Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the...
Transcript of Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the...
Roll-to-roll ALD prototype for 500 mm wide webs
Tapani Alasaarela
2012 AIMCAL Web Coating and Handling Conference
October 2012 Beneq © 2012
Company info
Established: 2005, Finland. Ownership: Privately owned, venture capital financed. Products: Industrial and research equipment for thin film coatings based on ALD (atomic layer deposition) and atmospheric aerosol technologies. Strong application development and coating
service offering. Comprehensive IPR-portfolio with more than 105 patent families. Markets: Solar energy (photovoltaics and thermal), optical, flat glass (in-line
and off-line), flexible and organic electronics, medical and lighting. Personnel: 85 Main office: Vantaa (Helsinki), Finland. Sales offices: Germany, China, USA (Beneq, Inc.). Sales Network: 34 sales representatives in
Europe, the Middle-East, Asia, Oceania and South-America.
Courtesy of Planar S
ystems, Inc.
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ALD process and properties
Al2O3: ~0.1 nm /cycle
Properties & Benefits • Low process temperatures (< 100 °C) • Nanoscale thickness accuracy • Dense, conformal, pinhole-free • Engineered new functional materials
1. Introduction of gases: fast
2. Chemical reaction: fast
3. Purging: slow
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Product lifetime challenge
Photo VTT
Flexible photovoltaics Flexible display Flexible OLED lighting
Photo VTT Photo VTT
Requirement for water vapor transmission rate (WVTR) of 10-6 g/(m2 day)
SOLUTION → single layer barrier by roll-to-roll atomic layer deposition
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R2R/Spatial ALD – paradigm change
>> 10 $/m2
<< 1 m2/h >100 nm/h
Large-area (batch) ALD
Single wafer ALD
Spatial/Roll-to-roll ALD
Semiconductor
Packaging, photovoltaics, lighting, flexible electronics
Solar, optical, lighting, medical
<10 $/m2 ~1-20 m2/h
~100 nm/h
< 1 $/m2 >20 m2/h
~6000 nm/h
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Beneq/ASTRaL R2R ALD approach
Basic spatial ALD approach is disclosed in 1970’s patents (US4058430, 1977)
Prec
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Prec
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r ”B
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Gas
buf
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Gas
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Gas
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1 ALD cycle Beneq © 2012
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Beneq/ASTRaL R2R ALD approach
4 ALD cycles (+rotation)
Minituarization
Scaling width
N ALD cycles (+ recitative movement)
Continuos ALD process
R2R ALD process
compatible process
R2R ALD advantages
Beneq R2R ALD technology:
Practical & scalable approach
Potential for low cost of ownership
Compatible with different webs
Compatible with existing vacuum web coating systems
Leverages on OEM parts (coaters, pre/post-treatment)
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R2R ALD productivity aspects
ALD precursors, Al2O3 Trimethylaluminum (TMA), low grade (< 1 $/g) Titanium tetrachloride (TiCl4) costs even less Water or alternative oxidizers
Material consumption < 1 g/m2
Inert gas (N2) flows in 10s of SLM’s Maintenance
In principle ”clean process” Moving/wearable part maintenance Maintenance of filter used for deactivating precursors
Cost of ownership Estimated CoO < 2$/m2 for mass production, < 1$/m2 in longer
term
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Continuous ALD process
Measurement limit (0.002g/(m2 day) was reached with 6.3 m/min linear speed
Growth per cycle (GPC) varies as a function of dose and substrate speed
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Continuous ALD process
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Roll-to-roll ALD system WCS 500
ALD
R2R ALD roadmap: 2008 concept development 2009-2011 proof-of-concept R&D system 2011-2012 industrial-scale prototype 2013 - commercialization/production
October 2012
Initial process trials
Oscillation of a) water and b) TMA nozzles on a stationary Ti-coated polymer web.
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ALD technology provides superior thin-film quality → solution for demanding (e.g. OLED lighting) applications
R2R ALD is a true paradigm shift Single layer flexible barrier solution CoO ≤ 2 $m2 is feasible at m’s/min speeds → enabling role in flexible PV and OLED
ASTRaL & SaimaFlex ALD Application Center (Mikkeli, Finland) to have the first R2R ALD system
EU FP7 Flexible CIGS project → R2R ALD Zn(OS) buffer Prof. David Cameron and ASTRaL team is thanked for their
contribution.
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Summary and outlook
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Thank you!
Beneq – Turning Innovations into Success.
Dr. Tapani Alasaarela Application Engineer
Co-authors: Mikko Söderlund, Pekka Soininen