0.5-kW PICOSECOND THIN-DISK LASER SYSTEM FOR PRE-PULSING IN HIGH-POWER EUV SOURCES
INTRODUCTIONHigh-average-power picosecond solid-state lasers are an important part of the extreme
ultraviolet (EUV) lithography technology using laser-produced plasma (LPP). They allow
increasing the conversion efficiency from laser to 13.5-nm EUV emission multiple times
by conditioning the droplet target with a picosecond pre-pulse into a uniform mist form
before it is hit by the main CO2 laser pulse. This poster presents a half-kilowatt high-
repetition-rate picosecond laser system PERLA C developed at the HiLASE Center in
Czechia, which has parameters relevant to LPP-EUV lithography.
The PERLA C laser system is based on an Yb:YAG thin-disk regenerative amplifier with
single thin disk in a ring cavity. The main amplifier is compact, highly efficient (43%
extraction efficiency) and capable of a reliable long-term operation. The laser system can
currently produce 5.5-mJ pulses at 100 kHz repetition rate (503 W average output power)
or 9-mJ pulse energy at 50 kHz repetition rate.
PRE-PULSER FOR EUVL
CONCLUSION AKNOWLEDGEMENTS
This work was co-financed by the European
Regional Development Fund, by the state
budget of the Czech Republic, and by the
Ministry of Education, Youth and Sports of the
Czech Republic
project HiLASE CoE, Grant No.
CZ.02.1.01/0.0/0.0/15_006/0000674
Programs NPU I – Project No. LO1602
Large Research Infrastructure – Project No.
LM2015086
Jiří Mužík*, Martin Smrž, Michał Chyła, Ondřej Novák, Akira Endo, Tomáš Mocek
HiLASE Centre, Institute of Physics CAS, Za Radnicí 828, 252 41 Dolní Břežany, Czechia
*Email: [email protected], phone: +420 314 0077 53, web: www.hilase.cz/en
PERLA C LAYOUT MAIN AMPLIFIER 37-MHz GO Pico
laser oscillator
(HiLASE-made)
CFBG stretcher with
temperature-controlled
dispersion
Yb-fiber front-end
nJ-to-mJ-level thin-disk
regenerative
preamplifier
Main thin-disk amplifier
CVBG pulse
compressor
HARMONICS GENERATIONLASER OUTPUT
500-W, 92-kHz (5.5 mJ) regenerative amplifier
6.5 m long ring cavity, compact 1.2×0.8 m2 setup
High efficiency (opt. efficiency >43%)
Good beam quality (M2 ≈ 1.4)
0 10 20 30 40 50 60 70 80 90 1000
5
10
15
20
25
Second harmonic (W)
Fourt
h h
arm
onic
(W
)
pulse duration ~10 ps
92 kHz
CLBO 6x6x6 mm (150 °C)
5-9-2018
0
5
10
15
20
25
30
35
40
Effic
iency (
%)
Frequency conversion to 2nd (515 nm), 3rd (343 nm),
4th (258 nm) and 5th harmonics (206 nm)
Currently up to 80W @515nm and 21W @258nm
Deep UV suitable for LPP EUVL
much lower ablation threshold than at 1 µm
1.4 psduration
Maximum compressed
power 216 W from incident
269 W (80% compr. eff.)
limited by the CVBG pulse
compressor
Pulse duration < 2 ps
Compressed beam quality
deteriorated at high power
due to CVBG
Surface-grating compressor
with >90% compression eff.
in preparation (for power
over 450 W)
Output Spectrum Autocorrelation & Profile Conversion from
2nd to 4th harmonics
Ar-filled box for λ-conversionSHG
Output vs. Seed vs. Pump Power
BW 1.6 nm
Picosecond pre-pulsing essential for HVM with EUVL
increased conversion efficiency, EUV power scaling,
and better optics lifetime
100-kHz, mJ-level picosecond laser with good beam
quality is ideal for pre-pulsing EUV light source
CO2-EUV Conversion Eff. Ionization Rate
EUV Light Source Schematics
Images by Gigaphoton Inc.
Thin-disk laser system PERLA C was presented
High power (500 W), high repetition rate (≈100 kHz), 1-2 ps pulse duration
Ideal pre-pulse platform for Sn LPP EUV light source
Pump lasers for wavelength conversion to DUV, UV, VIS, and MIR
Development of robust, commercially available laser systems based on
current prototypes
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