SLA-SH®nl.dentstore.ro/INNO/Documentatie/2016 Superiority of CWM...20000X Upper Energy - keV Energy...

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SLA-SH® Superiority of CWM Implant Surface When Superiority meet Dental Implant Surface… For Simpler, Speedier, Safer and Superior Implant Dentistry

Transcript of SLA-SH®nl.dentstore.ro/INNO/Documentatie/2016 Superiority of CWM...20000X Upper Energy - keV Energy...

Page 1: SLA-SH®nl.dentstore.ro/INNO/Documentatie/2016 Superiority of CWM...20000X Upper Energy - keV Energy - keV EDAX EDAX Element Wt% At% NK 00.92 03.08 SiK 00.64 01.07 TiK 98.43 95.86

SLA-SH®

Superiority of CWM Implant Surface When Superiority meet Dental Implant Surface…

For Simpler, Speedier, Safer and Superior Implant Dentistry

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Contents

1. Overview of Surface Treatment History

2. SEM & EDAX

3. 3D Illumination Photometry

4. IC & ICP Analysis

5. XPA Analysis

When Superiority meet Dental Implant Surface…

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1990’ 2000’ 2010’ 2015

SLA-SH Surface

Late Placement Marginal bone change Immediate Placement & Faster Healing

Overview

When Superiority meet Dental Implant Surface…

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2. SEM / EDAX

• Test Center :

Dong-Eui University

• Experimental Material :

1 pc of randomly selected implant from each manufacturer

• SEM : Scanning Electron Microscopy

• EDAX or EDX : Energy Dispersive X-ray microanalysis

When Superiority meet Dental Implant Surface…

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For Easier, Simpler & Safer Implant Dentistry Cowellmedi INNO Osstem TS Ⅲ SA

31X 31X

NeoBiotech IS-Ⅱ active Dentium Super Line

31X 31X

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For Easier, Simpler & Safer Implant Dentistry Cowellmedi INNO Osstem TS Ⅲ SA

31X 31X

NeoBiotech IS-Ⅱ active Dentium Super Line

31X 31X

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For Easier, Simpler & Safer Implant Dentistry Cowellmedi INNO Osstem TS Ⅲ SA

31X 31X

NeoBiotech IS-Ⅱ active Dentium Super Line

31X 31X

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Cowellmedi INNO Sample A

300X 300X

Sample B Sample C

300X 300X

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Cowellmedi INNO Osstem TS Ⅲ SA

Upper 1000X

Upper 1000X

NeoBiotech IS-Ⅱ active Dentium Super Line

Upper 1000X

Upper 1000X

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Cowellmedi INNO Sample A

Upper 3000X

Upper 3000X

Sample B Sample C

Upper 3000X

Upper 3000X

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Cowellmedi INNO Sample A

Upper 5000X

Upper 5000X

Sample B Sample C

Upper 5000X

Upper 5000X

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Cowellmedi INNO Sample A

20000X Upper

20000X Upper

Energy - keV

Energy - keV

EDAX EDAX

Element Wt% At%

NK 00.92 03.08

SiK 00.64 01.07

TiK 98.43 95.86

Matrix Correction ZAF

The foreign substance is not removed and it seems masking material

Element Wt% At%

TiK 100.00 100.00

Matrix Correction ZAF

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Sample B Sample C

20000X Upper

20000X Upper

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

NK 03.01 09.59

TiK 96.99 90.41

Matrix Correction ZAF

Element Wt% At%

NK 01.25 04.16

TiK 98.75 95.84

Matrix Correction ZAF

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Cowellmedi INNO Sample A

20000X Middle

20000X Middle

Energy - keV

Energy - keV

EDAX EDAX

Element Wt% At%

CK 03.21 10.70

NK 04.10 11.74

TiK 92.69 77.56

Matrix Correction ZAF

Foreign substance exists

Element Wt% At%

TiK 100.00 100.00

Matrix Correction ZAF

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Sample B Sample C

20000X Middle

20000X Middle

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

NK 00.89 02.99

TiK 99.11 97.01

Matrix Correction ZAF

Element Wt% At%

CK 02.66 08.58

NK 03.13 08.66

OK 04.07 09.86

TiK 90.14 72.90

Matrix Correction ZAF

Foreign Substance exists

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Cowellmedi INNO Sample A

20000X Lower

20000X Lower

Energy - keV

Energy - keV

EDAX EDAX

Element Wt% At%

NK 01.88 06.16

TiK 98.12 93.84

Matrix Correction ZAF

Element Wt% At%

TiK 100.00 100.00

Matrix Correction ZAF

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Sample B Sample C

20000X Lower

20000X Lower

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

NK 03.56 11.20

TiK 96.44 88.80

Matrix Correction ZAF

Element Wt% At%

NK 05.14 15.54

AlK 00.79 01.24

TiK 94.07 83.22

Matrix Correction ZAF

Foreign Substance (alumina) exists because the sample is sandblasted with alumina and not washed

completely

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Sample C Sample C

Foreign Substa

nce

Foreign Substan

ce

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

CK 51.69 81.01

TiK 48.31 18.99

Matrix Correction ZAF

소견 : 불순물 제거가 안되는 현상으로 보임

Element Wt% At%

CK 62.19 74.30

NK 06.13 06.28

OK 16.39 14.70

SiK 01.03 00.53

MoL 01.63 00.24

ClK 01.58 00.64

TiK 11.05 03.31

Matrix Correction ZAF

TBore part / Masking material left

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Sample B Sample B-2

Foreign Substan

ce

Foreign Substan

ce

Energy - keV

Energy - keV

EDAX EDAX

Element Wt% At%

CK 06.43 21.39

SiK 01.05 01.49

TiK 92.52 77.12

Matrix Correction ZAF

Element Wt% At%

NK 04.65 14.29

TiK 95.35 85.71

Matrix Correction ZAF

Improvement

The way to sort out : Changing sending media & Acid treatment before & after sending media

No complete wash out before & after masking

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Cowellmedi INNO - 2 Sample B-2

20000X Lower

20000X Lower

Energy - keV

Energy - keV

EDAX EDAX

Element Wt% At%

NK 05.43 16.41

TiK 94.57 83.59

Matrix Correction ZAF

Element Wt% At%

TiK 100.00 100.00

Matrix Correction ZAF

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Sample C-2 Sample C-3

20000X Upper

20000X Upper

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

NK 02.46 07.59

AlK 06.45 10.32

TiK 91.09 82.09

Matrix Correction ZAF

Element Wt% At%

CK 05.97 19.27

NK 02.39 06.62

TiK 91.63 74.11

Matrix Correction ZAF

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Sample C - 2 Sample C - 2

Foreign Substan

ce

Foreign Substan

ce

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

CK 12.43 33.60

NK 03.59 08.32

NaK 01.04 01.47

AlK 00.74 00.89

TiK 82.20 55.72

Matrix Correction ZAF

Element Wt% At%

CK 08.78 25.69

NK 03.83 09.60

AlK 01.09 01.42

TiK 86.29 63.28

Matrix Correction ZAF

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Sample C - 2 Sample C - 2

Foreign Substan

ce Foreign Substance

Foreign Substan

ce

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

NK 01.44 03.37

OK 19.08 39.19

NaK 01.10 01.56

AlK 03.95 04.81

TiK 74.43 51.06

Matrix Correction ZAF

Element Wt% At%

CK 51.69 81.01

TiK 48.31 18.99

Matrix Correction ZAF

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Sample C - 3 Sample C - 3

Foreign Substan

ce

Foreign Substan

ce

Energy - keV

Energy – keV

EDAX EDAX

Element Wt% At%

CK 04.89 14.17

NK 03.43 08.50

OK 05.12 11.13

AlK 05.97 07.70

TiK 80.58 58.50

Matrix Correction ZAF

Element Wt% At%

CK 04.61 14.16

NK 00.70 01.85

OK 04.62 10.65

AlK 06.54 08.95

TiK 83.53 64.39

Matrix Correction ZAF

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Sample B Sample C-3

Foreign

Substance

Foreign

Substance

Sample C-2 Sample C-2

Foreign

Substance

Foreign

Substance

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Surface is very uneven due to the lack of reaction time, temperature, post cleaning and concentration.

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Surface is very uneven due to the lack of reaction time, temperature, post cleaning and concentration.

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3. 3D Illumination Photometry

• Test Center :

Daegu Mechatronics & Material Institute

• Experimental Material :

1 pc of randomly selected implant from each manufacturer

• 3 D illumination Photometry :

3-Dimensional Interactive Display – Surface roughness

When Superiority meet Dental Implant Surface…

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3D Ra=2.53um

3D Ra=2.7um

CWM-INNO ASD (Alumina Sanding)

3D Ra=2.03um

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3D Ra=1.815um 2D Ra=1.312um

CWM-SLA (RBM Sanding)

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3D Ra=1.875um 2D Ra=1.377um

CWM-SLA+NaOH (RBM Sanding)

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Sample A

3D Ra=2.79um 2D Ra=1.997um

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Sample B

3D Ra=1.1um 2D Ra=0.687um

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Sample C

3D Ra=2.37um 2D Ra=1.757um

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Comparison

Cowellmedi INNO Ra= 1.57um~1.78um

Sample A Ra= 1.48um~3.11um

Sample B Ra= 0.61um~1.13um

Sample C Ra= 1.31um~2.65um

Div. Ra=0.21um

Div. Ra=1.63um

Div. Ra=0.52um

Div. Ra=1.34um

1

4

2

3

Min. Max. Uniform.

1

3

4

2

Ave.

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4. IC & ICP Analysis

• Test Center :

KRISS (Korea Research Institute of Standards and Science)

• Experimental Material :

4 pcs of randomly selected implant from each manufacturer

• IC : Ion chromatograph – separation & quantitative analysis in

cation & anion ion of organic & inorganic molecule

• ICP : Inductively coupled plasma-atomic emission spectrometer

Metal element analysis using inductively coupled plasma

AES (Many elements can be analyzed at once )

When Superiority meet Dental Implant Surface…

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IC

CWM-SLA 4ea

Sample A

4ea

Sample B

4ea

Sample C

4ea

CWM SLA 10ea

CWM SLA+ NaOH (10ea)

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ICP

CWM - SLA 4ea

A

4ea

B

4ea

C

4ea

CWM-SLA 10ea

SLA+ NaOH 10ea

Non NaOH treamented sample shows Na

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5. XPA Analysis

• Test Center :

- KRISS (Korea Research Institute of Standards and Science)

- ECC (Electro Ceramics Center)

• Experimental Material :

1 pc of randomly selected implant from each manufacturer

• XPA : X-ray Photoelectron Spectroscopy

- To analyze composition and chemical bonding statue measuring

photoelectron energy by X-ray of incident light to surface of the

samples, which enables to map element composition per portion

and depth profiling.

When Superiority meet Dental Implant Surface…

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Testing

Center Testing Provision

Cowellmedi (2012.07.06)

A (2012.04.06)

B (2012.04.06)

C (2012.04.06)

ECC

EDAX-Upper Si N/D 0.64 N/D N/D

EDAX-Middle

C N/D 3.21 2.66 N/D

O N/D N/D 4.07 N/D

EDAX-Lower Al N/D N/D 0.79 N/D

KRISS

IC

CI 0.012 0.024 0.027 0.071

NO2 N/D 0.027 0.019 0.02

NO3 0.028 0.031 0.03 0.023

SO4 N/D 0.002 0.002 N/D

ICP Na N/D N/D N/D N/D

Si N/D 0.02 N/D N/D

XPS-Upper

N N/D 0.47 1.57 N/D

Na N/D N/D N/D N/D

P N/D N/D N/D N/D

Si N/D 5.24 4.87 2.65

XPS-Middle N 3.77 2.17 1.8 0.99

Si N/D 5.95 N/D N/D

XPS-Lower N N/D 0.92 2.35 1.22

Si N/D 4.67 N/D N/D

Comparison

1 4 3 2 Rank

3th distilled water applied when final cleansing

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When Superiority meet Dental Implant Surface…

Thank you !