Towards X-ray excited optical microscopy (XEOM) for cultural heritage, spectroelectrochemistry, and...
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Transcript of Towards X-ray excited optical microscopy (XEOM) for cultural heritage, spectroelectrochemistry, and...
Towards X-ray excited optical microscopy (XEOM) for
cultural heritage, spectroelectrochemistry, and wider applications
Mark Dowsett1, Annemie Adriaens2, Gareth Jones1 and Alice Elia2
1Analytical Science Projects Group, University of Warwick2Electrochemistry and Surface Analysis Group, Ghent University
Thanks to : Paul Thompson, Simon Brown (XMaS, ESRF) Sergey Nikitenko (DUBBLE, ESRF), Nigel Poolton (Formerly SRS, Daresbury)
Analytical Science Projects
Goal: Develop XEOL microscope coupled to an environmental cell for synchrotron applications
Real time process monitoring in controlled electrochemical and gaseous ambients – corrosion and protection studies
Ultimate goal: Develop a portable version for direct chemical imaging in museums etc.
Microscopy of the chemical state rather than just elemental composition (i.e. A step beyond portable XRF)
Why XEOL?
• Based on transoptical emission (200-1000 nm) caused by keV X-ray irradiation - phosphorescence, fluorescence
• Electronic processes responsible for XANES and EXAFS impose similar structure on the light emission
• Extra band specific-features due to excitation of chromophores by LE electron scattering
• Spectra are (at least) two dimensional – X-ray energy and emitted optical wavelength
• Technique has a high surface specificity – sees thin layers on surfaces invisible to conventional XAS
• Basis of a chemically specific optical microscopy - image formation using broadband light optics
Proof of concept - ODXAS 1
Broadband PM
Shutter
Optical bench
Filter housing
Web cam (1 of 2)
X-ray port 1
eCell
Ref. electrode
Stepper 1
Stepper 2
X-ray port 2
X-ray detector
Illumination
Optics
Energy/keV
8.95 9.00 9.05 9.10 9.15
Flu
ore
sce
nce
/Arb
uni
ts
0.0
0.2
0.4
0.6
0.8
1.0XAS (DUBBLE)
Energy/keV
8.95 9.00 9.05 9.10 9.15
Flu
ore
sce
nce
/Arb
uni
ts
0.0
0.2
0.4
0.6
0.8
1.0XAS (DUBBLE)
XEOL (XMaS)
Copper – XAS and XEOL-XAS
Energy/keV
8.95 9.00 9.05 9.10 9.15
Flu
ore
sce
nce
/Arb
uni
ts
0.0
0.2
0.4
0.6
0.8
1.0XAS (DUBBLE)
XEOL (XMaS)
Parallel XAS (XMaS)
Nantokite on copper – XEOL surface specificity5
Energy / keV
8.9 9.0 9.1 9.2 9.3 9.4 9.5
No
rma
lize
d
0.0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
8.96 8.97 8.98 8.99 9.00 9.01 9.020.0
0.2
0.4
0.6
0.8
1.0
CuCl on Cu (XAS)
CuCl on Cu (ODXAS)
Cu(XAS)
CuCl ref (XAS)
(XEOL)
Cuprite (Cu20) – XAS and XEOL-XAS Comparison
Cuprite comparison
Energy / keV
8.7 8.8 8.9 9.0 9.1 9.2
Log(
Ra
w c
ount
)
102
103
104
105
106
XAS, DUBBLE
XEOL, stn 9.2 SRS
Behind fluid window, XEOL, stn 9.2 SRS
Dowsett, Adriaens, Jones, Fiddy, Nikitenko,Anal. Chem. 80 (2008) 8717-8724
Cuprite comparison
Energy / keV
8.7 8.8 8.9 9.0 9.1 9.2
Log(
Ra
w c
ount
)
102
103
104
105
106
XAS, DUBBLE
XEOL, stn 9.2 SRS
Behind fluid window, XEOL, stn 9.2 SRS
XEOL, XMaS+ODXAS 1
Copper broadband XEOL - Raw I/<I0>
Energy / eV
8900 8950 9000 9050 9100 9150 9200
No
rma
lized
inte
nsi
ty
60
80
100
120
140
160
180
200
220
No window
15 m PCTFE10 m "Clingfilm"
6 m Ultralene
Note - a single mean value of I0 has been used in each case,
rather than a point by point normalization.
6 m Ultralene Same mean as "No window"
Relative broadband visible fluorescence (13 keV X-rays)
Time / s
0 100 200 300 400
I /
I 0
0.2
0.3
0.4
0.5
0.6
0.7
0.80.9
0.1
1
Al
BDD
PCTFE
Acetal Copolymer
Materials of construction
... e.g. The eCell window... and the rest ...
eCell body
X-ray shielding
Optical column
Substrate (for Powders etc.)
(13 keV X-rays)
Other edges (so far)
Energy/keV
9.60 9.65 9.70 9.75 9.80 9.85
Flu
ore
sce
nce
/Arb
uni
ts
0.0
0.2
0.4
0.6
0.8
1.0
1.2 Zn (K)
Energy/keV
12.95 13.00 13.05 13.10 13.15 13.20
Flu
ore
sce
nce
/Arb
uni
ts
0.6
0.7
0.8
0.9
1.0
1.1
Pb (LIII)
Energy/keV
13.00 13.01 13.02 13.03 13.04 13.05 13.06
Flu
ore
sce
nce
/Arb
uni
ts
0.6
0.7
0.8
0.9
1.0
1.1
Clean metal
Lead decanoate
1.8 eVPb (LIII)
Atacamite: XMaS June 2009 EX10 XEOL with Filters
Energy / keV
8.95 9.00 9.05 9.10 9.15 9.20
No
rma
lize
d I
nte
nsi
ty
0.2
0.4
0.6
0.8
1.0
1.2
Atacamite: XMaS June 2009 EX10 XEOL with Filters
Energy / keV
8.95 9.00 9.05 9.10 9.15
No
rma
lize
d I
nte
nsi
ty
0.6
0.7
0.8
0.9
1.0
1.1
Colour filters
Nantokite (CuCl) on copper
Atacamite (Cu2(OH)3Cl) on copper
Paratacamite/Atatcamite 2009 06 EX08S4 EX14S7
Energy/keV
8.90 8.95 9.00 9.05 9.10 9.15
Op
tica
l em
issi
on
- a
rb.
un
its
0.2
0.4
0.6
0.8
1.0
1.2
1.4
1.6
1.8
Thick layer on copper
“Fine dusting” on acetal
Through green filter
Identifying mixtures with filters
Potential imaging modes
Time to a mean 3% precision per pixel in broadband image < 1000 s for 2048 x 2048 pixels
• Filtered images
• Near edge image spectra
• Dispersed images
• Edge correlated images (form image on correlation with specific oxidation state etc.
• EXAFS image spectra – given time
Next steps
Filters (imaging mode)
Filtered (imaging) or broadband (spectroscopy)
Schematic diagram of XEOM 1 - Imaging
Broadband CCD 2, 2048 x 2048
Sample
X-rays
Objectiveoptics
Broadband optical emission
Image
Focusing condenser
Next steps
Schematic diagram of XEOM 1 - Spectroscopy
Sample
X-rays
Objectiveoptics
Broadband optical emission
Grating
Projection optics
Broadband CCD 1, 500 x 2048
Spectrum/Image spectrum
Focusing condenser
Summary and Conclusions
• XEOL provides multispectral information including XANES and EXAFS from heritage metals and corrosion products
• Optical devices with constructed with broadband optics will provide microscopy with (light) wavelength limited resolution
• Suitable for beam lines with large (millimetres ) footprint
• XEOM has potential applications in Measurements in controlled environments Metal corrosion research Geosciences Semiconductor research Organo-metallics ...
• Silica lens – based microscope –> mid to end 2010 Mirror-based device -> 2011-2012 Portable device ?