6 Diffusion.pdf
1 Hf Based High-k Dieelctrics
EBB 323 Semiconductor Fabrication Technology Epitaxy Dr Khairunisak Abdul Razak Room 2.16 School of Material and Mineral Resources Engineering Universiti.
Figure 9.1. Use of silicon oxide as a masking layer during diffusion of dopants.
1 Dopant and Self-Diffusion in Semiconductors: A Tutorial Eugene Haller and Hughes Silvestri MS&E, UCB and LBNL FLCC Tutorial 1/26/04 FLCC.
