University of Groningen Dual photo- and redox- active ... · XPS was performed using a Surface...

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University of Groningen Dual photo- and redox- active molecular switches for smart surfaces Ivashenko, Oleksii IMPORTANT NOTE: You are advised to consult the publisher's version (publisher's PDF) if you wish to cite from it. Please check the document version below. Document Version Publisher's PDF, also known as Version of record Publication date: 2013 Link to publication in University of Groningen/UMCG research database Citation for published version (APA): Ivashenko, O. (2013). Dual photo- and redox- active molecular switches for smart surfaces. s.n. Copyright Other than for strictly personal use, it is not permitted to download or to forward/distribute the text or part of it without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license (like Creative Commons). Take-down policy If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Downloaded from the University of Groningen/UMCG research database (Pure): http://www.rug.nl/research/portal. For technical reasons the number of authors shown on this cover page is limited to 10 maximum. Download date: 02-08-2021

Transcript of University of Groningen Dual photo- and redox- active ... · XPS was performed using a Surface...

Page 1: University of Groningen Dual photo- and redox- active ... · XPS was performed using a Surface Science SSX-100 ESCA instrument with a monochromatic Al Kα X-ray source (hν = 1486.6

University of Groningen

Dual photo- and redox- active molecular switches for smart surfacesIvashenko, Oleksii

IMPORTANT NOTE: You are advised to consult the publisher's version (publisher's PDF) if you wish to cite fromit. Please check the document version below.

Document VersionPublisher's PDF, also known as Version of record

Publication date:2013

Link to publication in University of Groningen/UMCG research database

Citation for published version (APA):Ivashenko, O. (2013). Dual photo- and redox- active molecular switches for smart surfaces. s.n.

CopyrightOther than for strictly personal use, it is not permitted to download or to forward/distribute the text or part of it without the consent of theauthor(s) and/or copyright holder(s), unless the work is under an open content license (like Creative Commons).

Take-down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediatelyand investigate your claim.

Downloaded from the University of Groningen/UMCG research database (Pure): http://www.rug.nl/research/portal. For technical reasons thenumber of authors shown on this cover page is limited to 10 maximum.

Download date: 02-08-2021

Page 2: University of Groningen Dual photo- and redox- active ... · XPS was performed using a Surface Science SSX-100 ESCA instrument with a monochromatic Al Kα X-ray source (hν = 1486.6

E

The study of molecular switches anchored to surfaces involves several important

preceding steps – the synthesis of the molecular compound, the investigation of the

molecular behaviour in solution, the preparation of substrates, the self-assembly of the

molecules on the surface, the characterization of the obtained monolayer and the

observation of functionality in the self-assembled monolayer (SAM). In each step one or

preferably several spectroscopic techniques are used to monitor reactions in situ or assess

the state of the surface after a certain treatment.

In this chapter the general procedures for the preparation of different types of Au

substrates and for the self-assembly of the various molecular switches and other related

molecules are described. The experimental details of how X-ray photoelectron

spectroscopy, Fourier transformed infrared spectroscopy, Raman spectroscopy and UV/Vis

absorption spectroscopy were applied in our study and how electrochemical and contact

angle measurements were done are also explained. The synthesis of the molecules and

experimental details which are specific only to particular systems we investigated and not

general to all of them are indicated in the corresponding chapters and in references.

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Chapter 2

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Semitransparent Au substrates. For UV/Vis absorption measurements performed in

the course of the spectroelectrochemical studies of SAMs a 18-20 nm film of gold (purity

99.99%, Schöne Edelmetaal B.V.) was deposited on top of a 2 nm chromium (purity 99.6

%, Umicore) adhesion layer on a glass microscope slide (Knittel Glass). Prior to gold

evaporation, the slide was cleaned with 10% hydrochloric acid for 10 min, rinsed with

water, acetone and ethanol for 2 min, followed by drying under a stream of nitrogen. The

slides were then subjected to air plasma cleaning (Diener) for 1 min. Thicker (≥200 nm) Au

films on glass were prepared in the same way.

150 nm thick films of Au were grown on mica substrates (grade V-1, Ted Pella),

freshly cleaved and annealed at 375°C for 16 h in order to remove impurities, in the same

deposition system.

Gold bead substrates were prepared from 0.5 mm diameter 99.999% Au wire (Schöne

Edelmetaal B.V.), which was melted in a butane gas flame to form a bead with a diameter

of 2-3 mm. Freshly prepared beads were cleaned chemically and electrochemically [1].

Roughening of the gold beads and Au films was performed following the procedure

described by Tian et al. [1]; SERS-active surfaces were obtained after 24 cycles.

Monolayers were prepared by self-assembly from a 10-4

-10-3

M solution of the chosen

compound in dichloromethane. Immediately after cleaning and roughening or evaporation

the freshly prepared gold surfaces were immersed in a solution overnight at room

temperature in the dark. After functionalization of the surface, the substrate was rinsed with

dichloromethane, thoroughly dried with an argon gas stream and introduced immediately

into the measuring system.

The thickness of a film on a surface was determined using a VASE ellipsometer VB-

400 (J. A. Woolam Co., Inc.) with a control module unit, a high speed monochromator

system HS-190TM

and 75W light source. The system was calibrated on a silicon wafer and a

fresh 150 nm thick gold on mica reference substrate was used to generate the mathematical

model used to calculate the film thickness [2].

Contact angles were measured on a Device Dataphysics instrument with SCA20,

version 3.60.2 software. A 2 μl drop of doubly distilled deionized water was used as the

measuring liquid (sessile drop method [3]). A minimum of 5 spots on each sample were

probed and the contact angles averaged. Analysis consisted of applying a baseline and

elliptical curve fitting of the water-air contact profile. The uncertainty in the measurements

is +/- 2°.

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Experimental procedures

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XPS was performed using a Surface Science SSX-100 ESCA instrument with a

monochromatic Al Kα X-ray source (hν = 1486.6 eV). The pressure in the measurement

chamber was maintained below 5*10-9

mbar during data acquisition. The electron take-off

angle with respect to the surface normal was 37°. The diameter of the analysed area was

1000 μm; the energy resolution was 1.26 eV (or 1.67 eV for a broad survey scan). XPS

spectra were analysed using the least-squares curve fitting program Winspec [4]. Binding

energies were referenced to the Au 4f7/2 photoemission peak originating from the substrate,

centred at a binding energy of 84 eV [5]. Deconvolution of the spectra included a Shirley

[6] baseline subtraction and fitting with a minimum number of peaks consistent with the

structure of the molecules on a surface, taking into account the experimental resolution. The

profile of the peaks was taken as a convolution of Gaussian and Lorentzian functions.

When more than one component was used to fit a core level photoemission line, binding

energies are reported ± 0.1 eV. The average uncertainty in the peak intensity determination

is 3 % for nitrogen and sulfur, and 1% for carbon, gold, and oxygen. All measurements

were carried out on freshly prepared samples.

Exposure to UV (365 nm) light was conducted in situ or ex situ of the vacuum

chamber.

Electron irradiation of the nitrobenzene SAMs was performed with a flood gun which

is part of the XPS setup and was regulated to deliver a flux of electrons with 0.5 eV of

kinetic energy.

Electrochemical measurements were performed using either a CHInstruments 600C or

a 760C potentiostat. A three-electrode arrangement with a reference electrode (Hg/HgSO4,

Ag/AgCl wire pseudo reference electrode or SCE), Pt wire auxiliary electrode and glassy

carbon, gold (bead or slide) or ITO working electrode was used. The electrolytes were

freshly prepared 0.1 M solutions of a) tetrabutylammonium hexafluorophosphate (TBAPF6,

Sigma Aldrich Co, electrochemical grade) in acetonitrile or dichloromethane; b) NaClO4 or

c) LiClO4 in CH3CN (or in EtOH in the case of XPS measurements of oxidation of

spiropyran SAMs). All potentials are reported with respect to the Saturated Calomel

Electrode (SCE). Redox potentials are reported ± 10 mV. The surface coverage of the

electrodes was determined from the most defined redox peak (overcrowded alkene dication

reduction wave (ca. 0.36 V) or spiropyran oxidation wave (ca. 1 V)) on the first or second

sweep, taking into account the area of the electrode obtained by the AuO reduction wave

measured on a bare Au bead in 1N H2SO4 prior to monolayer deposition or measuring the

geometric area of the Au slide. Capacitance of the double layer at the electrode was

determined from the scan-rate dependence of the non-Faradic current (within a potential

range removed from redox processes of overcrowded alkene) in TBAPF6 in acetonitrile.

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Chapter 2

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Raman and UV/Vis absorption spectroelectrochemistry were carried out as described

above with a CHI600c potentiostat with Ag/AgCl reference electrode, Pt auxiliary electrode

and either a) a platinum gauze, b) a roughened gold bead with a monolayer of switch or c)

semitransparent Au/glass with SAM of switch as a working electrode. For thin layer

spectroelectrochemistry optically transparent thin layer electrochemical (OTTLE) cell was

employed with a platinum gauze working electrode, Pt auxiliary electrode and Ag/AgCl

reference electrode.

ATR FTIR spectra were collected on a Perkin Elmer FT-IR/F-FIR Spectrometer

“Spectrum 400” using a UATR attachment and liquid N2 cooled MCT detector.

Raman spectra were recorded at 785 nm using a Perkin Elmer Raman Station 400F.

The spot size for Raman and SERS measurements was 7.8x103 μm

2, or 0.78 μm

2 when a

microscope with a magnification of 100x was used. Spectra were recorded typically with 1

- 5 exposures of 2 - 40 s unless stated otherwise. Further analysis of the Raman spectra

involved manual baseline correction and normalization.

UV/Vis absorption spectra were acquired using either a JASCO V630 or a Analytik

Jena Specord S600 diode array spectrophotometer.

Solutions of colloidal Au nanoparticles were prepared according to the procedure

described by Frens [7]. Spiropyrans were mixed with Au colloid and aggregated using KCl

aqueous solution at a typical concentration of 0.1 mM.

Topographic AFM images were obtained measuring in contact mode in air using a

Scientec 5100 equipped with NT-MDT cantilever with silicon tip of typical radius 6 nm

and ∼ 0.13-0.003 Nm-1

of force constant (typical 0.03 Nm-1

). Data analysis was performed

using WSxM software (version 8.7, Nanotec Electronica S.L., Spain [8]).

Irradiation of solutions, solids or SAMs was performed using a Spectroline 365 nm

(centre wavelength) lamp and a Thorlabs fibre optic halogen lamp with an external 520 nm

long path glass filter.

All commercially available chemicals were purchased from Aldrich and Acros, and

used without further purification. All solvents used for spectroscopic and electrochemical

measurements were UVASOL grade (Merck) unless stated otherwise.

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Experimental procedures

35

1H NMR spectra were recorded using a Varian Mercury Plus spectrometer (300 or 400

MHz). Chemical shifts are relative to the residual solvent peak (CD3CN = 7.26 ppm, d6-

DMSO=2.49 ppm).

[1] Tian, Z.-Q.; Ren, B.; Wu, D.-Y. J. Phys. Chem. B 2002, 106, 9463-9483. [2] Valkenier, H.; Huisman, E. H.; van Hal, P. A.; de Leeuw, D. M.; Chiechi, R. C.; Hummelen, J. C. J. Am.

Chem. Soc. 2011, 133, 4930-4939.

[3] Mittal, K. L. Contact angle, wettability and adhesion; VSP, 2003. [4] LISE laboratory of the Facultés Universitaires Notre-Dame de la Paix, Namur, Belgium.

[5] Moulder, J. F.; Stickle, W. F.; Sobol, P. E. Handbook of X-Ray Photoelectron Spectroscopy. Perkin-Elmer,

Physical Electronics Division, 1993. [6] Shirley, D. A. Phys. Rev. B 1972, 5, 4709-4714.

[7] Frens, G. Nat. Phys. Sci. 1973, 241, 20-22.

[8] Horcas, I.; Fernández, R.; Gómez-Rodríguez, J. M.; Colchero, J.; Gómez-Herrero, J.; Baro, A. M. Rev. Sci. Instrum. 2007, 78, 013705–013705–8.

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