Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and...

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Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results

Transcript of Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and...

Page 1: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

FaStack Technology

A Look at Various 3D Applications, Their Designs, and Ultimate Silicon

Results

Page 2: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

3D Stacking Approaches

Irvine Sensors : Stacked Flash

Amkor : 4S CSP (MCP)

Chip Level

Density gain : “Yes”Cost impact: “Expensive”Speed gain: “Zero or Negative”Reliability: “No”Multi-Func: “Limited”

Transistor Level

: “Limited” only for PROM: “Expensive” due to low yield: “Extremely slow”: “No”: “No”

Wafer LevelMatrix: Vertical TFT Competitors : Conceptual

• Infineon/IBM• RPI• Ziptronix• ZyCube• TruSi• Xan3D/Vertical Circuit/Tessera

Tezzaron: 3 wafer stack

: “Yes” : “Cost effective”: “Extremely fast”: “yes”: “yes”

Tezzaron: Actual

Page 3: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

Wafer Level Stacking ApproachesInfineon/IBM

Impediments:• Sliced wafer handling• Alignment budget • Uniform bonding • Film stress during deep via fills• Wafer warp• Heat dissipation

RPI/ Ziptronix/ ZyCube

Impediments:• Large alignment errors• Strength/uniform bonding, voids• Peeling propensity during thinning• Film stress during deep via fills• Wafer warp• Heat dissipation

Tezzaron

3 wafer stack

“All key elements; Alignment, Bonding (Uniformity & Strength), Low thermal budget ( <400C), Si thinning (Control & Uniformity), Limiting stacking yield losses, Facile heat dissipation of wafer level stacking have been simultaneously integrated to meet market demand for density, cost and speed”

Ziptronix : Covalent bond (4-inch)

IBM : SOI wafer thinning

Backside of the stacked wafer

Infineon : W deep via RPI : Dielectric bonding

ZyCube : Injection glue bonding

Tezzaron : Copper bonding

3D Sensor

Page 4: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

The Objective

Page 5: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

“It is clearly seen in Figure 1, that without further reductions in interconnect delay, reducing gate dimensions much below 130nm do not result in corresponding chip improvements.” NSA Tech Trends Q3 2003

Page 6: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

Denser!

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Tezzaron Semiconductor

Faster!

Shorter Wirestd 0.35 x rcl2

Propagation delay is proportional to: 1 # of layers

Page 8: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

• Global Interconnect “problem”• Span of Control

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Tezzaron Semiconductor

Lower Power!

Poweravg = Capacitancetot x Voltage2 x Frequency

Therefore: Poweravg Capacitancetot

Capacitance is mostly due to wires.

Stacked wire length 1

# of layers

Therefore: Poweravg stacked Poweravg single layer

# of layers

Page 10: Tezzaron Semiconductor FaStack Technology A Look at Various 3D Applications, Their Designs, and Ultimate Silicon Results.

Tezzaron Semiconductor

Lower Costs!

• Less processing per layer

• Better optimization per wafer

• Higher bit density (memories)

• Lower test cost (using Bi-STAR™)

• Higher yield (using Bi-STAR™)