SPM2.0 Kickoff Barcelona 26.01 · › 15y+ experience in SPM dopant imaging › 5y experience in...
Transcript of SPM2.0 Kickoff Barcelona 26.01 · › 15y+ experience in SPM dopant imaging › 5y experience in...
SPM2.0 – Kickoff Barcelona 26.01.2017
Infineon Company Overview
Failure Analysis @ Infineon
Scanning Probe Microscopy / SMM @ FA
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Infineon at a glance
Financials Market Position
Business Segments Employees
377 620 897 982
FY 13 FY 14 FY 15 FY 16
[EUR m]
Europe
15,176 employees
More than 36,000 employees worldwide (as of Sep. 2016)
Americas
3,691 employees
Asia/Pacific
17,432 employees
34 R&D locations 19 manufacturing locations
Revenue Segment Result Margin
15.2% 15.5% 14.4% 9.8%
3,843 4,320
5,795 6,473
41%
11%
17%
31%
Automotive
(ATV)
Industrial Power
Control (IPC)
Chip Card &
Security (CCS)
Power Management & Multimarket (PMM)
Revenue FY 2016
# 2 # 1
Automotive Power Smart card ICs
# 2
Strategy Analytics, April 2016
IHS Markit, October 2016
IHS Markit, July 2016
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5.0%
5.7%
6.1%
6.3%
18.7%
Vishay
STMicro
Fairchild
Mitsubishi
Infineon
(incl. IRF)
Top positions in all major product categories
Discrete power semiconductors and power modules
Source: IHS Markit, October 2016
Microcontroller-based smart card ICs
Source: IHS Markit, July 2016
Automotive semiconductors incl. semiconductor sensors
Source: Strategy Analytics, April 2016
Automotive semiconductors
total market in CY 2015: $27.4bn
Power semiconductors
total market in CY 2015: $14.8bn
Smart card ICs
total market in CY 2015: $2.72bn
7.0%
7.7%
10.3%
10.4%
14.2%
Texas
Instruments
STMicro
Renesas
Infineon
NXP
13.3%
15.1%
16.2%
24.8%
30.5%
others
STMicro
Samsung
Infineon
NXP
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Tight customer relationships are based on system know-how and app understanding
EMS partners Distribution partners
ATV IPC CCS PMM
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Product range
Industrial Power Control (IPC)
› Bare die business
› Discrete IGBTs
› Driver ICs
› IGBT modules (high-power, medium-power, low-power)
› IGBT module solutions incl. IGBT stacks
Power Management & Multimarket (PMM)
› Control ICs
› Customized chips (ASICs)
› Discrete low-voltage and high-voltage power transistors
› GPS low-noise amplifier
› Low-voltage and high-voltage driver ICs
› MEMS and ASICs for silicon microphones
› RF antenna switches
› RF power transistors
› TVS (transient voltage suppressor) diode
Chip Card & Security (CCS)
› Smart card (contactless and contact-based) and embedded security ICs
› Turnkey security solutions e.g. OPTIGA™ Trust, OPTIGA™ TPM
› Packaging and service portfolio
› CIPURSE™ open standard based solutions
› Innovative solutions from basic security RFID and memories to high-end security controllers
› Leading technologies e.g. SOLID FLASH™, Integrity Guard, Coil on Module
Automotive (ATV)
› 32-bit automotive microcontrollers for powertrain, safety and driver assistance systems
› Discrete power semiconductors
› Magnetic and pressure sensors
› IGBT modules
› Power ICs
› Radar
› Transceiver (CAN, LIN, Flex Ray™)*
› Voltage regulators
*FlexRay is a trademark licensed by FlexRay Consortium GbR
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Semiconductor technology portfolio
Technology portfolio fits needs of logic and power applications
Digital CMOS: 800nm – 65nmTechnology Nodes (Platform <180nm incl. RF, AMS)
Analog/Mixed Signal: 500nm – 180nm Technology Nodes (CxNA)
eNVM: EEPROM: IMEMR, C9FL, OTP: C5OP (Automotive)
eFlash/EEPROM: 250nm – 65nm CxFL (Chip Card), CxFLA, CxFLN (Automotive)
HV-CMOS: 130nm, C11HV/HN
Analog Bipolar: DOPL, Ax, BIPEP, B4CD, HED
Analog BiCMOS: B6CA, B6CA-CT, B7CA, SPT170
HV-CMOS-SOI, Levelshift(SOI,JI)
Smart Power: 1200-130nm BIP/CMOS/DMOS
SPTx (Automotive, EDP) (BCD)
Smart: CMOS/DMOS, SMARTx, MSMARTx,
SSMARTx, Opto-TRIAC, SPS
Magnetic: BxCAS, C9FLRN_GMR
Opto: OP-DI, OP-TR, OP-C9N, µ-modules
C11TOF
DMOS: 12-500V Planar and Trench
MOSFET (OptiMOS™, StrongIRFET™)
HV-DMOS: Superjunction MOSFET
(CoolMOS™)
IGBT: Planar & Trench 500-6500V,
rev. cond., fast recov. diodes
SiC/GaN: Diode, JFET / power switches
Pressure: BxCSP, TIREPx
Silicon-Microphones: DSOUND
adopted for automotive, industrial and for high reliability requirements
Power/Analog incl. Green Robust
MEMS/Sensors
CMOS
RF/Bipolar
RF BiCMOS: 25GHz – 100GHz: B6HFC, B9COPT, B10C
Bipolar IC: 2GHz...200GHz RF-Bipolar: BxHF SiGe: B7HFM, B7/B9HF_SLC, B7HF200,
HiPAC: Al/Cu Integrated Passives B11HFC
P7Mxx, P7Dxx, P8Mxx RF Switches: C7NP, C11NP
Bipolar/Discretes/MMIC:
RF-Transistoren NF-TR; BxHF(D/M) SiGe: B7HFD/M, B7HF_SD
Leistungsverst.: LDMOS, LDxM, LDxIC, LD9AB RFMOS: HFM
Dioden: NF-DI, Tuner: DxT, Schottky: DxS PIN: DxP
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Package technology portfolio
1) for specialities only 2) phase-out
Through Hole
› TO, DIP SMD › TO ›DSO › SSOP › SupIR ›HBx Leadless › ThinPAK › TDSON › TSDSON ›DirectFETTM
› TISON ›WISON › IQFN ›HSOF › Blade
Power Modules
High Power › Easy › 34mm › 62mm › Econo › Econo-PACK™+ › Prime-PACK™ › IHM › IHV ›Hybrid-PACK™ ›MDIP › T-PAK › STACK
Intelligent Power Modules › IRAM › CIPOS™ › µIPM™
SMD leaded › SOT › SOD › TSOP › TSSOP Flat lead › TSFP › SC
Leadless › TSLP › TSSLP › TSNP Wafer level ›WLP ›WLL
Discretes
Power
Sensors
Through Hole
› PSSO SMD Leaded ›DSOSP › SSOM › TDSO › TISON Open cavity ›DSOF
Mold on LF › P-MCCx Mold › P-Mx.x Chip on Flex › P-FTM UV Globe top › T-Mx.x PRELAM › E-PPxx
Flip Chip
› S-MFCx.x › S-COMx.x
Wafer › Bumped ›Diced
Chip Card Leadframe
based Packages
Wafer Level Packages, Bare Die
Through Hole
›DIP 2)
SMD › PLCC 2)
› TSSOP › TQFP › LQFP ›MQFP Leadless › VQFN ›WQFN › PQFN ›O-LQFN 1)
› XSON ›USON
Power IC Laminate
based Packages
SMD ›OCCN 1,2)
› BGA › LBGA › LGA › xFBGA, xFSGA
Surface Mount Technology (SMD) Wafer Level w/o redistribution
›WLP (fan-in) w/redistribution
›WLB (fan-in)
› eWLB (fan-
out)
Bare Die ›Wirebond › Flip chip
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Our global R&D network
Malacca
Ipoh
Beijing
Morgan Hill
Seoul
Shanghai
Bangalore Torrance
Warstein
Duisburg
Bristol
Augsburg
Neubiberg (Munich)
Padua
Villach
Graz
Regensburg
Dresden
Bucharest
Linz
Warwick
Tewksbury
Karlsruhe
Le Puy Sainte
Réparade
Pavia
Skovlunde
El Segundo
San José
Leominster
Chandler
Singapore
Reigate
Manila
Mesa
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Worldwide manufacturing sites frontend and backend
Dresden Beijing
Wuxi
Batam Warstein Cegléd Malacca
Kulim Leominster San Jose Morgan Hill
Mesa
Tijuana
Temecula
Singapore
Newport
Cheonan
Regensburg Villach
Frontend Backend
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Failure Analysis @ Infineon Munich Group
Siegfried Görlich (IFAG BE QM FA) restricted
IFX Failure Analysis Sites, Managers and Org.-Units : ~490 HC in 21 labs Status: June16
Dresden
Eckl Stefan IFD FE QM D FA
Malacca
Chew Tat Tian IFMY BE QM FA O
Regensburg
Mack Walter IFAG BE QM FA 7
Batam Hamzah Muhammad
Rizal IFBT BE QM FA O
Wuxi
He Huaiyu IFWU QM
Livonia
Sidhu Gordon IFNA QM FA
Tokio
Tsujimura Naoyuki IFJ QM LAB
Munich
Görlich Siegfried IFAG BE QM FA
Kulim Gunaratnam
Vimaleson
IFKM FE QM FA
Regensburg
Zoth Guenther IFAG FE QM R FA
Singapore
Xue Ming IFAP BE QM FA
Morgan Hill
Bouissou Aude IFAM QM PMM RFP
Different site organization with
different tasks or missions
Malacca
Cheong Choke Fei IFMY BE QM FA PD
Beijing
Li Xu IFBJ IPC QM ACM
Seoul Kim Doo
Soon Philip IFKOR QM
Villach
Angerer Helmut IFAT FE QM FA
Warstein-
Belecke Roeckerath Martin IFAG IPC QM ACM
FAR-Lab BE- Lab PTD-Lab PD-LAB FE-Lab FTD-Lab
Temecula
Begoña Dominguez IFAM QM OP LAB
Tijuana
Rich West IRMX BE TIJ
QM FAR
Manila
Begoña
Dominguez
Cheonan Hur Jaehoon
IFPS IPC
ISD QM QA
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Failure Analysis is THE Way toward the Root Cause …
Verification
Localization
Preparation
Imaging
Material Analysis
Corrective
Actions !!
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Failure Analysis Flow, 1st Part: Verification of the Electrical Failure
Goal :Reproduce the electrical failure signature with FA methodology and equipment
– To define failure conditions
– Necessary for failure localization
› Methodology:
– Parametric tests:
– I/O characteristic (leakage, open..)
– Current consumption
– Functional tests:
– Memory tests
– Logic tests
– ATPG tests scan fail
› Equipment:
– Curve tracers
– DC Power supply
– Function generators
– Oscilloscopes
–
Pattern generators
Application boards
Testers: Agilant
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Failure Analysis Flow, 2nd Part: Non Destructive Investigation and Package Preparation
› Non destructive investigation methods to identify
failures on package level without changing the
electrical behavior
– Scanning acoustic microscopy : Using ultrasonic waves
to investigate the package Delamination
– X-Ray: Using X-ray to image the package internal
Bonding problems
– Time Domain Reflectrometry (TDR) : Identify
reflective behavior of a high frequency pulse Contact
open.
› Package preparation to give access to the region of
interest (ROI) without changing the electrical
behavior:
– Local decapsulation
– Repackaging
– Total decapsulation
512MT11
Chip Size Package
AI Processor
>500 bonds
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Failure Analysis Flow, 3rd Part: Failure Localization: Global and Chip Internal
› Identify the physical location of the failure during electrical failure condition:
– Lock-in Thermography : Detect thermal dissipation
– Liquid Crystal Thermography (LCT) : Detect thermal dissipation
– Emission Microscopy EMMI : Image light emission from defects in the active structure of the substrate.
– Thermal Induced Voltage Alteration (TIVA) : Image changes in the external voltage during local heating by an infrared LASER beam.
– Pico and Nano Probing: Measure DC and AC signals on metallization and vias.
– LASER Voltage Probing (LVP) : Using a pulsed IR Laser beam to probe transient signals through the substrate.
– Time Resolved Emission (EmiScope) : backside localization of time resolved photons during switching events.
LI-thermo
TIVA
EmiScope
LVP
Nanoprobing
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Failure Analysis Flow, 4th Part: Physical Failure Analysis and Identification
› Narrow and isolate the failure region by physical preparation
– Dry and wet chemical preparation : Narrow and isolate failure region by step-by-step chemical delayering using highly selective preparation methods.
– Mechanical polishing: Narrow and isolate failure region by layer-by-layer removal.
– Focus Ion Beam (FIB) : In situ high resolution delayering and cross sectioning.
– Dry and wet chemical delineation: Enhance contrast for high resolution imaging.
› Imaging the physical defect
– Optical microscopy
– Scanning electron microscopy (SEM): Surface imaging with resolution down to 1nm
– Transmission Electron Microscopy (TEM): Transmission imaging with an resolution below 1nm
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SMM @ Infineon FA
› 15y+ experience in SPM dopant imaging
› 5y experience in SMM
› Applications:
– High-resolution imaging of implant structures
– Highly sensitive capacitance measurements
› Current and future development:
– Quantitative dopant concentration measurements using calibration sample
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10 µm
n-type concentration:
1016 1017 1018 1019 1020
p-type concentration:
1020 1019 1018 1017 1016
SMM @ Infineon FA
› SMM application for wide band-gap semiconductors (SiC, GaN, etc.)
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surface
GaN
Depth
AlGaN
100 nm
Real (dS11/dV) 2DEG
AlG
aN
GaN
Substra
te
›2D
EG
Scan direction
SMM @ Infineon FA
– SMM probe evaluation for improved SNR and resolution
– FEM simulation using Keysight EMPro to optimize tip-sample-interface: define boundary conditions, cantilever dimension, material etc.
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Contribution to SPM2.0
› Scientific & non-scientific trainings
› Course: “Emerging applications of SPM2.0 technologies in Microelectronics”
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