EQ-10 EUV Source for Metrology Applications
Transcript of EQ-10 EUV Source for Metrology Applications
EQ-10 EUV Source
for Metrology Applications
EQ-10 EUV Source
for Metrology Applications
Debbie Gustafson, Matt Partlow,
Paul Blackborow, Steve Horne,
Matt Besen, Don Smith
Debbie Gustafson, Matt Partlow,
Paul Blackborow, Steve Horne,
Matt Besen, Don Smith
2010 International Workshop on EUV Sources – Dublin- November 2010 2
Key Requirements for a Metrology SourceKey Requirements for a Metrology Source
• High Brightness
• Excellent Spatial Stability
• High Pulse-Pulse Stability
• High System Reliability
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EQ-10 Source
• Introduced in 2005
• 13.5nm ±1% Power in 2π
– 10W continuously
– Now 20W
– @2 kHZ
• 10kHz operation also
• Operates continuously for
days and weeks
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Electrodeless Z-Pinch
Induced High Current Pulse
Induced High Current Pulse
Magnetic
Field
Magnetic
Field
Inductively
Coupled Gas
Plasma (Xe)
Inductively
Coupled Gas
Plasma (Xe)
Z-Pinched
Plasma
Z-Pinched
Plasma
EUV
• Inductive design
eliminates electrodes
and electrode current
• Plasma is magnetically
confined away from
source components and
‘pinned’
electromagnetically to
the geometric center of
the bore
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System Reliability
•Shipped over 15 sources in the field
• Installations in Japan, Europe and US
•Systems being operated 24/7 with minimal downtime
– One system has many 10s of billions of pulses at 2kHz at 24/7 operation
•Systems integrated into tools for research and development
– Actinic Inspection
– Resist Outgassing
– Mask Contamination
– Optics Testing
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Wavefront Metrology Tool
Optics Testing
Wavefront Metrology Tool
Optics Testing
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Actinic Mask Defect Detection Tool at
MIRAI-Selete
Recent Improvements in EQ-
10 Brightness and Power
Recent Improvements in EQ-
10 Brightness and Power
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EQ-10 in-band EUV Brightness
0
5000
10000
15000
20000
25000
30000
-2.5 -2 -1.5 -1 -0.5 0 0.5 1 1.5 2 2.5
radius [mm]
0%
10%
20%
30%
40%
50%
60%
70%
80%
90%
100%
0 0.5 1 1.5 2 2.5 3 3.5 4
radius [mm]
% p
ow
er
wit
hin
rad
ius
•Brightness is a function of power and radius
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0
1
2
3
4
5
6
7
8
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1
radius 'r' [mm]
bri
gh
tne
ss
(r)
[W/m
m^
2/s
r]
Brightness as function of radius
Standard EQ-10
P= 11.2 Watts/2π;
13.5nm 2%BW
F= 0.345 FWHM
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Stability in EUV Plasma Position
• Image recorded once an hour for over 300 million pulses (~44hours) of continuous
operation. Position then extracted from images:
– Position: σx= 5.8 µm and σy= 5.0 µm
-200
-150
-100
-50
0
50
100
150
200
-200 -100 0 100 200
X position [microns]
Y p
ositi
on [m
icro
ns]
• Brightness remains
constant
• This is open-loop stability: No feedback!
• Brightness remains
constant
• This is open-loop stability: No feedback!
-20
-10
0
10
20
-20 -10 0 10 20
FWHM ~ 400 µµµµm
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Stability in EUV Plasma Size
• Image recorded once an hour for over 300 million pulses (~44hours) of continuous
operation. Size then extracted from images:
– Size: σFWHMx= 3.1 µm and σFWHMy= 3.6 µm
300
320
340
360
380
400
420
440
460
480
500
0 50 100 150 200 250 300
millions of pulses
FW
HM
[m
icro
ns
]
x FWHM (microns)
y FWHM (microns)
mean +/- 30microns
• Brightness Remains Constant
• This is open-loop stability: No feedback!
• Brightness Remains Constant
• This is open-loop stability: No feedback!
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Redesigned Source
Advantages for new design
•All surfaces exposed to plasma
pinch are replaced with bore
exchange
• High current capacity contact
insert
– plasma erosion at contact area
reduced
– More consistent electrical contact
• Improved cooling for bore insert
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Increased Power with New Source Design
280V 1900Hz – Standard Operating Conditions
0
5
10
15
20
25
50 55 60 65 70 75 80 85 90
Pressure (mT)
EU
V P
ow
er
[Watt
s/2
p/2
%B
W]
EQ-10 Redesigned EQ-10
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Increased Brightness New Source
0
1
2
3
4
5
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9
10
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1
radius 'r' [mm]
bri
gh
tne
ss
(r)
[W/m
m^
2/s
r]
P= 25.7 Watts/2π
13.5nm 2%BW
F= 0.440 FWHM
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Improvements to Pulse ModulatorImprovements to Pulse Modulator
•Conditions: 280V,2200Hz,100mT
•The modulator was recently redesigned to improve power handling and stability.
•The redesign is to force the compression stages to a well-defined state prior to
each charging cycle, thus reducing or eliminating this source of variability
•Pulse to pulse stability with Original Modulator – ~16%
•Pulse to pulse stability with redesigned Modulator ~2%
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Key Requirements for a Metrology SourceKey Requirements for a Metrology Source
√High Brightness
√Excellent Spatial Stability
√High Pulse-Pulse Stability
√High System Reliability
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Closing RemarksClosing Remarks
• The Energetiq EQ-10 EUV source is a reliable and stable source of EUV
photons.
• The system is being operated in the field 24/7 with consistent operation over
years!
• Energetiq Sources are being used for infrastructure development globally.
• Redesign of the source offers higher power and higher brightness operation
– Brightness of ~8W/mm^2-sr
– 20W/ 2π
– Improved pulse-to-pulse stability
– Continued excellent plasma stability
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AcknowledgementsAcknowledgements
• The team at Energetiq…
• Our valued customers…
• Our excellent partners and collaborators…