Quantum System
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QUANTUM | SYSTEM “The ratio between neutrals and ions arriving at a surface, be it biased or grounded is now measurable by this groundbreaking system.”
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The Quantum Multi Sensor System is an energy resolving gridded quartz crystal microbalance, used to measure the ion neutral fraction hitting a surface inside a plasma reactor from multiple locations. This cutting edge instrument also measures the uniformity of deposition rate, ion energy, ion flux and bias voltage. The Quantum Multi Sensor is used in sectors across industry and research where uniformity is of interest, such as plasma deposition, coatings, plasma sputtering, PECVD, etching and ion beam. The Quantum System is perfect for users researching plasma recipes, ionization, plasma processes, tool development and fundamental plasma research.
Transcript of Quantum System
QUANTUM | SYSTEM
“The ratio between neutrals and ions arriving at a surface, be it biased or grounded is now measurable by this
groundbreaking system.”
QUANTUM | SYSTEM
The Quantum Single Sensor measures the ratio of ions to
neutrals hitting a surface inside a plasma reactor.
The Quantum Multi Sensor takes measurements from multiple
locations inside a plasma reactor helping with uniformity issues.
QUANTUM | SYSTEM
Plasma ParametersIon Neutral Fraction
Deposition Rate • Ion Energy • Flux Ionization Fraction
Negative Ions • TemperatureBias Voltage (Vdc)
Measurement FunctionalityTime Averaged • Time Trend
Neutral Flux FractionThe ionised state of particles in a plasma helps
determine the quality of a substrate.
Varying plasma input parameters results in a marked difference in the ionised state of particles arriving at the substrate position
Understanding the ratio between neutrals and ions provides insight for process optimisation
QUANTUM | SYSTEM
Installation Setup
Quantum Electronics
Generator Match Plasma Reactor
Computer
Quantum Sensor
QUANTUM | SYSTEM
How It Works
The first grid prevents the plasma entering the analyser
The second grid is biased with a negative potential to repel any electrons
A third grid is biased with a positive potential sweep. This creates a potential barrier for the positive ions
A collector plate (front face of quartz crystal) collects the current of ions which cross the potential barrier set
by the third grid to determine the ion energy distribution
The quartz crystal is made to oscillate at its resonant frequency which is measured externally and used to
calculate the deposition rate
QUANTUM | SYSTEM
Typical Results
Deposition as a Function of TimeThe ion and neutral components are measured for
a period of time after which the ion content is discriminated leaving the neutral component
Deposition as a Function of Average Energy
Deposition is measured at a range of energies until the energy of the incoming atoms begin to etch at
the substrate
QUANTUM | SYSTEM
Applications
Understanding the interaction of depositing layers in a plasma can greatly enhance the quality of the substrate.
The Quantum System can be used in the following applications:Dusty Plasma
Plasma EtchingHiPIMS Plasma
Ion Beam PlasmaPECVD
Space PlasmaPlasma Sputtering
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QUANTUM | SYSTEM
For further information on the Quantum System visitimpedans.com/quantum-multi-sensor
To request a quote visitwww.impedans.com/contact
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Chase HouseCity Junction Business Park
Northern CrossMalahide Road
Dublin 17Ireland
Ph: +353 1 842 8826Fax: +353 1 891 6519
Web: www.impedans.comEmail: [email protected]
