Afm 2005

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Materials Characterization Lab www.mri.psu.edu/mcl 250 MRL August 17 9:45 AM Particle Characterization 114 MRI Bldg August 24 9:45 AM X-ray photoelectron spectroscopy (XPS/ESCA) 114 MRI Bldg August 24 11:00 AM Auger Electron Spectroscopy (AES) 541 Deike Bldg. July 27 9:45 AM Chemical analysis (ICP, ICP-MS) 541 Deike Bldg. August 10 9:45 AM Small angle x-ray scattering (SAXS) 114 MRI Bldg August 3 9:45 AM Atomic Force Microscopy (AFM) 250 MRL Bldg. July 20 9:45 AM Orientation imaging microscopy (OIM/EBSD) 114 MRI Bldg July 13 11:00 AM TEM sample preparation 114 MRI Bldg July 13 9:45 AM Focused Ion Beam (FIB) 250 MRL Bldg. July 6 10:15 AM High temperature sintering lab (20 min lecture only) 250 MRL bldg. July 6 9:45 AM Dielectric Characterization (25 min lecture only) 250 MRL Bldg. June 29 9:45 AM X-ray Diffraction (XRD) 541 Deike Bldg. June 22 11:00 AM Analytical SEM 541 Deike Bldg. June 22 9:45 AM Scanning electron microscopy (SEM) 114 MRI Bldg June 15 9:45 AM Transmission Electron Microscopy (TEM/STEM) 250 MRL Bldg. June 8 9:45 AM Thermal analysis (TGA, DTA, DSC) Location Date Time Technique NOTE LOCATIONS: The MRI Bldg is in the Innovation Park near the Penn Stater Hotel; MRL Bldg . is on Hastings Road. More information: www.mri.psu.edu/mcl Summer Characterization Open Houses Summer Characterization Open Houses

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Transcript of Afm 2005

Materials Characterization Labwww.mri.psu.edu/mcl

250 MRLAugust 179:45 AMParticle Characterization

114 MRI BldgAugust 249:45 AMX-ray photoelectron spectroscopy (XPS/ESCA)

114 MRI BldgAugust 2411:00 AMAuger Electron Spectroscopy (AES)

541 Deike Bldg.July 279:45 AMChemical analysis (ICP, ICP-MS)

541 Deike Bldg.August 109:45 AMSmall angle x-ray scattering (SAXS)

114 MRI Bldg August 39:45 AMAtomic Force Microscopy (AFM)

250 MRL Bldg.July 209:45 AMOrientation imaging microscopy (OIM/EBSD)

114 MRI BldgJuly 1311:00 AMTEM sample preparation

114 MRI BldgJuly 139:45 AMFocused Ion Beam (FIB)

250 MRL Bldg.July 610:15 AMHigh temperature sintering lab (20 min lecture only)

250 MRL bldg.July 69:45 AMDielectric Characterization (25 min lecture only)

250 MRL Bldg.June 299:45 AMX-ray Diffraction (XRD)

541 Deike Bldg.June 2211:00 AMAnalytical SEM

541 Deike Bldg.June 229:45 AMScanning electron microscopy (SEM)

114 MRI BldgJune 159:45 AMTransmission Electron Microscopy (TEM/STEM)

250 MRL Bldg.June 89:45 AMThermal analysis (TGA, DTA, DSC)

LocationDateTimeTechnique

NOTE LOCATIONS: The MRI Bldg is in the Innovation Park near the Penn Stater Hotel; MRL Bldg. is on Hastings Road.More information: www.mri.psu.edu/mcl

Summer Characterization Open HousesSummer Characterization Open Houses

Materials Characterization Labwww.mri.psu.edu/mcl

BeaverStadium

Park Ave.

Park Ave.

Porter RoadPollock Road

University Drive

College Ave.

ShortlidgeR

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Centre Community

Hospital

E&ES Bldg:SEM

Hosler Bldg:SEM, ESEM, FE-SEM, EPMA, ICP, ICP-MS,BET, SAXS

MRI Bldg:XPS/ESCA, SIMS, TEM, HR-TEM, FE-Auger, AFM, XRD

Atherton Street

(322 Business)

MRL Bldg:SEM, XRD, OIM, DTA, DSC, TGA, FTIR, Raman, AFM, Powder, dielectric, prep, shop, IC, UV-Vis

Hastings Road

Penn StaterHotel

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Materials Characterization Lab LocationsBldg TelephoneMRL 863-7844MRI 865-0337Hosler 865-1981E&ES 863-4225

Route 322

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Steidle Bldg:Nanoindenter

Deike Bldg:

Materials Characterization Labwww.mri.psu.edu/mcl

Atomic Force MicroscopyVince Bojan

AFM / XPS / Auger / SIMS Analyst

August 3, 2005

Materials Characterization Labwww.mri.psu.edu/mcl

ACKNOWLEDGEMENTS

Jeff ShallenbergerRaafat Malek

Evangelos Manias

Materials Characterization Labwww.mri.psu.edu/mcl

OUTLINE

― an overview of the technique―discussion of MCL instrument capabilities― applications― AFM vs. SEM― how to get started ― resources― a brief lab tour / instrument demonstration

Materials Characterization Labwww.mri.psu.edu/mcl

Atomic Force Microscopy (AFM)is a subset of

“Scanning Probe Microscopies” (SPM)

The radius of this tip canvary from 1 angstrom (STM) to 1 micron

For AFM, tip radii range from1-20 nm.

A Practical Guide to Scanning Probe Microscopy, Howland & Benatar

Materials Characterization Labwww.mri.psu.edu/mcl

OTHER SCANNING PROBE MICROSCOPIES

• SCANNING TUNNELING MICROSCOPY (STM)• LATERAL FORCE MICROSCOPY (LFM)• MAGNETIC FORCE MICROSCOPY (MFM)• ELECTRIC FORCE MICROSCOPY (EFM)• CHEMICAL FORCE MICROSCOPY (CFM)• NEAR-FIELD SCANNING OPTICAL MICROSCOPY (SNOM OR

NSOM)• SCANNING CAPACITANCE MICROSCOPY (SCM)• BALLISTIC ELECTRON EMISSION MICROSCOPY (BEEM)• SCANNING THERMAL MICROSCOPY• PHOTON SCANNING TUNNELING MICROSCOPY• ELECTROCHEMICAL STM AND AFM• FORCE MODULATION MICROSCOPY• SURFACE POTENTIAL MICROSCOPY

Materials Characterization Labwww.mri.psu.edu/mcl

HISTORY

• SCANNING TUNNELING MICROSCOPE DEVELOPED BY BINNIG, ROHRER, GERBER AND WEIBEL AT IBM IN ZURICH

• 1982 NOBEL PRIZE IN PHYSICS FOR THE STM

• AFM DEVELOPED IN 1986 BY BINNIG, QUATE AND GERBER IN AN IBM / STANFORD COLLABORATION

Materials Characterization Labwww.mri.psu.edu/mcl

Scanning Tunneling Microscopy (STM) - G. Binnig, H. Rohrer, C. Gerber, E. Weibel, Phys. Rev. Lett. 1982, 49, 57.

COURTESY R. MALEK, MCL

Materials Characterization Labwww.mri.psu.edu/mcl

x,y-

scan

ner

z -

scan

ner

laser

mirror PSD

cantilever

sample

AB

CD

(A+B) - (C+D)(kept constant during scanning)

Drive voltage givesheight information

(constant deflection)

TYPICAL AFM LAYOUT

COURTESY R. MALEK

DI MULTIMODE

Materials Characterization Labwww.mri.psu.edu/mcl

MCL MICROSCOPES

DIGITAL INSTRUMENTSDIMENSION 3100 (MRI BLDG.)

LARGE SAMPLE CAPABILITY

DIGITAL INSTRUMENTSMULTIMODE (MRL BLDG.)

BETTER HI-MAGNIFICATION IMAGING

Materials Characterization Labwww.mri.psu.edu/mcl

10nm – 160 MICRONS

250nm – 100 MICRONSSCAN SIZE

AIR & LIQUIDAIR & LIQUIDSAMPLE ENVIRONMENT

5.5 MICRONS6.4 MICRONSVERTICAL FEATURE SIZE

12mm100 mmWIDTH

5mm11 mmHEIGHT

MULTIMODE(MRL)

DIMENSION 3100 (MRI)

Materials Characterization Labwww.mri.psu.edu/mcl

SAMPLE PREPARATIONCONDUCTIVE AND NON-CONDUCTIVE SAMPLESSURFACE CLEANING SOMETIMES NECESSARYSAMPLE MOUNTING MAY REQUIRE SOME EFFORT

VERTICAL RESOLUTION:DEPENDS ON INHERENT SCANNER RESOLUTION, ELECTRONIC RESOLUTION, COMBINED EFFECTS OF ELECTRICAL, MECHANICAL & ACOUSTIC NOISE…..TYPICALLY SUB ANGSTROM TO SEVERAL ANGSTROMS

LATERAL RESOLUTION:DEPENDS ON TIP RADIUS AND GEOMETRY, PIXEL DENSITY, TIP/SAMPLE INTERACTION FORCES, COMBINED ELECTRONIC, MECHANICAL, AND ACOUSTIC NOISE SOURCES, AND THE DEFINITION OF LATERAL RESOLUTION…..TYPICALLY A FEW TO 10S OF nm

Materials Characterization Labwww.mri.psu.edu/mcl

CONTACT VS. TAPPING MODEDIMENSION 3100 MICROSCOPE

BOTH METHODS SCAN THE SURFACE WITH A CONSTANT FORCE

Materials Characterization Labwww.mri.psu.edu/mcl

ADVANTAGES AND DISADVANTAGES OF CONTACT AND TAPPING MODES

CONTACTADVANTAGES•HIGH SCAN SPEEDS•VERY ROUGH SAMPLES CAN SOMETIMES BE SCANNED MORE EASILY

DISADVANTAGES•LATERAL FORCE DISTORTION•CAPILLARY FORCES FROM ADSORBED WATER CAN BE HIGH•HIGH LATERAL AND NORMAL FORCES CAN DAMAGE SOFT SAMPLES

TAPPINGADVANTAGES•HIGHER LATERAL RESOLUTION ON MOST SAMPLES•LOWER FORCES AND LESS DAMAGE TO SOFT SAMPLES IMAGED IN AIR•LATERAL FORCES VIRTUALLY ELIMINATED

DISADVANTAGES•SLOWER SCAN SPEEDS THAN CONTACT MODE

Materials Characterization Labwww.mri.psu.edu/mcl

Contact Mode Cantilever (Si3N4)

0.32

0.580.06

0.12

CANTILEVERS NOT DRAWN TO SCALE

COURTESY R. MALEK, MCL

Materials Characterization Labwww.mri.psu.edu/mcl

TAPPING MODE CANTILEVER

Materials Characterization Labwww.mri.psu.edu/mcl

TEMPERED GLASS TOPOGRAPHIC IMAGE

Materials Characterization Labwww.mri.psu.edu/mcl

MEASUREMENT OF LATERAL AND VERTICAL FEATURES

Materials Characterization Labwww.mri.psu.edu/mcl

AVERAGE ROUGHNESS CALCULATION

Materials Characterization Labwww.mri.psu.edu/mcl

PIXEL HEIGHT DISTRIBUTION ANALYSIS

HIGHEST (YELLOW)

LOWEST (MAROON)

4.1 nm

7.5 nm

10 nm

Materials Characterization Labwww.mri.psu.edu/mcl

NANOWIRE UNIFORMITY

Materials Characterization Labwww.mri.psu.edu/mcl

HOT-END SnO2 COATING ON A GLASS BEER BOTTLE

10 CTU 20 CTU 30 CTU

Materials Characterization Labwww.mri.psu.edu/mcl

CARBON NANOTUBES

Materials Characterization Labwww.mri.psu.edu/mcl

PHASE IMAGING IN TAPPING MODE

phas

e

ExtenderElectronics

amplitude

phase

Materials Characterization Labwww.mri.psu.edu/mcl

K. E. Strawhecker and E. Manias, AFM of Poly(vinyl alcohol) Crystals Next to an Inorganic Surface8475 Macromolecules 2001, 34, 8475-8482

Materials Characterization Labwww.mri.psu.edu/mcl

MEASUREMENT OF INTERMOLECULAR FORCESVIA FORCE-DISTANCE CURVES

Materials Characterization Labwww.mri.psu.edu/mcl

CHEMICAL FORCE MICROSCOPY

C.B. Prater, P.G. Maivald, K.J. Kjoller, M.G. Heaton,“Probing Nano-Scale Forces with the Atomic Force Microscope”DI application note

F-D curve fora Si3N4 cantileverand mica surface as a function of pH

Materials Characterization Labwww.mri.psu.edu/mcl

TIP SHAPE ISSUES

TIP RADIUS AND GEOMETRY INFLUENCE LATERAL RESOLUTION, AND THE ABILITY TO FOLLOW SURFACE TOPOGRAPHY

Materials Characterization Labwww.mri.psu.edu/mcl

TIP IMAGING

COURTESY E. MANIAS

Materials Characterization Labwww.mri.psu.edu/mcl

AFM VS. SEMAFM ADVANTAGES• QUANTITATIVE LATERAL AND VERTICAL MEASUREMENTS• NO NEED FOR SHARP EDGES OR SPECIAL SURFACE CHARACTERICTERISTICS TO

GENERATE GOOD TOPOGRAPHIC CONTRAST IN IMAGES• MEASUREMENTS PERFORMED IN AMBIENT AIR, LIQUID, VACUUM, OR OTHER

CONTROLLED ENVIRONMENTS• ELEVATIONS AND DEPRESSIONS ARE EASILY DISTINGUISHED• SAMPLE PREP CAN OFTEN BE NON-DESTRUCTIVE• ABILITY TO DISTINGUISH MATERIAL PROPERTY DIFFERENCES SUCH AS

STIFFNESS, ELASTICITY, COMPLIANCE, FRICTION, ADHESION, MAGNETIC FIELDS, CARRIER CONCENTRATION, TEMPERATURE DISTRIBUTION, SPREADING RESISTANCE, AND CONDUCTIVITY

SEM ADVANTAGES• QUALITATIVE ELEMENTAL INFORMATION VIA X-RAYS & BACKSCATTERED

ELECTRONS• ABILITY TO IMAGE UNDERCUTS OR CONVOLUTED STRUCTURES• LARGER DEPTH OF FIELD AND LATERAL SCAN RANGE• RELATIVELY FAST ACQUISITION OF IMAGES

Materials Characterization Labwww.mri.psu.edu/mcl

Images from DI Veeco Metrology application note “SEM and AFM: Complementary Techniques for High Resolution Surface Investigations”, by Russell, Batchelor, and Thornton.

Materials Characterization Labwww.mri.psu.edu/mcl

DATA PROCESSINGTYPICAL OPERATIONS INVOLVE:• Removing tilt, drift, scanner offsets and distortions• Altering contrast, brightness, colors• Magnify or reduce the vertical scale• Curvature or edge enhancement algorithms• Retouch areas of bad data• Filtering “environmental noise”• Introduce artificial light sources• Fourier Transform• 3-dimensional rendering• Low-Pass/High-Pass Filtering• Surface parameters such as roughness, skewness, or kurtosis• Cross sectional analyses• Bearing analyses

Materials Characterization Labwww.mri.psu.edu/mcl

COMMON IMAGE PROCESSING ALGORITHIMS CANINTRODUCE SIGNIFICANT DISTORTIONS INTO THE DATA

Materials Characterization Labwww.mri.psu.edu/mcl

RESOURCES

Veeco metrologyhttp://www.veeco.com/

MatSE 597Dhttp://zeus.plmsc.psu.edu/~manias/MatSc597/

Do a GOOGLE search on “scanning probe microscopy”

Materials Characterization Labwww.mri.psu.edu/mcl

SO HOW DO I GET AFM MEASUREMENTS MADE???

• CONTACT VINCE BOJAN ([email protected]) OR BOB HENGSTEBECK ([email protected] AT THE MRI BLDG. FOR THE DIMENSION 3100 LARGE-SAMPLE AFM.

• CONTACT DR. RAAFAT MALEK ([email protected]) FOR THE MULTIMODE AFM AT THE MRL BLDG.

• IF YOU HAVE JUST A FEW MEASUREMENTS, MCL STAFF MEMBERS CAN MAKE THE MEASUREMENTS FOR YOU, AND ALSO HELP YOU INTERPRET THE DATA

• IF YOU HAVE LOTS OF SAMPLES, YOU CAN BE TRAINED TO RUN THE MICROSCOPE YOURSELF

• AFTER TRAINING, RESERVE TIME ON THE AFM CALENDAR

• TRAINED, COMPETENT USERS GET ACCESS ON EVENINGS & WEEKENDS

Materials Characterization Labwww.mri.psu.edu/mcl

MCL WEB PAGEhttp://www.mri.psu.edu/mcl/index.asp

MCL ONLINE RESERVATION SYSTEMhttp://www.mri.psu.edu/mcl/online.asp