LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Introduction to Thin Film TechnologyIntroduction to Thin Film Technology
Verfahrenstechnik Verfahrenstechnik der der
OberflächenmodifikationenOberflächenmodifikationen
Prof. Dr. Xin JiangProf. Dr. Xin Jiang
LectureLectureInstitut für Werkstofftechnik der UniInstitut für Werkstofftechnik der Uni--SiegenSiegen
Sommersemester 2007Sommersemester 2007
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology FACHBEREICHMASCHINENBAU
Institut für Mechanik
Institut für Energietechnik
Institut für Mechanikund Regelungstechnik
- Mechatronik
Institut für Fertigungstechnik
Institut für Systemtechnik
Institut für Fluid-und Thermodynamik
Institut für Systemtechnik
y
Institut für Werkstofftechnik
Institut für Konstruktion
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Institut für WerkstofftechnikInstitut für WerkstofftechnikInstitut für WerkstofftechnikInstitut für Werkstofftechnik
Lehrstuhl für Lehrstuhl fürLehrstuhl für Materialkunde undWerkstoffprüfung
Lehrstuhl fürOberflächen- und
Werkstofftechnologie
Prof. Dr.-Ing. H.-J. Christ Prof. Dr. rer. nat. X. Jiang
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Forschungsschwerpunkte des LOTS hi ht tS hi ht tSuperharte SchichtenF kti hi htF kti hi ht
SchichtsystemeSchichtsysteme
FunktionsschichtenFunktionsschichtenKompositschichtenKompositschichten
NanomaterialienNanomaterialienKohlenstoffbasierte NanostrukturenKohlenstoffbasierte NanostrukturenNanokompositeNanokomposite
NanomaterialienNanomaterialien
a o o pos tea o o pos teGalvanische NanostrukturenGalvanische Nanostrukturen
WerkstoffanalytikWerkstoffanalytikStrukturuntersuchungenStrukturuntersuchungenBestimmung von Material/SystemeigenschaftenBestimmung von Material/Systemeigenschaften
WerkstoffanalytikWerkstoffanalytik
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Stil der VorlesungStil der Vorlesung
- Skript: Kopie der Folien (Internet)Vorlesung mit PP Präsentation überwiegend auf Englisch- Vorlesung mit PP-Präsentation, überwiegend auf Englisch
--PrüfungPrüfung (mündlich)Zeit nd Ra m erden ereinbartZeit und Raum werden vereinbart
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Contents
1. Introduction and Application Examples (2h)2. Vacuum Technique (1h)
2.1 Kinetics of Gases2 2 Transport and Pumping of Gases2.2 Transport and Pumping of Gases2.3 Pumping Systems
Preparation of Thin Films by PVD (Physical Vapor Deposition) (10h)2.2 Evaporation (3h)2 1 1 Thermal Evaporation2.1.1 Thermal Evaporation 2.1.2 Evaporation of alloy and compound films2.1.3 Reactive Evaporation2.1.4 Activated Reactive Evaporation2 1 5 Other modern Evaporation Techniques2.1.5 Other modern Evaporation Techniques
2.3 Sputtering (4h)2.2.1 Physical Principals of the Processes2.2.2 Further Processes in Film Growth by Sputtering2 2 3 Sputtering of Alloys2.2.3 Sputtering of Alloys2.2.4 Reactive Sputtering2.2.5 Technical Setups of Sputtering
2.4 Production of Thin Films by Ions and ionized Clusters (0,5h)2 5 Characteristic Data of the Particles and their Influences on the Growth of the thin films (1 5h)2.5 Characteristic Data of the Particles and their Influences on the Growth of the thin films (1,5h)
3 Preparation of Thin Films by CVD (Chemical Vapor Deposition) (4h)3.1 Conventional CVD Processes3.2 Plasma-Assisted CVD
Plasma Decomposition (a-C:H a-Si:H)
Prof. Dr. X. Jiang, 23.06.2008
Plasma Decomposition (a C:H, a Si:H)Microwave-Plasma-Assisted Diamond Deposition
4 Important Film Systems (2h)
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Literatures
1. M. Ohring, "The materials science of thin films" (Academic Press 1992).(Academic Press 1992).
2. R. Kern et al., „Basic Mechanisms in the early stages of epitaxy“ in Current Topics in Materials Science, vol 3, series Editor E. Kaldis, p.153-410.
3. 17. IFF-Ferienkurs „Dünne Schichten“, März 1986.
4. H. K. Pulker, Coatings on Glass, Thin Films Science and Technology, 6, Elsevier 1984.
5 K R i h l d X Ji Thi S lid Fil 191 91 126 5. K. Reichelt and X. Jiang, Thin Solid Films 191, 91-126 (1990).
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Definition
•• How is the “Thin Film” defined? How is the “Thin Film” defined? How is the Thin Film defined? How is the Thin Film defined?
Whi h t i i l d d i th Whi h t i i l d d i th •• Which topics are included in the Which topics are included in the “Surface Technology”?“Surface Technology”?
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
The cleavage of a crystal:The cleavage of a crystal:creation of new surfaces
B k f th b d• Break of the bonds• Reconstruction of the surface atom
Prof. Dr. X. Jiang, 23.06.2008
Section perpendicular to the line of cleavage
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Surface reconstruction
The real crystal has broken (unoccupied) bonds on its surface which may lead
Surface reconstruction
to the surface reconstruction. (100) Si surface before reconstruction (rotated 4x4x2 and 6x6x2 lattices). White and blue balls show two FCC sublattices of Si. 2x1 reconstruction of (100) Si surface (RGBW colored and 6x6x2 lattices).
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Real surface topography of metalsReal surface topography of metals
(V) Contamination layer (IV) Adsorption layer(III) Reaction layer
(II) Deformations layer
(I) Volume ( )
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Scientific areas
Å to nm ► surface physics/chemistry/technique
nm to µm ► physics/chemistry/technique of thin films
Bulk material ► solid state physics/chemistry/technique
Bulk properties dominited
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
l f l iDevelopment of electronics1 00
1 0-2
1 0
V akuumelekt ron ik
1 0-4
1 0Fest körpere lekt ron ik
Mikroe lekt ron ik
1 0-6
Mikroe lekt ron ik
In t egrie rt eMikroe lekt ron ik
1 0-8
1 0-1 0
1 9 2 0 1 9 4 0 1 9 6 0 1 9 8 0 2 0 0 0 2 0 2 0 2 0 4 0
Moleku lare Elekt ron ik
Prof. Dr. X. Jiang, 23.06.2008
9 0 9 0 9 6 0 9 8 0 0 0 0 0 0 0 0
J ahr
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Introduction to Thin Film TechnologyIntroduction to Thin Film TechnologyIntroduction to Thin Film TechnologyIntroduction to Thin Film Technology• The course provides foundations in thin film deposition; emphases
the most used techniquesthe most used techniques.
• Modern thin film technology has evolved into a sophisticated set of techniques used to increase performance and aesthetic value of many products and make new functional systems and devices.
• There are following categories of thin film deposition
•• Physical vapor deposition (PVD)Physical vapor deposition (PVD)•• Physical vapor deposition (PVD)Physical vapor deposition (PVD)•• Chemical vapor deposition (CVD)Chemical vapor deposition (CVD)•• Chemical methodsChemical methods•• Electrochemical methodsElectrochemical methods
• Combinations of these methods gives a large number of deposition
Prof. Dr. X. Jiang, 23.06.2008
Combinations of these methods gives a large number of deposition techniques with unique impact on the thin film formation.
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Films and DepositionThin Films and DepositionThin Films and DepositionThin Films and Deposition
Thin filmsThin films• Monolayer - several micrometers• Thin film properties may be different from those of bulkThin film properties may be different from those of bulk • Quantum confinement effect: quantum and size surface/area ratio
effects– quantum dots
Thin Film DepositionThin Film Depositionpp•• Thin films can be deposited under nonThin films can be deposited under non--equilibrium conditionsequilibrium conditions• Solid - Melting -Vaporization- Condensation-Solidification • Vapor Reaction Condensation Solidification• Vapor - Reaction -Condensation-Solidification• Gas/vapor- Plasma- Reaction-Condensation-Solidification
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Application areas of thin films and surface engineering
ElectronicsFlexible Polymer Light Emitting Displays
Optical coatingsOptical coatingsAnti-reflex films for liens systems und umbrella glass
Supra-conductive filmsSQUIDSQUIDs
Magnetic filmsStorage & reading
Environment & energy techniquelow E window glass coating
Heat prevention & corrosion resistanceTurbine blade coating
Super hard coatingsWear resistance of machine parts and tools
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film ApplicationsVariety of tool coatings: DLC / TiC / TiN, graphitic i-C, TiAlN, etc
Thin Film ApplicationsThin Film Applications
DLC / TiC / TiN, graphitic i C, TiAlN, etc
DryCoat IncDryCoat Inc
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film ApplicationsThin Film ApplicationsThin Film Applications
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Optical functional films – Anti-reflex filmsOptical functional films – Anti-reflex films
⎛ ⎞ 2
R =n0 − n2
n0 + n2
⎛
⎝ ⎜ ⎞
⎠ ⎟
R = I fl / Ii
0 2⎝ ⎠
R = Irefl./ Iinc.n2=1,52 refraction index for glassn2 = 1,0 refraction index for vacuum> 8% light lost by reflection. The reflection will be reduced by coating a selected film (MgF ) of certain fraction index (n = 1 38) and thickness:(MgF2 ) of certain fraction index (n1 = 1,38) and thickness:
n1 = n0 • n2 t =λ
Prof. Dr. X. Jiang, 23.06.2008
n1 n0 n2 t4
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film ApplicationsThin Film ApplicationsThin Film Applications
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film ApplicationsThin Film ApplicationsThin Film Applications
PatinorPatinor
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film Applicationspppp
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Thin Film ApplicationsThin Film ApplicationsThin Film ApplicationsThin Film Applications
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Tools coated with a-C:H filma
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Fil f h h iFilms for the energy techniqueGlass
Oxide block layerOxide block layerAg layer
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
ResearchResearch
•• Fundamental Fundamental
•• Development of new materialsDevelopment of new materials•• Development of new materialsDevelopment of new materials•• Material behaviorMaterial behavior
•• AppliedApplied
•• Development of new products Development of new products devices and systemsdevices and systems
•• Enhancement of the product performanceEnhancement of the product performance•• Enhancement of the product performanceEnhancement of the product performance•• Increase of product value including Increase of product value including
aesthetic valueaesthetic value
Prof. Dr. X. Jiang, 23.06.2008
LOT Chair of Surfaceand MaterialsTechnology
Introduction to Thin Film Technology
Films and surface technology in Films and surface technology in the research
Quanten Hall-Effekt
Prof. Dr. X. Jiang, 23.06.2008
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