EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... ·...

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1 Oct. 16 th , 2011 TWG EUV Carrier implementation to the mask tool October 16 th 2011 Hiroki Miyai

Transcript of EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... ·...

Page 1: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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EUV Carrier implementation to the mask toolOctober 16th 2011

Hiroki Miyai

Page 2: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Dual Pod Handling toolMAGICSMAGICS

Lasertec tool capability of EUV carrier handling

Mask blank inspection tool

Actinic Blank Inspection Actinic Blank Inspection

Mask pattern inspection toolMATRICSMATRICS

DP200DP200

Page 3: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Development of an EUV carrier handling

*1) Edge grip handling development (2006)- Added to the Mask blanks inspection tool M3350

*2) Side grip handling development (2007)- A stand alone mask handling tool DP200

2006 2008 2010

E152 pod handling

Edge grip handling

Lasertec achieved < 0.01 particles adder/cycle for EUV carrier handling.

Side grip handling

CNE prototype pod

Several prototypes for EUV pod handling

SEMI E152 pod handling

*1

*2

Page 4: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Outer coverInner cover

Mask

Inner baseOuter base

Side gripper

Dual pod (close)EUV carrier Close

Handling method of EUV carrier

Inner cover supporter

EUV carrier Open

Page 5: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Mask transfer requirements for inspection tools1. Face up transfer

Lasertec mask inspection tools require the face up transfer to the inspectionstage.

2. Front side cleannessLarge particles on the front side are blasted by the inspection laser.

-- > Large particles inside the illumination area are not allowed to exist.

Illumination

Particle blast Mask blanks inspection

mask

Illumination area

Insp

ectio

n

Page 6: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Comparison of Edge grip and Side grip

Side Grip Edge Grip

Applicabilityto Lasertec tools O O

Carrier Capability SEMI E152 Type ASEMI E152 Type B SEMI E152 Type A

Particle adder(Front □142mm) < 0.01 Particles/cycle < 0.01 Particles/cycle

Particle adder riskon the front edge Minimum Exists

(Edge contact area)

Risk of mask droppingPreventable bya soft holding mechanism and an interlock system

Preventable by a interlock system

Shape

mask

Kalrez ® etc. PEEK

mask

Page 7: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Clean transfer technology

Clean transfer is achieved by the design utilizing particle flow simulations and verification tests using an actual mask blanks inspection tool.

Air flow simulation Particle adder test by themask blank inspection tool

M6640 blanks Inspection

Particle adderevaluation

Page 8: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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DP200 particle adder evaluation result

Quoted from SEMATECH document , by Long He, et. al

Page 9: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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Particle Adder Test (DP200)Transfer Direction(Port1 <--> Port2)

Particle check surface Month/Day cycle Particle Adders

Dual Pod Type #1(Entegris #1 and

Entegris #2)

Dual Pod (Entegris#1) <--> Dual Pod (Entegris#2) Front Side 7/21 300 0

Dual Pod (Entegris#1) <--> Dual Pod (Entegris#2) Back Side 7/22 30 0

Dual Pod (Entegris#1) <--> Dual Pod (Entegris#2) Back Side 7/22 300 0

RSP200RSP200 <--> RSP200 Front Side 7/23 300 1

RSP200 <--> RSP200 Back Side 7/23 300 0

Particle adder < 0.003 (Whole Mask surface / 1 transport)

※SEMATECH photomask cleaning workshop at Monterey CA・USA

DP200 particle adder evaluation result

Page 10: EUV Carrier implementation to the mask toolieuvi.org/TWG/Mask/2011/MTG101611/10-Lasertec-EUV... · 2012-09-06 · Oct. 16th, 2011 TWG 3 Development of an EUV carrier handling *1)

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1. Lasertec has a capability of both edge grip handling and side grip handling.

2. Lasertec can achieve the cleanness of <0.01 particles /cycle based on many experiences.

3. Side grip handling can reduce a particle adder risk on the front edge.

Summary