High performance components from Gencoa for Research and Development

Simply better tools to build your devices

Transmission Electron Microscopy on an Fe/Si multilayer (photo courtesy of EPFL)

© Daresbury Lab.

With the range of Gencoa advanced thin film development tools at your disposal

your research investment can reach its full potential

Gencoa offer the following catagories of products for thin film Research & Development

Circular Magnetrons

Rotatable Magnetrons

Reactive Gas Control

Plasma Sources

Planar Magnetrons

Magnetic options for Gencoa Circular magnetrons

Unrivalled in the market, unique products

Magnetic packs available for circular range 2”, 3” 4”, 6”, 8”, 10”, 12”, 14” & 16”

BPφ

Standard 2 pole

(SW/PP)

VT variable

High Yield HY

HY – HU High

Uniformity

MRS -Multi-ring

static

FFE Hybrid

FFE Magnetic Materials

2” 50

3” 75

4” 100

6” 150

8” 200

10” 250

12” 300

14” 350

16” 400

Gencoa circular Magnetrons have a wide range of accessories

Such as head tilt and shutters

• Standard internal mounting on a shaft 25mm-80mm OD or KF / CF port connection

• Vacuum wall feed through for sliding / clamping of shaft mounted version – incorporates linear bearing for large versions

• External mounting with or without integral anode (with anode standard)

• Argon gas injection over target from single connection point which exits the cathode with the water and power connections (i.e. at atmosphere)

• Sputter chimney facility to aid gas separation and low pressure sputtering and prevent cross contamination

• Precision and easy tilting of the magnetron head by unique plunger adjustment

• Optionally electrically floating or biased anodes for reactive dielectric deposition - pulsed DC or AC

• Plasma fibre optic link for reactive gas control of process • A wide variety of shutters: manual, electro-pneumatic,

sliding, tilting, sliding & tilting combined, split blades for confined spaces, electrically floating

Let Gencoa create the design you need

Choose from the range of mechanical options below

Gencoa circular magnetron mounting can be adapted to suit every need

Gencoa have 5 design engineers – Creo (ProE) 3D CAD

Gencoa gas injection avoid passing gas between anode and cathode

Injected within the anode to exit at target surface

• A single atmosphere side gas connection point to uniform injection over the target surface.

• Avoids passing gas between anode and cathode to avoid side plasma’s.

Gencoa High Yield (HY) and High Uniformity (HU) magnetic arrays

Available on 150mm (6”) targets or larger

• Gencoa’s unique target clamping and anode design allows sputtering to the target edge for higher target use and greater cleanliness

• High Yield type magnetic arrays will deliver 40-50% target use

• High Uniformity magnetics optimize the uniformity on the substrate (multi-ring plasma)

• DC, RF and Hipims power connections • Water cooled and biased anodes

Gencoa ffe Full Face Erosion magnetrons for reduced defects

Dynamic plasma movement for 75mm (3”) and larger

ffe100

ffe75

ffe75

ffe75

ffe75

ffe100

• ffe for clean target sputtering

• High target use

• Fewer arcs and coating defects

Gencoa ffe Magnetrons internal or external mounts

All circular range options available including tilt

ffe75

• Ideal for high cost and compound targets, Hipims processes, reactive gas processes, defect free layers.

ffe100

ffe200

VT75UHV

Gencoa Vtech Magnetrons for magnetic field property control

Changes the field strength, balanced / unbalance

• Ideal for defining the optimum magnetic field and plasma properties for your process.

Vtech type magnetrons for plasma adjustments

Easy adjustment of the field even during the process

VT150 middle balanced position Bz=0 @ 111mm

VT150 fully unbalanced position Bz=0 @ 73.5mm

VT150 fully balanced position Bz=0 @ 127mm

VT75UHV

This relative movement creates large field changes

Vtech type magnetrons work by changing the position of the inner and outer magnets

Vtech type magnetrons for plasma adjustments

Illustration of field changes for a VT150

Small rectangular sources for R&D with the option of Vtech fully adjustable

magnetics

Small rectangular sources for R&D with variable target to substrate separation

Vtech type fully variable magnetics, varies field strength, shape and balance/unbalance

• Can be used with DC, pulsed DC, AC & RF power modes.

• Manual or stepper motor controlled – with touch screen HMI.

Gencoa Rectangular Magnetrons for Research and Development A variety of customized mounting styles

Gencoa IM75 plasma source for Research and Development A multi-functional plasma beam

• A powerful new tool for thin film research. • Fits into the space of a typical magnetron

and has head tilt adjustment. • Self neutralized plasma - no substrate

surface charging. • Variable plasma energy. • Automatic gas feedback control via the

IM300 power supply (any gas). • Robust design with no maintenance. • Can replace RF substrate etching. • Multiple uses - ion assistance, patterning,

pre-cleaning, coating stripping, PECVD

• Based upon the inverted magnetron principle.

• True plasma source for beam neutrality.

• DC power technology for low cost of ownership.

• Graphite anode and cathode to avoid etching and maintenance.

• Beam voltage and current can be adjusted, as can the gas type or mixture.

• Gas regulation via automatic feedback control from within the IM300 power supply

Gencoa IM75 plasma source for flexible Research and Development No research tool should be without them

Gencoa provide a unique customer built power supply that automatically regulates

the gas flow for ease of operation

Output voltage Up to 2500V ( 3000V ignition voltage ) Output current 300 mA Output Power 300W @ 2000V Output polarity Positive Regulation Mode Current 0-0.3A Output connector Fischer, type 105, 10kV rating for RG213 coax cable Dimensions Standard Rack 19” 3U Weight 8kg Cooling Forced air cooling Working temperature 15-35°C

GENCOA

I M75

MKS MFC

Pump

Chamber

IM-300-BDS-VT

Power Supply

Power Cable

MFC cable (for MKS's MFC), D9-D15 Shielded

Gas

MFC Spec: MKS 1179A

Db15 ±15V

Schematic of the ion source with power supply and automatic gas regulation

Removes beam variation – I & V regulated

IM600 at 300mA - gas Ar - Example of voltage tracking

feature via auto control of gas

Anode is at “zero height” compared to target to reduce coating build-up which reduces defects, arc’s and prevents electrical shorts caused by flaking from the anode

Low profile anode below target

surface

Gencoa Rotatable Magnetrons for Research & Development

End Block Target Dia Target Length

Power Capacity

Gencoa GRS 75-100mm ≤ 2m 80 kW

Gencoa GRS-C 75-100mm ≤ 2m 80 kW

SCI MM 75-165mm ≤ 2.5m 100 kW

SCI MC 75-165mm ≥ 2m ≤ 4m 200 kW

Gencoa Rotatable System (GRS) has a number of advantages for web

coating when compared to planar magnetrons

GenSys75 - 400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma

• Low defects and high reliability – less arcing due to clean target surface

• Better reactive oxide layers via clean targets and AC or bi-polar DC power modes

• Represents the production environment – easy scale-up for successful processes

• Ultimate flexibility – same GRS can perform multiple process types by switching magnetic arrays:

• DC, AC, RF & RF/DC sputter processes • PECVD processes • ARC processes • Hipims processes

Gencoa Rotatable System (GRS) is an ultra-compact rotatable magnetron that increases the

number of targets within a chamber

GenSys75 - 400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma

The small size of the GRS allows more targets to occupy the space which means development tools can be as compact and low cost as possible. As and example a dual GRS75 can replace a single 125mm target width planar.

Gencoa Rotatable Magnet Bar Products

GRS75

Applications Component parts supplied

LS Low strength

Low strength for higher voltage sputtering

RF Radio frequency

Strength optimized for RF power modes with active anode

SSF Standard Strength

Standard field strength of 410 Gauss over the target with balanced field design

HS High Strength

Higher field strength of 730 Gauss over the target with balanced field design

PP-RT Unbalanced ion assist processes

Single and multi-cathode unbalanced magnetic designs for high levels of ion assistance for deco and hard coatings

TCO Transparent

conduction oxide films

Single cathode magnetics with active anode for reduced resistivity TCO layers for DC and DC pulsed operation (patented)

LH/Web Single cathode with

lower heating of substrate

Single cathode magnetics with active anode for reduced heat loads during vacuum web coating for DC and DC pulsed operation (patented)

DLIM For better dual

cathode AC discharges

Double cathode Low Impedance Magnetics for high rate reactive deposition of oxides with lower substrate heating and plasma interference (patented)

DLIM-DC-TCO Single anode shared between 2 cathodes

for TCO

Double cathode low TCO resistivity magnetics for DC powered double magnetrons with an additional active anode (patented)

Gencoa have developed a wide range of magnet bar options for the GRS75 magnetrons in order

to control the plasma better

Magnet pack

Active magnetically guided anode

Example of low substrate deposition temperature at high deposition rates

from GRS75 rotatable dual magnetrons

• Rotatable magnetic configuration to minimize the substrate temperature for effective metallizing of temperature sensitive substrates and devices.

Process Control Loop

Controller (Speedflo)

Actuator (MFC)

Process (Reactive Sputtering)

Sensor (PEM, Lambda etc)

Voltage Out Gas Flow

Plasma intensity etc

Voltage In

Demanded plasma intensity etc

Cost of ownership of reactive feedback elements

• Line speed increase x 3-5

• Return on Speedflo (reactive controller) investment < 30 days

Gencoa have a range of optical components

P.E.M requires the light signal from the plasma to be transmitted

Up to 4 different wavelengths can be combined

Speedflo spectrometer based sensor displays the full plasma spectrum information

Reactive deposition

A ready made solution

• Large area reactive sputtering 30 years old • Mature processing products available • Reactive sputtering in the high rate metal mode is highly unstable process so appropriate process control the critical factor • Gencoa have implemented reactive process control over many different production plants with > 3m glass sizes • More than 600 Speedflo systems controlling reactive production plants around the world • Gencoa can set-up the process control on-site or connect remotely to the Speedflo box

Digital software drive process controller

The data processing in the Speedflo box (not PC) for high speed robust operation

Typical closed loop feedback times of 5-20 msec – from signal receipt to gas delivery in the target area.

Different sensor control modes possible for collecting the signal from the process

Penning-PEM

Target V

Lambda

Process-PEM

O2 gas

Example of reactive gas control for Al2O3 on web for ultra-barrier applications

Gencoa Speedflo Simulator & process tuning aids

Two simulation tools have been designed to offer a virtual experience of tuning and operating the Speedflo control system. The aim being to interactively teach the skills required for faster and more effective control system tuning and commissioning. The basic version teaches tuning the algorithm and the advanced tools includes other parameter variables

Gencoa Speedflo Auto-tuner

The tuning of reactive sputtering process requires some time and experience in order to determine the best tuning parameters for a specific process. To a large degree the process is trial and error – input different parameters and observe the process response. To simplify this process Gencoa have developed an advanced process tuning capability within the Speedflo controller. By selecting this feature the tuner will control the plasma and find the best parameters.

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0 20 40 60 80 100 120 140 160 180 200

Time (s)

Sig

nals

(%)

PEM (Al) AutotunedMFC (O2) AutotunedSetpointPEM (Al) DefaultMFC (O2) Default

Gencoa Key Advantages for Research & Development

•

• GENCOA have spent 17 years perfecting devices for thin film research to provide the best process solutions combined with highly robust components: