Transparent conducting Al:ZnO thin films on large area by efficient cylindrical
rotating DC magnetron sputtering
Sanjay R. Dhage and Amol C. Badgujar
Centre for Solar Energy Materials, International Advanced Research Centre for Powder
Metallurgy and New Materials (ARCI), PO Balapur, Hyderabad 500005. India.
Supplementary Data
Figure S1. Schematic of (a) planer target and (b) Cylindrical roatating target magnetron sputtering systems
Lattice micro strain in AZO thin films is calculated based on XRD data using following equation
ϵ=βcosθ ∕ 4
Whereϵ is strain and β is FWHM while θ is Braggs angle.
Figure S2. Variation of deposition rate and strain in AZO thin films with sputtering power and power density
Figure S3. FESEM surface morphology of AZO thin films obtained for various sputter process conditions (Scale bar = 500nm)
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