GENCOA

SpeedfloTM

is a multi-channel feedback control system for high speed adjustment of a reactive gas during magnetron sputter processes.

Spee

dflo

TM

Feedback control of reactive gas enables improved deposition rates, coating propertiesand process reliability, which is not possible toachieve with constant flow.

It is a well known and troublesome phenomenonthat reactive sputtering processes are highly un-stable. A magnetron target can very quickly switchfrom a metallic state into a fully poisoned condition.This change will make the process unworkable andresults in large variations in the sputtering rate.

One solution would be to use the target in fully poisoned mode (i.e. reaction product all over thetarget). However the compounds on the targetsputter at a much lower rate than a pure metal,hence it is usually not desirable. A better solution is to use a feedback control system that can veryquickly adjust the reactive gas flow in response tothe plasma conditions, in order to hold the processin high rate metallic or transition mode.

Reactive sputtering feedback control will lead toenhanced sputter rates, improved uniformitythrough the simultaneous control of multiple gas inputs, and better process monitoring.

Speedflo is an advanced form of this type of controlsystem, offering all of the advantages detailed aboveas well as a range of other benefits that help you toperfect your reactive processes.

Background to Reactive SputteringFeedback Control

3

100

0

Hysteresis Ramp x3 (Ti with reactive N2) 3 P.E.M sensors locations

80

60

40

20

0

Signals %

50 100 150 200 250

Time (s)

Sensor 1

Actuator 1

Sensor 2

Actuator 2

Sensor 3

Actuator 3

%

Layer Thickness

P.E.M Setpoint

200

160

120

80

40

nm.m/min

00 20 40 60 80 100

SiOx gas distribution

±1.5%

SiOx gas distributiontuned

SiO2 ratesat 15kW/m(dual rotable)

±2.5%

0 20 40 60 80 100 120

cm

There are many benefits to using the Speedflotechnology all of which contribute to a morecomplete solution from Gencoa.

Control algorithmSpeedflo utilizes a proprietary advanced PDF+control algorithm that is capable of extremelyfast and accurate feedback control. In addition to the PDF+ algorithm the Speedflo controller features a digital variable structure control lawthat is able to maintain fast-acting and stablecontrol, even when the MFC becomes fully openor closed. This enables feedback control that ishigh performance, robust and reliable.

Multiple control channelsThe Speedflo controller has up to eight fully featured and independent control channels. Thisallows for simultaneous feedback control of eightMFCs, with options to combine various sensorsand duplicate control channels. This powerful capability is especially useful for large targetareas, where precise deposition uniformity mustbe achieved.

Auto-calibration and controller tuningThe time-consuming process of sensor calibrationand controller tuning has been eliminated withGencoa’s latest Speedflo development. An automatic calibration and tuning procedure –unique to Speedflo – automatically detects thesensor levels corresponding to poisoned andfully metal states. The optimum controller parameters for the current sensor and processare then automatically calculated to ensure fast,accurate and robust feedback control.

Advanced user interfaceA highly developed software interface includesmany powerful functions to allow different methods of configuring the process control andcombating difficult control situations. All of thesoftware functions can be seamlessly incorporatedinto an existing PLC system.

Technology5

Speedflo is designed for the demands of realprocesses. It has been proven on hundreds of different industrial plasma-based deposition machines – each with varying demands.

Robust and reliableSpeedflo’s hardware and software has evolvedbased on the demands of real processes. Eachunit is expertly assembled by Gencoa techniciansand put through a rigorous series of QC testsand inspections before being shipped.

Fully supportedGencoa's process knowledge and experience isavailable to you at every stage – from remote assistance to on-site support.

FlexibleSpeedflo comes with a range of sensor, I/O, andcommunication options to meet the particulardemands of your process.

Continued innovation Gencoa’s process and control expertise meansthat Speedflo is always at the leading edge of reactive sputtering control. New Speedflo tech-nologies are continuously being developed, topush the operating window and help you to extract even more from your process.

Hardware optionsThe Speedflo controller is available in two options to suit different requirements: Speedfloand Speedflo Mini. The two controllers haveidentical algorithms and control software, but differ in the number of available inputs and outputs. Both controllers have ethernet connec-tivity for straightforward communication with thesoftware interface.

Speedflo8 sensor inputs and 8 MFC actuator outputs.

Speedflo Mini2 sensor inputs and 3 MFC actuator outputs.

Why choose Speedflo

4

Speedflo Highly developed software interface

SpeedfloMini

Remote P.E.M (Penning P.E.M)Gencoa’s Penning P.E.M sensor enables remotemonitoring of gas emission levels, and is ideal ifsubstrate interference is problematic with conventional P.E.M sensors. A small plasma isgenerated remotely in the Penning gaugehead.A conventional P.E.M sensor can then be used tomeasure light intensity at a wavelength of interest.This represents the excess gas from the process.

LambdaThe Lambda sensor is an oxygen probe whichprovides a direct signal of the oxygen concentrations present in the vacuum. The Gencoa Lambda sensor provides a robust signalwith good response speeds. Like P.E.M, it canprovide information from multiple monitoringzones down the target length.

Target voltageA convenient sensor from the process is the target voltage output from the magnetron power supply. This can be used for some material combinations as a stand-alone signal or in addition to a secondary signal such asP.E.M. Successful materials for this type of sensor are silicon and aluminum oxides and nitrides.

HiPIMSGencoa has developed sensor technology thatenables the control of reactive HiPIMS processesfor reproducible depositions and stable systemperformance.

Plasma Emission Monitoring (P.E.M)The visual light from the plasma contains infor-mation of all the species present via the opticalemission spectrum. To monitor the intensity ofany element in the plasma, a narrow band-passfilter can be used to allow through only thewavelength of light of the material or gas of interest.

P.E.M CCDThe plasma light can be captured by a CCD-typespectrometer which provides a universal pictureof the process. For control purposes, the wave-lengths of interest are electronically filtered andinput to the controller. This type of tool deliversmore information, however the integration timeof the spectrometer slows down the feedbackspeed compared to the conventional band-passP.E.M method.

Sensors 6 7

External type P.E.M sensor head

Penning P.E.M sensor

Plasma Emission Monitoring (P.E.M)

Voltage cable

Lambda cable

Lambda sensor

Modes of Operation9

ConstantFlow

Support 8

Gencoa Speedflo Simulator

Basic user interface

Basic user interface

Advanced user interface

3–Zone Process Control with Single P.E.M SensorTypical configuration for a small target length (<1m) or when only one sensor is required P.E.M Sensor

MFC

Gas Bar

Slaved

Master (sensor feedback controlled)

Constant Flow

Trimming gas bars in centre (typical planar configuration)

Typical control methodsTrimming gas bars on outside (typical rotatable configuration)

Many of Gencoa's key staff can boast a wealth ofexperience in the process and control environment.This is a key factor in our ability to develop products which are perfectly suited to the actualdemands of the process.

Remote and on-site assistanceGencoa can help customers optimize theirprocesses remotely or on-site, and offer a com-plete reactive gas set-up and process controlpackage – magnetrons, gas bars, controller andprocess know-how.

Speedflo SimulatorGencoa’s in-depth understanding of process control has resulted in the creation of a dynamicsimulation of the Speedflo system. This tool replicates the Speedflo user interface, and simulates the effect of Speedflo features such as controller gains and calibration parameters as well as system characteristics such as gas delivery pipe length.

The simulator is a highly effective tool which can aid the system user’s understanding of feedback control, as well as the operation of the Speedflo system.

Speedflo auto-tuneAchieving high performance control of your systemis a quick and easy process using Speedflo. Aproprietary, state-of-the-art automatic controllertuning procedure provides optimum controllerparameters for your process at the click of a button. The auto-tuning procedure is fast and effective – and works within any system or sensorconfiguration.

After performing an integrated system calibrationand identification procedure, the auto-tuner instantly generates the optimum controller para-meters for your process by using advanced inversedynamics algorithms to analyze the collected data.

The whole procedure takes a couple of minutesand, thanks to Gencoa’s unique combination ofprocess and control expertise, is perfectly suitedto the demands of real processes.

Modes of Operation11Modes of Operation 10

3–Zone Process Control with 3 P.E.M SensorsTypical configuration for a medium (0.75m – 2m) target length P.E.M Sensor

MFC

Gas Bar

P.E.M Sensor

MFC

Gas Bar

5–Zone Process Control with 3 P.E.M SensorsTypical configuration for a large (>1.5m) target length

Slaved

Master (sensor feedback controlled)

Constant Flow

Slaved

Master (sensor feedback controlled)

Constant Flow

Trimming gas bars in centre (typical planar configuration)

Typical control methodsTrimming gas bars on outside (typical rotatable configuration)Trimming gas bars in centre (typical planar configuration)

Typical control methodsTrimming gas bars on outside (typical rotatable configuration)

Magnet barsGencoa manufacture a wide range of magneticarrays and associated active anodes that can beused to enhance many rotatable based reactiveand non-reactive sputtering process. The differ-ent magnetic designs improve the target use and uniformity, but also provide significant toolsto optimize the plasma environment to improveproductivity or layer properties. The energyproduct of each individual magnet is measuredto assess suitability and the field uniformity of the complete magnetic assembly is mapped forquality control purposes.

Gas barsGas distribution is a critical area for any reactiveprocess as it will determine the speed of reactivegas control and coating uniformity. Gencoa dualchamber gas bars ensure a highly uniform delivery of gas with a fast gas response speed.This is combined with the ability to separate thedifferent gas zones for uniformity tuning overlarge areas.

Accessories 12 13

Gas bars

Dual rectangular

GRS75 rotatable plasma

Linear ion sources

GRS75 dual rotatable

Rectangular

Active anodesFor plasma stability and to eliminate long termdrift with reactive processes performed with rotatable magnetrons, Gencoa have developedan anode design that combines magnetic and electrical guiding of the plasma electrons. These active anodes serve to open up different powermodes and greatly help to control the uniformityand plasma density over the substrate surface.

Rotatable magnetronsGencoa offer two types of rotatable magnetrondepending upon the space available within theprocess machine and the process requirements.The Gencoa GRS75 magnetron accommodatestargets ranging from 75 to 100mm OD. The SCIbased end-block range accommodate targets of152mm and greater. Both types are particularlysuitable for reactive processes due to the self-cleaning of reaction product from the target surface.

Planar magnetronsGencoa offer rectangular magnetrons in the widestrange available on the market for both internaland external mounting, with an unrivalled rangeof magnetic and mechanical options available tooffer the optimum solution for your specific processing needs. Built-in gas distribution withinthe anodes provides uniform and fast gas responses for reactive deposition.

Ion sourcesLinear ion sources provide a robust and flexiblemeans of pre-cleaning polymer and glass sub-strates prior to thin film deposition. Gencoa Linearion sources are powered by the IM3000 powersupply and gas control module, which houses aSpeedflo controller.

Gencoa LimitedPhysics Road Liverpool L24 9HPUnited Kingdom

Phone +44 (0) 151 486 4466Fax +44 (0) 151 486 4488

www.gencoa.com

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coa Limited

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by Gencoa