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Atomistic nanoelectronic device engineering with sustained performances up to 1.44 PFlop/s

Atomistic nanoelectronic device engineering with sustained performances up to 1.44 PFlop/s

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Atomistic nanoelectronic device engineering with sustained performances up to 1.44 PFlop/s M. Luisier, T. Boykin, G. Klimeck, and W. Fichtner ETH Zurich,

Atomistic nanoelectronic device engineering with sustained performances up to 1.44 PFlop/s M. Luisier, T. Boykin, G. Klimeck, and W. Fichtner ETH Zurich,

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