X-ray Photoelectron Spectroscopy for Chemical Analysis · the field of X-ray spectroscopy.”...
Transcript of X-ray Photoelectron Spectroscopy for Chemical Analysis · the field of X-ray spectroscopy.”...
X-ray Photoelectron Spectroscopy
for Chemical Analysis J. ANIBAL BOSCOBOINIK
MSAE E8235x: Selected Topics In Materials Science. Columbia University, Oct 14th 2015
Ambient Pressure X-ray Photoelectron Spectroscopy (AP-XPS) endstation at NSLS-II
Photon Energy: 250 eV to 2000 eV Pressures up to 5 Torr.
Temperatures up to 900 C Capillary tube into Mass Spec.
AP-XPS End Station
BS Chemistry San Luis
PhD Chemistry Wisconsin
PostDoc Chemical Physics Berlin
Materials Scientist New York
Who is this guy?
Columbia University, Oct 14th 2015. Anibal Boscoboinik - CFN, Brookhaven Lab
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Anibal Boscoboinik - CFN, Brookhaven Lab
Our Playground
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What will you learn today?
• X-ray Photoelectron Spectroscopy (XPS)
• Ambient Pressure XPS.
• What you can do with it.
• Some examples.
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X-ray Photoelectron Spectroscopy
• Background
Photoelectric Effect
The photoelectric effect is the observation that many metals emit electrons when light shines upon them. (Hertz 1887)
𝑬 = 𝒉𝒗 In 1905 Albert Einstein published a paper that explained experimental data from the photoelectric effect as being the result of light energy being carried in discrete quantized packets (Photon). Nobel Prize 1921.
• The energy of the light must exceed certain value for emission of electrons to occur.
• The intensity of the light doesn’t affect the energy of the electrons, but it affects the number of emitted electrons
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ℎ𝑣 = 𝐵𝐸 + 𝐾𝐸
KE
Structure on an atom
• A photon (E=ℎ𝑣) is absorbed by an electron
• The electron is emitted from the atom with certain KE
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Periodicity Table, binding Energies
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X-ray Photoelectron Spectroscopy
• Background • Principles
• Karl Manne Georg Siegbahn. Nobel Prize in Physics in 1924 "for his discoveries and research in the field of X-ray spectroscopy.”
• Kai Manne Börje Siegbahn. Nobel Prize in Physics in 1981 “for developing the method of Electron Spectroscopy for Chemical Analysis (ESCA), now usually described as X-ray photoelectron spectroscopy (XPS)”
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ℎ𝑣 = 𝐵𝐸 + 𝐾𝐸
KE
Photon (X-ray) Source
Electron Energy
Detector
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Vacuum Level
Work Function Φ
Valence Band
1s
2s
2p
3s
3p
3d
K
L1
L2,3
M, etc
Emitted Photoelectron
Kinetic Energy (KE) X-ray
hv
X-ray Photoelectron Spectroscopy (XPS)
Courtesy of O. Furlong (UNSL) Columbia University, Oct 14th 2015. Anibal
Boscoboinik - CFN, Brookhaven Lab 14
ℎ𝑣 = 𝐵𝐸 + 𝐾𝐸
ℎ𝑣 = 𝐵𝐸 + 𝐾𝐸
KE Lab X-ray source
Synchrotron
Electron Analyzer
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Why is XPS surface sensitive?
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Electron Escape Depth
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ℎ𝑣 = 𝐵𝐸 + 𝐾𝐸
KE Lab X-ray source
Synchrotron
Electron Analyzer
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1s binding energies for these elements: B, C, O, Be, F, Li, N
1 2
3
4
5
6 7
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1s binding energies for these elements: B, C, O, Be, F, Li, N
1 2
3
4
5
6 7
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Aluminum Plate
O 1s
C 1s
Al 2s Al 2p
O 2s
O Auger
William Durrer, Ph.D. Department of Physics at the Univertsity of Texas at El Paso
N(E)
Binding Energy (eV)
XPS Survey EV/Step: 1 eV, Time/Step: 50 mSec, Sweeps: 10 Source: Mg K, Pass Energy: 100 eV
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Metallic Aluminum
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Metallic Aluminum What happens if we oxidize it?
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4.3 eV 2.1 eV
Oxidation State
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How can you determine the oxide thickness?
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Al - F
Al - O
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Al - F
Al - O
Chemical Shift
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XPS tells you
• What elements you have
• How much you have of each of them
• Their oxidation state
• Their coordination to other elements
• How deep they are from the surface
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Some fact about XPS
• Surface sensitive
• Traditionally carried out in UHV
• Many relevant systems require higher pressures.
–Catalysis
– Environmental and Atmospheric Chemistry
Ambient Pressure XPS
Elevated Pressures
• Developing tools at BNL
1. Ambient Pressure Photoelectron Spectroscopy (AP-PES)
• AP-XPS & AP-NEXAFS
2. Polarization-Modulation Infrared Reflection Absorption Spectroscopy (PM-IRAS)
3. Reactor-Scanning Tunneling Microscopy (r-STM)
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Ambient Pressure X-ray Photoelectron Spectroscopy (AP-XPS) endstation at NSLS-II
Pressures up to 5 Torr. Capillary tube into Mass Spec.
AP-XPS End Station
Starr, Tenney, Boscoboinik
AP-XPS
D. E. Starr, Z. Liu, M. Hävecker, A. Knop-Gericke, H. Bluhm. Chem. Soc. Rev., 2013,42, 5833-5857
> > > >
UHV
AP
• Differential Pumping • Refocussing Lenses
d z > d
Importance of a tightly focused beam
Cone
Sample
The smaller z, the higher P0
What can we use this for?
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Catalyst Model System Simplified version of a commercial catalyst
– allows to disentangle different factors that can potentially affect the chemical reaction.
– used for surface science mechanistic studies
There is a vast set of surface science tools to study model systems:
– Scanning Tunneling Microscopy
– X-ray Photoelectron Spectroscopy
– Etc.
Bäumer et al. Phys. Chem. Chem. Phys. 2007, 9, 3541-58
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CO adsorption and dissociation on Ru(0001) at elevated pressures. David E. Starr , Hendrik Bluhm
Surface Science Volume 608, 2013, Pages 241–248
Example using AP-XPS
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A-top Bridge
Three-fold
Adsorption site on triangular surface
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Ru(0001)
Ru(0001)
23 L of CO at 300 K
Photoionization Cross Sections. https://vuo.elettra.eu/services/elements/WebElements.html
C:Ru 3d5/2 ratio (0.088) from the spectrum correlated to known coverage of 0.66 ML
hn = 390 eV hn = 638 eV
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300 K
UHV
10-6 Torr
CO pressure
10-4 Torr
0.02 Torr
0.5 Torr
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Ambient Pressure X-ray Photoelectron Spectroscopy (AP-XPS) endstation at NSLS-II
• Photon Energy: 250 eV to 2000 eV • Pressures up to 5 Torr. • Temperatures up to 900 C • Capillary tube into Mass Spec.
• We can dose elevated pressures of
gases or liquid vapors. • (only non-corrosive)
Sample goes here ( up to ~ 1 cm)
Aluminosilicate Protective Layer
p(O2) = 1 × 10-4 mbar.
850x103
800
750
700
650
600
550
500
450
400
350
300
250
200
150
100
50
CP
S
290 288 286 284 282 280 278 276
Binding Energy (eV)
CPS_20131122_01_002_Ru3d_nor AlSiO_670eV_after_annealing_770C 670(eV) 584.86(eV) 257.2(mA) CPS_20131122_01_031_Ru3d_nor AlSiO_670eV_pO2_1E-4_650c 670(eV) 584.86(eV) 239.9(mA) CPS_20131118_02_009_Ru3d_nor CPS_20131118_02_041_Ru3d_nor
68x103
64
60
56
52
48
44
40
36
32
28
24
20
CP
S
535.0 532.5 530.0 527.5 525.0
Binding Energy (eV)
CPS_20131122_01_004_O1s_nor AlSiO_670eV_after_annealing_770C 670(eV) 584.86(eV) 256.1(mA) CPS_20131122_01_032_O1s_nor CPS_20131118_02_043_O1s_nor wave0
300 K 923 K
Ru 3d O 1s R
u(0
00
1)
Al 0
.2Si
0.8
O2/R
u(0
00
1)
300 K 873 K
T-O-T
O-Ru
O-Ru Ru-CO
Ru0
RuOx
RuOx
Exposure to elevated pressures of O2
Ru 3d O 1s
pO2 = 1 × 10-4 Torr
Emmez et al. Surf. Sci. 2015, In press.
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Aluminosilicate Protective Layer
p(O2) = 1 × 10-4 mbar.
850x103
800
750
700
650
600
550
500
450
400
350
300
250
200
150
100
50
CP
S
290 288 286 284 282 280 278 276
Binding Energy (eV)
CPS_20131122_01_002_Ru3d_nor AlSiO_670eV_after_annealing_770C 670(eV) 584.86(eV) 257.2(mA) CPS_20131122_01_031_Ru3d_nor AlSiO_670eV_pO2_1E-4_650c 670(eV) 584.86(eV) 239.9(mA) CPS_20131118_02_009_Ru3d_nor CPS_20131118_02_041_Ru3d_nor
68x103
64
60
56
52
48
44
40
36
32
28
24
20
CP
S
535.0 532.5 530.0 527.5 525.0
Binding Energy (eV)
CPS_20131122_01_004_O1s_nor AlSiO_670eV_after_annealing_770C 670(eV) 584.86(eV) 256.1(mA) CPS_20131122_01_032_O1s_nor CPS_20131118_02_043_O1s_nor wave0
300 K 923 K
Ru 3d O 1s R
u(0
00
1)
Al 0
.2Si
0.8
O2/R
u(0
00
1)
300 K 873 K
T-O-T
O-Ru
O-Ru Ru-CO
Ru0
RuOx
RuOx
Emmez et al. Surf. Sci. 2015, In press.
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Useful Resources
Dynamic Periodic Table
• http://www.ptable.com/#Orbital
Useful XPS pages
• http://www.xpsfitting.com/
• http://srdata.nist.gov/xps/Default.aspx
• http://xpssimplified.com/
• https://vuo.elettra.eu/services/elements/WebElements.html
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