Copy of TRAPATT and BARITT Diodes
Energy industry overview
Extreme UV (EUV) lithography 1.Overview, why EUV lithography? 2.EUV source (hot and dense plasma). 3.Optics (reflection mirrors). 4.Mask (absorber on mirrors).
LENR Theory-Fleischmann et al-Nuovo Cimento 1994
Success stories. november 2013
Use of Langmuir probes in strong RF plasmas Francis F. Chen, UCLA KAIST, Daejeon, S. Korea, April 2011.
Nuclear Physics with ELI, Population/depopulation of Isomers: modification of nuclear level lifetime F. Gobet, C. Plaisir, F. Hannachi, M. Tarisien, M.M.
Plasma Astrophysics Chapter 2: Single Particle Motion Yosuke Mizuno Institute of Astronomy National Tsing-Hua University.
Turbulent Origins of the Sun’s Corona & Solar WindS. R. Cranmer, September 22, 2011, B.U. CSP Turbulent Origins of the Sun’s Hot Corona and the Solar Wind.
Plasma Physics in the Solar System Steven R. Cranmer Harvard-Smithsonian Center for Astrophysics.
Laser Magnetized Plasma Interactions for the Creation of Solid Density Warm (~200 eV) Matter M.S. Bakeman @, R. Presura, Y. Sentoku, A. Kemp, C. Plechaty,
Exploring the Solar Wind with Ultraviolet Light Steven R. Cranmer and the UVCS/SOHO Team Harvard-Smithsonian Center for Astrophysics.
