AD A138 CALCULATIONS OF MISFIT DISLOCATION AND ...I conclude that abrupt Hg1 _xCdxTe heterojunction...

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AD A138 241 CALCULATIONS OF MISFIT DISLOCATION AND DANGLING BOND DENSITIES IN ABRUPT..(U) AEROSPACE CORP EL SEGUNDO CA CHEMISTRY AND PHYSICS LAB R B SCHOOLAR 15 DEC 83 INCASSIFED TRODB841494507)iSDTR-83-88 FG 2012 N( EIUZEEEEEEE

Transcript of AD A138 CALCULATIONS OF MISFIT DISLOCATION AND ...I conclude that abrupt Hg1 _xCdxTe heterojunction...

  • AD A138 241 CALCULATIONS OF MISFIT DISLOCATION AND DANGLING BONDDENSITIES IN ABRUPT..(U) AEROSPACE CORP EL SEGUNDO CACHEMISTRY AND PHYSICS LAB R B SCHOOLAR 15 DEC 83

    INCASSIFED TRODB841494507)iSDTR-83-88 FG 2012 N(EIUZEEEEEEE

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    SD-TR-83-88 r~b-, u~ 41 ______________4. TITLE (&" U.*NeI) S. TYPE OF REPORT a PERIOD COVERED

    Calculation of Misfit Dislocationsand Dangling Bond Densities In 6. PeRrPaQmixe. ORG. REPORT? NumSERAbrupt Hgi..jxCdxTe Heterojunctions TRm0844945-07)-l

    r1. ATNMOXr D. CONTRACTIOR GANT NUNSEWge)Richard B. Schoolar

    704701 -83-C-0084

    S. PERFORMING ORGANIZATION NAME AND ADDRESS 10. PROGRAM RIEET POET TASKThe Aerospace Corporation aRE W O~ UNI NUMBE RSEl Segundo, Calif. 90245

    11. CONTROLLING OFFICE NAME AND ADDRESS 12. REPORT DATESpac Divsion15 December 1983

    Los Angeles Air Force Station is. NUMBER or PAGESLos ngeesCali. 90096

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    1S. SUPPLEMENTARY NOTES

    SO. KEY WORDS (Comeaw. on side of 880006Wp old ~~P WIWI unS. )

    Epit axial growth \Inter acesHgCdT* Mercu cadmium tellurideInfrared detectors

    SO AShTRACT t(Aioinme em.. a#* Of aMd W1110111 IV mA.Based on the classical theo of epitaxial c stal groh h iftdsoations and dangling bond densit as of abrupt 1 HjCd!T eeojscinhave been calculated. *for th --! whiere (x2 - 1 Y. the dangling bonddensity Is an the order of 10 em' . Such l1rSe aangling bond densities mayproduce high Interface recombinat ion velocities or band-bending at theinterface

    * POEMA UnclassifiedIP*6SN.~0

  • The mrcury-cadmium-telluride (1gl_Cd.Te) alloy system has become an

    important semiconductor material for fabrication of infrared detectors. A

    Ulquid-phase-epitaxy (LPE) technique is commonly used to grow this semiconduc-

    tor with the desired Cd content on CdTe substrates. This alloy layer-

    substrate combination has been referred to as a "lattice matched" system since

    the lattice constants of HgTe and CdTe differ by only 0.3%. The high perform-

    ance of p-n Junction photovoltaic detectors produced from these epitaxiallayers has been taken as evidence of low surface recombination velocities and

    low defect densities at the Ihl.zCd.Te/CdTe interface.1 Consequently, inter-

    eat has been shown for using LPE techniques to produce more complex double-

    layer heterojunctions for device applications. 2 These structures are com-

    prised of an n-type layer of composition A2 on a rtype layer of composition x1and, in theory, should have lower leakage currents than p-n homojunction

    photodiodes. However, the defect structure of HglCd1Te heterojunctions has

    not been established.

    The purpose of this report is to present calculations of the misfit

    dislocation and dangling bond densities at abrupt Ug Cd Te/Egl Cd Teheterojunctlons where hx - (x2 - x1 ) is a variable. Thl ag'..xCd Te/&TeInterface Is a special case with the variable z becoming (I-x). The calcula-

    tions are made for the (111) plane using the theoretical treatment of Oldham

    and Milnes. 3 According to this study, the misfit dislocations for (111)heterojunctlos may lie in the , , and directions.with spacing

    h between sets as shown in Fig. 1. For pure edge dislocations, h is given by

    1 2

    r2 ( 2 -a2

    where a, and a2 are the lattice spaciag for x, and z2. respectively, on both

    sides of the beterojunction. The Interface dangling bond density Ms is them

    Me DTIC TABUnannouncedJusti ication

    Distribution/

    Availability Codes

    Avail and/or

    Dist Spsis)

    : ... . - ' ,- - ln

  • (211> DIRECTION (111> DIRECTION

    X2

    1071

    Tigere 1. Misfit Dilcation Lims In the (111) Plowe of anAbrupt g1..3Cd.Te Usatelrojuact ioo. The spacing hIs PIOmted fuss the lattice constants &I and aou both sides of the Interf ace.

    2 7'U Pt

  • where c Is the mean spacing between bonds along the dislocation line and for

    (111) orientations is given by

    81 j-C a 7

    A recent study of HBglCd.Te epitaxial crystal growth4 has shown that

    mirror-samooth films can be obtained on 1gl_xCdxTe substrates when Lx < 0.03.

    Networks of dislocation lines similar to the ones shown in Fig. I were

    observed when Ax > 0.07.

    According to the literature, the lattice constants of CdTe and UgTe at

    room temperature are 6.4818A and 6.4620A, respectively.5 The lattice para-

    meter of Ngl-xCdxTe varies approximately linearly with x across the entire5composition range. The linear thermal expansion coefficients for both mater-

    ials Is 5.0 x 10-6C71 above 300 K.

    6 ,7

    The dislocation line spacing and dangling bond densities for abrupt (Ill)

    IRsl-Cd.Te heterojunctions are shom in FiS. 2 as a function of ax. Since the

    thermal expansion coefficients of CdTe and UgTe are identical, these calcula-

    * tions apply for all LPE growth temperatures.

    These dangling bonds should occur in the HSl-zCdxTe epitaxial layer and

    not in the CdTe substrate since the alloy has the smaller lattice constant.

    In the case of heterojunctions between two alloy semiconductors, the dangling_bonds should occur In the layer wi~th the smaller lattice constant which also

    has the smaller energy gap. It Is well established that such dangling bondscan generate either donor-like or acceptor-like interface states, recombina-

    tion centers, traps, or In rare instances may remain neutral. The interfacial

    barrier height generated by donor or acceptor-like states can be estimated

    from As following the method outlined by Many, Goldstein, and Grover 8 for

    calculating surface potential. According to these calculations, barrier

    heights in excess of 4 KT/q can be generated whenever ax > 0.1.

    4!

    a 3

  • - U.:3) N V

    - 04

    004 4-4J~

    'us

    04a

    01 "0U

    1~ 0

    914

    to U (~

    U? ~W1

    (W~)L ir

  • .J

    According to this calculation, the Hgl_xCdxTe/CdTe interface is far from

    ideal when Ax > 0.1. For values of Ax typically encountered in epitaxial

    growth of detector layers, Me ) 01 2 c - 2 . Such high densities of dangling

    bonds could easily give rise to high Interface state densities and cause

    severe minority carrier recombination. Of course these interface states may

    produce band-bonding of the proper sign to screen minority carriers from the

    CdTe interface. This screening could reduce the interface recombination

    velocity and produce the enhanced "limited volume" diode characteristics

    reported for p-n Junctions fabricated in Hgl..Cd.Te epitaxial layers.1

    In the case of double layer heterojunctions with coincident metallurgical

    and p-n Junctions, the interface states would occur in the depletion region

    and could produce high recombination rates and excess leakage currents. Any

    band-bending which would screen thermally generated carriers would also repel

    optically generated carriers and degrade detector quantum efficiency. Thus,

    ftl-xCdxTe heterojunctions with Ax ) 0.1 might be expected to exhibit poor

    photodiode characteristics.

    I conclude that abrupt Hg1 _xCdxTe heterojunction Interfaces should have

    misfit dislocations and dangling bond densities in excess of 1011 ca - 2 when-

    ever Ax > 0.10. Such large numbers of dangling bonds may cause severe

    minority carrier recombination and/or band-bending at the interface. Thus,

    these Interfacial defects may play an important role, or may even dominate

    heterojunction device characteristics.

    I

  • References

    1. M4. Lanir, C.C. Wang, and A.H.I. Vandervyck, Appi. Phys. Lett. 34, 50

    (1979).

    2. S.R. Shin, A.H.B. Vandervyck, J.C. Kim, and D.T. Cheung, Appi. Phys. latt.

    37. 402 (1980).

    3. W.G. Oldhaim and A.G. milnes, Solid-State Electron. 7, 153 (1964).

    4. Y. Nemirousky, S. Margalit, E. Finkuan, Y. Shacham - Damand, and 1.

    Kidron, J. Electron, Mater. 11, 133 (1982).

    5. J.C. Woolley and B. Ray, J. Phys. Chen. Solids 13., 151 (1960).

    6. Novikova, Fiz. Tverd. Tela.3, 178 (1961) Eng. Trans.:Soviet Phys. - Solid

    State J3, 129 (1961).

    7. Novikova, and N. Kh. Abrikosov, Fit. Tverd. Tela 5 218(96)Eg.

    Trans.:Soviet Phys. - Solid State Z, 1558 (1964).

    8. A. Many, Y. Goldstein, and N.D. Grover, Semiconductor Surfaces, Chapter 4

    (North Holland Publishing Company, Amsterdam, 1965).

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