 - 4 Electro-Optic Properties of Intrinsic Half-V-

Mode FLCD and Its Application to Field

Sequential Full Color LCDs Using a p-Si TFT

MatrixArray 169

H. Furuta, J. Xu, S. Kobayashi, S. Arakawa*,

H. Kaida*. A. Torlyama*Tokyo Univ. ofSci, Yamaguchi, Japan

*Sony, Japan

LCTp3 - 5 Improvement of Fluorescent Liquid Crystal

Displays by Sensitizing Effect 173

R. Yamaguchi, H. Nagato, H. Hafiz, S. Sato

Akita Univ., Japan

LCTp3 - 6 Reflective Antiferroelectric Liquid CrystalMode in a Vertically Aligned Configuration

177

D.-H. You, Y. Choi, C.-J. Yu, S.-D. Lee

SeoulNat Univ., Korea

IDW '02 VII

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LCTp3 - 7 Reduced Power Consumption in Single-Polarizer Reflective DTN-LCDs 181

/. Fukuda, T. Izoe, S. Yunoki, H. Hando

Kanazawa Inst, ofTech., Japan

LCTp3 - 8 Hybrid Aligned Nematic Liquid Crystal

Display Driven by Fringe Electric Field with

Low Driving Voltage and Fast ResponseTime 185

Y. H. Jeong, H. Y. Kim, W. G. Lee,

H. S. Park, W. C. Kim*, S. H. Lee*

Hyundai Display Tech., Korea

*Chonbuk Nat. Univ., Korea

LCTp3 - 9 Electro-Optical Characteristics of In-Plane

Switching Twisted Nematic Mode 189

S. Oka, K. Kobayashi, Y. Toko*, M. Kimura,

T. Akahane

Nagaoka Univ. of Tech., Japan'Stanley Elec, Japan

LCTp3 -10 Electro-Optical and Switching Behavior of

Amorphous In-Plane Switching Twisted

Nematic Liquid Crystal Device 193

K. Kobayashi, S. Oka, Y. Toko*, M. Kimura,

T. Akahane

Nagaoka Univ. of Tech., Japan

'Stanley Elec, Japan

LCTp3 -11 A Reflective TN Mode TFT-LCD with a SinglePolarizer Considering Polarization Rotation

Effect 197

D.-H. Suh, Y.-l. Park, H.-C. Kim, S.-M. Rim,

W.-G. Lee, H.-S. Park

Hyundai Display Tech., Korea

See Late-News

AMD1/FMC2-4 122%-NTSC Color Gamut 15-in. TFT-LCD

Using 4-Primary Color LED Backlighting and

Field Sequential Driving 215

/. Hiyama, M. Tsumura, T. Inuzuka*,

H. Haneishi*-", M. Yamaguchi*1***,

N. Ohyama*1***

Hitachi, Japan'Telecommunications Advancement

Org., Japan**Chlba Univ., Japan

***Tokyo Inst, of Tech., Japan

10:50-11:55 Phoenix Hall

AMD2/EP1: Active-Matrix Electronic Paper

AMD2/EP1-1: Invited Polymer Semiconductor Active-

Matrix Backplane Fabricated by Ink-Jet

Technique 219

T. Kawase

Epson Cambridge Lab., UK

AMD2/EP1 -2 Ultra-Thin 3.1-in. Active-Matrix ElectronicInk

Display for Mobile Devices 223

J. Au, Y. Chen, A. Ritenour, P. Kazlas, H. Gates

E Ink, USA

AMD2/EP1 - 3 Developmentof Active Matrix Electronic Ink

Displays for SmartHandheld Applications227

A Henzen, M. Pitt*, M. Yasui* W. Dijkman**,K. Amundson***, ft W. Zehner***, H. Gates***

Philips Mobile Display Syss., The Netherlands

'Philips Mobile Display Syss., Japan

**Philips Applications Lab Comps.,The Netherlands

***Elnk, USA

Workshop on Active Matrix Displays

11:55-12:10

13:50-15:40

Thursday, December 5

9:00-10:30 Phoenix Hall

AMD1/FMC2: LC-TV Technologies

AMD1/FMCM: Invited Fast Response and Wide-Viewing

Angle Technologies for LC-TV Application203

Y. Yamada, K. Miyachi, M. Kubo, S. Mizushlma,

Y. Ishii, M. HijikigawaSharp, Japan

AMD1JFMC2-2: Invited Level - Adaptive Overdrive (LAO)Technology 207

H. Okumura, M. Baba, H. KobayashiToshiba, Japan

AMD1/FMC2-3 Fast Response IPS-LCD Using Feed-

Backward Overdrive Technology 211

D. Nakano, T. Minami*

IBM Res., Japan'IDTech, Japan

SeeLate-News (AMD5)

AMD3: AM-OLED

Phoenix Hall

AMD3-1: Invited A 17-in. WXGA Full-Color OLED

Displays by Using Polymer Ink-Jet

Technology 231

M. Kobayashi, J. Hanari, M. Shibusawa,

K. Sunohara, N. Ibarakl

Toshiba Matsushita Display Tech., Japan

AMD3-2: Invited Development of 2.2-in. Full Color

AM-OLED Display for Mobile Applications.235

K. Mameno, ft Nlshikawa, K. Suzuki,

S. Matsumoto, T. Yamaguchi, K. Yoneda,

Y. Hamada, H. Kanno, Y. Nishio, H. Matsuoka*,

Y. Saito*, S. Oima* N. Mori*, G. Rajeswaran*,S. Mizukoshi**, T. K. Hatwar***

Sanyo Elec, Japan*SKDisplay, Japan**KodakJapan, Japan***Eastman Kodak, USA

AMD3 - 3 New Pixel-Driving Scheme with Data-Line

Pre-Charge Function for AM-OLED Displays239

M. Shimoda, K. Abe, H. Haga, H. Asada,

H. Hayama, K. Iguchl, D. Iga, Y. Iketsu,

H. Imura, S. MiyanoNEC, Japan

VIII IDW '02

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AMD3 - 4 A Self-Biased TFT-OLED Pixel Driver Circuit

243

S. W. B. Tarn, M. Kimura*, ft Friend**,

T. Shimoda*. P. Mlgllorato***

Epson Cambridge Lab., UK

'Seiko Epson, Japan"Cavendish Lab., UK

***UraV. ofCambridge, UK

AMD3 - 5 A 2.2-in. Color TFT-OLED Display Using a

ContinuousSub-FieldWith a Multiplex

Scanning System 247

T. Ouchi, Y. Mikami, T. Satou, N. Kasai

Hitachi, Japan

10:45-12:25 Phoenix Hall

AMD6: TFT Technologies (2)

15:55-17:00 Phoenix Hall

AMD4: Organic TFT

AMD4-1: Invited Plastic Transistors in Active-Matrix

Displays 251

H. E. A Huitema, G. H. Gelinck,

J. B. P. H. van der Putten, E Cantatore,

D. M. de Leeuw

Philips Res. Lab, The Netherlands

AMD4 - 2 Fabrication of Poly (3-hexylthiophene) ThinFilm Transistors Using Microcontact

Printing Technology 255

Y. H. Kim, S. K. Park, J. I. Han, D. G. Moon,

W. K. Kim, M. G. Kwak

KETI, Korea

AMD4 - 3 Organic Thin-Film Transistor Array for

Active-Matrix Display Application 259

J.-C. Ho, L-P. Hsin, Y.-W. Wang, W.-K. Huang,

H.-L. Cheng, Y.-J. Wong, J.-L. Chen,

W.-Y. Chou, L-Y. Huang, T.-S. Hu, C.-C. Lee

ERSO/ITRI, Taiwan

Friday, December 6

9:00-10:30 Phoenix Hall

AMD5: TFT Technologies (1)

AMD5-1: Invited Advanced Laser-Crystallization

Technologies of Si for High-PerformanceTFTs 263

M. Matsumura

ALTEDEC, Japan

AMD5 - 2: Invited Single-Grain and Advanced TFTs

Using Metal Imprint Technology 267

T. Asano

Kyushu Inst, of Tech., Japan

AMD5 - 3 Effects of Ozone Oxidation for Poly-Si TFTs

271

Y. Ebiko, Y. Mishima

Fujitsu Labs., Japan

AMD5 - 4 A High Optical Transmittance Active-Matrix

LCD with a New Gate andCs Stacked Pixel

Structure 275

M. Hashimoto, S. Maklmura, H. Kadota,

H. Kaida, F. Abe, T. Sato

Sony, Japan

.279

.283

AMD6-1: Invited Future Trend in TFTs

S. Inoue, T. Shimoda

Seiko Epson, Japan

AMD6 - 2 Short Channel Poly-Si TFTs

S. D. Brotherton, S.-G. Lee*, C. Glasse,

J. R. Ayres, C. Glalster

Philips Res. Labs., UK

'LG.Philips LCD, Korea

AMD6 - 3 Thin Film Transistor Standard Cells 287

H. Hara, S. Inoue, T. Shimoda, N. Bavldge*,

P. Mlgllorato*Seiko Epson, Japan'Univ. ofCambridge, UK

AMD6 - 4 Long Term Roadmap for Products and

Technology of TFT-LCD toward 2010 291

H. Kitahara, M. Morimoto*. H. katoh**,

M. Hijiklgawa***IBM Japan, Japan'NEC, Japan

"SEMI Japan, Japan

***Sharp, Japan

See Late-News

14:00-15:20 Phoenix Hall

AMD7: Mobile Display Technologies

AMD7-1

AMD7-2

AMD7-3

AMD7 - 4

Ultra Low Power Consumption Technologies

for Mobile TFT-LCDs 295

K. Tsuda, N. Kimura, S. Mizushima

Sharp, Japan

Highly Efficient TransflectiveTFT-LCDs with

Novel Structure 299

Y. Narutaki, K. Fujimori, Y. Itoh, T. Shinomlya,

N. Kimura, S. Mizushima, M. Hijiklgawa

Sharp, Japan

The Ultimate Low-Power AM-LCD 303

S. J. Roosendaal, J. R. Hector*

Philips Res. Labs., The Netherlands

'PhilipsRes. Labs., UK

Improved Reflective Light Efficiency Using a

New in-Cell Diffusing Reflector 307

N. Sumi, M. Fukumoto, H. Nakamura,

Y. Hamawaki, Y. Matsushita

Philips Mobile Display Syss., Japan

15:40-16:50 Phoenix Hall

AMD8: Flexible AM-LCDs

AMD8-1: Invited Towards FlexibleAM-LCDs 311

P. Cirkel, N. Young*, P. Slikkerveer

Philips Res. Eindhoven, TheNetherlands

'Philips Res. Redhill, UK

AMD8 - 2: Invited Development of a Color Reflective

TFT-LCD Using Plastic Substrates 315

M. Okamoto, Y. Okada, A. Ban, W. Oka*

Y. Matsuda*, S. Shibahara*

Sharp, Japan

'Sumitomo Bakellte, Japan

IDW '02 IX

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AMD8 - 3 A Flexible 8.4-in. Color Low-TemperaturePoly-Si TFT-LCD 319

T. Hioki, M. Aktyama, M. Nakajlma, M. Tanaka,Y. Onozuka, Y. Hara, H. Naito*, Y. Mori*

Toshiba, Japan*Toshlba Matsushita Display Tech., Japan

Wednesday, December 4

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster AMDp: Active-Matrix Displays

AMDp -1 Feedback Level-Adaptive Overdrive

(FB-LAO) Method for Multi-Media LCDs

.323

H. Kobayashi, M. Baba, H. Okumura

Toshiba, Japan

AMDp- 2 Electrical Degradation in LTPS-TFTsbyPH3/H2 Ion Shower Doping 327

C.-S. Chuang, J.-J. Chang, C.-C. Chen,Y.-H. Yah, L.-M. WangERSO/ITRI, Taiwan

AMDp - 3 Stability Evaluation of Activation Effect on

Lightly Doped Drain Low Temperature Poly-Si TFTs 331

C.-C. Chen, C.-S. Chuang, J.-J. Chang,Y.-H. Yeh

ERSO/ITRI, Taiwan

AMDp - 4 TEOS Oxide Film Character Analysis byDifferent Annealing Conditions 335

K.-C. Kuo, Y.-R. Huang, Y.-J. Wu

ERSO/ITRI, Taiwan

AMDp - 5 Characterization of Antenna Charging Effect

on Low Temperature Poly-Si TFTs 339

J.-J. Chang, C.-C. Chen, C.-S. Chuang,Y.-H. Yeh, C.-Y. Chen

ERSO/ITRI, Taiwan

AMDp - 6 Effect on Poly-Si Film Uniformity and TFT

Performance of Overlap Irradiation by a

Stable Scanning CW Laser 343

K. Yoshino, M. Take!, M. Chida, A. Hara,N. Sasaki

Fujitsu Labs., Japan

AMDp - 7 Characteristics of Self-Aligned LDD Poly-SiTFT with Excimer Laser Annealing 347

Y.-H. Kim, C.-S. Hwang, S.-H. Choi,

Y.-H. Song, S.-Y. Kang, C.-H. Chung, Y.-W. Ko,B.-C. Kim, C.-Y. Sohn, S.-H. Ko Park,

D.-Y. Cho* H.-S. Choi* H.-S. Soh* J. H. Lee

ETRI, Korea

'LG.Phllips LCD, Korea

AMDp- 8 Analysis of Gate Electrode Forming Damageon Low Temperature Poly-Si TFTs 351

W. Y. Huang, P. F. Chen, C. C. Chen, Y. H. Yeh

ERSO/ITRI, Taiwan

AMDp- 9 Surface Wave Plasma Oxidation at Low

Temperature for Gate Insulator of Poly-SiTFTs 355

M. Goto, K. Azuma, T. Okamoto, Y. Nakata

ALTEDEC, Japan

AMDp-10 Gate Insulatorof Low Temperature Poly-SiTFTs by Combination of Photo-Oxidation

andPECVD 359

K. Azuma, T. Okamoto, M. Goto, Y. Nakata

ALTEDEC, Japan

AMDp -11 Influence of Excimer Laser Condition and

Substrate Structure on LTPS Grain

Morphology 363

N. Kawamoto.N. Matsuo, F. A. B. A. Aziz,T. Nouda*, H. Tsuchlya*. H. Hamada*

Yamaguchi Univ., Japan'Sanyo Elec, Japan

AMDp -12 A New Current Programmable Pixel

Structure for Large-Size and High-Resolution AM-OELDs 367

Y. W. Kim, 0. K. Kwon, K. N. Kim*, D. Y. Shin*,B. H. Kim*, H. K. Chung*Hanyang Univ., Korea

'Samsung SDI, Korea

AMDp-13 New Charge-Pumping Circuits with Level-

Shift Circuits for TFT-LCD Drivers 371

J. Yokota, Y. Suzuki, M. Yoshida, I. Takahashi,K. HayashiTokai Univ., Japan

.375

AMDp -14 Digital Interface System for Pixellized

DisplaysX. Yan

TCL Multimedia Elect., China

AMDp - 15 Programmable and Frequency RegulatedLow-Power, High-Voltage Generators for

Display Drivers 379

W. Hendrix, J. Doutreloigne, A. Van Calster

Univ. Ghent, Belgium

AMDp - 16 A New High-Voltage Generator Using Two-

Point Voltage Detection Method for TFT-LCD

Drivers 383

H. Hasegawa, Y. Suzuki, M. Yoshida,T. Shimizu, I. Takahashi, J. Yokota,

Tokai Univ., Japan

See Late-News

Workshop on

FPD Materials and Components

Wednesday, December 4

15:25-17:00 HimawariFMC1: LCD Technologies Road Map

FMC1 -1: Invited Current Display Trends from a

Historical Perspective 389

A ft. Kmetz

Agere Systems, USA

FMC1 - 2: Invited Technology Roadmap of Materials

and Components for LCD 393

Y. Suzuki, N. Tsutsui*, M. Ohtsuka",K. Matsushima***, K. Aoki****, H. Takeuchi*****

Tokai Univ., Japan*ITES, Japan**NH Techno Glass, Japan***Dai Nippon Printing, Japan****NEC Elect. Devices, Japan*****Stanley Elec, Japan

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TABLE OF CONTENTS

FMC1 - 3: Invited RecentTrends of the Active Matrix

LCDs for Mobile Use 397

ft. Watanabe, O. Tomita

Toshiba Matsushita Display Tech., Japan

FMC1 - 4 Flexible Plastic Substrate for Flat Panel

Displays 401

7. Hanada, I. Shlrolshi, N. Salto, T. Shim,

T. Yatabe

Teijln, Japan

Thursday, December 5

9:00-10:30 Phoenix Hall

FMC2/AMD1: LC-TV Technologies

FHC2/AMD1-1: Invited FastResponse and Wide-Viewing

AngleTechnologies for LC-TV Application203

K. Miyachi, M. Kubo, Y. Yamada, Y. Ishii,

M. HljikigawaSharp, Japan

FMC2/AMD1 - 2: Invited Level - Adaptive Overdrive (LAO)Technology

207

H. Okumura, H. Kobayashi, M. Baba

Toshiba, Japan

FMC2/AMD1 3 Fast Response IPS-LCD Using Feed-

Backward OverdriveTechnology 211

D. Nakano, T. Minami*

IBM Res., Japan*IDTech, Japan

FMC2/AMD1 -4 122%-NTSC Color Gamut 15-in. TFT-LCD

Using 4-Primary ColorLED Backlighting and

Field Sequential Driving 215

/. Hiyama, M. Tsumura, T. Inuzuka*

H. nanais^***, M. Yamaguchi*'***,N. Ohyama*1***Hitachi, Japan

Telecommunications Advancement Org.,

Japan**Chtba Univ., Japan

***Tokyo Inst, of Tech., Japan

10:40-12:00 Dahlia 2

FMC3: Optical Films

FMC3 -1 Manufacturing and Coating EquipmentDevelopment for Thin Crystal Film

Polarizers Printing 405

Y. Bobrov, L Fennell, T. Ganpule, P. Lazarev,

S. Ohmura*, H. Bae* Y. Ishibashl*

O. Yamashita*

Optiva, USA

*Nakan, Japan

FMC3 - 2 Striped Non-Uniform Transmission of

Polarizer-Based LCD 409

S. E Han, S. H. Kim, I. S. HwangLG Chem., Korea

FMC3 - 3 ANew Thin Retardation Film Consisting

Polymerisable Liquid Crystal 413

K. Kashima, T. Yosomiya, ft. Nakamura,

K. Ishlzaki, S. Umise

DaiNippon Printing, Japan

FMC3 - 4 Optical Design for Wide-Viewing-AngleTransflective TFT-LCD with Hybrid AlignedNematic Compensator 417

T. Uesaka, E. Yoda, T. Ogasawara, T. Toyooka

Nippon Oil, Japan

13:50-15:10 Dahlia 2

FMC4: Color Filter

FMC4-1 HighSensitive Pigment-Dispersed ColorResistfor LCD Color Filter 421

/. Maklhlra, T. Nagatsuka, H. Miyamoto

JSR, Japan

FMC4 - 2 Chemically Modified Carbon Black for Resin

Black Matrix in LCD Color Filter 425

E Step, A. Freitag, J. Belmont

Cabot, USA

FMC4- 3 A Reflective TFT-LCD Including a

Cholesteric Liquid Crystal Color Filter

429

S. Yoon, H. N. Hwang, J. W. Moon, S. H. Park,

M. C. Kim, J. H. Hur

LG.Philips LCD, Korea

FMC4 - 4 New Transflective TFT-LCD with Dual Color

Filter 433

K.-J. Kim, J. S. Urn, T. Y. Jung, C. Nam,

B. C. Ahn

LG.Philips LCD, Korea

15:20-16:55 Dahlia 2

FMC5: Advanced Process Technologies

FMC5 -1: Invited Paradigm Shifts in Semiconductor

Industry Leading to Single-Wafer Processing

- Implementing "SCROD" Clean in

Production - 437

T. Hattori

Sony, Japan

FMC5-2: Invited Diversion of Exposure Technology,

Born from Development of SphericalSemiconductor- The Maskless Exposure

Apparatus- 441

M. Yoshida, A. Ishikawa

BallSemiconductor, Japan

FMC5-3: Invited Ultrafine Ink-JetSystem and Its

Application 445

K. Murata, H. Yokoyama

Nat. Inst, ofAdvanced Ind. Sci. & Tech., Japan

FMC5- 4 Novel Micro-PatterningTechniqueUsing

Photocatalystfor Manufacturing of Flat

Panel Display Components 449

H. Kobayashi, K. Ueyama, M. Yamamolo,

M. NishiyamaDaiNippon Printing, Japan

9:00-10:30

Friday, December 6

FMC6: ProjectionSystems

Dahlia 2

FMC6 -1: Invited A1,000-Lumen Grating Light Valve

Laser Projector 453

N. Eguchi, S. Kubota

Sony, Japan

IDW '02 XI

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TABLE OF CONTENTS

FMC6-2: Invited LCOS Technology for Home

Projector 457

Z. Tajima, I. Takemoto, K. Shibata,

Hitachi, Japan

FMC6- 3 Optical Design of a Flat Panel ProjectionWedge Display 461

A R. L Travis*'**, J. ft. Moore**, J. J. Zhong*'Cambridge Univ., UK

"Cambridge 3D Display, UK

FMC6-4 Withdrawn

10:40-11:45 Dahlia 2

FMC7: Optical Components

FMC7 -1 Development of Ultra-Compact Color

Separation and Recombination SystemComprized of Only One Cubical Space

469

Y. Kurosaka, T. Ikeda, K. Tateishl,

H. Kanayama, K. Konlshi, T. Obase, Y. Funazou

Sanyo Elec, Japan

FMC7 - 2 High Gain and High Contrast Front

Projection Display System using AmbientLight Control Screen 473

S. Kataglrl, T. Mlyashita, T. Ishinabe, T. Uchida

Tohoku Univ., Japan

FMC7- 3: Invited Integration of Optical Functions on a

Display Substrate by Multi-layer Direct

Molding Process 477

F. Yamada, Y. Taira

IBM Res., Japan

14:00-15:25 Dahlia 2

FMC8: Lighting System (1)

FMC8-1: Invited AdvancedUHP Lamps for Bright and

Compact Projection Systems 481

H. Moench, U. Hechtfischer, G. Heusler,A Koerber, P. Pekarski, J. Pollmann-Retsch,A.RItz

Philips Res. Lab., Germany

FMC8 - 2 A Mercury-Free CFL Backlight for

Automotive-Navigations 485

ft. Tsuchlya, H. Noguchl, H. Yano,

H. Nakamura

Harlson Toshiba Lighting, Japan

FMC8- 3 The Characteristics of the External Electrode

Mercury Fluorescent Lamp for a LC TV's

Backlight 489

Y. Takeda, M. Takagi, T. Kurita

Harlson Toshiba Lighting, Japan

FMC8- 4 External Electrode Fluorescent LampBacklight Technology 493

S. J. Kim, N. 0. Kwon, Y. M. Kim, D. O. Yang,J. W. Hong, Y. G. Lee, G. Cho, B. S. Kim,J. G. KangKwangwoon Univ., Korea

15:35-17:00 Dahlia 2

FMC9: Lighting System (2)

FMC9 -1: Invited TFT-LCD with More than 100%-NTSC

Color Reproduction Using LED-Backlightingand Well-Tuned TFT-LCD Panel

497

H. Ohtsuki, K. Nakanishi, A. Mori, S. Sakat,A. Sumi, S. Yachi*. Q. van Voorst-Vader

Advanced Display, Japan*Lumlleds Lighting Best, The Netherlands

FMC9 - 2 High Power LED Illuminators for Data and

Video Projectors 501

G. Harbers, M. Keuper, S. Paollni

Lumileds Lighting, USA

FMC9 - 3 New Direction Selective Light Extraction

Light Pipe for LCD Backlighting with LEDs

505

N. Pfeffer, C. Hoelen, W. Timmers, M. Keuper*,G. Harbers*

LumiledsLighting Best, The Netherlands

*Lumileds San Jose, USA

FMC9- 4 Functional Light-Guide Plate Characterized

by Direct Light-Extraction Microstructures

for Luminance Enhancement of

Transmissive and Transflective LCD

Backlight Unit 509

K. Kalantar, C. Satou, S. Matsumoto, T. Katoh

Nippon Leiz, Japan

Wednesday, December 4

14:00-16:30 Poster/AI Room (Conf. Management Rm.)Poster FMCp: FPD Materials and Components

FMCp -1 Black-Matrix Photoresists with High OpticalDensity Derived from Cardo-Type Resins

513

M. Hlgashi, M. Kouno

Nippon Steel Chem., Japan

FMCp - 2 Development of a Highly Photosensitive

Photoresistfor the Patterned Spacer of

LCDs 517

l.-E Kwon, J.-S. Kim, S.-H. Lee, S.-H. Kim,

K.-J. Kim

LG Chem., Korea

FMCp • 3 Effective Measurements of Retardation and

Its Wavelength Dispersion of CompensationFilms for Liquid Crystal Display 521

N. V. Malimonenko, S. V. Belyaev, J. S. YuLG Chem., Korea

FMCp - 4 Wavelength Dispersion Effects of

Retardation Films on VA-LCDs 525

Y. Ono, Y. Ikeda, A. Uchiyama, T. Yatabe

Teijin, Japan

FMCp - 5 A Broadband Circularly Polarized Film (CPF)529

L-S. Luh, W.-C. Hu, J.-K. Kao, /..-ft. Chen,

J.-D. Jan, J.-Y. Ou

ITRI, Taiwan

FMCp - 6 Computer Simulations on the Bandwidth of

Uniform and Gradient-Pitch Cholesteric

Liquid Crystal Displays 533

Q. Hong, T. X. Wu, S. T. Wu

Univ. of Central Florida, USA

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TABLE OF CONTENTS

FMCp - 7 Improvement of the Hue Balance of the

Polarizer for High Performance LCD 537

T. Kamijo, T. Nagatsuka, Y. Fujlmura,

T. Miyashita*, T. Uchida*

Nitto Denko, Japan

'Tohoku Univ., Japan

FMCp - 8 LCD Polarizers Based on Lyotropic Dichroic

Dyes with High Dichroic Ratio 541

/. G. Khan, S. V. Belyaev, N. V. Malimonenko,

M. L Kukushkina, E. Y. Shishkina,

N. N. Masanova, G. N. Vorozhtsov

The FSUE State Scientific Ctr. "NIOPIK",

Russia

FMCp - 9 High Efficiency Plastic Reflector Fabricated

by Molding Method 545

C.-C. Liao, Y.-J. Wong, C.-M. Lai, I.-J. Lin,

P.-L Shiao*, H.-T. Chang*ERSO/ITRI, Taiwan

*ITRI, Taiwan

FMCp -10 Viewing Angle Control Using OpticalMicrostructures on Light-Guide Plate for

Illumination System of Mobile Transmissive

LCD Module 549

K. Kalantar

Nippon Lelz, Japan

FMCp-11 Withdrawn

FMCp -12 Analysis and Inspection of Killer Defects on

High-Resolution LTPS TFT Panel 557

J.-J. Chang, C.-C. Chen, C.-S. Chuang,

Y.-H. Yeh, Y.-M. Kang, Y.-S. Huang*

ERSO/ITRI, Taiwan

*Hirose Tech., Taiwan

FMCp -13 Glass Materials for Display Devices

Fabricated by A New Etching Process

561

K. Yakushiji, Y. Shibuya, H. Kuroda, K. Adachi,

T. Hoshino, T. Takatsuka

Arisawa Manufacturing, Japan

14:00-15:20

CRT2: Projection CRTs

Dahlia 2

CRT2 -1: Invited Market and Technology Trends for

Projection CRTs 579

K Hirai, S. Shirai*, K. Brown, T. Heiser,

T. Asano*

Hitachi Elect. Devices (USA), USA

'Hitachi, Japan

CRT2 - 2 A16-crn Dual Neck Diameter, Integrated

Component, Projection CRT.583

ft. Long, J. Kilton, M. Nagaoka, K. Hirota*.

T. Kakesu", N. Suzuki***

Hitachi Elect. Devices (USA), USA

'Hitachi, Japan

**Hitachl Device Eng., Japan

***Hitachi Elect. Devices, Japan

CRT2 - 3: Invited Improvement in Velocity Modulation

Efficiency for Projection CRTs 587

M. Konda, Y. Taguchi, T. Ishlkawa, K. Shimada

Matsushita Elec. Ind., Japan

CRT2-4: Invited Phosphorsfor Projection CRTs.591

SeeLate-News

Workshop on CRTs

Wednesday, December 4

10:40-12:00 Dahlia 2

CRT1: Market and New CRTs

CRT1 -1: Invited CRTIndustry in India : Technology

Status and Market Scenario 567

S. Gupta

Samtel Color, India

K. KajlwaraSony, Japan

15:40-17:00 Dahlia 2

CRT3: Glass and Screen Technologies

CRT3 -1 Prediction of Failure Probability for CRT in

Missile Test 595

7. Murakami, T. Murakami, Y. KobayashiAsahl Glass, Japan

CRT3 - 2 A High Contrast Antistatic/Antireflective

Coatingfor flat Video Display Screenwith

Adjustable Light Transmission and Uniform

Light Absorption 599

K.-C. Wang, H.-S. Tong, C.-M. Hu

Chunghwa Picture Tubes, Taiwan

CRT3 - 3 ANew Concept in Low-Refractive Index,

Anti-Reflection Coatings using Porous SiOa

Particles and a Hybrid SiO: Matrix 603

H. Matsuda, T. Ito, Y. Ootani*. T. Hirai**,

M. Kumazawa**, M. Komatsu**

Toshiba, Japan'Asahi Glass, Japan

"Catalysts & Chems. Ind., Japan

CRT3 - 4 Three Layer Reactive Sputter Coating for

Transmission Control of CRT 607

J. S. Bist

Samtel Color, India

CRT1 - 2 Tracking System of the Fast Intelligent

Tracking (FIT) Tube 571

H. B. van den Brink, O. H. Willemsen

Philips Res. Labs., The Netherlands

CRT1 - 3 Developmentof New Screen Processes in

Flatron 575

J.-M. Song, Y.-L. Cho, T.-Y. Kim, J.-M. Kim,

S.-C. Ryu, N.-J. Koh

LG.Philips Displays, Korea

14:00-15:20

Thursday, December 5

CRT4: Electron Guns

Ran

CRT4-1: Invited Development of Electron Gun for

High Brightness CRT 611

T. Shiroishi, S. Nakata, S. Okuda, N. Hlnomoto,

K. Oono, F. Murakami

Mitsubishi Elec, Japan

See Late-News

IDW '02 XIII

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TABLE OF CONTENTS

CRT4 - 2 Double Layer Chainlink (DLC) Main Lens

Color CRT Electron Gun Design for 19-in.

and 21-in. CDT Application 615

H. Y. Chen, Y. K. Ma, H. L. ChangChunghwa Picture Tubes, Taiwan

CRT4 - 3 Coaxial Analysis of Convergence Cup for

CRT Electron Guns 619

C. N. Mo, C.-H. Yeh

Chunghwa Picture Tubes, Taiwan

CRT4 - 4 The Effect of Focus Voltage and Beam

Repulsion on the Microscopic Electron SpotShape 623

A A. S. Sluyterman, T. G. SpanjerLG.Philips Displays, The Netherlands

15:40-17:00 Ran

CRT5: Cathodes

CRT5 -1: Invited The Oxide Cathode Revisited 627

D. den EngelsenLG.Philips Displays, The Netherlands

CRT5 - 2 Barium-Scandate Dispersed Oxide Cathodefor CRT with High Beam Current Density

631

T. Komlya, S. Koizumi

Hitachi, Japan

CRT5 - 3 Reduction in Cut-Off Voltage Drift of HighCurrent Density Oxide Cathode 635

T. Sawada, H. Yamaguchi, S. Nakata

Mitsubishi Elec, Japan

CRT5 - 4 Reducing Ion Bombardment on l-Cathodes

639

X. Zhang, W. Lei, N. Feng*, J. Havekes**,D. den Engelsen**Southeast Univ., China*HuaFei Colour Display Sys., China

**LG. Philips Displays, The Netherlands

Thursday, December 5

9:30 - 12:00 Poster/AI Room (Conf. Management Rm.)Poster CRTp:CRTs

CRTp -1 Investigation on Breakdown VoltageReduction of Heater for ImpregnatedCathodes 643

B.-M. Weon, G.-S. Park, C.-H. HwangLG.Philips Displays, Korea

CRTp - 2 The Study of Raster Moire on Color CRTs

647

J. J. Lee, J. H. Rhee, K. Y. Jeon, S. H. Jeon

Samsung SDI, Korea

CRTp - 3 Analytical Design of Exposure Filter for the

Improvement of CRT's Purity651

J. K. Ryu, H. S. Park, S. J. Lee, C. M. Jo

Samsung SDI, Korea

CRTp - 4 Electron Reflecting Layer with The WOs-ZnS:Cu. AI-PbO-Si02 System Concerned in

Doming Property of Shadow Maskin CRT

655

S.-M. Kim, Y.-L. Cho, N.-J. Koh, S.-D. Han

LG.Philips Displays, Korea

See Late-News

Workshop on Plasma Displays

Wednesday, December 410:40-12:00 Himawari

PDP1: Components and Manufacturing Process

PDP1 -1: Invited Development of 42-in. VGA PDP

Using LTCC-M Technology 661

S. S. Kong, B. J. Koo, G. J. Moon, I. T. Kim,S. H. Lee, J. D. Mun, C. R. Cho, K. T. Hwang,S. J. Moon, K. P. Choi, Y. H. Kwon, M. S. Kim,J. D. Kim

Orion Elec, Korea

PDP1 - 2 Cell Design and the Structure of the Plasma

Tube Array Display 665

M. Ishimoto, H. Yamada, A. Tokai, K. Awamoto,T. Shinoda

Fujitsu Labs., Japan

PDP1 - 3 Mechanical Properties and Fracture Analysisof Glass Substrate for PDPs 669

K. Maeda, Y. Nakao

Asahi Glass, Japan

PDP1 - 4 PDP Optical Filter with High Picture Quality673

Y. Chiaki, M. Koike, M. Ishlgaki, K. Kariya,H. Ohki*

FHP, Japan

*Hitachi Video Info. Sys., Japan

14:00-14:40 Himawari

PDP2: PDP TV

PDP2 -1: Invited Hitachi's Strategy for the Creation of

PDP TV Market 677

M. Yoshino

Hitachi, Japan

PDP2 - 2: Invited Technology Trends on PDP TV - 42-

in. HDTV - 681

ft. Mural, K. Mizuno, Y. Tahara*, Y. Ohe,S. Tujihara, Y. Muto, S. Masuda, K. OgawaMatsushita Elec. Ind., Japan'Matsushita PDP, Japan

Thursday, December 59:05-10:35 Himawari

PDP3/PH1: Phosphors for PDPs

PDP3/PH1 -1: Invited Technical Trend of Phosphors for

Plasma Display Panels 685

T. Hisamune

Kasei Optonix, Japan

PDP3/PH1 - 2 AStudy on the Degradation Mechanisms ofBlue Emitting Phosphor BaMgAI«Oi7:Eu2*

689

S. Zhang***, H. Uchiike"

'Daiden, Japan

"Saga Univ., Japan

PDP3/PH1 - 3 Intercalation of Water into

BaMgAhoOi7:Eu2+(BAM) Blue Phosphor for

Plasma Display Panels 693

T. Onimaru, S. Fukuta, T. Misawa, K. Sakita,K. Betsui

Fujitsu Labs., Japan

XIV IDW '02

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TABLE OF CONTENTS

PDP3/PH1 - 4 The Improvement of Luminescence

Degradation of PDP Blue Phosphor with

New UV Phosphor 697

N. Yokosawa, E. Nakazawa*

Toshiba, Japan

'Kogakuin Univ., Japan

10:45-12:05 Himawari

PDP4: Special Topic and Driving Methods

PDP4 -1: Invited Research and Development of Color

PDPs in China 701

C. Liu, F. He

Xl'an Jiaotong Univ., China

PDP4 - 2 Expansion of the Sustain Operational Marginwith Low Inductance Technology 705

M. Onozawa, M. Ohsawa, T. Kuwahara,

T. Ohno, T. Nakamura*

FHP, Japan'Hitachi, Japan

PDP4 - 3 Analysis of Priming Effect Using Vt Close

Curve 709

S. K. Lee, W. J. Kim, Y. J. Lee, Y. D. Kim,

M. S. Kim, S. J. Moon, Y. H. Kwon, S. J. Yoo,

J. D. Kim

Orion Elec, Korea

PDP4 - 4 High Luminance and High Contrast 54-

Subfield Drive of an AC PDP with 3-Phase

Sustain Pulses 713

H. Fujimura, T. Shiga, K. Igarashl, S. Mikoshiba

Univ. of Electro-Commun., Japan

14:00-15:20 Himawari

PDP5: Cell Operation and Discharge Characterization

PDP5 -1 Relationships between Opposed Firing and

Ramp Reset Voltage in AC PDP DrivingWaveform 717

Y. D. Kim, W. J. Kim, Y. J. Lee, S. K Lee,

M. S. Kim, S. J. Moon, Y. H. Kwon, S. J. Yoo,

J. D. Kim

Orion Elec, Korea

PDP5 - 2 Measurementof the Spatiotemporal Wall

Charge Distribution in an AC PDP Cell by the

Longitudinal Electro-Optic AmplitudeModulation Method 721

D. C. Jeong, W. J. Chung, K. W. WhangSeoul Nat. Univ., Korea

PDP5 - 3 Laser Thomson Scattering Studies of Two

Dimensional Structure of Micro-Discharge

Plasmas for PDP 725

S. Hassaballa, S. Suzuki, K. Uchino,

K. Muraoka

Kyushu Univ., Japan

PDP5 - 4 Behavior of Ar Metastable Atoms near

Dielectric Surface in Barrier and PDP

Discharge Measured by Laser Spectroscopy729

T. Sakural, S. Matsuzawa, Y. Kamo

Yamanashi Univ., Japan

15:40-17:00 Himawari

PDP6: Driving ICs and Image Qualities

PDP6 -1: Invited Advances of Driver IC Techniquesfor PDPs 733

K. Meguro, Y. Shigeta, G. Tada, H. Sumida,

A. HirabayashiFuji Elec, Japan

PDP6-2: Invited Development of SOI PDP Address

Driver ICs UsingTape Carrier Package.737

PDP6-3

PDP6-4

K. Takahashi, A. Fujiwara, S. Kawahlgashl,M. Itou

NEC, Japan

New Metacode Coding Concept for

Improving PDP Grayscale Quality 741

S. Weitbruch, C. Thebault, ft. Zwing, C. Correa

Deutsche Thomson-Brandt, Germany

Peak Luminance Enhancement Technology

with Maintaining Stable Driving 745

M. Takeuchi, T. Ueda, S. Asao, Y. Noguchi,A. Yamamoto

FHP, Japan

Friday, December 6

9:00-10:20 Himawari

PDP7: Physical Properties of MgO Thin Films

PDP7 -1 Influence of Evaporation Conditions on

Physical Propertiesof MgO Thin Film 749

T. Hirakawa, S. Goto, S. Zhang, H. Uchiike

Saga Univ., Japan

PDP7 - 2 Theoretical Design of MgO Protection Layerfor PDP by Accelerated Quantum Chemical

Molecular Dynamics Approach 753

M. Kubo, K. Sasata, T. Yokosuka, T. Kusagaya,S. Takami, H. Kajiyama*, A Kato*,

A. Imamura", A. MiyamotoTohoku Univ., Japan

*Hitachi, Japan"Hiroshima Kokusai Gakuln Univ., Japan

PDP7 - 3 Ion Irradiation Effects on the Electric Field

Condition of MgO Surface 757

T. Miyake, H. Kajiyama, A. Kato, Y. Kawanami*,

S. Hldaka*

Hitachi, Japan

*FHP, Japan

PDP7- 4 Effect of the Kinetic Energy on the

Secondary Electron Ejection from MgO by

Low Energy Noble Ions 761

S. K. Lee, J. H. Kim, J. Lee, K.-W. Whang

Seoul Nat. Univ., Korea

10:40-12:15 Himawari

PDP8: New Cell Configuration

PDP8 -1 Development of Ag Fence-Electrode

Structure PDP withoutITO 765

N. Nagao, N. Kosugi, Y. Takata, N. Nishimura,

K. Sumida, S. Fujiwara

Matsushita Elec. Ind., Japan

IDW '02 XV

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PDP8 - 2 High Luminous Efficiency of PDP with 'TwinCell Structure' 769

J. S. Choi, S. J. Moon, G. J. Moon, M. S. Kim,J. K. Chu, C. H. Son, H. S. Jang, W. J. Kim,Y. H. Kwon, S. J. Yoo, J. D. Kim

Orion Elec, Korea

PDP8 - 3 AC PDP with Large Coplanar Gap: Macro-

Cell Experiment and Modeling 773

J. Ouyang, Th. Callegari, N. Lebarq, B. Caillier,J.-P. Boeuf

Univ. of P. Sabatier, France

PDP8 - 4 New Cell Structure for Higher Resolution

PDPs with Discharge Deactivation Film

.777

S. Nagano, K. Jo, K. Hirose, T. Sakurai

Mitsubishi Elec, Japan

See Late-News

Wednesday, December 414:00 -16:30 Poster/AI Room (Conf. Management Rm.)

Poster PDPpI: Panel Technologies

PDPpI -1 Measurement of Ion-Induced SecondaryElectron Emission Coefficient Y for MgO ThinFilm with O2 PlasmaTreatment 781

H. S. Jeong, J. S. Oh, J. Y. Urn, E. H. Choi

Kwangwoon Univ., Korea

PDPpI - 2 Influence of Geometrical Surface Structuresof MgO Protective Layer on the SecondaryElectron Emission Coefficient t 785

J. S. Oh, J. Y. Urn, H. S. Jeong, E. H. Choi

Kwangwoon Univ., Korea

PDPpI - 3 Measurementof Ion-Induced SecondaryElectron Emission Coefficient Y of VacuumAnnealed and as-deposited MgO Protective

Layer with/without air-hold in AC PDP

789

J. Y. Urn, J. S. Oh, H. S. Jeong, J. M. Jeong,E. H. Choi

Kwangwoon Univ., Korea

PDPpI - 4 Ion-Induced Secondary Electron Emission

Characteristics of Compound Oxide

Materials - Automatic Measuring System -

793

S. Goto, T. Hirakawa, S. Zhang, H. Uchiike

Saga Univ., Japan

PDPpI - 5 Electro-Optical Properties of Ne-Kr-Xe Gas

Mixtures for Improving the Luminous

Efficiency in PDP 797

E Y. Jung, J. S. Choi, K. H. Bu, S. J. Moon,Y. H. Kwon, S. J. Yoo, J. D. KimOrion Elec, Korea

PDPpI - 6 PDP Employing Near Ultra Violet RaysEmitted from N2 Gas-Mixture Discharge

.801

K. C. Choi, B.-J. Baek, S.-M. HongSejong Univ., Korea

PDPpI - 8 A Magnesium Oxide Coating on Zn2Si04:Mn

for Improvement of DischargeCharacteristics in PDP 809

B. W. Jeoung,, G. Y. Hong, B. S. Jeon,J. S. Yoo

Chung-Ang Univ., Korea

PDPpI - 9 Cross Sectional Observation of IR Emission

in AC PDP Cell for Investigating the Effect of

Auxiliary Pulse by Ultra-High SpeedElectronic Camera 813

H. J. Seo, D. C Jeong*, S.-H. Jang, H.-S. Tae,S.-1. Chlen, K.-W. Whang*Kyungpook Nat. Univ., Korea

*SeoulNat. Univ., Korea

PDPpI -10 Effects of Bias Potential of Address

Electrode and Driving Pulse Width on

Sustain Discharge Characteristics of an AC

PDP 817

Y. Shintani, J. C. Ahn, K. Tachibana, T. Sakai*

Kyoto Univ., Japan

*Display Res. Labs.

PDPpI -11 Measurement of Electron Temperature andPlasma Densitiy in Coplanar AC PDPs

821

/. ft. Cho, M. W. Moon, C. G. Ryu, M. C. Choi,E H. Choi

Kwangwoon Univ., Korea

PDPpI -12 Influence of Ne-XeGas Mixture Ratio on

Vacuum Ultraviolet and Infrared Lines in AC

PDP 825

P.-Y. Oh, I. ft. Cho, Y. Jung, K. D. Park,J.-S. Oh, C.-G. Ryu, G.-S. Cho, E-H. Choi

Kwangwoon Univ., Korea

PDPpI -13 Discharge Characteristics Comparison of

Stripe and Closed Barrier Structure with

Three-Dimensional Fluid Simulation 829

Y. K. Shin, I. Lee, J. H. Ryu, H. C. Kim*,J. K. Lee*

LG Elect, Korea

*Pohang Univ. ofSci. & Tech., Korea

PDPpI -14 Three-Dimensional Simulations of He/Ne/Xe

Filled Coplanar AC PDPs 833

S. J. Yoon, I. Lee, K. Y. Choi, Y. K. Shin

LG Elect, Korea

PDPpI -15 PDP with Improved Drive Performance at

Reduced Cost 837

J. Rutherford, B. VelayudhanFPDs Syss., USA

PDPpI -16 Withdrawn

PDPpI -17 Measurement and Estimation of ChargeFlow to Adjacent Cells from Discharge Cells

845

T. Ando, H. Tachibana, T. Murakoso,H, HigashinoMatsushita Elec. Ind., Japan

PDPpI -7 Improvement of Luminanceand Luminous

Efficiency by the Optimized Gas in AC PDP

805

S.-J. Lee, J.-K. Lee, H.-J. HwangChung-Ang Univ., Korea

IDW '02

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TABLE OF CONTENTS

PDPpI -18 Vacuum In-line PDP Sealing in Low

Temperature by Organic Materials 849

D. J. Lee*'*"*, G. J. Moon", J. D. Kim",

C. H. Song*", J. Jang**", M. H. Oh"*",

B. K. Ju*

'KIST, Korea

"Orion Elec, Korea

"'XMPDIsplay, Korea

""Kyunghee Univ, Korea

"*"Dankook Univ., Korea

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster PDPp2: Driving Technologies

PDPp2 -1 Method for Compensating Luminance of a

PDP 853

S.-C. Yang, S.-R. Tong, L.-R. Lyu, L. Lu,

C.-K. Tsai, J.-F. HuangAU Optronics, Taiwan

PDPp2 - 2 Reduction of Motional Artifacts on PDPs by

Using a High Field Frequency Drive 857

T. Tamai, M. Tezuka, T. Shiga, S. Mikoshiba,

T. Ohe*. T. Ueda*

Univ. ofElectro-Commun., Japan*FHP, Japan

PDPp2 - 3 Gray Level Reproduction and Dynamic False

ContourReduction on PDP by Single Error

Diffusion 861

S. H. Park, C. W. Kim

Inha Univ., Korea

PDPp2 - 4 Influence of Wall Charge Configurations

prior to Addressing Discharge on Dynamic

Margin in AC PDP 865

Y. Jung, J. H. Choi, C G. Ryu, S. B. Kim,

E. H. Choi

Kwangwoon Univ., Korea

PDPp2 - 5 Influence of Data Voltage on Sustain

Discharge and Luminescence in AC PDPs

.869

,873

C. G. Ryu, Y. Jung, J. H. Choi, S. B. Kim,

E. H. Choi

Kwangwoon Univ., Korea

PDPp2 - 6 Space Charge Effect on Sustaining

Discharge in Coplanar AC PDPJ. H. Choi, Y. Jung, C. G. Ryu, S. B. Kim,

E. H. Choi

Kwangwoon Univ., Korea

PDPp2-7 A New Asymmetric Scan Method to ImproveAddress Discharge Characteristics Based

onAddressing Discharge DelayedFormation in AC PDP 877

B.-G. Cho, H.-S. Tae, S.-l. Chien

KyungpookNat. Univ., Korea

PDPp2 - 8 Experimental Characterization of Charge-Controlled Driving Method for AC PDP

.881

J.-Y. Kim, Y.-K. Lee, J.-S. Urn, H.-S. Kim,

S.-H. Lee*

Sejong Univ., Korea

*lnha Univ., Korea

PDPp2 - 9 New Addressing Technique for Reduction of

Addressing Time in AC PDP 885

K.-D. Cho, H.-S. Tae, S.-l. Chien, J.-H. Lee*

Kyungpook Nat. Univ., Korea

*Hong Ik Univ., Korea

PDPp2 -10 High Luminous Efficiency Current-

Controlled Driving Methodfor AC PDP

.889

J.-Y. Kim, Y.-K. Lee

Sejong Univ., Korea

PDPp2 -11 High-Contrast Ratio Low-Address Voltage

Driving Method for PDP 893

fl. L Xu, Z. C. Xie, H. B. Niu

Shenzhen Univ., China

PDPp2 -12 A New Reset Waveform for the Dark Room

Contrast Ratio Improvement Using the X

Electrode of AC PDP 897

G. S. Kim, H. Y. Choi, S. H. Lee, J. Y. Kim*

Inha Univ., Korea

*Sejong Univ., Korea

PDPp2 -13 Measurementof Wall Voltagein Reset

Discharge of AC PDP 901

K. D. Park, Y. Jung, C. G. Ryu, J. H. Choi,

S. B. Kim, T. S. Cho, P. Y. Oh, S. H. Jeon,

E. H. Choi

Kwangwoon Univ., Korea

PDPp2 -14 Simulation Utilization at PDP Module ImpactTest 905

C. C. Liao, Y. M. Huang, J. F. Huang

AU Optronics, Taiwan

See Late-News

Workshop on

EL Displays, LEDs and Phosphors

Thursday, December 5

9:00-9:05 Himawari

Opening

9:00

Opening Remarks

H. Kobayashi, Workshop Co-Chair

9:05-10:35 Himawari

PH1/PDP3: Phosphors for PDPs

PH1/PDP3-1: Invited Technical Trend of Phosphors for

Plasma Display Panels 685

T. Hisamune

Kasel Optonix, Japan

PH1/PDP3 - 2 A Study on the Degradation Mechanisms of

BlueEmitting Phosphor BaMgAhoOi7:Eu2t689

S.-X.Zhang*>", H. Uchiike"

*Daiden, Japan

"Saga Univ., Japan

PH1/PDP3- 3 Intercalation of Water into

BaMgAhoOi7:Eu2*(BAM)Blue Phosphor for

Plasma Display Panels 693

T. Onimaru, S. Fukuta, T. Misawa, K. Saklta,K. Betsui

Fujitsu Labs., Japan

IDW '02 XVII

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TABLE OF CONTENTS

PH1/PDP3 -4 The Improvement ofThermal and VUV

Irradiative Degradation of PDP Blue

Phosphor with New UV Phosphor 697

N. Yokosawa, E Nakazawa*

Toshiba, Japan

*Kogakuin Univ., Japan

PH3 - 4 Electron Traps and Luminescent Propertiesin ZnS:Ag, Al Phosphors 943

M. Komatsu, M. Shilki, ft. Inoue

Hitachi, Japan

11:05-12:35 Dahlia 1

PH4/FED2: Phosphors for FEDs

10:45-12:50 Ran

PH2: ELDs

PH2-1:

PH2-2

Invited Filter-Less Full Color Inorganic EL

Display 911

M. Susuklda, J. Hlrabayashi, Y. Yano,

K. NaganoTDK, Japan

Development of New High Luminance

Green EL Devices Based on Eu-DopedCalcium ThioaluminateMaterials System

PH4/FED2-1: Invited New Synthesis of Phosphor and

Screenig Process for FED

J. E. Jang*, S. J. Lee", W. Y. Jin*,

Y. J. Moon", J. E Jung*, C. G. Lee",

T. S. Oh", J. S. Choi", S. K. Kang",J. M. Kim*'"

'Samsung Advanced Inst, of Tech., Korea

"Samsung SDI, Korea

947

.951

.915

PH2-3

PH2-4

PH2-5

A M. Nakua, D. Cheong, X. Wu

iFire Tech., Canada

Improvement in Reproducibility of Bluish-

Green Ce* Luminescence in SrS:Ce Thin

Film Electroluminescent Devices 919

T. Kimura, H. Oka, K. Takasu, H. Fukada,

K. Ohmi, S. Tanaka, H. KobayashiTottori Univ., Japan

SrS:Ce-Buried Thin-Film Electroluminescent

Devices 923

K. Tanaka, S. Okamoto, Y. Izumi

NHK, Japan

Effects of Rb Doping on AgingCharacteristics of SrS:Ce Thin Film

Electroluminescent Devices 927

A Sasakura, H. Fukada, T. Kimura, K. Ohmi,S. Tanaka, H. KobayashiTottori Univ., Japan

See Late-News

9:00-10:40

Friday, December 6

PH3: LEDs and Phosphors

Ran

PH3-1: Invited LEDs Make Things Better 931

C. Ronda*'"

'Philips Res. Labs. Aachen, Germany"Utrecht Univ., The Netherlands

PH3 - 2: Invited 'Quantum Confined Atom' Based

Nanophosphors 935

ft. Bhargava, V. Chhabra, B. Kulkarni,A. Ekimov, N. Taskar

Nanocrystals Tech., USA

PH3 - 3 Mechanism of UV Irradiation Induced

Photoluminescence Enhancement Ettect on

ZnS:Mn Nanocrystals Modified by Poly(acrylic acid)

939

L Sun''", T. Isobe*

'Kelo Univ., Japan

"Peking Univ.

PH4/FED2- 2 Luminescence Properties of a Blue

Phosphor, GaN:Zn for VFDs

Y. Sato, H. Takahashi, H. Tamaki*.M. Kameshima*

Futaba, Japan

*Nichla, Japan

PH4/FED2 - 3 Film Properties and Cathodoluminescence

of Y202S:Eu Thin Films 955

M. M. Sychov, Y. Nakanishl* H. Nakajima*,T. Magami* H. Kominami*. Y. Hatanaka"

St. Petersburg State Inst of Tech., Russia

*Shizuoka Univ., Japan"Aichi Univ of Tech., Japan

PH4/FED2 - 4 Electron Penetration Depth into ZnS Particle

Layer at Low Excitation Voltage 959

ft. Inoue, M. Komatsu, M. Shiiki, S. Imamura

Hitachi, Japan

Thursday, December 5

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster PHp1:ELDs

PHp1 -1 Effect of Zn-Doping on Luminescent

Characteristics of MgS:Eu and (Mg,Ca)S:EuRed Phosphors 963

A Mikami, K. Yamamoto

Kanazawa Inst, of Tech., Japan

PHp1 - 2 AStudy about the Long Decay Time of the

Phosphor Layer Voltage on Double

Insulating Layer Thin Film EL Devices

967

S. Furukawa, K. Sowa

Denso Tech. College, Japan

PHp1 - 3 Effect of H2S on Luminescent

Characteristics of Blue-emitting(Sn-xCaxJSiCu.FTFEL Devices 971

M. Ehara, S. Hakamata, H. Kominami,

Y. Nakanishl, Y. Hatanaka*

Shizuoka Univ., Japan'Aichi Univ. ofTech., Japan

PHp1 - 4 High-Luminance Thin-Film EL Devices UsingMn-Activated Y203-Gd20a Phosphors 975

T. Minami, Y. Kobayashi, T. MiyataKanazawa Inst, of Tech., Japan

PHp1 - 5 Withdrawn

XVIII IDW '02

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TABLE OF CONTENTS

PHp1 - 6 A Filter Less MgxCai-xAhS4:Eu Green

Phosphor for Thick Dielectric EL Displays.983

Workshop on Field Emission Display

D. Cheong, A M. Nakua, X. Wu

iFire Tech., Canada 9:00-9:10

PHp2-3

PHp2 - 4

PHp2-5

PHp2-6

PHp2-7

PHp2

See Late-News

14:00-16:30 Poster/AI Room (Conf. ManagementRm.)Poster PHp2: Phosphors

PHp2 -1 Eu2+ doped CaMgSizOe Phosphor Thin Films

Prepared by Pulsed Laser DepositionTechnique 987

T. Ishisaka, E. Hata, S. Honda, T. Kunimoto*,

K. Ohmi, S. Tanaka, H. KobayashiTottori Univ., Japan'Kobe Univ., Japan

PHp2 - 2 Phase Transition of Betha-Alumina Structure

in BaMgAhoOi7:Eu2+ Phosphor 991

K. B. Kim, K. W. Koo* J. G. Kang",T. Y. Cho*", H. G. Chun*"

ETRI, Korea

*Youngdong Univ., Korea

"Chungnam Nat. Univ. Korea

"*Univ. ofUlsan, Korea

Effectof ZnO for Structural and CL

Properties of Ya03:Tb Thin Film Phosphors995

T. Magami, M. M. Sychov*. Y. Kominami,

Y. Nakanishl, Y. Hatanaka"

Shizuoka Univ., Japan*St. Petersburg State Inst, of Tech., Russia

"Alch Univ. of Tech., Japan

Preparation of GaN:Zn Phosphors byAerosol Pyroiysisfor FED Applications

Friday, December 6

Opening

Dahlia 1

9:00

Opening RemarksK. Yokoo, Workshop Chair

9:10-10:55 Dahlia 1

FED1:FEDs

FED1 -1: Invited FEDs with CNT on Large Area

Applications 1021

FED1-2:

FED1-3:

.999

G. Y. Hong, B. W. Jeoung, J. S. Yoo

Chung-Ang Univ., KoreaCathodoluminescence of ZnO:Tm PhosphorPowder 1003

A Uemura, Y. Mlneyama, H. Ohnishi

Ehime Univ., Japan

Synthesis and Characterization of Eu DopedSn02 Phosphor Powders by Combustion

Method 1007

J. H. Kang, J. Y. Kim, D. Y. Jeon

KAIST, Korea

Optical Characteristics of SnAImOsiEu

Phosphors Excited by UV LED 1011

/. W. Park, W. T. Yoo*, J. S. Yoo*, C. K. Choi

Seoul Nat Univ., Korea

*Chung-Ang Univ., Korea

8 The Effect of Heat-Treatment on YAG

Phosphorsfor LEDs Applications 1015

W. T. Yoo, G. Y. Hong, B. W. Jeoung, J. S. Yoo

Chung-Ang Univ., Korea

FED1- 4

FED1-5

C. G. Lee, S. J. Lee, S. Y. Whang, E. J. Chi,

T. I. Yun, J. S. Lee, J. W. Kim* J. E. Jang*,

S. H. Cho, B. G. Lee, S. J. Lee, H. S. Han,

S. H. Ahn, K. S. Ryu, K. W. Jung, J. H. Kaug,S. H. Jin, J. E Jung* J. S. Choi, T. S. Oh,

S. K. Kang, J. M. Kim

Samsung SDI, Korea

*Samsung Advanced Inst, ofTech., Korea

Invited Large-Sized CNT-FED 1025

S. Uemura, J. Yotani, T. Nagasako, H. Kurachi,

H. Yamada, T. Ezakl, T. Maesoba, T. Nakao,

Y. Saito* M. Yumura"

Noritake ITRON, Japan*Mie Univ., Japan"AIST, Japan

Invited Development of NanocrystallineSilicon Ballistic Electron Emitter andIts

Application to Flat Panel Display 1029

N. Koshlda, A. Kojima, Y. Nakajlma,T. Ichihara*, Y. Watabe*, T. Komoda*

Tokyo Univ. ofA&T, Japan'Matsushita Elec Works, Japan

Improved Electron Emission Characteristics

of BSD (Ballistic Electron Surface-Emitting

Display) on a Glass Substrate Fabricated

with Low Temperature Process 1033

T. Ichihara, Y. Honda, T. Baba, Y. Takegawa,

Y. Watabe, T. Ratal, K. Aizawa, T. Komoda,

V. Vezin* N. Koshida*

Matsushita Elec. Works, Japan

'Tokyo Univ. ofA&T, Japan

Development of an Advanced HEED (High

Efficiency Electro-emission Device) and Its

Application to FPDs 1037

T. Yamada, T. Hata, K. Sakemura, S. Iwasakl,

N. Neglshl, T. Chuman, H. Satoh,

T. Yoshikawa, K. Ogasawara, N. Koshida*

Pioneer, JapanTokyo Univ. ofA&T, Japan

11:05-12:35 Dahlia 1

FED2/PH4: Phosphors for FEDs

FED2/PH4-1: Invited New Synthesis of Phosphor and

Screenig Process for FED 947

J. M. Kim*'", J. E. Jang*'", S. J. Lee*'",J. S. Choi*'", Y. J. Moon*", S. N. Cha-",

S. K. Kang*-", T. S. Oh*'", Y. W. Jin*'",J. E. Jung"", C.G.Lee*"

'Samsung SDI, Korea

"SamsungAdvanced Inst, of Tech., Korea

IDW '02 XIX

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TABLE OF CONTENTS

FED2/PH4- 2 Luminescence Properties of a Blue

Phosphor, GaN:Zn for VFDs 951

Y. Sato, H. Takahashi, H. Tamaki*

M. Kameshima*

Futaba, Japan

*Nichia, Japan

FED2fPH4-3 Film Properties and Cathodoluminescence

of Y202S:Eu Thin Films 955

M. M. Sychov, Y. Nakanishi* H. Nakajima*.T. Magami*. H. Kominami*, Y. Hatanaka*

St. Petersburg State Inst ofTech., Russia

*Shizuoka Univ., Japan

FED2/PH4- 4 Electron Penetration Depth into ZnS Particle

Layer at Low Excitation Voltage 959

ft Inoue, M. Komatsu, M. Shilki, S. Imamura

Hitachi, Japan

FED4 - 2 Fabrication of a Triode Structure GraphiteNanofiber FED by Thermal CVD Method

1065

M. Hlrakawa, K. Ono, O. Miura, H. Murakami,K. Okasaka'K. Fujli* T. Sasaki*,

T. Yamamoto", K. Hagiwara", M. Seki"

ULVAC, Japan*ULVAC Coating, Japan

"NHK, Japan

FED4 - 3 FED UsingWire-Cathode Coating CNTs

12:35-13:10 See Late-News (FED5)

.1069

Y. Sakamoto, S. Yoshida, I. Fukuda

Kanazawa Inst, of Tech., Japan

FED4 - 4 High Performance HfC-Coated Si FEAs

.1073

M. Nagao, T. Sato*, S. Kanemaru,

T. Matsukawa, J. Itoh, S. Yamamoto*

AIST, JapanTsukuba Univ., Japan

13:55-15:10 Dahlia 1

FED3: FE Structuresand Emission Characteristics

FED3 -1 Defect-Free MIM-Cathode Array with the

Double-Field Insulator Structure 1041

T. Kusunoki, M. Sagawa, M. Suzuki, K. TsujiHitachi, Japan

FED3 - 2 Characterization of MIM Cathodes by Low-

Stress l-V Measurement 1045

M. Suzuki, M. Sagawa, T. Kusunoki, K. TsujiHitachi, Japan

FED3 - 3 MIM Cold Cathode Using Ion-Beam

Irradiated Polyimide as Tunneling Insulator

1049

A Saba, T. Yoshida, T. Asano

Kyushu Inst, of Tech., Japan

FED3 - 4 Transient Response of the AMC (ActiveMatrix Cathode) Composed ofa-Si:H TFT

and Molybdenum Tips 1053

C.-H. Chung, Y.-H. Song, C.-S. Hwang,S.-D. Ahn, B.-C. Kim, Y.-R. Cho* J. H. Lee,K. I. Cho

ETRI, Korea

'Pusan Nat. Univ., Korea

FED3 - 5 Emission Microscopic Observation of

N-TypeSi FEAinSeveral Gasses 1057

K. Minaml, K. Yamane, H. Nakane, H. Adachi,Y. Suzuki*, H. Mimura*. K. Yokoo*

Muroran Inst, of Tech., JapanTohoku Univ., Japan

15:20-17:00 Dahlia 1

FED4:FE Materials and Emission Characteristics

FED4 -1: Invited Field Emission Applications of

Aligned Carbon Nanotubes/Fibres 1061

W. I. Milne

Cambridge Univ., UK

FED4 - 5 Effect of Surface Morphology on Field

Emission Characteristics of Boron Nitride

Films 1077

S. Funakawa, T. SuginoOsaka Univ., Japan

FED4 - 6 Preparation and Evaluation of Transition

Metal Nitride and Carbide Thin Films for

Field Emission Cathode 1081

Y. Gotoh, H. Tsuji, J. Ishikawa

Kyoto Univ., Japan

Thursday, December 5

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster FEDp: FED Technologies and Novel Devices

FEDp -1 Atom Probe Analysis of Surface

Contamination on Field Emitter 1085

M. Ushirozawa, M. Huang*, A. Cerezo*

NHK, Japan'Univ. ofOxford, UK

FEDp - 2 Optimization of Graphite Nanofibers as

Field Electron Emitters 1089

K. Ono, M. Hlrakawa, O. Miura, H. Murakami

ULVAC, Japan

FEDp - 3 FlatLamp Fabrication Using CNTs Grown on

Glass Substrate 1093

Y.-D. Lee, D.-J. Lee, Y.-H. Lee*", J.-E. Yoo*,J.-H. Park*, B.-C. Kim", B.-K. Ju

KIST, Korea

*lljin Nanotech, Korea

"ETRI, Korea

*"Korea Univ., Korea

FEDp - 4 Characterization of Field Emitter Based on

Porous Polycrystalline Si Nano-Structure

1097

J.-W. Lee, H.-Kim, Y.-H. Lee*", M.-H. Oh*,

J.-Jang", B.-K. Ju

KIST, Korea

'Dankook Univ., Korea

"Kyunghee Univ., Korea

*"Korea Univ., Korea

XX IDW '02

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TABLE OF CONTENTS

FEDp - 5 X-Ray Source Using Graphite Nanofibers

and Its Application to X-Ray Radiography1101

T. Matsumoto, J. Matsuda, S. Taya,H. Mimura*

Stanley Elec, Japan

Tohoku Univ., Japan

OEL3- 3 Flexible Polymer Electroluminescent Device

with Poly (N-vinylcarbazole) Light-Emitting

Layer on High-Index of Refraction Plastic

Substrate 1139

A Mikami, S. Nakajima, K. Okada

Kanazawa Inst, ofTech., Japan

Workshop on Organic EL Displays

Wednesday, December 4

9:30-12:00

OELp-1

10:40-12:00 Phoenix Hall

0EL1: Displays

OEL1 -1: Invited High Efficiency Active MatrixOLED

1107

H. K. Chung

Samsung SDI, Korea

OEL1 - 2: Invited Polymer OLED Displays for Wireless

and Automotive Applications 1111

H. Antoniadis

Osram Opto Semiconductors, USA

OEL1 - 3 Withdrawn

14:00-15:10 Phoenix Hall

OEL2: Materials and Devices (1)

OEL2 -1: Invited High Efficiency Phosphorescent

OLED Displays 1119

J. J. Brown, ft. C. Kwong, M.-H. M. Lu,

M. Hack, Y.-J. Tung, M. S. Weaver,

A. B. Chwang, T. X.Zhou

Universal Display, USA

OEL2 - 2 Highly Efficient OLEDs with Solution-

Processed Dendrimer Emitter 1123

O. V. Salata, Z. G. Liu, A. Safonov*,

N. Mustapha*. V. Christou*, S.-C. Lo,

P. L Burn, I. D. W. Samuel", J. Markham"

Univ. of Oxford, UK

*Opsys, UK"Univ. of St. Andrews, UK

OEL2 - 3 Polymorphs and Optical Behaviors of di-ji-2-

(2-hydroxyphenyl) thiazolate-bis [mono-2-

(2-hydroxyphenyl) thiazolate] Zinc (II)1127

T. S. Kim, K. Nishii, J. S. Ahn, T. Okubo,

T. Mitani

JAIST, Japan

15:40-16:40 Phoenix Hall

OEL3: Materials and Devices (2)

OEL3 -1 HighlyEfficient Red EL Device Based on a

New HostSystem 1131

T. Arakane, K. Fukuoka, T. Iwakuma,

H. Ikeda, M. Funahashl, C. Hosokawa,

T. Kusumoto

Idemitsu Kosan, Japan

OEL3 - 2 Efficient Electrofluorescent Red Emitters in

Organic Electroluminescent Devices

1135

T.-H. Liu, C.-Y. lou, C. H. Chen

Nat. Chiao Tung Univ., Taiwan

Thursday, December 5

Poster/AI Room (Conf. Management Rm.)Poster OELp: OEL Posters

Encapsulation of Organic Light-EmittingDevices Using Spin-Coating Method

.1143

G. H. Kim, J. Y. Oh, H. Y. Chu, Y. S. Yang,

J. I. Lee, L M. Do, T. Y. ZyungETRI, Korea

OELp - 2 Simpleand Effective Encapsulation Layers

and Their Influence on Organic Light

Emitting Devices 1147

J. Oh, G. H. Kim, H. Y. Chu, Y. S. Yang,J.-l. Lee, L.-M. Do, T. ZyungETRI, Korea

OELp - 3 1.9-in. Passive Matrix Polymer Light-

Emitting Display 1151

J. I. Kang, J. Y. E, ft G. Roh, B. H. Hwang,

S. W. Kim, J. H. Lee, S. J. Kang, H. B. Jun,

W. M. Han, K. S. Lee, W. Y. Kim

Hyundai LCD, Korea

OELp - 4 Poly(p-xylylene) Film Passivation for

Longevityof anOrganic Light-EmittingDiode fabricated on the Polyethylene-terephthalate (PET) substrate 1155

S. H. Kwon, J. S. Kim, J. S. Yoo, Y. B. Kim*

Chung-Ang Univ., Korea

*Kon-KukUniv., Korea

OELp - 5 High Stability White Organic Light EmittingDiode with a Single Emitting Layer,

SAIq:DCJTB 1159

Y. W. Ko, J. H. Lee, Y. H. Kim, C. H. Chung,C. Y. Son, ft C. Kim, C. S. Hwang, Y. H. Song,

J. Urn*, Y. J. Ahn* G.-W. Kang*,

N. H. Lee*, C. H. Lee*

ETRI, Korea

'Inha Univ., Korea

OELp - 6 Application of Low Refractive Materials for

Optical Windows of Displays 1163

T. Nakayama, H. Murakami, K. Okasaka",

K. Fujii*. T. Sasaki

ULVAC, Japan*ULVAC Coating, Japan

OELp - 7 Study on the Inorganic Thin-Film

Passivation for Organic Light-Emitting Diode

1167

H. Kim, K.-H. Kim, J.-K. Kim, Y.-H. Lee*",

L.-M. Do*, J.-l. Han", J. Jang**", B.-K. Ju

KIST, Korea

'ETRI, Korea

"KETI, Korea

"*Korea Univ., Korea

""Kyung Hee Univ., Korea

OELp - 8 Withdrawn

IDW '02 XXI

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OELp-9 The Structure and MorphologyCharacterization of Vacuum-EvaporatedPentacene as a Function of the EvaporationCondition 1175

J. W. Chang*'", H. Kim*'", J. K. Kim*,Y. H. Lee* M. H. Oh"*, J. Jang", B. K. Ju*

*KIST, Korea

"Kyung Hee Univ., Korea

'"Dankook Univ., Korea

OELp -10 Painting Method of OrganicElectroluminescent Devices 1179

M. Ooe, R. Satoh, S. Naka, H. Okada,H. Onnagawa

Toyama Univ., Japan

OELp -11 Improved Efficiency by Balancing ChargeInjection in Organic Electroluminescent

Devices 1183

C. Ganzorig, M. FujlhiraTokyo Inst, ofTech., Japan

OE Lp -12 Solution Processible Small Molecule OLED

Materials and Device 1187

J.-A. Cheng, C.-C. Yeh, C. H. Chen

Nat. Chiao Tung Univ., Taiwan

OELp -13 Analysis of the Deterioration Mechanism of

OrganicEL Films 1191

ft. Kamoto, T. Matsunobe, T. Watanabe,M. Ichikawa* Y. Taniguchi*Toray Res. Ctr„ Japan*Shinshu Univ., Japan

OELp -14 Low-Power Driving Method and Circuit for

Passive Matrix Organic Electro-LuminescentDisplays 1195

S. J. Kim, O. K. Kwon

Hanyang Univ., Korea

OELp -15 Simulation and Optimization of OLED Device

1199

C. ft. Ou

ITRI/OES, Taiwan

OELp -16 White Light Emission from Polymer Light-Emitting Diodes Based on PhosphorescentPolymers 1203

M. Suzuki, M. Kamachi*. K. Shirane*, S. Tokito,F. Sato

NHK Japan*Showa Denko, Japan

OELp -17 Perfluorophenyl-Substituted 2-

Phenylpyridine Iridium Complexes: EfficientMaterials for Emission Layer of OLEDs

1207N. Shirasawa, T. Tsuzuki*, T. Suzuki, S. Tokito*

Inst, for Molecular Sci., Japan*NHK, Japan

OELp -18 Influences of Shape of ITO Electrode

Surface on Preparations and Characteristics

of EL Devices 1211K. Tanaka, S. FujitaHachinohe Inst, of Tech., Japan

See Late-News

Workshop on 3D/Hyper-Realistic

Displays and Systems

10:55-11:00Friday, December 6

Opening

Ran

10:55

Opening Remarks

F. Okano, Workshop Chair

11:00-12:00 Ran

3D1: Applications

3D1 -1: Invited 3-HD Panorama Video Transmission

Experimentfor 2002 World Cup Soccer

1217

N. Nishinaga, T. Takahashi, S. Ohba*,

M. Sato", J.-H. Jang, K. Tanaka, M. Tanaka

CRL, Japan

*Sony, Japan"JVC, Japan

3D1 - 2: Invited 3D HDTV Relay Broadcast

Experiments Using a Terrestrial and SatelliteNetwork in Korea 1221

N. H. Hur, G. S. Lee, C. H. Ahn, C.-T. Ahn

ETRI, Korea

14:00-15:20 Ran

3D2: 3D Displays and Related Technologies

3D2 -1 Quality Quantification of Multiview

3-Dimensional Image 1225

J.-Y. Son, V. V. Saveljev, Y.-J. Choi, S.-K. Kim

KIST, Korea

3D2 - 2 High-Resolution Integral VideographyAutostereoscopic Display Using Multi-

Projector 1229

H. Liao, M. Iwahara, N. Hata, I. Sakuma,T. Dohi, T. Koike*, Y. Momoi*, T. Mlnakawa*,M. Yamasaki* F. Tajima*, H. Takeda*

Univ. of Tokyo, Japan

'Hitachi, Japan

3D2 - 3 An Autostereoscopic Display with Multi-

Viewer Tracking and Multi-Viewzone

Capabilities 1233

N.-Y. Wang, C.-H. Tsai, W.-J. Hsueh

ITRI, Taiwan

3D2 - 4 Synthesizing Intermediate Image UsingContour Images 1237

J.-H. Kwak, Vs. V. Komar, K.-T. Kim

Hannam Univ., Korea

15:40-16:50 Ran3D3: Large Area 2D/3D Display

3D3 -1: Invited A Wide-Screen Projector of 4k x 8k

Pixels 1241

M. Kanazawa, K. Hamada, I. Kondoh,F. Okano, Y. Haino* M. Sato*, K. Doi*

NHK, Japan

*JVC, Japan

XXII IDW '02

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3D3 - 2 Advantages of 2nd Generation Home

EntertainmentDLP Technology 1245

S. Watanabe*, K. Ohara, T. Kaeriyama*,A Takeda*

Texas Instrs., USA

Texas Instrs. Japan, Japan

3D3 - 3 Elimination of Pseudoscopic Viewing Area

of Stereoscopic Full-Color LED Display

Using Parallax Barrier 1249

H. Yamamoto, M. Kouno, Y. Hayasaki,S. Muguruma*, Y. Nagai*, Y. Shimizu*

N. Nishida

Univ. of Tokushima, Japan

'Nichia, Japan

Thursday, December 5

14:00-16:30 Poster/AI Room (Conf. ManagementRm.)Poster 3Dp: Display Technologies and Holography

3Dp-1 Hyper-Realistic Retinal Scanning DisplaywithWavefront Curvature Modulator

1253

M. Watanabe, H. Takayama, N. Asa/,

ft. Matsuda, S. Yamada

BrotherInds., Japan

3Dp - 2 Turn Type Three-Dimensional Display

System Using Arrayed Light Emitting Diodes

1257

Y. Sakamoto, S. Maruyama, I. Fukuda

Kanazawa Inst, ofTech., Japan

3Dp- 3 Holography in the Bragg Type AOSLM.1261

H. Choi, S.-K. Kim, J.-Y. Son, J. W. Wu*,

T. T. V. Anh

KIST, Korea

*Ewha Womans Univ., Korea

VHF1 - 3 Measurement of Memory Color for Elderly

Peopleand its Application to the NTSC

Color TV System 1275

H. Isono, T. Ishibashl*. C. Yamada

Nippon Inst, of Tech., Japan

*Univ. of Electro-Commun., Japan

13:40-15:15 Ran

VHF2: Image Quality (2)

VHF2 -1 A Characteristic ofthe Temporal Integratorin the Eye-Tracing Integration Model of the

Visual System on the Perception of

Displayed Moving Images 1279

T. Kurita, A. Saito*

NHK, Japan'Matsushita Elec, Japan

VHF2 - 2 Simulation of Visual Perception on MovingPictures 1283

K. SeklyaIBMRes., Japan

VHF2 - 3 The Moving Picture Evaluation Method of

LCDbyPSNR .1287

Y. Nakamura, N. Okuda, J. Someya,M. Yamakawa

Mitsubishi Elec, Japan

VHF2 - 4 Evaluation of the Quality of Moving Images

Displayed on LCDs by Using MTF Method: A

Comparison between H-V-Mode FLCD, TN-

LCDandCRT 1291

K. Ida, H. Furuta, T. Miyama, T. Hlmuro*.

H. Ushinohama", Y. Yoda", S. KobayashiSci. Univ. of Tokyo in Yamaguchi, Japan*HIT, Japan"Otsuka Elect, Japan

See Late-News

Workshop on

Applied Vision and Human Factors15:30-17:00 Ran

VHF3: Applied Vision

Wednesday, December 4

10:40-10:50 Ran

Opening

10:40

Opening Remarks

H. Isono, Workshop Chair

10:50-12:00 Ran

VHF1: Image Quality (1)

VHF1 -1: Invited Sharpness as Perceived on a CRT

1267

/. Heynderickx, E Mastenbroek*, S. Bech"

Philips Res. Labs., TheNetherlands

'LG.Philips Displays, The Netherlands

"Bang & Olufsen A/S, Denmark

VHF1 - 2 Color Management UsingNeural Networks

1271

S. Tominaga, T. Nishida

Osaka Electro-Commun. Univ., Japan

VHF3 -1: Invited Experiments and Analysis of the

Proper Area for Watching a Large-Scale

Display 1295

K. Nomoto, M. Wakamatsu

Mitsubishi Elec, Japan

VHF3 - 2 Judging the Eye Direction of Non-Human

Agents 1299

R. S. Nagayama, J. Seyama*

Hiroshima Pref. College ofHealth Sciences,

Japan*Univ. of Tokyo

VHF3 - 3 Effects of Interpupillary Distance and AC/A

Ratio on Binocular Fusion and Depth

Perception 1303

J. K. Bahn*'", J. Y. Son*, Y. J. Choi*

K. Kham", C. S. Chung"

*KIST, Korea

"Yonsel Univ., Korea

VHF3 -4 Retinal and Near the Eye Display: What is

Good.WhatisBad 1307

G. G. DemirchoglyanAll-Russian Res. Inst, ofPhysical Culture &

Sport (VNIIFK), Russia

IDW '02 XXIII

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Thursday, December 5

9:30-12:00 Poster/AI Room (Conf. Management Rm.)Poster VHFp: Applied Vision and Human Factors

14:00-15:10

EP2: Electronic Paper (1)

VHFp-1

VHFp-2

High Accurate Location Measurement of

Pixel Defects Using Image Processing

Dahlia 1

.1333

.1311

VHFp-3

VHFp-4

VHFp-5

F. Saitoh

Gifu Univ., Japan

ErgonomicApproach to Evaluate Minimum

Perceivable Non-Uniformity in Liquid CrystalDisplays 1315

Y. Mori, T. Tamura*, ft. Yoshitake",

K. Moriguchl", K. Takahashi, S. TsujiID Tech., JapanTokyo Inst ofPolytech., Japan"IBM Japan, Japan

Picture Quality Evaluated Against Color

Reproduction Ranges on a Display 1319

K. Itakura, Y. Shimodaira, G. Ohashi

Shizuoka Univ., Japan

Displaying Method in On-Board Display (1) -

Recognizable Information Amount - 1323

T. Hamada, M. Kawasumi*. T. Nakano,S. Yamamoto

Meijo Univ., Japan*Aichi Shukutoku Univ., Japan

Displaying Method in On-Board Display (2) -

Route Guidance Method Based on Sex

Differences - 1327

M. Kawai, M. Kawasumi*, T. Nakano,S. Yamamoto

Meijo Univ., Japan'Aichi Shukutoku Univ., Japan

EP2 -1: Invited Visual Performance of

Electrodeposition DisplayT. Matsumoto, K. Shinozaki

Sony, Japan

EP2-2: Invited Microcup Electrophoretic Displaysby a Roll-to-Roll Manufacturing Processes

1337

ft. C. Liang, J. Hou, H. M. ZangStPix Imaging, USA

EP2 - 3 Newly Designed, High Resolution, Active-

Matrix Addressing In-Plane EPD 1341

Y. Matsuda, E. Kishi, T. Goden, A. Ogawa,N. Ukigaya, Y. Uno, K. Ishige, T. Ikeda,

H. Matsuda

Canon Res. Ctr., Japan

15:40-17:00 Dahlia 1

EP3: Electronicpaper (2)

EP3-1

EP3-2

Topical Session on Electronic Paper EP3-3

Thursday, December 5

10:50-11:55 Phoenix Hall

EP1/AMD2: Active-Matrix Electronic Paper

EP1/AMD2-1: Invited Polymer Semiconductor Active-

Matrix Backplane Fabricated by Ink-Jet

Technique 219

T. Kawase

Epson Cambridge Lab., UK

EP1/AMD2-2 Ultra-Thin 3.1-in. Active-Matrix Electronic Ink

Display for Mobile Devices 223

J. Au, Y. Chen, A. Ritenour, P. Kazlas, H. Gates

Elnk, USA

EP1/AMD2 3 Development of Active Matrix Electronic Ink

Display Modules for Smart Handheld

Applications 227

A Henzen, M. Pitt*, M. Yasui*. W. Dijkman",K. Amundson*", ft. W. Zehner*", H. Gates"*

Philips Mobile Display Syss., The Netherlands

'Philips Mobile Display Syss., Japan

"Philips Applications Lab Comps.,The Netherlands

*"Elnk, USA

Black and White Photo-Addressable

Electronic Paper Using EncapsulatedCholesteric Liquid Crystal and OrganicPhotoconductor 1345

T. Kakinuma, M. Araki, T. Hikichi, N. Hiji,H. Kobayashi, S. Yamamoto, H. Arisawa

FujiXerox, Japan

Dynamically Driven Polymer Stabilized Black

andWhite Cholesteric Liquid Crystal Display1349

A Khan, N. Miller, F. Nicholson, ft. Armbruster,J. W. Doane, D. Wang* D.-K. Yang*Kent Displays, USA

*Kent State Univ., USA

Characterization of "Peas in a Pod", a Novel

Idea for Electronic Paper 1353

S. Maeda, H. Sawamoto, H. Kato,

S. Hayashi, K Gocho*. M. Omodani*

Oji Paper, Japan

Tokai Univ., Japan

EP3-4

.1357

Printer Development for the Thermal-

Rewritable TechnologyY. Kimura

Okilnfo. Syss., Japan

Wednesday, December 4

14:00 -16:30 Poster/AI Room (Conf. Management Rm.)Poster EPp: Electronic Paper Materials

EPp -1 Electrical and Optical Properties of PolymerCoated Ti02 Particles Using DispersionPolymerization Technique for

Electrophoretic Display 1361S. D. Ahn, M. K Kim, M. J. Joung, C. A. Kim,Y. E. Lee, S. ft. Kang, K. I. Cho, K. S. Suh

ETRI, Korea

XXIV IDW '02

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EPp - 2 Microencapsulation of Wax Coated Titanium

Oxide Pigment Particles for ElectrophoreticDisplay 1365

C. A. Kim, M. J. Joung, M. K. Kim, S. D. Ahn,

S.-Y. Kang, K. S. Suh

ETRI, Korea

See Late-News

LATE-NEWS PAPERS 1369

COLOR PAGES 1427

AUTHOR INDEX 1433

AFFILIATION INDEX 1448

IDW '02 COMMITTEE 1454

LIST OF EXHIBITORS 1461

FLOOR PLAN 1462