CMOS Pixel Sensors for Charged Particle Tracking ... · Pitch (microns) 15 20 25 30 35 40 45...

Post on 28-Jan-2020

0 views 0 download

Transcript of CMOS Pixel Sensors for Charged Particle Tracking ... · Pitch (microns) 15 20 25 30 35 40 45...

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Copenhagen, 26 August 2009

CMOS Pixel Sensors for Charged Particle Tracking :

Achieved Performances and PerspectivesMarc Winter (IPHC/Strasbourg)

on behalf of IPHC/Strasbourg – IRFU/Saclay collaboration

⊲ More information on IPHC Web site: http://www.iphc.cnrs.fr/-CMOS-ILC-.html

• Motivation of the talk :

> ∼ 11 years since the 1st CMOS sensor was proposed for vertexing (at the ILC)

> numerous other applications of CMOS sensors have emerged since then

> ∼ 10–15 HEP groups in the US & Europe are presently active in CMOS sensor R&D

• Scope of the talk :

> R&D motivations

> performances achieved with CMOS pixel sensors

> current applications

> perspectives with 2D and 3D sensors

CMOS pixel sensors, –1–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- What is the ILC Project ?

• ILC ≡ next large scale accelerator after LHC ⊲⊲⊲ Physics & 2020

⊲ it is an electron - positron linear collider : c.m. energy up to ∼ 1 TeV ; & 31 km long site;

⊲ it will deepen discoveries made at LHC and extend the experimental sensitivity to new phenomena

underlying the history of Universe (laws of Nature) and its present mysteries (Dark Matter, Dark Energy)

• ILC design expected to be technically ready for constructio n & 2012 (... R&D started & 10 years ago ... )

→ Detector concept should mature synchronously (time scale less tight as LHC)

CMOS pixel sensors, –2–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- The Quest for Highly Precise & Sensitive Detectors

• ILC is a high precision machine :

⊲ electron - positron collisions are relatively (compared to LHC) background free

⊲ physics conditions of elementary interactions are particularly well defined and tunable

Very high precision/sensitivity studies accessible if det ectors are extremely sensitive

Vertex Detector with unprecedented performances

• Major requirements :

⋄ Resolution on vertex position ∼ O(10) µm ⋄ O(103) hit pixels /cm2/10 µs (inner layer)

⋄ Ionising radiation : O(100) kRad / yr ⋄ Non-ionising radiation . O(1011)neq /cm2/yr from e±BS

and . O(1010)neq /cm2/yr from neutron gas

CMOS pixel sensors, –3–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Granularity and Transparency

• How to achieve high spatial resolution : small pixels (pitch ) and reduced material ( ≡ weight)

→ Figure of merit : σip = a ⊕ b/pt b governs low momentum (∼ 30 % particles < 1 GeV/c)

a governs high momentum

Accelerator a (µm) b (µm · GeV )

LEP 25 70

SLD 8 33

LHC 12 70

RHIC-II 13 19

ILC < 5 < 10

b dominated

ւ

a dominated

CMOS pixel sensors, –4–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Granularity and Transparency

• How to achieve high spatial resolution : small pixels (pitch ) and reduced material ( ≡ weight)

→ Figure of merit : σip = a ⊕ b/pt b governs low momentum (∼ 30 % particles < 1 GeV/c)

a governs high momentum

Accelerator a (µm) b (µm · GeV )

LEP 25 70

SLD 8 33

LHC 12 70

RHIC-II 13 19

ILC < 5 < 10

b dominated

ւ

a dominated

Existing pixel technologies cannot do the job :

> CCDs are too slow and radiation soft

> Hybrid Pixel Sensors are not granular and thin enough

CMOS pixel sensors, –4-a–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Main Features and Advantages of CMOS Sensors

• P-type low-resistivity Si hosting n-type ”charge collecto rs”

• signal created in epitaxial layer (low doping):

Q ∼ 80 e-h / µm 7→ signal . 1000 e−

• charge sensing through n-well/p-epi junction

• excess carriers propagate (thermally) to diode

with help of reflection on boundaries

with p-well and substrate (high doping)

• Prominent advantages of CMOS sensors:

⋄ granularity: pixels of . 10×10 µm2 high spatial resolution

⋄ low mat. budget: sensitive volume ∼ 10 - 15 µm total thickness . 50 µm

⋄ Signal processing µcircuits integrated in the sensors compacity, high data throughput, flexibility, etc.

⋄ other attractive aspects: cost, multi-project run frequen cy, Troom operation, etc.

⊲ ⊲ ⊲ Attractive balance between granularity, mat. budget, rad. tolerance, r.o. speed and power dissipation

• Limitations ⋊⋉ Very thin sensitive volume impact on signal magnitude (mV !) vey low noise FEE

⋊⋉ Sensitive volume almost undepleted impact on radiation tolerance & speed

⋊⋉ Commercial fabrication fab. param. (doping profile, etc.) not optimal for charged pa rt. detection

⋊⋉ etc.

CMOS pixel sensors, –5–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

-

Achieved Performances

with Analog Output Sensors

CMOS pixel sensors, –6–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- M.I.P. Detection with CMOS Sensors

• ∼ 100 chips (M1, M2, M4, M5, M8, M9, M11, M14, M15, M16, M17, M18) tested on H.E. beams since 2001 at

CERN & DESY, mounted on Si-strip telescope (calibrated with 55Fe) 7→ well established perfo. (analog output):

> Example of well performing technology: AMS 0.35 µm OPTO ∼ 14 & 20 µm epitaxy thickness

> N ∼ 10 e−ENC 7→ S/N & 20 – 30 (MPV) at room Temperature

> Technology without epitaxy also performing well : very high S/N but large clusters (hit separation ց)

> Macroscopic sensors : MIMOSA-5 (∼ 1.7x1.7 cm2; 1 Mpix) ; MIMOSA-20 (1x2 cm2; 200 kpix) ;

MIMOSA-17 (0.76x0.76 cm2; 65 kpix) ; MIMOSA-18 (0.55x0.55 cm2 ; 256 kpix)

CMOS pixel sensors, –7–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Detection Efficiency & Spatial Resolution

• Detection efficiency:

> Ex: MIMOSA-9 data (20, 30 & 40 µm pitch)

> ǫdet & 99.5–99.9 % repeatedly observed

at room temperature (fake rate ∼ 10−5)

> Toper. & 40 C

C)oTemp (

-20 -10 0 10 20 30 40

Effi

cenc

y %

99

99.2

99.4

99.6

99.8

100

100.2

pitch 20 small diode chip 1

pitch 30 small diode chip 1

pitch 40 small diode chip 1

pitch 20 small diode chip 3

pitch 30 small diode chip 3

pitch 40 small diode chip 3

Efficency vs Temperature Small Diode

pitch (microns)

5 10 15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

0.5

1

1.5

2

2.5

3

3.5

Mimosa resolution vs pitchMimosa resolution vs pitch• Single point resolution versus pixel pitch:

> clusters reconstructed with eta-function,

exploiting charge sharing between pixels (12-bit ADC)

> σsp ∼ 1 µm (10 µm pitch) . 3 µm (40 µm pitch)

> 4-bit ADC simul. σsp . 2 µm (20 µm pitch)

> measured binary output resolution (MIMOSA-16, -22):

σsp & 3.5 & 4.5 µm (18.4 & 25 µm pitch)

CMOS pixel sensors, –8–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Radiation Tolerance: Condensed Summary

• Ionising radiation tolerance (chips irradiated with 10 keV X-Rays) :

> Pixels modified against hole accumulations (thick oxide) an d leakage current increase (guard ring)

> MIMOSA-15 tested with ∼ 5 GeV e− at DESY after 10 kGy exposure : Preliminary results

• T = - 20C, tr.o. ∼ 180 µs

• tr.o. << 1ms crucial at Troom

Integ. Dose Noise S/N ( MPV) Detection Efficiency

0 9.0 ± 1.1 27.8 ± 0.5 100 %

1 MRad 10.7 ± 0.9 19.5 ± 0.2 99.96 ± 0.04 %

• Non-ionising radiation tolerance (chips irradiated with O (1 MeV) neutrons):

> MIMOSA-15 (20 µm pitch) tested on DESY e − beams : Preliminary results

• T = - 20C, tr.o. ∼ 700 µs Fluence (10 12neq /cm2) 0 0.47 2.1 5.8 (5/2) 5.8 (4/2)

S/N (MPV) 27.8 ± 0.5 21.8 ± 0.5 14.7 ± 0.3 8.7 ± 2. 7.5 ± 2.

Det. Efficiency (%) 100. 99.9 ± 0.1 99.3 ± 0.2 77. ± 2 84. ± 2.

5.8·1012neq /cm2 values

with standard & soft cuts

> MIMOSA-18 (10 µm pitch) tested at CERN-SPS (120 GeV π− beam) : Preliminary results

• T = - 20C, tr.o. ∼ 3 ms Fluence (n eq /cm2) 0 6·1012 1·1013

Qclust (e−) 1026 680 560

S/N (MPV) 28.5 ± 0.2 20.4 ± 0.2 14.7 ± 0.2

Det. Efficiency (%) 99.93 ± 0.03 99.85 ± 0.05 99.5± 0.1

parasitic 1–2 kGy γ gas Nր

• Conclusion :

> obs. tolerance: O(10 kGy) & 2·1012 neq /cm2 (20 µm pitch) > 1·1013 neq /cm2 (10 µm pitch)

> further studies needed : tolerance vs diode size, r.o. speed, digital output, ................ , annealing ??

CMOS pixel sensors, –9–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- System Integration

• Industrial thinning (via STAR coll. at LBNL) MIMOSA-18 (5.5×5.5 mm2 thinned to 50 µm)

• Devt of ladder equipped with MIMOSA chips (coll. with LBL): STAR (. 0.3 % X0 ) ILC (< 0.2 % X0 )

• Perspectives ?

> accessibility of industrial thinning + post-processing of ”high-res” substrate

> stitching alleviates material budget of flex cable

CMOS pixel sensors, –10–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Applications of Sensors with Analog Output

• Beam telescope of the FP6 project EUDET

> 2 arms of 3 planes (plus 1 high resolution plane)

> σextrapol. . 1 µm EVEN with e− (3 GeV, DESY)

> frame read-out frequency O(102) Hz

> running since ’07 CERN-SPS & DESY (numerous users)

> evolution towards 104 frames/s in 2009, using

binary output sensors (see later)

• Several other applications :

> MIMOSA sensor R&D : Pixel telescope of Strasbourg (TAPI)

> STAR (RHIC) : telescope (3 MIMOSA-14) inside apparatus (2007)

background meast, no pick-up !

> CBM (FAIR) : MVD demonstrator (double-sided layers) to be used

for high precision tracking in HADES (GSI) ∼ 2010

> Spin-offs : beta imaging, hybrid photo-detector, dosimetre, ...

CMOS pixel sensors, –11–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

-

Improving the Read-Out Speed

with Digital Output Sensors

CMOS pixel sensors, –12–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Development Strategy of Fast CMOS Sensors

• Target value : read-out time . 20 - - - - 200 µs sensors organised in pixel columns read out in //

• R&D organisation : 3 simultaneous R&D lines 3 types of µcircuits MIMOSA-22H

> architecture of pixel arrays organised in columns read out in //

⊲ CDS and pre-amp µcircuit in each pixel

⊲ 1 discriminator ending each column

→ MIMOSA-8 (2004), MIMOSA-16 (2006), MIMOSA-22 (2007/08)

> Ø µcircuits & output memories : SUZE-01 (2007) −→

> 4–5 bits ADCs (1000 ADC featuring 20×500 µm2 per sensor ! )

⊲ potentialy replacing each discriminator

→ σsp < 2 µm (4 bits) 1.7–1.6 µm (5 bits) for 20 µm pitch

CMOS pixel sensors, –13–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Performances of a Large Prototype with Digitised Output

• MIMOSA-22 : fabricated in 2007/08 (coll. with IRFU/Saclay)

⋄ 136 col. of 576 pixels (18.4 µm pitch, integrated CDS )

⋄ 128 col. ended with an integrated discriminator

⋄ integrated JTAG controller

• Tests at CERN-SPS (∼ 120 GeV π−) in 2008 results of different sub-arrays

Discri. Threshold (mV)2 3 4 5 6 7 8

Effic

ienc

y (%

)

80

82

84

86

88

90

92

94

96

98

100

102

Reso

lutio

n (u

m)

0

0.5

1

1.5

2

2.5

3

3.5

4

4.5

5

Aver

age

fake

hit

rate

/pixe

l/eve

nt

-710

-610

-510

-410

-310

-210

M22 digital S6. Efficiency, Fake rate and Resolution

S/N3 4 5 6 7 8 9 10 11 12

Effic

ienc

y (%

)

90

91

92

93

94

95

96

97

98

99

100

S6 MIMOSA22

S5 MIMOSA22bis

S2 MIMOSA22bis

S6 M22, S5 M22bis & S2 M22bis digital Efficiency

S/N3 4 5 6 7 8 9 10 11 12

Aver

age

fake

hit

rate

/pixe

l/eve

nt

-610

-510

-410

-310

-210

S6 MIMOSA22

S5 MIMOSA22bis

S2 MIMOSA22bis

M22bis digital fake hit rate

⊲⊲⊲ Architectures of pixel (integrated CDS ) and of full chain ma de of

”columns ended with integrated discri. ” validated at real s cale

CMOS pixel sensors, –14–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Zero Suppression Micro-Circuit : SUZE-01 Test Results

• 1st chip (SUZE-01) with integrated Ø and output memories (no pixels) :

> 2 step, raw by raw, logic :

⋄ step-1 (inside blocks of 64 columns) :

identify up to 6 series of ≤ 4 neighbour pixels per raw

delivering signal > discriminator threshold

⋄ step-2 : read-out outcome of step-1 in all blocks

and keep up to 9 series of ≤ 4 neighbour pixels

> 4 output memories (512x16 bits) taken from AMS I.P. lib.

> adapted to 2 × 64 columns

> surface ∼ 3.9 × 3.6 mm2

• Test results summary :

> designed & fabricated in ’07 (lab) tests completed by Spring ’08

> design performances reproduced up to 1.15 × design read-out frequency (Troom) :

noise values as predicted, no pattern encoding error, can handle > 100 hits/frame at rate > 104 frames/s

• Still to do : improve radiation tolerance (SEU, latch-up ) of ouput memories

CMOS pixel sensors, –15–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- MIMOSA-26 : 1st Sensor with Integrated Ø

• MIMOSA-26 ≡ final sensor for EUDET telescope

> MIMOSA-22 (binary outputs) complemented with Ø (SUZE-01)

> Active surface : 1152 columns of 576 pixels (21.2 x 10.6 mm 2)

> Pitch : 18.4 µm ∼ 0.7 million of pixels σsp & 3.5 µm

> Integration time . 110 µs ∼ 104 frames / second

suited to > 106 particles/cm2/s

> Ø in 18 groups of 64 col. allowing ≤ 9 ”pixel strings” / raw

> Sensor full dimensions : ∼ 21 x 12 mm2

> Data throughput: 1 output at ≥ 80 Mbits/s

or 2 outputs at ≥ 40 Mbits/s

• Fabricated in AMS-0.35 technology:

> Sensor currently being tested preliminary test results satisfactory (see next slide)

> Sensor foreseen to equip several beam telescopes (including ATLAS)

> Architecture is baseline for STAR, CBM and ILC vertex detectors

CMOS pixel sensors, –16–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- MIMOSA-26 : Preliminary Lab Test Results

• MIMOSA-26 ≡ final sensor for EUDET telescope

> 9 sensors mounted on interface board and tested with/withou t 55Fe source

> Noise performance assessment performed separately for

each of the 4 groups of 288 columns, at nominal r.o. speed

> Typical value of pixel (i.e. temporal noise) ∼ 0.6–0.7 mV

> Typical value of FPN (discriminator) noise ∼ 0.3–0.4 mV

> Results are ∼ identical to MIMOSA-22 values

> Ø logic seems to work as foreseen

> 3 sensors mounted as DUT on EUDET beam telescope

Sensor is operational at nominal speed

• Next steps :

> Commission final version of EUDET beam telescope at CERN-SPS (Septembre ’09)

> Cross-check radiation tolerance

> Yield investigate stitching ?

> Extend design to various vertex detectors (STAR, CBM, ILC, etc.)

CMOS pixel sensors, –17–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Extensions of MIMOSA-22 & MIMOSA-26 to STAR

• 1st generation sensor for the HFT- PIXEL of STAR (PHASE-1):

> full scale extension of MIMOSA-22 (no Ø)

> 640x640 pixels (30 µm pitch) active surface : 19.2 x 19.2 mm2

> integration time : 640 µs

> designed and fabricated in 2008 currently under test at LBNL

> 3 + 9 ladders to equip with 10 sensors thinned to 50 µm (1/4 of PIXEL)

> 1st physics data expected in 2011

• Final HFT- PIXEL sensor :

> MIMOSA-26 with active surface × 1.8 & improved rad. tolerance

→ 1152 col. of 1024 pixels (21.2 x 18.8 mm2)

> Pitch : 18.4 µm ∼ 1.1 million pixels

> Integration time ∼ 200 µs

> Design in 2009 fab. early 2010

1st physics data expected in 2012

CMOS pixel sensors, –18–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- ILC Vertex Detector R&D Goals

• Sensor requirements defined w.r.t. ILD VTX geometries> 2 alternative geometries :

⋄ 5 single-sided layers

⋄ 3 double-sided layers (mini-vectors)

> pixel array read-out perpendicular to beam lines

• Prominent specifications :

> read-out time target values (continuous read-out version) :

SL1/SL2 /SL3 /SL4 /SL5 DL1 / DL2 / DL3

⋄ single-sided : 25 / 50 / 100 / 100 / 100 µs ⋄ double-sided : 25–25 / 100–100 / 100–100 µs

> σsp < 3 µm (partly with binary outputs)

> full ladder material budget in sensitive area (. 50 µm thin sensors) :

⋄ single-sided : < 0.2 % X0 ⋄ double-sided : ∼ 0.2 % X0

> Pdiss . 0.1–1 W/cm2× 1/50 duty cycle

(5 Hz, 1 ms long, bunch train frequency)

CMOS pixel sensors, –19–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- From MIMOSA-26 to the ILC Design

• Move from AMS-0.35 µm to feature size ≤ 0.18 µm

improved clock frequency, more metal layers, more compact peripheral circuitry, etc.

• Outer layers (t int ∼ 100 µs) : • Inner layers (t int ∼ 25 - 50 µs) :

> pitch . 35 µm (need phys. studies ) > double-sided r.o. twice shorter (= faster) columns

> 4-bit ADC σsp ∼ 3 µm > pitch . 15 µm

> 576 col. of 576 pixels 2x2 cm2> binary r.o. σsp . 3 µm

> 1600 columns of 320 pixels . 24x0.95 mm2

CMOS pixel sensors, –20–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- System Integration : PLUME Project

• PLUME project

≡ Pixelised Ladder using Ultra-light Material Embedding

• Objectives :

> achieve a double-sided ladder prototype by 2012

> evaluate benefits of 2-sided concept (mini-vectors) :

σsp, alignment, shallow angle pointing

• Collaboration:

> Bristol - DESY - Oxford - Strasbourg

> Synergy with Vertex Detector of CBM/FAIR

• Perspective:

> to be integrated in FP-7 project called DEVDET (proposal in preparation)

> interest for (s)LHC experiments ?

CMOS pixel sensors, –21–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- System Integration : PLUME Project

• 1st step (2009) :

> 2 pairs of MIMOSA-20 sensors (4x1 cm2, 50 µm thin)

mounted on flex cable, assembled on SiC (8 %) support

> total material budget ∼ 0.5 % X0

SiC foam sensors glue flex0.18 % 0.11 % 0.02 % 0.29 %

> beam tests at CERN-SPS in Novembre

• 2nd step (2009 − 2012) :

> 2 sets of 6 MIMOSA-26 sensors (12.5x1 cm2, 50 µm thin)

mounted on flex cable, assembled on SiC support

> total material budget & 0.2 % X0 (stitching ???)

> prototype for innermost layer

CMOS pixel sensors, –22–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

-

Evolution of CMOS Sensors

CMOS pixel sensors, –23–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- High Resistivity Sensitive Volume

• Advantages :

> faster charge collection (< 10 ns ) faster frame read-out frequency

> shorter minority charge carrier path length improved tolerance to non-ionising radiation

• Exploration of 0.6 µm techno: ∼ 15 µm thick epitaxy ; Vdd ≤ 5 V ; ρ ∼ O(103)Ω · cm

> MIMOSA-25 : fabricated in 2008 & tested with 106Ru (β) source before/after O(1 MeV) neutron irradiation

⋄ 20 µm pitch, + 20C, 160 µs r.o. time

⋄ fluence ∼ 0.3 / 1.3 / 3·1013neq /cm2

⋄ tolerance improved by > 1 order of mag.

⋄ need to confirm ǫdet (uniformity !) with

beam tests (CERN-SPS in July ’09)

• Exploration of a new VDSM technology with depleted substrat e : project LePIX

project driven by CERN for SLHC trackers (also attractive for CBM, ILC and CLIC Vx Det.)

> 1st prototypes by the end of 2009 > thinning and post-processing of substrate ?

CMOS pixel sensors, –24–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Using 3DIT to Improve CMOS Sensor Performances

• 3D Integration Techno. allow integrating high density signal processing µcircuits inside small pixels

• 3DIT are expected to be particularly beneficial for CMOS sens ors :

> combine different fab. processes > alleviate constraints on transistor type inside pixel

• Split signal collection and processing functionnalities :

> Tier-1: charge collection system > Tier-2: analog signal processing

> Tier-3: mixed and digital signal processing > Tier-4: data formatting (electro-optical conversion ?)

• Use best suited technology for each Tier :

> Tier-1: epitaxy (depleted or not), deep N-well ? > Tier-2: analog, low Ileak , process (nb of metal layers)

> Tier-3 & -4 : digital process (nb of metal layers), feature size fast laser (VOCSEL) driver, etc.

CMOS pixel sensors, –25–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Ex: Delayed R.O. Architecture for the ILC Vertex Detector

• Run in Chartered - Tezzaron technology Tier-1

> 2-Tier run with ”high-res” substrate (allows m.i.p. detection)

3-Tier architecture compactified in 2-Tier chip

> feature size = 130 nm design foreseen for smaller feature size

• Try 3D architecture based on small pixel pitch, motivated by : Tier-2

> < 3 µm single point resolution with binary output

> probability of > 1 hit per train << 10 %

12 µm pitch : σsp & 2.5 µm & . 5 % proba. of > 1 hit/train

• Split signal collection and processing functionnalities :

> Tier-1A: sensing diode & amplifier

> Tier-1B: shaper & discriminator

> Tier-2: time stamp (5 bits) + overflow bit & read-out delayed r.o.

• Architecture prepares for 3-Tier perspectives :

> Tier-1: CMOS process adapted to charge collection

> Tier-2: CMOS process adapted to analog & mixed signal processing

> Tier-3: digital process (<< 100 nm ????) Tier-2

CMOS pixel sensors, –26–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- Ex: Low Power Design & Mixed CMOS Technologies ‘

• Other ex. of chips designed in Chartered - Tezzaron technolo gy for ILC

> FAST architecture aiming to minimise power consumption (IRFU/Saclay) :

⋄ subdivide sensitive area in ”small” matrices running INDIVIDUALLY in rolling shutter mode

⋄ adapt the number of raws to required frame r.o. time

few µs r.o. time may be reached (???)

• Combine 2-Tier read-out chip with Tier hosting sensitive vo lume :

> Tier-1: XFAB-0.6 (depleted epitaxy) signal sensing volume

> Tier-2 /-3 : Chartered signal processing micro-circuits

> adapted to fast (few µs), low occupancy, particle detection (small sub-arrays in projective geometry)

• Memory tolerant to SEU & SEL (CMP/Grenoble)

⊲⊲⊲ Chips submitted to foundry back by end of 2009

CMOS pixel sensors, –27–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- CONCLUSIONS – SUMMARY

• 2D CMOS sensors have reached necessary prototyping maturit y for real scale applications :

> beam telescopes (EUDET/FP6, etc.) σsp ∼ few µm & 106 part./s/cm2 (even few GeV e± !!!)

> vertex detectors requiring high resolution & very low material budget (STAR-HFT, etc.)

→ 2-sided ladder with . 0.3 % X0 (PLUME project)

> wide spectrum of spin-offs (bio-medical imaging, synchro. rad., dosimetry, hadrontherapy, ...)

• The emergence of fabrication processes with depleted epita xy / substrate opens the door to :

> substantial improvements in read-out speed and non-ionising radiation tolerance

> ”large pitch” applications trackers (e.g. Super LHC )

• Translation to 3D integration processes :

> resorbs most limitations specific to CMOS sensors :

T type & density, peripheral insensitive zone, combination of different CMOS processes

> offers improved read-out speed : O(µs ) !

many obstacles to explore & overcome (e.g. power consumption)

→ R&D is progressing 2009 ≡ important step for process validation

CMOS pixel sensors, –28–

Pitch (microns)

15 20 25 30 35 40 45

Res

olut

ion

(mic

rons

)

1

1.5

2

2.5

3

3.5

Mimosa 9: resolution vs pitch

- 3D-MAPS Consortium

R.Yarema/IUC/Nov.08CMOS pixel sensors, –29–