QUALI-LINE QUANTÅ - ECI Technology › wp-content › uploads › ...in the plating solution....

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Simplified Process Control Rapid Ramp-Up to HVM Comprehensive Control of Chemistry Automatic Standard Generator Maximize Yield and Reliability We Keep Your Chemistry Right. To achieve ever-greater chip densities, leading chipmakers need to address two critical parts of the device: contacts (MOL) and interconnects (BEOL). At 10nm/7nm, new topologies (such as cobalt) promise to boost the performance and reduce unwanted resistance in chips. In advanced applications, electroplated cobalt (Co) has started to replace tungsten (W) for 10nm/7nm contacts and first (local) interconnects layers. The Co electroplating process requires a very accurate and reliable control of the key ingredients in the plating solution. ECI’s QUALI-LINE QUANTÅ is a state-of-the-art analyzer designed to monitor Co electroplating solutions with the highest degree of accuracy and reproducibility: Newly Designed Platform Comply with the tightest tolerances specs necessary to assure successful deposition Supports wide range of Cobalt deposition concentrations Maximizes Yield and Reliability Sets a new norm for Accuracy / Repeatability specs for Co chemistries Fast analysis of all main components for ultimate process control Rapid Conversion to HVM QUANTÅ analyzer configuration can be easily scaled for HVM roll-out Minimal consumption of reagents and parts for reduced CoO Predictive maintenance using new Analyzer Health Monitor (AHM) The QUANTÅ is designed for reliable performance over time Minimal, predictable maintenance Convenient and friendly user interface QUALI-LINE QUANTÅ ® Advanced on-Line Chemical Management for Cobalt Deposition The Preferred Analyzer for Cobalt

Transcript of QUALI-LINE QUANTÅ - ECI Technology › wp-content › uploads › ...in the plating solution....

Page 1: QUALI-LINE QUANTÅ - ECI Technology › wp-content › uploads › ...in the plating solution. ECI’s QUALI-LINE QUANTÅ is a state-of-the-art analyzer designed to monitor Co electroplating

Simplified Process Control

Rapid Ramp-Up to HVM

Comprehensive Control

of Chemistry

Automatic Standard

Generator

Maximize Yield and Reliability

We Keep Your Chemistry Right.™

To achieve ever-greater chip densities, leading chipmakers need to address two critical parts of the device: contacts (MOL) and interconnects (BEOL). At 10nm/7nm, new topologies (such as cobalt) promise to boost the performance and reduce unwanted resistance in chips. In advanced applications, electroplated cobalt (Co) has started to replace tungsten (W) for 10nm/7nm contacts and first (local) interconnects layers.

The Co electroplating process requires a very accurate and reliable control of the key ingredients in the plating solution. ECI’s QUALI-LINE QUANTÅ is a state-of-the-art analyzer designed to monitor Co electroplating solutions with the highest degree of accuracy and reproducibility:

Newly Designed Platform• Comply with the tightest tolerances specs

necessary to assure successful deposition

• Supports wide range of Cobalt deposition concentrations

Maximizes Yield and Reliability• Sets a new norm for Accuracy / Repeatability specs

for Co chemistries• Fast analysis of all main components for

ultimate process control

Rapid Conversion to HVM• QUANTÅ analyzer configuration can be easily scaled

for HVM roll-out• Minimal consumption of reagents and parts for

reduced CoO• Predictive maintenance using new Analyzer Health

Monitor (AHM)

• The QUANTÅ is designed for reliable performance over time

• Minimal, predictable maintenance • Convenient and friendly user interface

QUALI-LINE QUANTÅ® Advanced on-Line Chemical Management for Cobalt Deposition

The Preferred Analyzer for Cobalt

Page 2: QUALI-LINE QUANTÅ - ECI Technology › wp-content › uploads › ...in the plating solution. ECI’s QUALI-LINE QUANTÅ is a state-of-the-art analyzer designed to monitor Co electroplating

Analysis Results

SPC Report

SPC Data Statistics

ECI International, Inc. Taiwan Branch6F.-1, No. 81, Shuili RoadHsinchu City, 30059, R.O.CTel: 011-886-03-5735899

ECI Technology International Corp.3F Leaders Tower, Wongomae-ro 12, Giheung-gu, Yongin-city, Gyeonggi-do 17086, South KoreaTelephone: 82-31-262-8503

ECI Japan, Inc.Meguro Building, 7F,3-22-5 Shin-Yokohama,Kohoku, Kanagawa Japan 222-0033Tel: 81-45-620-4661

Accurate, Fast, Comprehensive Analysis

Features

Component Accuracy RSDCo ±2% 2%pH 0.01 pH unit 0.01 pH unit

Acid ±2% 2%Additive A ±3% 2%Additive B ±3% 2%

*-Chemistry Dependent

For additional information and specifications, call or visit us online:email: [email protected]: www.ecitechnology.com

Headquarters60 Gordon Drive, Totowa, NJ 07512 U.S.A.Tel: 973•890•1114 Fax: 973•890•1118

Backed by ECI Global Support

QUALI-LINE QUANTÅ

Specifications*

Support for all commercial chemistries/formulations• Automatic validation and calibration

• Seamless integration with plating tools

• Automatic Standard Generator - for supreme RSD and very low CoO

• All-new modular design

• NOWPak® reagent delivery system available

• Complies with industry safety standards: S2/S8 and CE

• Engineered to provide excellent performance over time, in demanding processes