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Supplementary Material
Bio-inspired Highly Hydrophobic Surface with Ecdysis Behavior Using an Organic Monolithic
Resin and Titanium Dioxide Photocatalyst
Munetoshi Sakai, Tomoya Kato, Norio Ishizuka, Akira Nakajima, Akira Fujishima.
1. Film thickness of a highly hydrophobic coating with surface restoration
The film thickness after surface restoration was approximately constant (Figure S1). The change in
film thickness was less than 0.25 m after three months, although testing was carried out on
different days than indicated in Figure 4. Therefore, the apparent film thickness was maintained. The
film thickness was measured using a micrometer (Figure S2). The measurement points were located
between three red markers. Highly hydrophobic coatings on the SUS substrate were formed as
described in Figure 4.
Figure S1. Fluctuation of film thickness during outdoor testing.
Figure S2. Micrometer and the back of the SUS substrate. a) Micrometer and the evaluated sample. b) Measurement points are located between red markers on the back of the SUS substrate.
-1.0
-0.75
-0.5
-0.25
0.0
0.25
0.5
0.75
1.0
0 25 50 75 100 125 150
変化量
[m
]
経過時間 [d]
TiO2: 0 Mass%TiO2: 3.1× 10-5 Mass%
0
20
40
60
80
100
120
140
160
0 25 50 75 100 125 150経過時間 [d]
接触角
[ o]
150100500
[㎜]
TiO2: 0 Mass%TiO2: 3.1× 10-5 Mass%
膜厚変化 接触角変化
降水量の経日変化(横浜管区気象台)
Elapsed time [day]
Am
ount
of t
hick
ness
cha
nge
[m
]
Rainfall fluctuation (Yokohama District Meteorological Observatory)
■ TiO2: 0 Mass%◆ TiO2: 3.1 × 10-5 Mass%
a) b)
2. Function of the ultraviolet absorbing agent in the organic monolithic resin as TiO2
photocatalyst
Figure S3 shows the contact angles under an ultraviolet lamp. The UV intensity was 2 mW/cm2. In
this test, since there was no simulated rain, the self-restoration function was not generated.
Moreover, the evaluated samples were OMR-POF samples. The contact angles depend on the
abundance of TiO2 photocatalyst (ST-01). The diffuse reflectance spectrum of UV/VIS is shown in
Figure S4. When the organic monolithic resin contains TiO2 photocatalyst, the decrease in the
contact angles was slowest. Although TiO2 photocatalyst may absorb ultraviolet light, fluorine
polymer could not be decomposed. On the other hand, organic monolithic resin with more TiO2
photocatalyst quickly appeared in the hydrophilic epoxy resin as a result of the decomposition of
fluorine polymer.
Figure S3. Contact angles under ultraviolet exposure. The UV intensity was 2 mW/cm2.
0102030405060708090
100
300 400 500 600 700Wavelength [nm]
Ref
lect
ance
[%]
ST-01
0 200 400 600 800 1000 1200 1400 1600Irradiation time [h]
0
20
40
60
80
100
120
140
160
Without TiO2
TiO2 3.1×10-5 Mass% Black light
Sample
UV Intensity 2 mW/cm2
TiO2 31× 10-5 Mass%
Con
tact
ang
le [
o ]
3. Contact angles calculated from the Cassie function
Figure S5 shows a schematic diagram of the simple model of the contact angle in the organic
monolithic resin with TiO2 photocatalyst. The contact angle is calculated using the Cassie model [5].
Then, the contact angle of the organic monolithic resin with TiO2 photocatalyst was 148.8 when the
TiO2 photocatalyst was made superhydrophilic by applying ultraviolet light. On the other hand, the
contact angle of the organic monolithic resin without TiO2 photocatalyst was 150.3. Therefore,
incorporating TiO2 photocatalyst into the organic monolithic resin has an insignificant effect on the
contact angle.
Figure S5. Schematic diagram of the simple model of the contact angle in an organic monolithic resin with TiO2 photocatalyst. The Cassie model was used [5].
Figure S4. Diffuse reflectance spectrum of UV/VIS in TiO2 photocatalyst (ST-01).
Air
Area of frame modified by fluorine polymer
Porosity of organic monolithic resin: 80 % ⇒ l = 0.8Maximum Mass % of TiO2 particles in organic monolithic resin: 5 % ⇒ m = 0.05
l 1- l
Area of baredTiO2 particles
1- m m
Frame
Here, when qa, qp and qf were the contact angle of air, fluorine polymer modified frame and superhydrophilic TiO2 particle respectively, Cassie function in this model was described as follows.
Apparent contact angle q on the surface of the organic monolithic resin was calucurated, when qa, qp and qf were putted 180, 0 and 110 degree respectively.
4. Phase separation between the mixture and the solvent
Figure S6 shows the phase separation between the mixture and various organic solvents. For the
cases of toluene and xylene, phase separation between the mixture and the solvent occurred quickly.
However, phase separation did not occur in the mixture with acetone.
5. Coloring of the highly hydrophobic monolithic resin
Extra pigment was eliminated by washing the PEG. The discoloration of the dye did not appear
after 24 h (Figure S7). On the other hand, the hydrophobicity performance was similar to that in the
rubbing test.
Figure S6. Phase separation between the mixture and the solvent.
Figure S7. Colored highly hydrophobic coating and discoloration test by washing the film.
RedBlueWhite
Discolored testing
UV-VIS
After placing samples in the water, a change with the color ends within 4 minutes.
Mixture with dye.Discolored testing.
Red: New CoccineBlue: Brilliant Blue FCF
(Tar dye)
Soaking sample in water: 200 ml.⇒ UV-VIS
(absorption of water)
Wave length [nm]
Rat
e of
Abs
orpt
ion
After 24 hours, the discoloring of dye isn’t appeared.≅ Corresponding time of
PEG washing in figure 2.Similar performance of the hydrophobicity in rubbing test.
6. Prepared conditions of the highly hydrophobic monolithic resin
Table S1 shows the prepared conditions of the highly hydrophobic monolithic resin. Then, the
important conditions in the present study are as follows.
180
24Te
trad C
14.3
Toma
id 24
5-S
14.3
MW 20
071
.4-
--
-0.0
000.0
000.6
1-
Figur
e S1,
S32
8024
Tetra
d C14
.3To
maid
245-
S14
.3MW
200
71.4
--
--
0.000
13.1
×10
-50.6
1-
Figur
e 4, S
1, S3
380
24Te
trad C
14.3
Toma
id 24
5-S
14.3
MW 20
071
.4-
--
-0.0
0131
×10
-50.6
1-
Figur
e 44
8024
Tetra
d C14
.3To
maid
245-
S14
.3MW
200
71.4
--
--
0.005
6.2×
10-5
0.61
-Fig
ure 4
580
24Te
trad C
9.52T
omaid
245-
S9.5
2MW
200
47.62
33.3
63.6
0.00.0
0-
-0.6
1Fig
ure 6
680
24Te
trad C
9.52T
omaid
245-
S9.5
2MW
200
47.59
33.3
63.6
0.10.1
3-
-0.6
1-
Figur
e 67
8024
Tetra
d C9.4
6Tom
aid 24
5-S
9.46M
W 20
047
.3033
.162
.80.7
1.26
--
0.61
-Fig
ure 6
880
24Te
trad C
9.22T
omaid
245-
S9.2
2MW
200
46.08
32.3
59.8
3.25.9
8-
-0.6
1-
Figur
e 69
100
1Te
trad C
15.41
4,4'-D
iamino
dicyc
lohex
ylmet
hane
7.70M
W 20
048
.9725
.349
.72.6
5.03
--
0.61a
ceto
neFig
ure 7
, 810
100
1Te
trad C
15.41
4,4'-D
iamino
dicyc
lohex
ylmet
hane
7.70M
W 20
048
.9725
.349
.72.6
5.03
--
0.61x
ylene
Figur
e 711
100
1Te
trad C
15.41
4,4'-D
iamino
dicyc
lohex
ylmet
hane
7.70M
W 20
048
.9725
.349
.72.6
5.03
--
0.61t
oluen
eFig
ure 7
1210
01
Tetra
d C15
.474,4
'-Diam
inodic
ycloh
exylm
etha
ne7.6
3MW
200
48.96
25.5
49.9
2.54.8
3-
-0.6
1-
Figur
e 10
1390
1Te
trad C
15.47
4,4'-D
iamino
dicyc
lohex
ylmet
hane
7.63M
W 20
148
.9625
.549
.92.5
4.83
--
0.61
-Fig
ure 9
, 10
1411
01
Tetra
d C15
.474,4
'-Diam
inodic
ycloh
exylm
etha
ne7.6
3MW
200
48.96
25.5
49.9
2.54.8
3-
-0.6
1-
Figur
e 9, 1
015
120
1Te
trad C
15.47
4,4'-D
iamino
dicyc
lohex
ylmet
hane
7.63M
W 20
048
.9625
.549
.92.5
4.83
--
0.61
-Fig
ure 9
, 10
1614
01
Tetra
d C15
.474,4
'-Diam
inodic
ycloh
exylm
etha
ne7.6
3MW
200
48.96
25.5
49.9
2.54.8
3-
-0.6
1-
Figur
e 9, 1
0
On fr
ame
OMR-
POF
()
In fra
meOM
R-PI
F(
)
Samp
le Na
me
TiO2 P
hoto
cata
lyst
in So
l solu
sion
Mass
%on
fram
e.Ma
ss %
infra
me.
Mass
%Ma
ss %
PEG
Mass
%
Mat
erial
s for
fram
e in O
rganic
Mon
olith
ic Re
sinPT
FE pa
rticle
sTiO
2 Pho
toca
talys
t
Mass
%Ma
ss %
infra
me.
Solut
ionMa
ss %
Amine
Mass
%
Heat
ingTe
mper
atur
eoC
Heat
ingTim
e [h]
Conc
entra
tion i
n Mixt
ure
FPCo
ncen
tratio
n[M
ass %
inSo
lution
]
Orga
nicso
lvent
for sp
ray
coat
ingRe
mark
Resin
Tabl
e S1.
The
pre
pare
d co
nditi
ons o
f the
hig
hly
hydr
opho
bic
mon
olith
ic re
sin.