Université Lyon I NATO/ASI and Euro Summer School September 16-27, 2002 JM.M SMASMA OPTICS IN...

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NATO/ASI and Euro Summer School September 16-27, 2002 JM.M

SMASMASMASMA

OPTICS IN ASTROPHYSICSOPTICS IN ASTROPHYSICSCoatings Performances &

LimitationsCoatings Performances &

Limitations

Jean-Marie MACKOWSKI

Université Claude Bernard Lyon 1SMA-VIRGO

Bât 21322, Bd Niels Bohr

69622 Villeurbanne Cedex

[email protected] : + 33 04 72 43 26 69

Fax : + 33 04 78 89 19 36

Jean-Marie MACKOWSKI

Université Claude Bernard Lyon 1SMA-VIRGO

Bât 21322, Bd Niels Bohr

69622 Villeurbanne Cedex

[email protected] : + 33 04 72 43 26 69

Fax : + 33 04 78 89 19 36

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Limitations TODAY MENU TODAY MENU

COATING DEPOSITION TECHNIQUES

VIRGO EXPERIENCE

VIRGO METROLOGY&

OPTICS PERFORMANCES

LIMITATIONS SOURCES

COATING DEPOSITION TECHNIQUES

VIRGO EXPERIENCE

VIRGO METROLOGY&

OPTICS PERFORMANCES

LIMITATIONS SOURCES

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Limitations

COATINGS DEPOSITION TECHNIQUESCOATINGS DEPOSITION TECHNIQUES

TODAY MENU TODAY MENU

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LimitationsION ASSISTED DEPOSITIONADION ASSISTED DEPOSITIONAD

coating

crucible

substrat

Assistance source

Vapor flow

material

Electron beam, Joule effect, Laser, …

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Limitations

O2

Ar

Ar

O2

Meissner Trap

Sample Holder ( Planetary Motion )

Ar

Targets

Quartz

Neutralizor(Filament, PBN)

Neutralizor

- -

- -

SputteringSource

++

++

++ -

---

AssistSource

-++++

+++

- -

---

SputteredParticles

Substrates

I.B.S. Deposition Principles

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LimitationsI.B.S. Deposition

Systems

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LimitationsC.V.D Plasma Deposition

Systems

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LimitationsFROM SOURCE TO SUBSTRAT

SURFACEFROM SOURCE TO SUBSTRAT

SURFACE

Source

TemperatureEmission law

Mediumpressure

Substrat

Temperature

Vapor flow:nature, direction, energy

Evaporation: 0.1 eV (1100K) m.s-1

Sputtering: 10 to 50 eV km.s-1

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Limitations

•Dimension: 2x2.2x2.2 m3

•Vacuum: 2.10-8 mBar

•DIBS technology

•Environment: Class 1

VIRGO LARGE COATER

VIRGO LARGE COATER

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LimitationsCLASS 1 CLEAN ROOM BEFORE INTEGRATIONCLASS 1 CLEAN ROOM BEFORE INTEGRATION

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LimitationsVIRGO LARGE

COATERVIRGO LARGE

COATER

robot simple rotation

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Limitations

Thickness uniformity (%)

-25

-20

-15

-10

-5

0

5

-400 -300 -200 -100 0 100 200 300 400

Position (mm)

C 01035 PC=50°C 01041 PC=50° Mask 1 C 01043 PC=50° Mask 2C 01047 PC=50° Mask 3

Ta2O

5

•3.10-3 with masking on 700 mm•6.10-3 without masking on 350 mm

COATING THICKNESS UNIFORMITY

COATING THICKNESS UNIFORMITY

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Limitations

SputteredAtoms

Masque

X

YRobot

Atomespulvérisés

Cible SiO2

Source d’ions

Miroir

InterféromètreContrôle du front d’onde

SiO2 Target

Sputtered

Atomes

Mask

Ion Source

Mirror

Interferometer

Robot

CORRECTIVE COATINGCORRECTIVE COATING

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Limitations

30 nm P.V.

0

14 nm P.V.

0

beforebeforecorrectioncorrection

afteraftercorrectioncorrection

6 nm R.M.S

1.5 nm R.M.S.

CORRECTIVE COATINGCORRECTIVE COATING

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LimitationsIBS COATERIBS COATER

Absorption @ 1064 nm : 0.2 / 1 ppmAbsorption @ 1064 nm : 0.2 / 1 ppm

Process Difffusion @ 1064 nm : 0.6 / 4 Process Difffusion @ 1064 nm : 0.6 / 4 ppmppm

Centring Wavelength repeatability : +/- Centring Wavelength repeatability : +/- 0.4 %0.4 %

Wavefront after Corrective Coating : <1 Wavefront after Corrective Coating : <1 nmnm

Absorption @ 1064 nm : 0.2 / 1 ppmAbsorption @ 1064 nm : 0.2 / 1 ppm

Process Difffusion @ 1064 nm : 0.6 / 4 Process Difffusion @ 1064 nm : 0.6 / 4 ppmppm

Centring Wavelength repeatability : +/- Centring Wavelength repeatability : +/- 0.4 %0.4 %

Wavefront after Corrective Coating : <1 Wavefront after Corrective Coating : <1 nmnm

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VIRGO EXPERIMENTVIRGO EXPERIMENT

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LimitationsVIRGO VIRGO VIRGO VIRGO

FRANC0-ITALIEN PROJECT

11 Laboratories

5 in France 11 in Italy

200 people

100 M€

Antenna Located at PISA

FRANC0-ITALIEN PROJECT

11 Laboratories

5 in France 11 in Italy

200 people

100 M€

Antenna Located at PISA

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Limitations

LASER YAG:Nd3+

20 W

détecteur

AR

R<5.10-4

MIRROR

R=0.92

BSR=0.5

ARR<10

-3

ARR<5.10

-4

MIRRORR=0.88

MIRRORR=0.88

ARR<5.10

-4MIRROR HRR=0.99995

MIRROR HRR=0.99995

DETECTOR

3 km

3 km

MMRRMME2E2

MME1E1

MMI2I2

MMI1I1

B.S.B.S.

VIRGO INTERFEROMETER

VIRGO INTERFEROMETER

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LimitationsVIRGO SITE VIRGO SITE

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LimitationsVIRGO TUNNEL VIRGO TUNNEL

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LimitationsVIRGO CENTRAL BUILDING VIRGO CENTRAL BUILDING

N

W

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LimitationsVIRGO SUSPENSIONS VIRGO SUSPENSIONS

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LimitationsBeam splitter

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VIRGO METROLOGY&

OPTICS PERFORMANCES

VIRGO METROLOGY&

OPTICS PERFORMANCES

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Limitations

• Bulk diameter : 350 mm

• Coating diameter : 330 mm

• Bulk Thickness : 96 mm

FIRST VIRGO MIRRORFIRST VIRGO MIRROR

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Limitations

•Absorption•Birefringence•Relative reflexion•Wave front (stitching)•Scattering •Transmission•Microroughness•Defect detection

METROLOGYMETROLOGY



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Limitations

28W CW YAG:Nd3+ pump laser Mappings up to Ø400 mm

Mesurement of the coating absorption … … as well as the bulk absorption

ABSORPTION BENCHABSORPTION BENCH

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Limitations

Sensitivity: 20 ppb0,63 0.07 ppm

Ø 150mm

COATING ABSORPTION (VEM04) @ 1064 nm on Ø 150 mm

COATING ABSORPTION (VEM04) @ 1064 nm on Ø 150 mm

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Limitations

Sensitivity: 30 ppb.cm-10,74 0.05 ppm.cm-1

Ø 150mm

BULK ABSORPTION (VIM03) @ 1064 nm on Ø 150 mm

BULK ABSORPTION (VIM03) @ 1064 nm on Ø 150 mm

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Limitations

Mesurement of the amplitude as

well as the principle axis direction.

Mappings up to Ø400 mm.

losses due to birefringence in P or S polarisation(log10)

BIREFRINGENCE BENCH

BIREFRINGENCE BENCH

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Limitations

Amplitude. Sensitivity: 10-5 rad.cm-1 Principle axis direction

BIREFRINGENCE (VIM01) on Ø 150 mm

BIREFRINGENCE (VIM01) on Ø 150 mm

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Limitations

SENSITIVITY: R/R = 2.10-5

RELATIVE REFLEXION BENCH

RELATIVE REFLEXION BENCH

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LimitationsWAVE FRONT MEASUREMENTWAVE FRONT MEASUREMENT

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LimitationsWAVE FRONT (VEM04) on Ø 150

mm WAVE FRONT (VEM04) on Ø 150

mm

3.8 mn RMS29 nm PVØ 150mm

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LimitationsSTITCHINGSTITCHING

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Limitations STITCHING WAVE FRONT

(VEM04) on Ø 280 mm STITCHING WAVE FRONT

(VEM04) on Ø 280 mm

11.6 mn RMS73.8 nm PVØ 280mm

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Limitations

Multiplexeur Electronique

Détecteur

Echantillon

PlatineGoniométrique

RéflexionSpéculaire

Miroir de Focalisation

M1

M2

FiltreSpatial

Modulateur

Détecteurde référence

I risd'alignement

S

Laser(He- Ne, Yag, CO2)

Lumière Diffusée

I risd'alignement

SCATTERING MEASUREMENTSCATTERING MEASUREMENT

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Limitations

4 ppm150150 mm2

75

-75

0

0-75 - 37.5 37.5 75

37.5

- 37.5

SCATTERING (VEM04) on 150150 mm2SCATTERING (VEM04) on 150150 mm2

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Limitations

42.9 0.2 ppmØ50mm

TRANSMISSION (VEM04) on 150150 mm2

TRANSMISSION (VEM04) on 150150 mm2

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Limitations

MICROROUGHNESS

DEFECT DETECTION

MICROMAPMICROMAP

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Limitations

SIDE Bmeasurements

VIRGOrequirements

SMA-VIRGOmeasurements

averagescattering

< 5 ppm4 ppm

150150 mm2

averagetransmission

10 < T < 50 ppm42,9 +/- 0,2 ppm

50 mm

averageabsorption

< 5 ppm0,63 +/- 0,07 ppm

150 mm

birefringence < 5.10-4 rad.cm-1 < 5.10-4 rad.cm-1

150 mm

wave frontflatness

< 8 nm RMS

150 mm3,8 nm RMS

150 mm

shapeconcave

3450 +/- 100 m

150 mm

concave3580 +/- 17 m

150 mm

END MIRROR (VEM04) OPTICAL PERFORMANCES

END MIRROR (VEM04) OPTICAL PERFORMANCES

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LIMITATION SOURCES

OF PERFORMANCE

LIMITATION SOURCES

OF PERFORMANCE

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LimitationsLIMITATION SOURCESLIMITATION SOURCES

SUBSTRATE (BULK)CHEMICALS USED FOR THE POLISHING PROCESS

CHEMICALS USED FOR THE CLEANING PROCEDURESPUTTERING TARGETS

COATER WALLSION SOURCES COMPONENTS

GAZ USED FOR DEPOSITION PROCESS, …

MATERIALS PURITYMATERIALS PURITY

ENVIRONNEMENTAL CONDITIONSENVIRONNEMENTAL CONDITIONS

PARTICULATE CONTAMINATIONSORGANIC CONTAMINATIONS

BOXES FOR TRANSFERT & TRANSPORTATION

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LimitationsLIMITATION SOURCES

MATERIALS PURITY &

MATERIALS PURITY &

ENVIRONNEMENTAL CONDITIONSCONTROL

ENVIRONNEMENTAL CONDITIONSCONTROL

PHYSICO-CHEMICAL ANALYSIS TOOLS

LIKE :

ESCA, RBS, AUGER, SEM, XTM, SIMS…

PHYSICO-CHEMICAL ANALYSIS TOOLS

LIKE :

ESCA, RBS, AUGER, SEM, XTM, SIMS…

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Limitations SIMS PRINCIPLES SIMS PRINCIPLES

e-

Acquisition

Secondary Ions m/eElectron

beam (flood gun)

SAMPLE

Common Ions Sources

O+, Ar+, Cs+, Ga+…

Magnetic Quadrupole

Scintillator

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Limitations MIRRORS :SIMS PROFILES MIRRORS :SIMS PROFILES

1,E+00

1,E+01

1,E+02

1,E+03

1,E+04

1,E+05

0 0,1 0,2 0,3 0,4 0,5profondeur (µm)

inte

nsi

té (

u.a

.)

Oxyde 1

Oxyde 2

Na+ 23

K+ 39

SiO2 Ta205

Na + 23 K +

39

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Limitations

Ta+ Si+Ti+

MIRRORS :SIMS PROFILES MIRRORS :SIMS PROFILES

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Limitations MIRRORS :SIMS PROFILES MIRRORS :SIMS PROFILES

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LimitationsCONCLUSION

AT THIS STEP,OPTICAL LOSSES IMPROVEMENT

AT THIS STEP,OPTICAL LOSSES IMPROVEMENT

NEEDS BIG R&D EFFORTSNEEDS BIG R&D EFFORTS

Université Lyon I NATO/ASI and Euro Summer School September 16-27, 2002 JM.M SMASMA OPTICS IN...

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Transcript of Université Lyon I NATO/ASI and Euro Summer School September 16-27, 2002 JM.M SMASMA OPTICS IN...