EQP Series High Sensitivity Mass and Energy Analysers for Monitoring,
Control and Characterisation of Ions, Neutrals and Radicals in Plasma
Plasma Sampling InterfaceXX Plasma is sampled via a laser drilled orifice available from 30 – 300 µm.
XX The orifice is specifically designed for plasma sampling, using pre-thinned material for the laser drilled component.
XX The ion extraction optics are software controlled and optimised for minimum plasma perturbation.
XX The optics are fully tuneable for optimum detection of +ve and –ve ions as well as electrons and radicals.
Integral Ionisation SourceXX The integral ioniser is fully software controllable offering precise control
of electron energy (0-150 eV) and thermionic emission (0.2-2000 µA).
XX Two oxide coated iridium filaments, with a radially symmetrical cage offering Electron Impact, Appearance Potential and Soft Ionisation modes for powerful characterisation of the neutral and radical species from the plasma.
XX A key feature of the EQP ionisation source is the confinement of the electrons in the source cage, allowing precise control for appearance potential measurements for the analysis of radical species and energetic neutrals.
XX Optionally, Electron Attachment Ionisation allows for the analysis of electronegative species from the plasma. This feature provides valuable information of radical species from electronegative plasmas.
Energy AnalyserXX The EQP analyser offers constant transmission at all energies with
minimum perturbation of the ion flight path.
XX The 45° electrostatic parallel plate energy analyser is used to provide minimum perturbation of the ion flight path within the analyser for optimum energy resolution.
XX Constant transmission for ion energy distribution functions throughout the ion energy range +/- 100 eV or +/- 1000 eV.
XX Software controlled Energy scan increments are from 0.05 eV, with a <0.25 eV FWHM energy resolution.
XX The EQP system can be floated to 10 keV with an external power supply and isolation components. EXAMPLE DATA SHOWING TYPICAL ENERGY SPECTRUM
EQP PLASMA SAMPLING INTERFACE
EQP IONISATION SOURCE
EQP 45° ENERGY SECTOR ANALYSER
Internal Ioniser
Ion Energy eV
Sem
C/S
The Hiden EQP Series - Mass and Energy Analysers for Plasma Diagnostics and Characterisation
Mass AnalyserXX A Hiden high performance triple filter mass spectrometer
is included with the EQP system.
XX Mass range options of 20, 50, 200, 300, 510, 1000, 2500 and 5000 amu are offered.
XX 6, 9 and 20 mm quadrupole diameters are offered for specialist plasma sampling applications.
XX The triple mass filter system comprises a main filter featuring RF and DC filtering, coupled with RF only pre and post filters. This technology minimises the effects from fringe fields at the primary mass filter entrance and exit, enhancing mass resolution and transmission. Triple filter technology allows high mass species such as clusters and metallic compounds used in plasma deposition to be analysed.
XX Abundance sensitivity is to 0.1 ppm and minimum detection of plasma species is 20 ppb.
XX Mass filter rods are precision machined from molybdenum with radially supported precision ceramics.
DetectorXX A digital ion counting detector is included as standard with
7-decade continuous dynamic range. Counting is via a 32-bit counter for 1 c/s resolution.
XX A Faraday Cup option extends the range up to 5 x 1010 c/s for high density plasma applications.
XX The EQP MASsoft Professional software provides data acquisition as raw counts, counts per second or integrated counts. Averaging or accumulating counts over repeated mass and energy scans significantly increases the signal to noise ratio in the analysis of minor components.
XX A TTL output of raw counts is available via an external connector on the EQP electronics system.
XX Signal gating with 100 ns time resolution for energy & mass distributions.
XX Optional integrated Multi-Channel Scalar (MCS) device offers 50 ns time resolution for transient event analysis such as HiPIMS, plasma ignition/modulation/extinction experiments and ion flight time measurements.
SE
M: c
/s C+ at ~20PPB
100PPB
100
90
80
70
60
50
40
30
20
10
07 8 9 10 11 12 13 14 15 16 17
mass : amu
SE
M: c
/s
1.6e+08
1.4e+08
1.2e+08
1e+08
8e+07
6e+07
4e+07
2e+07
035 36 37 38 36 40 41 42 43 44 45
mass : amu
EQP ABUNDANCE SENSITIVITY - Typical Ar+ and ArH+ mass resolved spectrum
Turbo molecular pump port
45˚ Sector field energy analyser
Triple filter quadrupole mass analyser
Ion counting detector
Ion flight tube to provide plasma sampling insertion from 240 mm up to 750 mm
The Hiden EQP Series - Mass and Energy Analysers for Plasma Diagnostics and Characterisation
EQP-6 3F MASS ANALYSER
EQP SENSITIVITY - 20 ppb detection of C+ ions from CF4 plasma
SE
M: c
/s C+ at ~20PPB
100PPB
100
90
80
70
60
50
40
30
20
10
07 8 9 10 11 12 13 14 15 16 17
mass : amu
SE
M: c
/s
1.6e+08
1.4e+08
1.2e+08
1e+08
8e+07
6e+07
4e+07
2e+07
035 36 37 38 36 40 41 42 43 44 45
mass : amu
SE
M: c
/s
90000
70000
80000
60000
50000
40000
30000
20000
10000
08.5 8.7 8.9 9.1 9.3 9.5 9.7 9.9 10.1 10.3 10.5
energy eV
FWHM 0.24ev
EQP ENERGY RESOLUTION
Hiden EQP Plasma diagnostics Systems
The Hiden EQP System is an advanced plasma diagnostic tool with combined high transmission ion energy analyser and quadrupole mass spectrometer, acquiring both mass spectra at specified ion energies and ion energy distributions of selected plasma ions. The advanced EQP ioniser provides for neutral and radical detection, the electron attachment ionisation feature further enhancing the detection capability for radicals in electronegative plasma chemistries.
XX High Sensitivity Sub ppm detection of plasma ions, neutrals and radicals.
XX Ion Energy Analysis Ion Energy distributions of plasma ions are acquired in seconds, 100 eV and 1000 eV energy range versions are available.
XX HiPIMS, Afterglow, Pulsed and Laser Ablation A standard TTL signal gating input is included for time resolved studies. The programmable signal gating option provides for automatic data acquisition for defined time slices through the plasma pulse. Gating resolution is 100 ns.
XX Optional innovative Multi-Channel Scalar (MCS) device integrated into controller firmware and MASsoft Professional software.
XX 6000-bin multichannel scalar resolution offering 50 ns time resolution with data intuitive to obtain and can be manipulated in external programmes such as Excel and Origin.
XX Positive and Negative Ion Measurement Pre-set software modes enable automatic switching between positive ion, negative ion and neutral analysis modes.
XX Neutral and Radical Detection The EQP integral electron impact ioniser provides for analysis of neutral and radical species.
XX Electron Attachment Ionisation This technique of soft ionisation offered as an option for the analysis of electronegative species in plasma, further enhances the analysis of neutrals and radicals.
XX Appearance Potential Spectra The EQP ioniser features precision control of all ion source parameters, including the facility to accurately scan electron energy for appearance potential spectra of selected species. The appearance potential spectra provide direct information to confirm the fragmentation and excitation state of plasma neutral species.
ION ENERGY DISTRIBUTIONS of selected +ve and -ve ions
MASS SPECTRA at selected ion energies for +ve ions, -ve ions and neutrals.
electron-energy: V
10000
9000
8000
7000
6000
5000
4000
3000
2000
1000
10 10.5 11 11.5 12 12.51 3 13.51 4 14.51 50
SE
M:
c/s
400 W plasmametastable O2
excited state a1Δg
no plasmaground state O2
-
X3 Σ-g
APPEARANCE POTENTIAL SPECTRA for identification of radical species from parent stable molecules.
EQP OPERATING MODES
ELECTRON ATTACHMENT IONISATION scans to identify radical species produced in the plasma from electronegative gases.
00
500000
1e+06
1.5e+06
2.5e+06
3e+06
3.5e+06
2e+06
10 20 30 40 50 60 70 80 90 100
SE
M:
c/s
Ar+ IED Inductively Coupled Plasma Source 3x10-2 mbar 100W
electron-energy: V
mass : amu
0 1 2 3 4 5 6 7 8 9 10 11 120
500
3500
2500
3000
2000
1500
1000
SE
M:
c/s
CF3- Ions By Attachment by in CF4
Appearance Potential of O2+ from CO2
Plasma On
Plasma Off
electron-energy: V
100000
1e+06
10000
1000
100
10
010 20 30 40 50
SE
M:
c/s
Replace‘MassSpectra’withthisone:
ReplaceElectronAttachmentionisationwiththisone:
0
1000
2000
3000
4000
5000
6000
0 1 2 3 4 5 6 7 8 9 10 11 12 13
SEM
: c/s
Plasma Off
Plasma On
Ti+
N+
Ti2+
Ar+
XX Parallel-plate Argon plasma driven by a 20 kHz AC supply.
XX MCS device used to collect mass resolved ion energy distributions for Ar+ plasma at 200 ns intervals.
XX Data shows ignition and decay of features in the ion energy spectra that are not possible to obtain with time averaged data.
Example EQP Data
Ion Energy Distributions in dual frequency RF PlasmasIon energy distributions (IEDs) for both positive and negative ions have been measured, using a mass/energy spectrometer system, for two plasma reactors which can be operated using a combination of two RF power sources. One reactor uses capacitively-coupled inputs and the other includes an inductively-coupled input. Typical data for 2.26, 13.56 and 27.1 MHz inputs are presented for a range of phase relationships. The IEDs clearly show significant differences between the data for different species of ions. The differences result, in part, from the ion-molecule collisions occurring particularly in the plasma/surface sheath regions.
IEDs for argon plasma at 2.5x10-2 mbar with 13.56 and 27.12 MHz for phase differences 0° to 180°.
IEDs for N+ ions in nitrogen plasma at 6x10-2 mbar for mixed 2.26 and 13.56 MHz signals for selected phase differences.
IEDs for O- ions from a nitrous oxide plasma at selected phase differences.
0
2000
4000
6000
8000
10000
12000
Ar+ ion energies. 6x10-2 mbar 20 kHz plasma.
0 eV
20 eV
Time Resolved Ar+ Ion Energy Distributions in RF Plasma
Example EQP Data
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2 atmosphere as used to deposit the CrN/NbN nanolayer coating.
Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
MAGNETRON SPUTTERING – POSITIVE AND NEGATIVE ION MASS SPECTRA
HIPIMS AND CONVENTIONAL SPUTTERING COMPARED – MASS AND ENERGY SPECTRA
EQP Operating Modes
plas
ma
diag
nost
ics
gas
anal
ysis
vacu
uman
alys
is
surfa
cesc
ienc
e
Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +veand -ve ions.
• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification ofradical species from parent stable molecules.
10000900080007000600050004000300020001000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SE
M: c
/s
400 W plasmametastable O2
excited state a1∆g
no plasmaground state O2-
X3 Σ-g
• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.
• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.
• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.
• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.
• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.
• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.
• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.
• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518
Email: [email protected]
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+
Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+ Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).
Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)
100
2000
0120 140 160
mass : amu
SE
M: c
/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210 150
1000
0170 190 210
mass : amu
SE
M: c
/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+ IEDInductively CoupledPlasma Source25mT 100W
SE
M: c
/s
energy: VCycle number 0000001
00
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SE
M: c
/s
00
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
EQP Operating Modes
plas
ma
diag
nost
ics
gas
anal
ysis
vacu
uman
alys
is
surfa
cesc
ienc
e
Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +veand -ve ions.
• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification ofradical species from parent stable molecules.
10000900080007000600050004000300020001000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SE
M: c
/s
400 W plasmametastable O2
excited state a1∆g
no plasmaground state O2-
X3 Σ-g
• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.
• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.
• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.
• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.
• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.
• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.
• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.
• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518
Email: [email protected]
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+
Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+ Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).
Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)
100
2000
0120 140 160
mass : amu
SE
M: c
/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210 150
1000
0170 190 210
mass : amu
SE
M: c
/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+ IEDInductively CoupledPlasma Source25mT 100W
SE
M: c
/s
energy: VCycle number 0000001
00
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SE
M: c
/s
00
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
EQP Operating Modes
plas
ma
diag
nost
ics
gas
anal
ysis
vacu
uman
alys
is
surfa
cesc
ienc
e
Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +veand -ve ions.
• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification ofradical species from parent stable molecules.
10000900080007000600050004000300020001000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SE
M: c
/s
400 W plasmametastable O2
excited state a1∆g
no plasmaground state O2-
X3 Σ-g
• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.
• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.
• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.
• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.
• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.
• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.
• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.
• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518
Email: [email protected]
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+
Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+ Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).
Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)
100
2000
0120 140 160
mass : amu
SE
M: c
/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210 150
1000
0170 190 210
mass : amu
SE
M: c
/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+ IEDInductively CoupledPlasma Source25mT 100W
SE
M: c
/s
energy: VCycle number 0000001
00
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SE
M: c
/s
00
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
EQP Operating Modes
plas
ma
diag
nost
ics
gas
anal
ysis
vacu
uman
alys
is
surfa
cesc
ienc
e
Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +veand -ve ions.
• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification ofradical species from parent stable molecules.
10000900080007000600050004000300020001000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SE
M: c
/s
400 W plasmametastable O2
excited state a1∆g
no plasmaground state O2-
X3 Σ-g
• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.
• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.
• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.
• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.
• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.
• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.
• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.
• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518
Email: [email protected]
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+
Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
Cou
ntra
te, c
s-1
Flux
, (x1
06
coun
ts-1
)
Ar+ Cr1+
N2+
N+
Cr2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0 10 20 30 40 50 60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).
Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)
100
2000
0120 140 160
mass : amu
SE
M: c
/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210 150
1000
0170 190 210
mass : amuS
EM
: c/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+ IEDInductively CoupledPlasma Source25mT 100W
SE
M: c
/s
energy: VCycle number 0000001
00
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SE
M: c
/s
00
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
POSITIVE IONS Molybdenum Cathode. Sulphur Hexafluoride Gas. Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.
NEGATIVE IONS Molybdenum Cathode. Sulphur Hexafluoride Gas. Mass spectrum 140 to 220 amu, showing SF6
-, MoF5- and MoF6
- Ions.
EQP System Configurations
Plasma Applications
System OptionsThe EQP system can be configured with a wide range of customised options to suit many plasma conditions. These include:
Option Part No.1000 eV energy range 620100
Dual Faraday/ Electron Multiplier Detector 443020
Extended Flight Tube 321 or 400 mm 620200
Extended Flight Tube to 750 mm 620400
Magnetic Shielding to 800 Gauss 610201
Magnetic Shielding to 500 Gauss 610211
Electron Attachment Ionisation 610320
DC Driven Electrode 44 mm diameter 618010
RF/DC Driven Electrode 150 mm diameter 618020
Water Cooled RF/DC Electrode 84 mm diameter 618030
4.5” UHV Gate Valve 202350
Z-drive 4” Stroke – Manual 202500
Z-drive 12” Stroke – Motorised 202900
Front End Shutter 610440
RIV60 Re-Entrant Isolation Valve 610450
PC Computer with MASsoft Professional Software Pre-Installed 800624
Windows NIST MS Database 800500
0-10 volt 8 Channel Analogue Output Card 304908
Penning Gauge and Controller incl. Vacuum Interlock for System Protection 303805
Programmable Signal Gating with Foreground and Background Delay Timers 110600
Multi-Channel Scalar (MCS) Mode for 50 ns Time Resolution 800404
HPR-60 Molecular Beam Sampling Option for Atmospheric Plasma Sampling 303065
EQP systems are offered with a range of standard plasma sampling options to provide non-invasive sampling of a broad range of plasma applications including:
XX HiPIMS
XX ECR – Electron Cyclotron Discharge
XX Magnetron Discharge
XX Helicon Source
XX DC Glow Discharge Plasma
XX Pulsed Plasma & Laser Ablation
XX Parallel Plate – RF Plasma
XX ICP – Inductively Coupled Plasma
EQP Mass Spectrometer RangeEQP-6 6 mm quadrupole rod diameter - Mass range options 300 and 510 amu
EQP-9 9 mm quadrupole rod diameter - Mass range options 50, 300, 510, 1000, 2500 and 5000 amu
EQP-20 20 mm quadrupole rod diameter - Zone H Mass range 20 amu - Zone 1 Mass range 200 amu
Plasma Pressure OptionsXX Up to 0.5 mbar – Differential pumping with a 60 l/s
turbomolecular pump
XX Up to 2 mbar – Differential pumping with a 240 l/s turbomolecular pump
XX > 2 mbar - EQP system is upgradeable to the multi stage HPR-60 molecular beam sampling system
EQP SYSTEM in plasma PLASMA NEEDLE - atmospheric plasma - analysis with EQP/HPR-60 molecular beam sampling system.
Hiden Analytical Ltd.420 Europa BoulevardWarrington WA5 7UN England
T +44 [0] 1925 445 225 F +44 [0] 1925 416 518 E [email protected] W www.HidenAnalytical.com
Hiden’s quadrupole mass spectrometer systems address a broad application range in:
GAS ANALYSIS
dynamic measurement of reaction gas streamscatalysis and thermal analysismolecular beam studiesdissolved species probesfermentation, environmental and ecological studies
SURFACE ANALYSIS
UHV TPDSIMSend point detection in ion beam etchelemental imaging – 3D mapping
PLASMA DIAGNOSTICS
plasma source characterisationetch and deposition process reaction kinetic studiesanalysis of neutral and radical species
VACUUM ANALYSIS
partial pressure measurement and control of process gasesreactive sputter process controlvacuum diagnosticsvacuum coating process monitoring
TDS 172/2
Sales Offices:We have sales offices situated around the globe. Visit our website for further information.
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