Servicii de micro şi nanofabricaţieîn cadrul facilităţii IMT-MINAFAB

Raluca Müller, Radu Popa

IMT- Bucharest, Romaniawww.imt.ro

Contact: Tel:: +40 21 269 0770; Fax: + 40 21 269 0772

Erou Iancu Nicolae 126A St., 077190, Voluntari- Ilfov, Romania

IMT Supervised by the National Authority for Scientific Research (ANCS), Ministry of Education, Research, Youth and Sport;

Acting autonomously, like a scientific company; Having the status of a public institution.

Mission: Integrating R&D with education and training and with support for industry (services, technology transfer); networking at national and international level innovation, in the field of micro-nanotechnologies and microsystems (RF- MEMS, photonics devices and circuits, sensors, bio-nano-info technologies, CNT and graphenebased sensors and nanodevices, (bio)sensors, integrated nano-bio systems, microfluidics, microactuators).

Main targeted applications: communications, automotive, biomedical, health, environment, energy, robotics.

Training activities: master courses, internships, hands-on labs for students, PhD supervising and post-doc programs.

Organization

→→→→ Department for Scientific and Technological Research

→→→→ Technical Department

The present R&D activities of the institute are structured 4directions of research corresponding to the 4“centers”,focusing the activity of 10 R&D laboratories.

IMT MINAFAB- Facility : providing state of the art

services in micro-nanotechnology and hands-on

education and training.

Organization:

Department for Scientific and Technological Research

4 centers, grouping 10 R&D laboratories

► MIMOMEMS: European Research Centre of Excellence “Micro- and nano systems for radiofrequency and photonics”

► CNT- IMT: Centre of Nanotechnologies” (under the aegis of the

Romanian Academy)

► CINTECH: Research Centre for integration of technologies” (micro-nano-biotechnologies)

► CENASIC: Research Centre for nanotechnologies and carbon –based nanomaterials”

Technological Department

● Clean rooms – class 1000, and 10 000● Mask shop including: pattern generator – DWL 66fs Laser

Lithography System from Heidelberg Instruments Mikrotechnik GmbH ● EBL: Electron Beam Nanolitography from RAITH- nanoenginering

work station

► MIMOMEMS: Research Centre of Excellence “Micro- and nanosystems for radiofrequency and photonics”

•••• Micro-Nano Photonics Laboratory - L3•••• Micromachined structures, microwave circuits and devices

Laboratory (RF-MEMS) - L4

► CNT-IMT: Centre of Nanotechnologies- under the aegis of Romanian Academy

•••• Laboratory of Nanobiotechnology - L1

•••• Nano-Scale Structuring and Characterization – L6

•••• Molecular nanotechnology laboratory - L9

► CINTECH:Research Centre for Integration of Technologies

•••• Microsystems in Biomedical and EnvironmentalApplications Laboratory - L2

•••• Ambiental Technologies Laboratory

•••• Micro and Nanolfluidics Laboratory

► CENASIC: Research Centre for Nanotechnologies and Carbon-based Nanomaterials

•••• Simulation, Modelling and Computer Aided Design Laboratory

•••• Reliability Laboratory

The research laboratories of IMT-Bucharest are involved in joint research with international and national partners, including companies, based on a multidisciplinary approach, promoting the convergence of micro-nano-bio- info technologies. Main topics:

►MEMS based microsensors and actuators for bio-medical, environmental applications and robotics: pressure sensors, accelerometers, microgrippers

► RF-MEMS devices and circuits: design, modelling and manufacturing of dielectric membrane supported inductors, capacitors, filters and antennae based on silicon and GaAs

micromachining; micromachined millimetre and sub millimetre wave receiver modules, SAW interdigitated traducers

► Photonic devices and MOEMS (waveguides, optical couplers, µring filters and resonators; grating-based microstructures, tuneable interferometers based on movable micromirrors,

optical sensors), photonic circuits for optical interconnections

The research laboratories of IMT-Bucharest are also developing:►CNT and graphene based micro-nanostructures for sensing and interconnections►microfluidic devices

►biochips for biological materials investigation and detection (proteins, DNA, enzymes) on various substrates (silicon, glass, polymers), microarrays, biosensors► silicon nanoelectrode arrays, porous silicon layers (El, PL and bio-active properties); field emission nanostructures;

► magnetic nanostructures

Research topics

IMT- MINAFAB: facts

IMT-MINAFAB as an integrated cluster of new experimental laboratories initiated and operated by multidisciplinary research groups and other equipments that can be used for production (mask shop, wafer processing etc.) which are managed by execution personnel, from the Technological Department.

IMT- MINAFAB: facts

• State of the art research facility

• Center of services for micro-nanofabrication

• Platform of interaction as open-centre for research and education-by-research, focused on multidisciplinary innovation and knowledge transfer to industry.

• Enables highly efficient exploitation of IMT's existing tangible and intangible assets in nano-science/technologies: clean-room facility,

advanced equipments, multidisciplinary knowledge and experience,

partners and clients.

• Complex technological platform: CAD tools, mask shop sector,

analysis and characterization, nanobio fabrication, reliability tests.

• Access is facilitated in a variety of ways, with notable accent on

developing common R&D projects and on offering direct access of innovative companies to nanoscience and nanotechnology expertise

and tools.

• Accumulated funding based on:

� three projects for national networks (2005-2008) -NanoScaleLab and NanoBioLab labs created in this context: nuclei of some current experimental labs .

� four infrastructure projects (2006-2008) - extension of capabilities.

� eight infrastructure projects from the “Capacities”programme (2007-2009) - five of them consolidated the “Centre of nanotechnologies”; reconstruction/updating of the premises.

� MIMOMEMS project of centre of excellence, funded by the EU- REGPOT.

� Various research projects in national programmes.

� Structural Funding

� 2005: Starting the investments in a new clean room;� 2006-2009: about 7 millions of Euro in equipments only; a

new clean room (200 sqm, operational since2008)

► Inauguration of the experimental facility IMT-MINAFAB, an open centre of micro- and nanofabrication (April 2009):

– Interdisciplinary research;– Education and training (M. Sc., Ph.D., postdoctoral

etc.);– Access for companies.

� 2010-2013: a new campaign of investments, based mainly on structural funding

► Extending cooperation with industry

– In European consortia (especially within ENIAC-JU, FP7): Thales TRT, France; NXP (Philips), IMST GmbH, Germany

– Partnerships with Infineon Technologies Romania and Honeywell Romania

IMT MINAFAB Infrastructure:

→ is a unique experimental facility in micro- and nanotechnologies, open to:

-multidisciplinary research,

-education and

-industry.

This infrastructure has a unique position in this region of Europe, due to the following features:

►integrates “micro” with “nano” in a complete facility, providing tools from computer-aided simulation and design, to wafer fabrication and reliability testing.

►is an “open” facility, following the best known models of interaction in the so-called “knowledge triangle”.

IMT- MINAFAB Facility

�Main facilities:

–A class 1000 clean room (220 sqm) for the mask shop and the most demanding technological processes (in use since September 2008);

–A class 100,000 clean room, the so called “Grey Area”(200 sqm), mostly for the characterization equipments (in use since September 2008);

–A class 10,000 clean room (105 sqm) for thin layer deposition by CVD techniques: LPCVD, PECVD; DRIE; RTP etc.

Clean room, class 1,000

Large range of servicesMain categories:

-micro/nanofabrication for devices and systems

-inspection, analysis and characterization of surfaces, films, crystals, nanostructures

-design, modeling and simulation

-complex RDI services - from design, to reliability testing

New technologies for fabrication and characterization-nanolithography, soft-lithography and replication.

-rapid prototyping: dip-pen nanolithography, 3D and inkjet printing.

-nanomechanical characterization of materials

Silicon Wafer

Photolitographic mask

Processed wafer

Wire bonding(part of packaging

process)

Processing chain

Testing

GaN SAW structure with fingers and interdigits 300 nm wide resonating at a frequency close to 4 GHz

3.2 3.6 4 4.4 4.8

Frequency (GHz)

SAW_300 nm

-70

-60

-50

-40

-30

S21 p

ara

mete

r [d

B]

3.93 GHz-67.49 dB

MSM photodetector based based

on on subwavelengthsubwavelength

interdigitatedinterdigitated electrodeselectrodes

Experimental PCs optical waveguide divisor configuration integrtatedwith an optical waveguide,

using EBL nanolithography

Ground speed sensor at 77 GHz

EXAMPLES

IMT-MINAFAB views

17

Infrastructure: IMT-MINAFAB views

Infrastructure: IMT-MINAFAB views

Infrastructure: Capabilities and Equipments - Highlights

20

� Computation, Simulation and Design� High performance computing server - IBM x3850 HPC server - 32 cores XEON

X7350 @ 2.93 GHz, RAM 200 GB, HDD 1.5 TB

� Coupled analysis for MEMS - CoventorWare 2011 (COVENTOR, USA) - ARCHITECT, DESIGNER, ANALYZER, MemElectro, MemMech, CoSolveEM, MemETherm, MemPZR, MemPZE, Damping MM, InertiaMM, MemHenry, MemCFD, Netflow, SwitchSim, ReactSim, MemFSI, BubbleSim,

DropSim, SEMulator3D, EM3D ; Ansys Multiphysics 12.1 (ANSYS, USA) - structural, thermal,

acoustic, electro magnetic and coupled field analyses; COMSOL Multiphysics

� Photonic components - simulation, modeling and design - Opti FDTD 8.1, Opti-

HS, OptiBPM 9.0, OptiGrating (Optiwave, Canada)

� Microwave and millimeter wave circuits and microsystems: design and modeling

- IE3D, CST, FIDELITY (Zeland, USA)

� Atomistic DFT calculations: electronic structure calculations and ab initio molecular

dynamics simulations of molecules and solids - SIESTA (ICMAB-SIESTA), Inelastica

MI-Lab-on-Chip - FP6 STREP/NMP

MEMSAS - CEEX

Capacitive microphone optimization

Si microreflectoroptimization

Micromanipulation element (microgripper)

First principles electronic structure calculations

LoC for molecular imaging agents

IMT and European Cooperation

► IMT was involved in 15 FP6 European projects

► IMT was and is involved in 12 FP7 projects

► IMT is involved 4 ENIAC (Nanaoelectronics) projects

► IMT was and is involved 6 MNT ERA-NET projects and 1 COST project

Exemples:

• SMARTPOWER- Smart integration of GaN & SiC high power electronics for industrial and RF applications ", IP FP7-ICT- contract no. 288801, 2011 - 2014

Coordinator: Thales SA - Thales Research & Technology, France

• FlexPAET- Flexible Patterning of Complex Micro Structures using Adaptive Embossing Technology, IP, NMP, 2008-2010

Coordinator: Fraunhofer Gesellschaft zur Förderung der angewandten Forschunge.V. Fraunhofer Institut für Produktionstechnolgie (IPT), Germany

IMT and European Cooperation

A common European virtual lab LEA (Associated European Laboratory) in RF- MEMS, affiliated to CNRS, was created in 2009, including:

LAAS/CNRS, Toulouse, France;IMT-Bucharest, RomaniaFORTH, Heraklion, Greece

This lab is the second common CNRS, French- Romanian lab (the first one being created in the field of mathematics).

IMT has an active participation in European Technological Platforms:

- ENIAC (Nanoelectronics)- Nanomedicine, EPoSS (Smart System Integration)- MINAM (Technology Platform for Micro- and Nano Manufacturing )- Photonics 21

Other International Partnerships

� Apart of cooperation with dozens of organizations from Europe in EU projects IMT- Bucharest was and is involved in a great number of bilateral inter-guvernamental European projects (especially with Italy, France, Belgium, Greece, Rep. Moldova, Slovakia)

� Outside Europe, IMT- Bucharest has also bilateral guvernamentalcooperation with:

� South - Africa: Univ. of Pretoria� Korea - KERI Changwon� Japan - Institute of Advanced Energy, Kyoto University

Bilateral Agreement- institute to institute with:

- KETI (Korea Electronics Technology Institute), Korea

- Sungkyunkwan University, Suwon, Korea

- Inst. of Electrical Eng. and Nanotechnology “D.Ghitu” Rep.Moldova

- Université catholique de Louvain -ICTM Institute, Louvain La Neuve, Belgium

The experience of IMT in cooperation with industry in European projects

► Thales Research and Technology (TRT), Paris in

- FP7: SMARTYPOWER, NANOTEC

- ENIAC: MERCUR, NANOCM

► NXP Semiconductor Netherlands BV (Philips) in: ENIAC:SE2A

► IMST GmbH, Germany in: FP7 MEMS4MMIC

MOTORBRAIN; Infineon Technologies AG Germany, Siemens Germany ZF Friedrichshafen AG Germany, AVL List GMBH Austria, NXP Semiconductors BV Netherlands, Volkswagen AG, Germany

•In the period 27- Feb. 2012- 2 March 2012, two FP7 meetings are organized at IMT – Bucharest

• SMART POWER –IP, coordinator Thales TRT, Paris, 15 partners• MEMS4MMIC- STREP coordinator IMST, Germany, 8 partners

Cooperations with multinational companies, from Romania

► Honeywell Romania

•••• Agreement of cooperation, IMT offering scientific service

•••• Access to technology and host of equipments

► INFINEON Technologies Romania

•••• Partners in ENIAC project : MOTORBRAIN: Nanoelectronics for Electric Vehicle Intelligent Failsafe Drive Train;Coordinator: Infineon AG, Germany - IMT role: partner

•••• Organization of common actions in Romania as:- NanoElRei Summit: „NanoElectronics in Romania: Research-education-industry”: 2010, 2011

- Workshop “New trends in Automotive electronics and semiconductor” -satellite event to CAS 2010 (CAS is an IEEE event at 35th edition in 2012, organized by IMT- Bucharest)

- Co-organizer of the European Semiconductor Device Research Conference (EUROPEAN SOLID–STATE DEVICE RESEARCH CONFERENCE – ESSDERC) and the European Conference on Semiconductor Circuits (EUROPEAN SOLID–STATE CIRCUITS CONFERENCE – ESSCIRC) 2013

Educational activities at IMT

�New Master (M.Sc. Courses) at the Faculty for Electronics, Communications and Information Technology, “Politehnica”University of Bucharest starting October 2009 and held in IMT (with

access to experimental facilities).

• Microsystems:- Intelligent sensors and microsystems;- Microphysical characterization of micro and nanostructures;

• Micro- and Nanoelectronics: - Advanced Technological Processes

• Electronic Technology for Medical Applications:- Micro- and Nanotechnologiesfor Medical Applications

►Hands-on courses

• “Microsensors”, for students of year IV, Faculty of Electronics, Tele-

communications and Information Technology, “Politehnica” University of Bucharest: Applications lab at IMT using MINAFAB Facility

• Applications lab for RF-MEMS master course

Field Emission Gun Scanning Electron Microscope (FEG-SEM)

Nova NanoSEM 630

FEI Company, USA

NanoScaleLab

- ultra high resolution in the nanoscale range, for a variety of applications

that involve sample characterization, analysis for S/TEM sample

preparation

Research

- Materials Qualification

- Surface morphology

inspection

- Nanometrology

- Device Characterization

Main current cooperation

- INFN Rome

- FORTH Heraklion

- Univ. Salerno

- Univ. Kyoto

NanoScale

Lab

Electron beam lithography and nanoengineeringworkstation - e_Line

Raith, Germany

- high resolution FE SEM

- direct writing Electron Beam nanoLithography (EBL)

- nanomanipulation: e-beam induced deposition (EBID), e-beam

induced etching (EBIE)

Stage:

laser interferometer;

100mmx100mm;

2nm resolution

Minimum line width:

10-20nm

Stitching accuracy:

40nm

. Two different structures with fingers and interdigit spacing 100nm and 200nm

wide respectively have been processed, using PMMA resist with a thickness of 200 nm. The MSM structure has 500 fingers and 499 interdigits spacing for the first structure and 250 fingers and 249 interdigits spacing for the second one. The length of the digits was 100 µm. A semitransparent Ni/Au (5nm/10nm)

metallization was deposited by lift-off.

100 nm wide fingers/interdigitspacing

GaN membrane

supported UV

Photodetector-

Published in Thin

Solid Films (2011) pp

2158-2161

E. Budianu, M. Purica, A. Dinescu, E. Manea “Metal-Semiconductor-Metal photodetector on silicon insulating wafersbased on nanoscale interdigitated electrodes”, EMRS Fall meeting 2009, September 14-18, Warsaw, Poland

Schematic cross-section of the membrane MSM UV detector structure.

MSM photodetectors on silicon

NanoBioLab

Combined Time Resolved and Steady State Fluorescence Spectrometer - FLS920P - Edinburgh Instruments, UK

Zeta Potential and Submicron Particle Size Analyzer - DelsaNano -Beckman Coulter, USA

Applications

• Formulation / tableting

• Final QC

• Formulation stability

• Research

– Virus, bacteria

– protein applications (aggregation)

– bio-nanoparticles

– Lyposomes, lipids, polysaccharides

– Colloid drug carrier systems

– Parenteral and oral drugs

– micelles

• Zeta potential of tablet surface

Applications: photophysics, photochemistry, biophysics and

semiconductor.

Biomedical field: study of enzymes, dynamics and structure of

nucleic acids, protein folding and DNA sequencing.

Pharmaceutical : monitoring drug interactions.

Materials physics: study nanostructures such as quantum wells

and quantum dots; characterisation of doping or impurity level in

semiconductors.

010

110

210

0 2 4 6 8 10 12 14 16 18

4.5

0.0

-4.5

Cou

nts

Resid

ua

ls

Time/nsFluorescence decay of BSA-Cy3

Characterization of photonic waveguides by

Scanning Near Field Optical Microscopy (SNOM)

AFM image of a dielectric

loaded plasmon polariton

waveguide acquired

simultaneously with the SNOM

image

Evanescent field in a dielectric

loaded plasmon polariton

waveguide measured with

SNOM working in photon

scanning tunneling

microscopy (PSTM)

Contcat: Dr. Cristian Kusko

AFM image of a dielectric

loaded plasmon polariton

waveguide acquired

simultaneously with the SNOM

image

Thank you for your attention!

Further information: www.imt.ro