Electron Energy-Loss Spectroscopy and Nanoanalysis (TEM-EELS)
EELS (electron energy loss spectroscopy): electron populations and excitations involved
description
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ECParticipants:
UPS, UCAM, UMIL, UoS,SU, FZR, LiU, MTA
Angström
Participants:E.Coronel,S.Valizadeh, F.Ericson etc.
Museum ofNatural History
Participants:U.Hålenius
Arrhenius
Participants:G.Svensson, Terasaki
Fysikum SU: S.Csillag,S.Nyquist,S.Wachtmeister,A.Zobelli
Samples
Samples
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NETWORK SHORT TITLE: NEW FULLERENE LIKE MATERIALS
Part A - The Participants
The Principal Contractor
1. Stockholm University [SU] Sweden
The Members
2 Linköping University [LiU] Sweden 3 University of Newcastle upon Tyne [UNEW] United Kingdom4 Forschungszentrum Rossendorf [FZR] Germany5 Université Paris Sud [UPS] France6 The Chancellor, Masters and Scholars of the University of Cambridge [UCAM-DENG] United Kingdom7 Technische Universitet Dreseden [TUD] Germany8 University of Milano [UMIL] Italy9 University of Sussex [UoS] United Kingdom10 Research Institute for Technical Physics and Materials Science of the Hungarian Academy of Sciences [MTA MFA] Hungary
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EELS (electron energy loss spectroscopy): electron populations and excitations involved
0 100 200 300 400 5000
0.5
1.0
1.5
2.0
2.5
Energy loss (eV)
Inte
nsity
(nb
er o
f cou
nts
x 10
6 )
600 700
x50 x106
Low lossCore loss
CK
MnL2,3
EF
unoccupiedconduction
states
1s corestates
Core loss(K edge)
250 300 400 350
CK
Energy-loss (eV)
Low loss
0 10 20 30 40Energy-loss (eV)
Plasmon mode
2p corestates
Core loss(L edge)
690630 640 650 660 670 680
c)
Energy-loss (eV)
MnL2,3
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I I I I
250 300 350 400
0-
40-
(nm)
Energy Loss (eV)
Spectrum line
A
B
HADF image
20 nm
450400350300Energy Loss (eV)
EELS spectrum
AB
Specimen
Magnetic spectrometer
Field emission gun
E
E -E
o
o
CameraCCD
HADF detectors
Spectrum
Probe• 0.1 to 1nA• in 0.5 to 1 nm
Scanning coils
100 keV
0.5 to 0.8 eV1ms to 10s
The spectrum image mode
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IntroductionIntroduction
Growing interest in FIBGrowing interest in FIB
What are the drivers of this ?What are the drivers of this ? Smaller critical dimensionsSmaller critical dimensions Fewer and smaller critical sitesFewer and smaller critical sites More reliance on TEMMore reliance on TEM Interest in micro and nano machiningInterest in micro and nano machining Greater variety of materials from: biologicalGreater variety of materials from: biological
sciences, astro-geology, superconductors,sciences, astro-geology, superconductors,ceramics, metallurgy, …..ceramics, metallurgy, …..
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The DualBeam Advantage:The DualBeam Advantage:
TheCoincidencePoint
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Introduction
Large stage systems:200mm stage DualBeam300mm stage DualBeam
Ga+ ions are rastered across a specimen and secondary electron / ion signals are
collected by a detector.
Liquid Metal Ion Source (LMIS) is used to generate an ion beam.
The ion beam is focused through a series of lenses and concentrated at a focal point
through an aperture.
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Strata DB235: Optimized GeometryStrata DB235: Optimized Geometry
DetectorDetector
HexalensHexalens
GISGIS
MagnumMagnum
SampleSample
EDXEDX
Single coincident point:Single coincident point:
SEMSEM
FIBFIB
Gas ChemistryGas Chemistry
Chemical AnalysisChemical Analysis
Eucentric stage-tiltEucentric stage-tilt
No compromise forNo compromise forelectron or ionelectron or ioncolumncolumn
5mm WD5mm WD
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Introduction
Chemical reactions can be induced between adsorbed gas and substrate particles
Gas-enhanced etching is efficient for removing large volumes of material and is chemistry-specific
Conductors and insulators can be deposited by using different gases.
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GISGIS
EDSEDS
MagnumMagnum
HexalensHexalens
StageStage
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Site specific sample prepSite specific sample prep
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