ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K....

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ULE ® Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates Ken Hrdina and Carlos Duran Corning Incorporated 2012 International Symposium on Extreme Ultraviolet Lithography Brussels, Belgium, Sept. 30 Oct. 4, 2012

Transcript of ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K....

Page 1: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

ULE® Glass with Improved Thermal Properties for

EUVL Masks and Projection Optics Substrates

Ken Hrdina and Carlos Duran

Corning Incorporated

2012 International Symposium on Extreme Ultraviolet Lithography

Brussels, Belgium, Sept. 30 – Oct. 4, 2012

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2 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Introduction – Ultra Low Expansion ULE® Glass

• Corning has made ULE® Glass for 4 decades: – A high-purity, single-phase SiO2 glass doped with TiO2

– Used as a substrate for high performance mirrors:

• EUV Lithography driving material improvements: – “Polishability”

– Absolute CTE better than ±5 ppb/K

– Detailed metrology and uniformity requirements

– Push for lower thermal expansion

Hubble Telescope

2.4 m Primary Mirror

(1978)

Subaru Telescope

8.2 m Primary Mirror

(1994)

Page 3: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

3 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Introduction – ULE® Glass (continued)

• Most outstanding feature of ULE® Glass is its extremely low coefficient of

thermal expansion:

– Mean CTE5-35C = 0±30 ppb/K (more than 100x better than PYREX®)

• Single-Phase Glass enables other important properties:

– Long Term Dimensional stability

– No hysteresis when cycled up to ~300 °C • Room-Temperature shape and CTE are unchanged

• No specific thermal cycle or cooling rate is needed

• No temporal drift in properties is triggered

• Material is not affected by standard optical manufacturing and coating

techniques

– Mechanical strength • No delayed elastic effects have been observed (J.W. Pepi & D. Golini,

Adv. Optics 20, 3087 (1991)

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ULE® Glass for EUVL – Why?

• High throughput in EUVL requires a bright light source (100’s of Watts).

• Mirrors are expected to heat up:

– Single mirror reflectivity is only ~70% at 13.5 nm.

– Vacuum makes heat removal difficult.

– In a 6 mirror + mask system, >90% of the light is absorbed before it

gets to the wafer.

– Ultra low expansion material in mask and mirrors is a must in order to

preserve sub-nm wavefront distortion.

• ULE® Glass can be polished to sub nm roughness.

• Temperature of CTE=0 (crossover temperature Tzc) can be tuned.

• Metrology capable of non-destructively certifying material compliance

within a narrow range.

Page 5: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

5 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Thermal Expansion in ULE® Glass

• CTE in ULE® Glass is controlled by composition: – Temperature dependence of expansivity curve is known.

– Curve shifts in a predictable manner with changes in TiO2 concentration.

– Manufacturing adjustments in a narrow range around room temperature are

understood, and compatible with production process.

– Non-destructive metrology allows us to define the actual CTE of all glass we

make (ultrasound velocity technique).

-80

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0

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-10 0 10 20 30 40 50

Temperature in [°C]

Ex

pa

ns

ivit

y i

n [

pp

b/K

]

Less TiO2

Nominal ULE

More TiO2δ(ΔL / L)

δT

Th

erm

al e

xp

an

sio

n

ΔL / L

[p

pm

]

Temperature [°C]

Tzc = 20 C

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6 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Minimizing Distortion in EUVL Optics and Masks

CASE I

Standard Grade

ULE®Glass

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7 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Minimizing Distortion in EUVL Optics and Masks

Case II

EUVL Grade

ULE®Glass

With TZC set at ~20⁰C.

• Tune Tzc to expected temperature range in the optic:

• Done by adjusting TiO2 content during glass forming.

• It is difficult to control when Tzc is tightly specified.

Page 8: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

8 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Minimizing Distortion in EUVL Optics and Masks

Case III

EUVL Grade

ULE®Glass.

With TZC set at

~midpoint.

Page 9: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

9 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Minimizing Distortion in EUVL Optics and Masks

Case IV

EUVL Grade

ULE®Glass.

With TZC set at

~midpoint.

And

Reduced

expansivity

slope. •Reduce slope of expansivity curve:

• In addition to tuning Tzc

• Gain becomes more important as the optic temperature range grows.

Page 10: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

10 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Expansivity Improvement Definition

TEMPERATURE (°C)

EX

PA

NS

IVIT

Y (

ppb/K

) Current

behavior

Ideal behavior

(“100%” Improved)

Goal of this project was to optimize the expansivity through thermal

treatment only, without introducing changes to a well established ULE®

Glass production process.

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Expansivity Improvement –

Required Metrology

• Characterization of glass structural state after annealing:

• We use Fictive Temperature (Tf) as parameter to describe the

structural state of the glass.

• Measure Tf through FTIR measurements (method by A. Agarwal,

K.M. Davis and M. Tomozawa, J. Non-Crystalline Solids 185 (1995),

p191-198). (J.E. Shelby, Phys. Chem. Glasses., 2005, 46 (5), 494-

499).

• Specific implementation and calibration for ULE® Glass submitted to

J. Non-Crystalline Solids – Tingley et al. (2012).

• Measurement of effect on expansivity:

• Sandwich Seal measurements

• Other production-compatible techniques

• Modeling of Tf

• Calibration of Ultrasound Velocity technique for improved material.

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12 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Glass Tf Characterization

FTIR Measurements and Empirical Modeling

• Quenched samples after isothermal

holds at various temperatures to

calibrate Tf vs. FTIR Peak Position.

• Empirical model to calculate Tf after

anneal and obtain correlation

between model predictions and

measurements.

Model Predictions vs. Measurements

y = 1.000x

R2 = 0.976

860

880

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920

940

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860 880 900 920 940 960 980

SIMULATED TfM

EA

SU

RE

D T

f

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13 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Measuring Changes in Expansivity -Sandwich Seal Differential Expansion Measurement

Incoming Light

Center – reference glass

Top & Bottom – unknown glass

Outgoing Light (Elliptically Polarized)

Seal with stress (due to difference in CTE)

(Linearly Polarized)

• Use polarized light to measure stress, and evaluate thermal expansion.

• Technique by H. Hagy and collaborators, J. Opt. Soc. Am. A3, P83 (1986), and

references therein.

• New setup incorporates computer control and data analysis: • Can detect small differences in thermal expansion.

• Requires smaller samples than other techniques.

• Temperature range from ~200 to 425 K (-70 to 150 °C).

Page 14: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

14 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Sandwich Seal Data Analysis (Conceptual) - Seals made with standard production ULE® Glass -

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TEPERATURE (C)

EX

P D

IFF

(p

pb

)

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TEMPERATURE (C)

EX

PA

NS

IVIT

Y (

pp

b/C

)

Seal Signals Material Expansivity

• Expansivity curves in production ULE® Glass have a constant shape vs. T

• Only effect of changes in TiO2 concentration is to shift the curves

vertically.

• Stress measured in sandwich seals made with this glass will be linear: • Sign of stress indicates whether “bread” expands more or less than “meat”.

• Slope is a direct measurement of difference in CTE between bread and meat.

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15 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Sandwich Seal – Correlation to Ultrasound

(Actual Measurements)

• Set of six sandwich seal samples were made using ULE® Glass with different amounts of TiO2 doping.

• System has excellent sensitivity to small expansion differences.

• Expansion Difference vs. Temperature plots are straight lines:

– Explicitly shows that Expansivity is independent of CTE offset.

• Uncertainty in CTE difference from Sandwich Seal is ~±2-3ppb/K – Excellent tool for evaluation of new materials.

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TEMPERATURE (K)

Exp

an

sio

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iff

(pp

b)

Seal#6

Seal#5

Seal#4

Seal#3

Seal#2

Seal#1

R2 = 0.98

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Ultrasound CTE difference (ppb/K)

Seal C

TE

diff

ere

nce

(ppb/K

)

Page 16: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

16 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Sandwich Seal Data Analysis (Conceptual)

- Seals made with non-Standard ULE® Glass -

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EX

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IVIT

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pp

b/C

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pb

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Seal Signals Material Expansivity

• Seals are prepared using Standard ULE® Glass for the “meat”, and non-

standard for the “bread”

• If expansivity curves are not parallel, measured stress is no longer linear

with temperature.

• Fit measured seal stress adding a quadratic term:

• Sign and magnitude of quadratic term indicates whether the bread

expands slower than or faster than standard ULE® Glass.

Page 17: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

17 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Sandwich Seal Measurement Results

(Actual Measurements)

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TEMPERATURE (K)

Exp

an

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(pp

b)

Seal#6

Seal#5

Seal#4

Seal#3

Seal#2

Seal#1

S1S1

S1S2

S1S5

Seals made with “bread” slices of non-Std Anneal ULE®

• Curved lines indicate expansivity slope change.

• Measurement of curvature allows quantification of

improvements in expansivity (next slide).

Page 18: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

18 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Change in Expansivity Slope

(Quadratic Term in Sandwich Seal Fits)

• Samples prepared from different Boules of ULE® Glass.

• Consistent behavior seen for all seals measured.

• US Patent Applications 2011/0207592 and 2011/0207593

Page 19: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

19 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Thermal Expansion in Improved ULE® Glass

Improvement in

Thermal Expansion

• Improvement shown in this figure is ~ 24%

• US Patent Applications 2011/0207592 and 2011/0207593

Page 20: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

20 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

Summary

• Until now, Tzc of ULE® Glass has been determined during the glass

forming process

• Using controlled annealing, we can simultaneously improve the

expansivity and fine tune the Tzc of ULE® Glass (US Patent Application

2011/0048075) – Process can be tuned to meet specific customer requirements.

– We have demonstrated improvements in expansivity greater than 30%.

– Tzc tuning will allow us to supply glass within narrower specification ranges

• Corning ULE® Glass is an enabler for EUV Lithography today – We are committed to continue to improve material properties and

manufacturing processes towards future needs

Page 21: ULE Glass with Improved Thermal Properties for EUVL Masks ...euvlsymposium.lbl.gov/pdf/2012/pres/K. Hrdina.pdf880 900 920 940 960 980 860 880 900 920 940 960 980 SIMULATED Tf f. Hrdina/Duran

21 Hrdina/Duran / ULE® Glass for EUV Lithography © Corning Incorporated - 2012

ACKNOWLEDGMENTS

• D. Sears

• J. Tingley

• T. Carapella

• B. Tuttle

• J. Maxon

• B. Whispell

• D. Gauthier