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![Page 1: Proposal on construction of new beamlines in spectral range 1 meV - 1.5 keV at the Kurchatov Center for SR and Nanotechnology V. Stankevich Russian Research.](https://reader035.fdocuments.in/reader035/viewer/2022081501/56649dd15503460f94ac7452/html5/thumbnails/1.jpg)
Proposal on constructionof new beamlines
in spectral range 1 meV - 1.5 keV at the Kurchatov Center for SR and
Nanotechnology
V. Stankevich
Russian Research CenterKurchatov Institute
Russian-Italian meetingDecember 11, 2009
Kurchatov Center for Synchrotron Radiation and Nanotechnology
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Synchrotron sources with electron beam energy 1.5-3 GeV
GeV total < 1,5 keV %
SOLEIL 2,75 24 10 42ANKA 2,4 16 3 19Bessy II 1,7 51 34 67Elettra 2 - 2,4 26 16 62MAX II 1,5 14 5 36SLS 2,4 10 4 40DIAMOND 3 22 3 14SRS 2 39 13 33CLS 2,9 14 6 43ALS 1,9 45 17 37CAMD 1,5 13 4 31BEPC 1,4 14 3 27PF 2,5 66 18 27PAL 2,5 31 10 32NSRRC 1,5 30 15 50AS 3 13 4 31
428 165 ~ 40
The analysis of world experience shows that more than 40% of experimental stations on synchrotron facilities are dedicated to investigations in the spectral range < 1.5 keV
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We plan to add a wide range of experimental capabilities to the current facilities at the KCSR .
valence and bending vibrations of bond, bond type, isotope
effect – IR spectroscopy
Fundamental characteristics of substances studied by up to 1.5 keV radiation
electron density, bond type, valence band, band dispersion –
PES
valence and conducting bands, electron-phonon interactions,
optical constants – optical spectroscopy
core levels (C - 285 eV, N - 410 eV, O - 543 eV, F - 697 eV),
bond type – X-ray absorption
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There are only 3 experimental stations using soft Siberia-1 storage ring radiation:- photoelectron spectroscopy FES station (20 - 100 eV);- optical investigation Lokus station (3 – 25 eV);- optical investigation Spectra station (3 – 200 eV)
Siberia-1 storage ring:Ee = 450 MeVλc = 61 Ånatural emittance = 880 nm*rad
Siberia-2 storage ring:Ee = 2.5 GeVλc = 1.67 Ånatural emittance = 76 nm*rad
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id
id
id
PES
PES
PESIR
Optic
ML
ML
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Beamline energy range resolution methods
Universal IR beamline 30000 – 10 cm-1
(4 – 0.001 eV)
10 – 0.01cm-1 3 experimental stations: UV–IR, 2
IR Fourier-transform
spectroscopy stations (FT-IR) for
spectroscopy and microscopy
Universal optical
beamline SpectroLumi
4 – 1200 eV 50 meV adsorption, reflectance,
luminescence research of solid
state
Surface research
beamline
25 – 1500 eV 50 meV PES, ARPES
NEXAFS
X-ray emission
High-resolution PES 10 – 250 eV 3 meV ARPES
Microscope
(imaging mode)
25 – 1500 eV 10 nm SPELEEM
(Spectroscopic Photoemission
Low Energy Electron
Microscope)
Metrological
Laboratory
0.01 – 35 keV max photometry, radiometry
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SUPERLUMI, HASYLAB → SPECTROLUMI, KurchatovSUPERLUMI, HASYLAB → SPECTROLUMI, Kurchatov
Presently, the demand for this type of measurements is higher than SUPERLUMI’s capacity. SUPERLUMI is expected to be closed as a part of DORIS III facility.
Advanced materials often require conventional types of investigation. The user community will benefit from access to a station of this type.
New type of information can be provided by luminescence spectroscopy with more extended excitation range than that provided by SUPERLUMI.
Combination of time-resolved luminescence spectroscopy with measurements of other secondary processes, such as photoemission, photoconductivity, desorption and induced absorption, would allow creating a full picture of energy relaxation processes in solids.
We propose to create a new station in the Kurchatov Center of Synchrotron Radiation dedicated to the study of luminescence properties of various materials with the excitation range 5 eV to 1.5 keV. It will be the only station of this type in the world.
We propose to create a new station in the Kurchatov Center of Synchrotron Radiation dedicated to the study of luminescence properties of various materials with the excitation range 5 eV to 1.5 keV. It will be the only station of this type in the world.
Analysis of performance of SUPERLUMIAnalysis of performance of SUPERLUMI
Beamline 3.1 SPECTROLUMIBeamline 3.1 SPECTROLUMI
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cooled focusing
mirror
cooled focusing
mirror
NIM-PGM monochromator
5-1500 eV
NIM-PGM monochromator
5-1500 eV
refocusing mirror
refocusing mirror
refocusing mirror
refocusing mirror
experimental chamber
experimental chamber
Siberia-2undulator
Siberia-2undulator
LayoutLayoutBeamline 3.1 SPECTROLUMIBeamline 3.1 SPECTROLUMI
Optical schemeOptical scheme
slitslit
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Strong tradition of Russian luminescence research suggests the following directions of investigations performed at this station:
Strong tradition of Russian luminescence research suggests the following directions of investigations performed at this station:
Medical applications – yield, time resolution, etc.
Medical applications – yield, time resolution, etc.
High energy physics (LHC, Panda, …) – radiation hardness
High energy physics (LHC, Panda, …) – radiation hardness
Security Applications – ultra-high sensitivity required
Security Applications – ultra-high sensitivity required
Scintillator materialsScintillator materials
Astrophysics and space research
Astrophysics and space research
Geophysics – well monitoring
Geophysics – well monitoring
FEL Beam diagnostics
FEL Beam diagnostics
Fluorescent materials and phosphors
Fluorescent materials and phosphors
Advanced MaterialsAdvanced Materials
Plasma displaysPlasma displays
White LEDs
White LEDs
Fluorescent lampsFluorescent lamps
Meso-materials, superlattices, etc.
Meso-materials, superlattices, etc.
Beamline 3.1 SPECTROLUMI. Research areasBeamline 3.1 SPECTROLUMI. Research areas
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Beamline 4.1 High-resolution UPS stationBeamline 4.1 High-resolution UPS station
Super high-resolution UPS station requires undulator radiation with
characteristic energy below 100 eV .
The station is dedicated to high precision bandmapping of occupied
electron states near Fermi level for single crystals in order to determine
the dispersion relation of the electron energy versus the electron
momentum (for example, measurements of superconducting gap for
HTSC).
Energy range: 10-320 eV
Main experimental methods: super high energy and angle-resolved
photoemission spectroscopy.
Expected energy resolution: 3-5 meV.
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Beamline 4.1 High-resolution UPS stationBeamline 4.1 High-resolution UPS station
slitslit
experimental chamber, electron
spectrometer
experimental chamber, electron
spectrometer
PGM monochromator
25-1500 eV
PGM monochromator
25-1500 eV
cooled plane and focusing mirrors
cooled plane and focusing mirrors
refocusing mirror
refocusing mirror
Monochromator energy range 10 – 320 eV
Energy analyzer range 0 – 1500 eV
Angular resolution 10 mrad
Overall energy resolution 3 – 5 meV
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Beamline 2.1 SPELEEM (PES Microscope)Beamline 2.1 SPELEEM (PES Microscope)
Spectroscopic PhotoEEmission and Low Energy Electron Microscopewith spatial resolution below 10 nm for nanotechnology research
Purpose of the microscope
The unit allows to obtain extremely useful information for resolving a wide range of nanotechnology problems:
• investigations of pure single-crystal surfaces,
• mapping of defects in complex chips, etc.
• spatial or diffraction imaging of surfaces using secondary electrons with fixed kinetic energy.
There are only 5 microscopes of this level in the world, and some are under construction at present time.
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E
lect
ron
anal
yzer
MAX-Lab SPELEEM layout
Projector Deflector
Transfer Lens
Ph
oto
n b
eam
Pro
ject
or
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Beamline 2.1 SPELEEM (PES Microscope)Beamline 2.1 SPELEEM (PES Microscope)
slitslit
SPELEEMSPELEEM
PGM monochromator
25-1500 eV
PGM monochromator
25-1500 eV
Siberia-2undulator
Siberia-2undulator
cooled focusing
mirror
cooled focusing
mirror
refocusing mirror
refocusing mirror
Principal optical schemePrincipal optical scheme
undulatorundulator
Monochromator energy range 25 – 1500 eV
Energy resolution 103
Spatial resolution 10 nm
refocusing mirror
refocusing mirror
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Metrological Laboratoryat Kurchatov SR Source
Main applications:
• diagnostics of SR source electron bunch and beam;• secondary sources calibration;• reflectometry;• detector calibrations;• metrological support EUV nanolithography (filters, mirrors, multilayers);• photobiological research (cytology, oncology);• standards development.
The project is aimed at the creation of a metrological complex based on several SR beamlines. The complex is dedicated to solving various photometry and radiometry problems.
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Source Siberia-1
Beamline D`3.3
Energy range 0.01 – 35 eV
entranceslit
focusing mirrorrefocusing
mirror
Fourier IR spectrometer
refocusing mirror
1-m normal monochromator
(3-35 eV)
Siberia-1
experimental chamber
Metrological Laboratory
7 m
3.5 m
2 m
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First experiments on the metrology beamline at Siberia-1
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CCD CAMERA CALIBRATIONS
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Source Siberia-2
Beamline K3.6
Energy range 20 – 1200 eV 0.6 – 35 keV
Siberia-2bending magnet
cooled focusing mirror
Metrological Laboratory
slit
PGM monochromator
refocusing mirror
experimental chamber
refocusing mirror
X-ray multilayer monochromator
experimentalX-ray hutch
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Advanced projectsAdvanced projects
In addition to standard techniques there are some advanced proposals based on combination of different experimental methods.
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IR research features:
• form oil inclusions in minerals to living tissues
• non-destructive and non-ionizing analysis methods;red corpuscles in vivo
• image maps of the charge carriers in nanometer-thick layer in organic FET
Installation of 3 experimental stations will provide a number of techniques in a wide energy range 4 – 0.001 eV (30000 – 10 cm-1)
Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
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ALS Beamline 1.4.3: The voltage-induced IR absorption spectra of the organic FET (poly(3-hexylthiophene)) - direct probe of the electronic excitations due to injected carriers: 1000–1500 cm-1 - polymer chain modes, 3500 cm-1 - polarons. Image map (right) – from scan beam spots 33 μm. The charge carriers are confined to a nanometer-thick layer at the semiconductor–insulator interface, i.e. difficult to study using inelastic X-ray and neutron scattering, STM, photoemission spectroscopy.
Использование ИК в нанотехнологии: органич. полевой транзистор
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Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
M2, M3 -refocusingtoroidal mirrors
D - diamond window
experimental hutches
M1- focusingellipticalmirror
Siberia-2edge radiation
D
25
m
10
m
top view
M0 - cooled plane mirror
Principal optical scheme
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UV-IR 30000 –8000 cm-1 (4-1 eV)
near IR spectroscopy combined with optical spectroscopy in VIS-UV range for materials characterization in wide energy range
Middle IR 10000 – 500 cm-1
(1-0.05 eV)
IR spectroscopy and spectromicroscopy with resolution up to 100 nm
Far IR 500 – 10 cm-1
(0.05-0.001 eV)Terahertz radiation for investigations of lattice vibrations, large molecules, clusters, biomolecules, low frequency protein motions, collective excitations in solids
Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
Beamline 6.1: Universal Beamlinefor Infrared Spectroscopy and Spectromicroscopy
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Conceptual layout of the beamline proposed by Laboratori Nazionali di Frascati.
IR combined with NEXAFS techniqueIR combined with NEXAFS technique
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Simultaneous analysis of vibrations and electronic states
4000 3500 3000 2500 2000 1500 1000 500
0,00
0,01
0,02
0,03
0,04
0,05
Re
flec
tivi
ty
Wavenumbers, cm-1
C=C aromaticstretch
CD2,3
stretch
C-Haromaticsp2
OHstretch
CHn
CHn
stretch sp3
CD2
CD2,3
deform
COOH
CO2
COstretch
OHstretch
CH2bend
270 280 290 300 310 320 3300,0
0,2
0,4
0,6
0,8
1,0
Inte
nsity
Eb, eV
C=C
-C=O
O=C-OH
C=C
-C=O
O=C-OH
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Multipurpose station for:
• bandmapping of occupied electron states near the Fermi level in single
crystals in order to determine the dispersion relation for the electron
energy versus the electron momentum;
• low-dimensional and strongly correlated systems;
• carbon, organic and bioorganic systems;
• nanostructures, nanoclusters and nanodevice technology;
• surface chemistry.
Experimental methods: • photoelectron spectroscopy PES
• angle resolved PES (ARPES)
• NEXAFS
Energy range: 25-1500 eV
Beamline 6.5: station “Surface”Beamline 6.5: station “Surface”
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Beamline 6.5 station “Surface”Beamline 6.5 station “Surface”Siberia-2bending magnet
Siberia-2bending magnet
refocusing mirror
refocusing mirror
slitslit
experimental chamber, electron spectrometer,
catalytic unit
experimental chamber, electron spectrometer,
catalytic unit
PGM monochromator25-1500 eV
PGM monochromator25-1500 eV
refocusing mirror
refocusing mirror
Monochromator energy range 25 – 1500 eV
Energy analyzer range 0 – 1500 eV
Angular resolution 50-200 mrad
Overall energy resolution 20 meV
Principal optical schemePrincipal optical scheme
cooled plane and focusing
mirrors
cooled plane and focusing
mirrors
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KCSR NANOFACTORY – “NANOFAB 100”
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NANOTECHNOLOGICAL FABRICATION FACILITY (NANOFAB-100) COMPRISES A CLUSTER OF WAFER–SIZE TECHNOLOGIES AND A CLUSTER OF NANO-LOCAL TECHNOLOGIES, INCLUDING:
• PLASMA ETCHING
• PULSED LASER DEPOSITION
• FIB WITH DEPOSITION AND ION IMPLANTATION
• UHV SCANNING PROBE MICROSCOPE
• ATOMIC–FORCE MICROSCOPE WITH A LOCAL OF GAS INJECTION SYSTEM
KCSR NANOFACTORY – “NANOFAB 100”
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NANOTECHNOLOGICAL FABRICATION FACILITY (NANOFAB-100), COMPRISING A CLUSTER OF WAFER–SIZE TECHNOLOGIES AND A CLUSTER OF NANO-LOCAL TECHNOLOGIES, INCLUDING:
• PLASMA ETCHING
• PULSED LASER DEPOSITION
• FIB WITH DEPOSITION AND ION IMPLANTATION
• UHV SCANNING PROBE MICROSCOPE
• ATOMIC–FORCE MICROSCOPE WITH A LOCAL OF GAS INJECTION SYSTEM
KCSR NANOFACTORY – “NANOFAB 100”
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Station “NanoSurface”Station “NanoSurface”
NANOTECHNOLOGICAL FABRICATION FACILITY (NANOFAB-100), COMPRISING A CLUSTER OF WAFER–SIZE TECHNOLOGIES AND A CLUSTER OF NANO-LOCAL TECHNOLOGIES, INCLUDING:
• PLASMA ETCHING
• PULSED LASER DEPOSITION
• FIB WITH DEPOSITION AND ION IMPLANTATION
• UHV SCANNING PROBE MICROSCOPE
• ATOMIC–FORCE MICROSCOPE WITH A LOCAL OF GAS INJECTION SYSTEM
combined with SR station “SURFACE”: • photoelectron spectroscopy PES
• angle resolved PES (ARPES)
• NEXAFS
Unique capability: in situ step by step characterization of layered nanostructures and nanosystems
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Station “NanoSurface”Station “NanoSurface”
Class ISO 6 clean room
NANOFAB-100
Siberia-2bendingmagnet
station SURFACE
station SURFACE
beamlinebeamline
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Station “NanoSurface”Station “NanoSurface”
monochromatized SRmonochromatized SR
station “SURFACE”: experimental chamber station “SURFACE”: experimental chamber
NANOFAB
compatible modules
NANOFAB
compatible modules
revolver type sample storage and distribution module
revolver type sample storage and distribution module
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MATERIALS AND STRUCTURES CAPABLE OF CONVERTING AMBIENT NATURAL ENERGY (SOLAR, HEAT AND CHEMICAL GRADIENTS, ETC.) INTO ELECTRICITY.
MATERIALS AND STRUCTURES CAPABLE OF CONVERTING AMBIENT NATURAL ENERGY (SOLAR, HEAT AND CHEMICAL GRADIENTS, ETC.) INTO ELECTRICITY.
CLEANTECH: ENERGY HARVESTING MATERIALS
CLEANTECH: ENERGY HARVESTING MATERIALS
TECHNOLOGIES OF MATERIALS AND NANOSTRUCTURES CAPABLE OF ADAPTING THEIR PROPERTIES UNDER THE INFLUENCE OF EXTERNAL FACTORS.
TECHNOLOGIES OF MATERIALS AND NANOSTRUCTURES CAPABLE OF ADAPTING THEIR PROPERTIES UNDER THE INFLUENCE OF EXTERNAL FACTORS.
ADAPTIVE NANO– AND META MATERIALS
ADAPTIVE NANO– AND META MATERIALS
GRAPHENE AND SYSTEMS ON ITS BASIS. SURFACES WITH HIGH ABSORPTION OF OPTICAL AND ELECTROMAGNETIC RADIATION
GRAPHENE AND SYSTEMS ON ITS BASIS. SURFACES WITH HIGH ABSORPTION OF OPTICAL AND ELECTROMAGNETIC RADIATION
INNOVATIVE ELECTRONIC MATERIALS
INNOVATIVE ELECTRONIC MATERIALS
TECHNOLOGIES OF MOLECULAR SELF–ASSEMBLY. MATERIALS POSSESSING “NATURAL” PROPERTIES, E.G. SELF–CLEANING AND NON–WETTING SURFACES
TECHNOLOGIES OF MOLECULAR SELF–ASSEMBLY. MATERIALS POSSESSING “NATURAL” PROPERTIES, E.G. SELF–CLEANING AND NON–WETTING SURFACES
ANISOTROPIC AND BIOMIMETIC MATERIALS
ANISOTROPIC AND BIOMIMETIC MATERIALS
RESEARCH PLANS AND EXPECTED RESULTSRESEARCH PLANS AND EXPECTED RESULTS
![Page 36: Proposal on construction of new beamlines in spectral range 1 meV - 1.5 keV at the Kurchatov Center for SR and Nanotechnology V. Stankevich Russian Research.](https://reader035.fdocuments.in/reader035/viewer/2022081501/56649dd15503460f94ac7452/html5/thumbnails/36.jpg)
Thank you for your attention!
We are looking forward to a fruitful collaboration.
Thank you for your attention!
We are looking forward to a fruitful collaboration.