SiO 2 properties and applications. Thermal oxidation basics. Manufacturing methods and equipment.
Introduction and application. Dopant solid solubility and sheet resistance.
Introduction and application. Dopant solid solubility and sheet resistance. Microscopic view point: diffusion equations. Physical basis for diffusion.
Introduction and application. Light source and photomask, alignment. Photolithography systems. Resolution, depth of focus, modulation transfer function.
Chapter 4 Clean room, wafer cleaning and gettering
