Energy Band Diagram

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    ELEC 3908, Physical Devices Lecture 3

    Energy Band Diagramsand Doping

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    Lecture Outline

    Continue the study of semiconductor devices by looking atthe material used to make most devices

    The energy band diagram is a representation of carrier

    energy in a semiconducting material and will be related to

    an orbital bonding representation

    Devices require materials with tailored characteristics,

    obtained through doping, the controlled introduction of

    impurities

    Will discuss electronsand holes, as well as intrinsic, n-type

    andp-typematerials Later lectures will apply these concepts to diode, bipolar

    junction transistor and FET

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    Atomic Electron Energy Levels

    A free electron can assume any

    energy level (continuous)

    Quantum mechanics predicts a

    boundelectron can only assumediscrete energy levels

    This is a result of the interaction

    between the electron and the nuclearproton(s)

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    Crystal Energy Bands

    Crystal is composed of a large

    number of atoms (!1022cm-3 for

    silicon)

    Interaction between the electrons of

    each atom and the protons of other

    atoms

    Result is a perturbation of each

    electrons discrete energy level to

    form continua at the previous energylevels

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    Covalent Bonding

    Silicon crystal formed by covalent

    bonds

    Covalent bonds share electrons

    between atoms in lattice so each

    thinks its orbitals are full

    Most important bands are therefore

    band which would be filled at 0 K -

    valenceband

    next band above in energy -conductionband

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    Simplified Energy Band Diagram

    Movement within a band is notdifficult due to continuum of energy

    levels

    Movement between bands requires

    acquisition of difference in energy

    between bands (in pure crystal, cant

    exist in between)

    Main features of interest for first

    order device analysis are

    top of valence band (Ev) bottom of conduction band (Ec)

    difference in energy betweenEcandEv,

    energy gapEg

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    Orbital Bonding Model

    Represent valence and conduction bands by separate siliconlattice structures

    The two diagrams coexist in space -the same set of silicon

    atoms is represented in each diagram

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    Electron Transitions -Energy Band Diagram

    At room temperature, very

    few electrons can gain energy

    Egto move to the conduction

    band ( !1010cm-3at 300K =

    23C)

    In pure silicon at 300K, most

    valence band orbitals ( !1022

    cm-3) are full, most

    conduction band orbitals areempty

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    Electron Transitions Orbital Bonding

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    Electrons and Holes

    Conduction of current occurs through electron movement

    Two mechanisms of electron movement are possible:

    movement within the nearly empty conduction band orbital

    structure

    movement within the nearly full valence band orbital structure Conduction in the valence band structure is more conveniently

    modeled as the movement of an empty orbital

    Model this empty valence band orbital as a positively charged

    pseudo-particle called a hole

    Density of electrons in conduction band is n(cm-3)

    Density of holes in valence band isp(cm-3)

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    Electron and Hole Conduction

    Electron movement in

    conduction band can be

    modeled directly

    Movement of electrons in

    valence band modeled as

    movement (in opposite

    direction) of positively

    charged hole

    Electric Field

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    Intrinsic Material

    Semiconducting material which has not had any impuritiesadded is called intrinsic

    In an intrinsic material, the number of electrons and holes must

    be equal because they are generated in pairs

    Call the density of electrons and holes in intrinsic material theintrinsic density ni(for Si@300K, ni!1.45x10

    10cm-3)

    Therefore, for intrinsic material

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    Extrinsic Material

    Intentional addition of impurities during manufacture or in

    specialized fabrication steps is termed doping

    Doped material is called extrinsic

    Ability to change the electrical characteristics of the materialthrough selective introduction of impurities is the basic reason

    why semiconductor devices are possible

    Later lectures will outline the processes used to introduce

    impurities in a controlled and repeatable way

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    Mass-Action Law

    For intrinsic material, n=p= ni, therefore

    This turns out to be a general relationship called the

    mass-action law, which can be used for doped material

    in equilibrium

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    Group V Impurity Atom

    An atom from group V of the periodic table has one morenuclear proton and valence electron than silicon

    If the atom replaces a silicon atom in the lattice, the extra

    electron can move into the conduction band (ionization)

    A group V atom is a donorsince it donates an electron to thesilicon lattice

    Density of donor dopant atoms given symbolND(cm-3)

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    Donor Ionization - Energy Band Diagram

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    Donor Ionization Orbital Bonding Model

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    Donor Doping -Electron and Hole Densities

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    Example 3.1: Arsenic Doping

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    Example 3.1: Solution

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    Group III Impurity Atom

    An atom from group III of the periodic table has one less nuclearproton and valence electron than silicon

    If the atom replaces a silicon atom in the lattice, the empty

    valence orbital can be filled by an electron (ionization)

    A group III atom is an acceptorsince it accepts an electron fromthe silicon lattice

    Density of acceptor dopant atoms given symbolNA(cm-3)

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    Acceptor Ionization - Energy Band Diagram

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    Acceptor Ionization Orbital Bonding Model

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    Acceptor Doping - Electron and Hole Densities

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    Example 3.2: Gallium Doping

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    Example 3.2: Solution

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    Compensated Doping

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    Example 3.3: Compensated Doping

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    Example 3.3: Solution

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    Lecture Summary