Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the...

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Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela 2012 AIMCAL Web Coating and Handling Conference

Transcript of Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the...

Page 1: Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the Middle-East, Asia, Oceania and South-America. ... Flexible photovoltaics Flexible display

Roll-to-roll ALD prototype for 500 mm wide webs

Tapani Alasaarela

2012 AIMCAL Web Coating and Handling Conference

Page 2: Roll-to-roll ALD prototype for 500 mm wide webs Tapani Alasaarela · 2018-10-08 · Europe, the Middle-East, Asia, Oceania and South-America. ... Flexible photovoltaics Flexible display

October 2012 Beneq © 2012

Company info

Established: 2005, Finland. Ownership: Privately owned, venture capital financed. Products: Industrial and research equipment for thin film coatings based on ALD (atomic layer deposition) and atmospheric aerosol technologies. Strong application development and coating

service offering. Comprehensive IPR-portfolio with more than 105 patent families. Markets: Solar energy (photovoltaics and thermal), optical, flat glass (in-line

and off-line), flexible and organic electronics, medical and lighting. Personnel: 85 Main office: Vantaa (Helsinki), Finland. Sales offices: Germany, China, USA (Beneq, Inc.). Sales Network: 34 sales representatives in

Europe, the Middle-East, Asia, Oceania and South-America.

Courtesy of Planar S

ystems, Inc.

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ALD process and properties

Al2O3: ~0.1 nm /cycle

Properties & Benefits • Low process temperatures (< 100 °C) • Nanoscale thickness accuracy • Dense, conformal, pinhole-free • Engineered new functional materials

1. Introduction of gases: fast

2. Chemical reaction: fast

3. Purging: slow

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Product lifetime challenge

Photo VTT

Flexible photovoltaics Flexible display Flexible OLED lighting

Photo VTT Photo VTT

Requirement for water vapor transmission rate (WVTR) of 10-6 g/(m2 day)

SOLUTION → single layer barrier by roll-to-roll atomic layer deposition

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R2R/Spatial ALD – paradigm change

>> 10 $/m2

<< 1 m2/h >100 nm/h

Large-area (batch) ALD

Single wafer ALD

Spatial/Roll-to-roll ALD

Semiconductor

Packaging, photovoltaics, lighting, flexible electronics

Solar, optical, lighting, medical

<10 $/m2 ~1-20 m2/h

~100 nm/h

< 1 $/m2 >20 m2/h

~6000 nm/h

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October 2012

Beneq/ASTRaL R2R ALD approach

Basic spatial ALD approach is disclosed in 1970’s patents (US4058430, 1977)

Prec

urso

r ”A

Prec

urso

r ”B

Gas

buf

fer

Gas

buf

fer

Gas

buf

fer

1 ALD cycle Beneq © 2012

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October 2012 Beneq © 2012

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Beneq/ASTRaL R2R ALD approach

4 ALD cycles (+rotation)

Minituarization

Scaling width

N ALD cycles (+ recitative movement)

Continuos ALD process

R2R ALD process

compatible process

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R2R ALD advantages

Beneq R2R ALD technology:

Practical & scalable approach

Potential for low cost of ownership

Compatible with different webs

Compatible with existing vacuum web coating systems

Leverages on OEM parts (coaters, pre/post-treatment)

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R2R ALD productivity aspects

ALD precursors, Al2O3 Trimethylaluminum (TMA), low grade (< 1 $/g) Titanium tetrachloride (TiCl4) costs even less Water or alternative oxidizers

Material consumption < 1 g/m2

Inert gas (N2) flows in 10s of SLM’s Maintenance

In principle ”clean process” Moving/wearable part maintenance Maintenance of filter used for deactivating precursors

Cost of ownership Estimated CoO < 2$/m2 for mass production, < 1$/m2 in longer

term

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Continuous ALD process

Measurement limit (0.002g/(m2 day) was reached with 6.3 m/min linear speed

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Growth per cycle (GPC) varies as a function of dose and substrate speed

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Continuous ALD process

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Roll-to-roll ALD system WCS 500

ALD

R2R ALD roadmap: 2008 concept development 2009-2011 proof-of-concept R&D system 2011-2012 industrial-scale prototype 2013 - commercialization/production

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October 2012

Initial process trials

Oscillation of a) water and b) TMA nozzles on a stationary Ti-coated polymer web.

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ALD technology provides superior thin-film quality → solution for demanding (e.g. OLED lighting) applications

R2R ALD is a true paradigm shift Single layer flexible barrier solution CoO ≤ 2 $m2 is feasible at m’s/min speeds → enabling role in flexible PV and OLED

ASTRaL & SaimaFlex ALD Application Center (Mikkeli, Finland) to have the first R2R ALD system

EU FP7 Flexible CIGS project → R2R ALD Zn(OS) buffer Prof. David Cameron and ASTRaL team is thanked for their

contribution.

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Summary and outlook

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October 2012 Beneq © 2012

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Thank you!

Beneq – Turning Innovations into Success.

Dr. Tapani Alasaarela Application Engineer

[email protected]

Co-authors: Mikko Söderlund, Pekka Soininen