Tutorials on Systems Miniaturization Luiz Otávio S. Ferreira - LNLS November 28, 2001.

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Tutorials on Systems Miniaturization Luiz Otávio S. Ferreira - LNLS November 28, 2001
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Transcript of Tutorials on Systems Miniaturization Luiz Otávio S. Ferreira - LNLS November 28, 2001.

Tutorials on Systems Miniaturization

Luiz Otávio S. Ferreira - LNLS

November 28, 2001

Luiz Otávio S. Ferreira 2

Outline

• Introduction to Systems Miniaturization

• Microfabrication Technologies

• Microsystems Development and Packaging

• Microfabrication in Brazil

Luiz Otávio S. Ferreira 3

Introduction to Systems Miniaturization

• Microsystems:– Sets of microdevices capable of

integrated sensing, analysis and actuation.

• Microdevices:– Microstructures capable of actuation, or

signal transduction, or chemical reaction, etc.

Ivo M. Raimundo Jr. IQ/UNICAMPMUSA2000Nobuo Oki

UNESP Ilha SolteiraMUSA2000

Luiz O.S. Ferreira LNLS

Luiz Otávio S. Ferreira 4

Why Miniaturization?• Reduction on mass and size.• Integration with electronics.• Exploitation of new effects due to

small size.• Cost/performance advantages.• Improved reproducibility, accuracy

and reliability.• Redundancy and arrays.• Low power consumption.• Less material used for

manufacturing.• Avoiding of rare or aggressive to

environment material.• Easy disposal.

Luiz Otávio S. Ferreira 5

Vocabulary

• USA– MEMS– Microelectromechanical Systems

• Europe– Micro Systems

Micro Systems Technology

• Asia– Mechatronics– Micromanufacturing

• Other names– Micromechanics– Nanotechnology– Microtechnology– Meso Systems

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Market Demands on Miniature Systems

• Environment

• Medicin Technology

• Information Technology

• Biotechnology

• Automotive

• Consumer electronics

• Projected sales for 2003:32 B$ (US$)

Source:

Solid State Technology, July 1999, pp. 63-65.

Luiz Otávio S. Ferreira 7

Technological Possibilites - 1

• Microtechnology for electronics– Technologies developed or improved

on last 20 years:• Silicon crystal production.• Thin film technology.• Lithography and etching.• Modeling.• Characterization.

– Non electronic interations:• Springs, membranes, piezoresistive effect,

heaters, etc.

– Well developed material and technology: low cost if large scale production.

– Systems integration.

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Technological Possibilities - 2

• Full system approach– Technologies for

• Assembly

• Interconnection

• Housing

• System integration

– Bonding and joining• SMD, COB, TAB, DCA, Wire bonding,

Flip Chip

– Analysis of the interactions

– Reliability

– Performance and cost

– Volume

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Technology Adaptation

• Old technologies, from micro-electronics and from mechanics, are adapted for use on micro-systems integration.

• Some new steps must be developed.• Old materials are used on new ways:

different properties.• Only a whole system approach leads

to effective systems.• Numerical analysis of

interdependencies.

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Why Integration?

• Better shielding of weak electric signals from sensors.

• Individual sensor calibration on factory. Lower calibration cost.

• On board intelligence.

• Reduction of connection cables.

• Standard communication protocols.

• Save cost on extra electronics housing.

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How to Integrate?

• Monolithic Integration:– Very difficult and expensive.

– Very large scale of production.

– Large number of interconnects.

– Number of masks.

– Time of development.

– Yield.

– MCM

• Hybrid Integration:– In 1997, 8% of the pressure sensors and

12% of the accelerometers where monolithically integrated.

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Product Oriented Approach

• Problem and product oriented approach: YES!

• Technology oriented approach: NO!• Technology: manufacturability.• Important technologies are not silicon

based:– Mechanical micromachining.– High aspect ratio microstructuring

(LIGA).– Replication methods:

• Electroplating,• Injection molding.• Hot embossing.

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Availability of Production

• Many prototypes of sensors.• Small number on the market.• Prototyping labs are not equipped to

make 100,000 devices batchs.• Moving the prototype to a foundry

implies on starting again from the scratch.

• Orders of less than 250,000 devices are not attractive to silicon foundries.

• Multi-User prototyping approach (The MUSA Project).

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COSTS• CMOS foundry for monolithically

integrated sensors: US$30 Millions.• Micromechanical parts line (if the ion

implantation is made externally): US$4 Million.

• Hybrid integration (assembly and thick film line): US$1 Million.

• CMOS processed silicon: US$ 2.5 to 8. Cent per mm2 = US$750 to 2100 for a processed 20cm waver.

• Sensor process: US$0.35 per mm2 for batch of more than 50,000 chips.

• Surface micromachining; US$1.80 per mm2 for 10,000 Chips batch, and 30 cents per mm2 for 500,000 chips batch.

• Less than 1 Million chips per year is a risk.• Bellow 10,000 chips a year: a big problem.

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People Demand

• 1996: total= 48,000

• USA Japan Europe

• 29,000 13,000 6,000

• 2002: projected total=100,000