Interface Structure of Photonic Multilayers Prepared by PECVD Hyeonjae Kim a, Mark D. Foster a, Hao...
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Interface Structure of Photonic Multilayers Prepared
by PECVD
Hyeonjae Kim a, Mark D. Foster a, Hao Jiang b,c, Scott Tullis b, Timothy J. Bunning b,
Charles F. Majkrzak d
a Maurice Morton Institute of Polymer Science, The University of Akron, Akron, OH 44325b Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH 54533c Anteon Co., Dayton, OH 45431d NIST Center for Neutron Research, Gaithersburg, MD 20899
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Research Interests in Photonics
•Non-inorganic films•Often inorganic l/4 stacks are deposited on plastics•Delamination problems arise
•Non-conventional, organic, multilayer thin films•Non-stacked filters
•Weakest part of film failure is interface
•Could smear interface to increase robustness
•Ability to tailor refractive index•Many times, we require an index which is not readily available (1.43)
n = 1.5
n = 1.3
n = 1.43
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PECVD Schematic
Molecular Drag Pump
Gate Valve
Butterfly Valve
Pressure Transducer
Roughing pump
Sample
RF Power Supply
Flow Controller
Flow Controller
Flow Controller
UHP Argon
Sample RotationDevice
Precursor Bubbler
Precursor Gas Supply
Reaction Zone
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High
High
High
Low
Low
Low
ns
n0
0
4
4
40tn f
• Notch filter by Plasma Enhanced Chemical Vapor Deposition (PECVD)
• Maximum interference occurs when thickness is l/4
Wavelength
Tra
nsm
ittan
ce
Increasing N
decreasesnn lh )(
Multilayer Thin Films: 1/4 Wave Stack
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Objective
Structure ?
Thickness of each layer Interface width (roughness) Composition Density Crosslink density
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Structure of PECVD Multilayers
Three monomers considered
* Benzene (B) : high refractive index, 1.61
* Octafluorocyclobutane (OFCB) : low refractive index, 1.40
* Hexamethyldisiloxane (HMDS) : 1.45
Films studied
Single layer films of single monomer Bilayer of PP-(OFCB/B) Multilayer of 5*PP-(B/OFCB) Single layers of “copolymer” substrate
PP-OFCBPP-B
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X-ray or Neutron Specular Reflectivity Gives Averaged Structural Information
- qz = 4sin(/- Sensitive to the structure surface normal- Kiessig fringes, d=2/q- Roughness of interface - Scattering Length Density (SLD), (b/V)
0 0.1 0.2 0.3 0.4qz (Å-1)
Ref
lect
ivity
, R
100
10-1
10-2
10-3
10-4
10-5
10-6
qc
qki kf
q=qz
dThin film
Substrate
x
z
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NR Gives SLD of PP-OFCB andReveals Uniform (b/V)n of PP-OFCB
Composition : CF1.8
Density, b ≈ 1.9 g/cm3
SiO2 = 2 Å
dOFCB = 251 Å
OFCB = 4 Å
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XR Shows Low SLD Transition Regionin PP-OFCB Single Layer
Transition regionbetween substrate andOFCB film (~ 6Å) with composition of CF
Preferential reactivity of CF species
SiO2 = 2 Å
dOFCB = 251 Å
OFCB = 4 Å
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XR Confirms the Structure of PP-dB Revealed by NR
Composition : CD1.23
Density, b = 1.16 g/cm3
SiO2 = 3 Å
ddB = 249 Å
dB = 5 Å
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NR & XR Show Multilayer Structurein a Self-Consistent Manner
(OFCB/air) : 8 Å(dB/OFCB) : 13 Å (OFCB/dB) : 20 Å
d(dB) : 101 ± 4 Åd(OFCB) : 136 ± 17 Å
(OFCB/air) : 6 Å(dB/OFCB) : 16 Å (OFCB/dB) : 13 Å
d(dB) : 101 ± 2 Åd(OFCB) : 136 ± 17 Å
NR XR
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Structure of B-OFCB Copolymer Films
- Uniform films can be made with B-OFCB copolymer
- Transition region varies in B-OFCB copolymer
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Structure of OFCB-HMDS Copolymer Films
- Uniform, smooth films
- Transition region for both precursors
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Off-specular X-ray Scattering Probes Interface Lateral Structure
Transverse scans from PS brushes
- Sensitive to in-plane correlation of interface structure- Liquid-like or not?- Periodic structures
SubstratePECVD film
q qz
qx
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Surface Fluctuations Highly Suppressed On Single Layer
- Behavior different from that of tethered brush
- Surface fluctuations more suppressed on PECVD film
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Long wavelength fluctuations do not grow with thickness
OFCB Benzene
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Kinetic roughening proposed
results from competition between
film deposition and surface relaxation.
Deposition rates: PP-B : 55Å/min
PP-OFCB : 12Å/min
PP-OFCB surface relaxes more during deposition
=> Longer wavelengths not as strongly suppressed => Faster increase in roughness with thickness.
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Swelling in solvent vapor for over 3hrs
PP-B in Toluene vapor PP-OFCB in THF vapor
Increase in thickness by
~2%
Increase in thickness by
~30%
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Summary
PECVD creates well-defined, uniform, smooth films
XR and NR reveal structure of multilayer photonic film
Limited transient deposition behavior next to the substrate for OFCB and HMDS
Interfaces between PECVD layers can be sharp (~16 Å rms).
Air interface is very sharp ( < 8 Å rms).
Surface roughness may be dictated by kinetic roughening
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Future work
- Better understand connection between surface roughness and deposition rate
- Study variations in crosslink density with depth
- Characterize structure of films with other types of interfaces
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Acknowledgements
- Funded by the Collaborative Center for
Polymer Photonics (F49620-02-1-0428).
- Use of Advanced Photon Source supported by the U.S.
DOE, Office of Science, Office of Basic Energy Science,
under Contract No. W-31-109-ENG-38.
- Dr. Michael Silverstein and Dr. Takao Usami for
helpful discussions.
- Experimental assistance from Bulent Akgun.
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NR Gives SLD of PP-dB andReveals Uniform (b/V)n of PP-dB
SiO2 = 8 Å
ddB = 238 Å
dB = 5 Å
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Interface Width Revealed by both NR and XR for PP-(OFCB/dB) Bilayer
NR
- (OFCB / dB interface): 16 Å - Transition region in OFCB- (OFCB / dB interface): 13 Å
XR
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Structure of HMDS
Me 3Si SiMe 3O