Wolfang Peukert at BASF Science Symposium 2015
Transcript of Wolfang Peukert at BASF Science Symposium 2015
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Particle design and formulation for hierarchical materials
Wolfgang PeukertInstitute of Particle Technology
Cluster of Excellence – Engineering of Advanced Materialswww.lfg.fau.de, www.eam.fau.de
150 years BASFSmart energy for a sustainable future
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Outline
Concepts of product design and materials assembly
Towards rigorous mathematical optimization
Particle Formation
• Modelling of gas phase synthesis
• Optimization of time – temperature profiles
• Modelling of quantum dot synthesis
• FIMOR: a fully implicit method for Ostwaldt ripening
Aspects of formulation science and technology
Hierarchies: self-assembly and thin films
Conclusions
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Structure – property functions across all levels:Molecular, particulate, particle ensemble, final product
Product design
Process – structure functionsProcess design and process variables determine structure formation ofmolecules, particles, particle ensembles and final product.
Process chain, e.g. for semiconductor formation/application
SynthesisPhase A
Phase transferPhase B Formulation Thin film
High surface area &low pressure drop & catalytic
Transparent & smooth & very strong
Free flowing & easily dispersible& controlled defect state
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Property functions
Property function = f (dispersity, composition)Dispersity: Size, shape, structure, surface
Functional properties of interest:• Mechanical - Young‘s modulus, strength …• Thermodynamic – solubility …• Opto-electronic – permittivity, band gap… • Particle interactions – vdW, charge …
Dry coating
Shape & surface optimization ofpolymer powders for 3D printing
Schmidt et al, Powder Technology 2014 Mehringer et al, Nanoscale 2015
Bandgap of quantum dots (PbS)
Segets et al, ACS Nano 2012
Si@Ge alloys
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Natural Engineering Process Science Fundamentals Technology
0.1 nm 1 nm 10 nm 0.1 µm 1 µm 10 µm 0.1 mm 1 mm 1 cm 0.1 m 1 m
From building blocks to functional devices
Building blocks
200 n
Super-structures
Application
Functional devices
DemonstratorsPrinted transistorsSolar cellsMetamaterialsNew catalystsLightweight components
Semiconducting film
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Enabling technologies
Unifying concepts of product design
Modelling &Simulation
Top-downBottom-up
IntermolecularInterparticulatePhase behaviour
Transport phenomenaSelf-organization
Off-lineOn-lineIn-line
MultiscaleQuantum mechanicsDiscrete elementsContinuum
Particleformation Interactions Structure
formationCharacter-
ization
Hierarchical structure in mesocrystals
200nm 20nm 5nm
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Property
Structure
ProcessOptimized!
Validated models (process, structure) integrated in a unified optimization framework
Numerical optimization based on predictive models
Can we optimize properties and processes based on predictive modeling?
Not optimized!PropertyStructureProcessDefine processvariables
Define properties
process optimization structural optimization
e.g. cooling rate,RTD-temperature profile
LSTM
Klupp Taylor et al, Advanced Materials 2011
Optical properties
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Optimization paradigms
Repeat until done: trial and error approachno improvement guaranteed, no estimates
Stopping criteria: systematic search, no gradientstypically many iterations, no estimates
com
plex
ity
T&E
SciCo
In cooperation with G. Leugering (Erlangen)
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FilterSample
Ar, H2, SiH4
GeH4
T = 500°C - 1000°C
Ar quench
N2 quenchPump
T = 900° - 1200°C
Gas phase synthesis of Si@Ge
Objective: Ultrapure semiconductors (Si, Ge)Two-stage hot wall reactor set-up
Patchy particlesSi@Ge
„Monodisperse“SiNPs, σ > 1.04
Körmer et al J. Aerosol Sci 2010, Crystal Growth & Design 2012Mehringer et al, J. Aerosol Sci. 2014, Nanoscale 2015
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Particle formation dynamics
Modelling approach for Si NP formation from silane decomposition:
Simplified global gas phase kinetics of decomposition of silane
Homogeneous nucleation of silicon
Growth by global surface reaction of silane with Si NPs
Condensation of free monomers
No need to include agglomeration and sintering due to low particle concentration
( ) ( ) ( ) ( )( ) ( ) ( )x,nDx,nBx
xnxGxfBtxn
aggaggK −+∂
⋅∂−⋅=
∂∂
Population balance approach (simplest case - Si NP formation):
Körmer et al. J. Aerosol Sci. 2010, Gröschel et al, Chem. Eng. Sci. 2012
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Comparison of measured and simulated PSDs
Experimental validation
Optimization step 1:Optimized parameter set for unknown gas phase reaction kinetics for one base case(F1 and F2)
Körmer et al. J. Aerosol Sci. 2010, Gröschel et al, Chem. Eng. Sci. 2012
Size range: 10 – 50 nmT: 900 – 1100 °CIn-situ doping andfunctionalization
Narrow size distributionby separation ofnucleation and growthsimilar to colloid synthesis
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Optimization result (exemplary)
time
[s]
particle diameter [nm]
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Optimal control aiming at of PSD
Narrow PSD Wide PSD
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Quantum dots: particles with quantum confinement (x < 10 nm)
Many synthetic protocols for tailoring of• size, shape and surface properties by• hot injection method but• mostly empirical approaches
Properties: electronic, optical, catalytic, biological …
Objectives:Develop colloidal process engineering including• understanding of formation mechanisms• stabilization and chemical modification• purification and classification• process modelling• continuous scalable production• modelling of formation dynamics• integration into devices
Towards knowledge-based design and production
Quantum dots
Hot injection method
Source: Talapin group
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ZnO QD formation & characterization
0 2 4 6 8 10 120
0.5
1
1.5
2
2.5
particle size [nm]volu
me
dens
ity d
istri
butio
n [n
m-1
]
final PSD: TEMfinal PSD: model10 min20 min50 min100 min240 minfinal PSD: DLS
260 280 300 320 340 360 3800
0.2
0.4
0.6
0.8
wavelength [nm]
abso
rban
ce [-
]
10 min20 min50 min100 min240 min890 min correct construction
of PSDin situUV/Vis
Zn4O(Ac)6 + 6LiOH 4ZnO + 6Li+ + 6Ac-+ 3H2O
Segets et al., J. Phys. Chem. C, 2009
Segets et al., ACS Nano 2009
Evaluation of bimodal absorbance spectra by mixing small and large particles
correct constructionof PSD
small size fractionlarge size fraction
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Simulation of Ostwald ripening: challenges due to stiff system behavior
Population Balance Equations (PBE) of Ostwald ripening are challenging
𝑅𝑅 𝑥𝑥, 𝑡𝑡, 𝑐𝑐 = 𝑓𝑓𝑐𝑐 𝑡𝑡𝑐𝑐𝐿𝐿∞
= 𝑓𝑓 𝑒𝑒𝑥𝑥𝑒𝑒4 � 𝛾𝛾 � 𝑉𝑉𝑚𝑚
𝜐𝜐 � 𝑥𝑥 � 𝑘𝑘𝐵𝐵 � 𝑇𝑇≈ 𝑓𝑓 1 +
4 � 𝛾𝛾 � 𝑉𝑉𝑚𝑚𝜈𝜈 � 𝑥𝑥 � 𝑘𝑘𝐵𝐵 � 𝑇𝑇
large gradients around the equilibrium particle size ripening rate and thus the solid concentration exceeds several orders of
magnitude when particle size changes by a few pm discretized system behaviour is extremely stiff
Fully Implicit Method for simulating Ostwald Ripening(developed by M. Gröschel and G. Leugering from Applied Mathematics, FAU)
0 2 4 6 8 102
4
6
8
Process time / h
x 1,3 /
nm
Exp. dataTaylorFIMOR
20 °C
40 °C
0 0.5 1 1.5 2
10-2
100
process time / h
ripen
ing
rate
/ pm
s-1
ΙR(x5,0)Ι
ΙR(x95,0)Ι
ΙR(x50,0)Ι
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From ripening to solubility
0 2 4 6 8 10 122
3
4
5
6
7
8
process time / h
x 1,3 /
nm
T
aggregation50 °C40 °C35 °C30 °C25 °C20 °C15 °C10 °C
0 2 4 62
3
4
5
process time / h
mea
n pa
rticl
e si
ze /
nm
ExperimentFIMOR
10 °C35 °C
25 °C10 °C
Ripening kinetics allows to determine solubility and surface energy
𝑐𝑐𝐿𝐿 𝑥𝑥,𝑇𝑇 = 𝑐𝑐𝐿𝐿∞(𝑇𝑇) � 𝑒𝑒𝑥𝑥𝑒𝑒4 � 𝛾𝛾(𝑇𝑇) � 𝑉𝑉𝑚𝑚𝑥𝑥 � 𝑘𝑘𝐵𝐵 � 𝑇𝑇
.
Kelvin equation
EA = 119 kJ/mol
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Continuous NP synthesis
Objectives Continuous, highly reproducible particle production Transfer from batch reactions Investigation of growth mechanism & kinetics Optimization of process parameters Development of new reactors & processes
Process conditions & challenges Continuous micro-reaction setup Several feed lines Wide temperature and pressure range Flow rates from 100 ml/h to 4 l/h, In-situ optical characterization Advanced process control
1nm
ZnS
10nm
PbS CIS
nucleation rate
Inline optics
UV-VisHRSPL
Continuous production
Here: BaSO4 (mixing controlled)ZnO/Cu (catalyst precursor)CoFe2O4 (battery material)FeOOH (pigment)
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Modular microreaction technology
fast reaction / nucleation
slow ripening (or growth) in residence time reactor
in-situ absorbance spectroscopy
combination ofFIMOR – PBE approach
temperature control
ZnO
LiOH
ZnAc2
Modular microreaction setup
0
1
cum
. RTD
/ -
100 1020
1
2
3
diff.
RTD
/ m
in-1
time / min
19.7 ml/min9.8 ml/min4.9 ml/min2.0 ml/min1.0 ml/min0.5 ml/min
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Process optimization
Optimizer FIMOR
T, tR
Cost functional
PSDJ
Application of FIMOR within optimization frameworks• FIMOR: Evolution of PSD as function of T, c0, tR
→ Optimization parameters e.g.: T, tR: 2-D optimization (n = 2)• Objective: Meet mean particle size with sharp PSD in short ripening ti
• Cost functional: weighting factors w depending on application
Matching target mean particle size
Sharp PSD
Short ripening time
w are weights
still reducedoptimization:no simultaneousderivatives
ongoing:all-at-once approach,more optimizationvariables
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2D Process optimization
Variables: Temperature & residence time
Batch• Three different target sizes• Initial values equal for each run• RTD not yet considered• Computation time 15 - 25 min
0 5 10 1510
20
30
40
50
Residence time / hrs
Tem
pera
ture
/ °C
Initial valuesxtarget = 3.0 nmxtarget = 4.5 nmxtarget = 5.5 nmFinal values
Continuous microreactor
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Interactions and structure formation
See the fundamental hierarchy:
electronic structure of atoms, molecules, particles which define the
interactions between the objects, these determine the
structure which in turn defines
macroscopic properties
Porosity, pressure losselectrical & thermal conductivity,
light absorption & scattering, catalytic activity …..
O
OHOH
NH
N N
BrBr
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Scalable synthesis of building blocks
Stabilization and surface engineering to• ensure colloidal stability• tailor rheology• control self-organization
Thin film formation in functional device
Formulation en route towards devices
Faber et al., Nanoscale 2011
Colloidal stability
explanation only with ζ-potential is not possible
stable unstable
ZnO QDs
Suspension is not stable when ελ = 400 nm > 0 Scattering by agglomerates Monitoring with UV/Vis spectroscopy and AUC
After synthesis: stable1 washing cycle: stable2 washing cycles: stable3 washing cycles: not stable
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Stabilization against agglomeration
Balancing interaction potentials (electrostatic & steric repulsion, vdW attraction)
Reindl et al., J. Coll. Int. Sci., 2008
washing
• Removal of protecting acetate ionsfrom particle surface during washing
• Stability map by screening of variousexperimental datapoints
Marczak et al., Adv. Pow. Techn., 2010Segets, Marczak et al., ACS Nano, 2011 Electrostatic repulsion / vdW attraction
ster
icco
ntrib
utio
n
O
OHOH
NH
N N
BrBr
O
HO OH
HN
NBr
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NP surfaces in the focus
Solid-liquid interface largely unknown (binding motifs, ligand exchange …) Case study: Functionalization of ZnO with different catechols
Wei Lin et al., Chemistry of Materials, 2015
0 2 4 6 8 10 120.0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
2.6ML
2ML
∆G=-19.50 kJ mol-1
ZnO-catechol Langmuir fit
Surf
ace
cove
rage
(θ)
Free CAT concentration (mM)
R2=0.957Θ=K[L]/(1+K[L])K=2618247 Μ-1
physisorptionchemisorption
1ML
Surface coverage from ICP, NMR, AUC
K / M-1 3697 ± 620
∆H / kJ mol-1 -16.35 ± 0.89∆G / kJ mol-1 -20.32 ± 0.43∆S / J K-1 mol-1 +13.31 ± 3.24
For comparison:
ΔG = -50 kJ ∙ mol-1 for Au-SΔG = -30 kJ ∙ mol-1 for CdSe-S
Binding strength ITC, (here: ZnO / catechol)
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Self-organization of particles
Particles with „molecular“ complexityComplex superstructures@new propertiesPhase behaviourMechanisms and kinetics of formation
Glotzer et al, Nature 2007
Library of building blocks andtheir organization principles
1 µm
300 nm100 nm
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Zn(CH3COO)2 *2H2O
initiation in block copolymer melt,sonication in water
Complexation of Zn(CH3COO)2 within the polymer matrix at 150 °C in the melt.
ZnO superstructures in polymer melt
Jeffamine block copolymer
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Consecutive oriented, multiple aggregation process
ZnO ellopsoid formation mechanism
Klaumünzer et al, Cryst.Comm.Eng. 2014
Temporal evolution of UV/VIS spectra
5 min
10 min
15 min
20 min
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Define• Identification of
desirable optical properties
Design• Forward simulation• Shape and topology
optimization
Build• “Toolkit“ for
nanostructured particle synthesis
Test• Single and
multiple particle optical characterization
Ext
inct
ion
Wavelength
Product design of optical materials
Design of transparent UV absorbers
Nanoscale 2012
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One perspective: Optical properties …
…. strongly depend on size, shape, core-shell properties, topology and materials
Colloidal crystals (N. Vogel) Patchy particles (R. Klupp Taylor)
Shape optimization (G. Leugering): Making particles invisible
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Functional thin films
Relevance of layered systems, e.g.
• Electrodes, e.g. fuel cells, electrolysis, batteries• Printable electronics, e.g. displays, LEDs• Membranes• Solar absorber & solar cells• Supercaps• Thermoelectrical devices• Heat management• Catalyst layers• …..
TEM Tomography, E. Spiecker, Erlangen
SAM@pressure Ordered C60-SAM monolayerSAM@FET
Key questions: Understanding and tailoring structure-property and process-structure functions Layered systems and their interactions (adhesion, transfer across interfaces) Continuous role-to-roll production
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Particleformation
Gas phase synthesisHydrothermal synthesisPrecipitation…..
Process chain for printed thin films
200 nm
200 nm
200 nm
Functionalisation& Spectroscopy
fs spectroscopyESR, PL, IS, HRTEM
Sn doped In2O3 K
Ene
rgy
Undoped In2O3
StabilizationLayer formation
Chemical modificationSpin-/dip-coatingµ-contact printing….
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Printing
Roll-to-roll-processesTape castingInk jet printing …
Process chain for printed thin films
Device fabrication
FETLED, Solar cellFuel cells, electrolysis
DryingDensification
Structure formationLaser annealing…
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between the building blocks,
across time and length scales,
between the involved disciplines,
between academia and industry,
… between you and us!
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Many thanks !
My coworkersDr. B. Braunschweig, Dr. M. Distaso, M. Haderlein, M. Klaumünzer,
C. Mehringer, C. Meltzer, Dr. D. Segets (LFG)
For excellent cooperationColleagues in the Cluster of Excellence (EAM)
Profs. T. Clark, R. Klupp Taylor, G. Leugering, E. Spiecker
For fundingDFG - Priority Program „Dynamic Modelling of Solids Processes“
Research Training Group „Disperse Systems for Electronics“German Excellence Initiative
BASF