VTS Sputter Roll Coater

VTSs Web/Roll Systems for the Converting Industry are individually designed to meet each customers specific requirements.The system presented in this brochure allows the user to develop a process using state-of-the-art components and then go into production.VTSs multi-process high vacuum Web/Roll Coating system is designed to coat Polyimide Film, Mylar, foil and other thin plastic or metallic materials stored in continuous roll form. Typical process stations within the high vacuum chamber can include sputter sources, electron beam guns, thermal sources, substrate heat, ion beam sources and Plasma Process Bar.

VTSs Sputter Roll Coater Introduction

AWC-550 Sputter Roll Coater Product Information TechnologyBy AWC-550, metals will be deposited to one side of the film to form a multi- layer at high rate. Ion beam source is equipped with gas inlet system for argon and reactive gases.Equipment Technique Multi-Chamber-System consisting of chambers for winding, pretreatment, coating, intermediate pumping One coating drum to cool the film during the coating process Cooling/heating equipment for coating drum Pump equipment for short pump down with turbomolecular pumps Pre-treatment by Ion beam source Up to four standard DC magnetrons for metallic sputter processes Electronically controlled winding system with 3 driving motorsTechnical DataSubstrate Material Plastic film (PET, PI, etc.)

Roll diameter max. 380mm

Width up to 550 mm Thickness 25 to 200

Film Speed 0.1 to 5 M/min

Linear Ion Beam Source Product Information VTSs Linear Ion Beam Source Features / Benefits

No Filaments or Grids

Truly production Worthy-low maintenance, no consumables, low cost

Reactive gas compatible - I.e.100% oxygen Low temperature

Operates at Magnetron Pressures(0.1-5mTorr)

Size Free

No need for multiple power supplies-hence easy integration

High Energy

High Current Density

Stability of Beam Uniformity Current Density Distribution Profile

DC magnetrons Sputter Source Product Information Power vs Deposition RatePosition vs Deposition Profile/min VTSs Linear Sputter Source Features / Benefits

Truly production Worthy-low maintenance, no consumables, low cost

Low temperature

Operates at Magnetron Pressures(0.8- 5mTorr)

Size Free

High Power compatible

High Deposition Rate

Stability of Coating Uniformity

VTSs Technical Data for FCCL

VTSs Technical Data for FCCL Wetting angle of polyimide with various Doses by irradiated at ionsSurface energy of polyimide with various Doses by irradiated at ionsSurface Modification of Polyimide film by ATECs Linear Ion Beam Source

VTSs Technical Data for FCCL Wetting angle of polyimide with different ion current by irradiated at ionsAdhesion strength with different gases by irradiated at ionsLow Current DensityHigh Current DensitySurface Modification of Polyimide by ATECs Linear Ion Beam Source

VTSs Technical Data for FCCL Schematic drawing of the polymeric repeat unit of PMDAODA.XPS spectra of O 1s, N 1s, and C 1s from as-received PMDA-ODA polyimide after peak deconvolutionBinding Energy (eV) Binding Energy (eV) XPS spectra of O 1s, N 1s, and C 1s from PMDA-ODApolyimide after irradiation by linear ion beam source.XPS Data of modified polyimide film by Ion Beam Source

VTSs Technical Data for FCCL SAM Data of modified polyimide film by Ion Beam SourceBy Gas A + C By Gas ABy Gas CRaw Film

VTSs Technical Data for FCCL Peel strength with various doses byirradiated at ionsPeel strength with various doses by irradiated at ionsSurface Modification of Polyimide film by Ion Source

VTSs Technical Data for FCCL Cu Thickness vs Peel Strength Curing Test (150, 168h)Peel strength with various doses byirradiated at ions

By Gas A + CBy Gas CTest ConditionSample Width : 3 Sample Position : MD CPI Thickness : 38 Cu Thickness : 9 Peeling mode : vertical(90)Peeling Speed : 50 / min Mean : 0.80 kgf/cm Normal Temperature Mean : 0. 78 kgf/cmHCL TestKOH TestMean : 0.79 kgf/cmChemical Test VTSs Technical Data for FCCL

By Gas ABy Gas A + CBy Gas C Conclusion VTSs Web/Roll Systems : State-of-the-art Equipment

VTSs Linear Ion Beam Source : High Current Density Stability of Beam Uniformity Size Free

VTSs Linear DC Magnetron Sputter Source : High Deposition Rate Stability of Coating Uniformity Size Free

Surface Modification of Pl by Gas C Ion : High Surface Energy Fast Surface Modification High Peel Strength Ion Source of High Current Density : High Surface Energy High Peel Strength

Curing Test : 0.32 kgf/

Chemical Test : 0.78 kgf/