Presentation1
-
Upload
md-mustafa-kamal -
Category
Documents
-
view
67 -
download
0
Transcript of Presentation1
PAPER TITLEADVERSE EFFECT OF SEMICONDUCTOR INDUSTRY ON ENVIRONMENT AND ITS
REMEDIES
Presented by:
MD MUSTAFA KAMAL
DEPTT.OF ELECTRICAL ENGINEERING
NITTTR ,CHANDIGARH
NATIONAL CONFERENCE ONLATEST DEVELOPMENTS IN POLLUTION CONTROL AND
PREVENTION TECHNIQUES
CONTENT
Introduction
Effect of semiconductor industries on environment
Remedies
Conclusion
INTRODUCTION
INDIAN SEMICONDUCTOR INDUSTRY GROWTH RATE
PFC GASES USED IN DIFFERENT PROCESS
Perfluorocompounds (PFCs) are used extensively by the semiconductor industry in etch processes and chemical vapor deposition (CVD) chamber cleans and the vapor testing process .Common PFCs used in these processes include perfluoromethane (CF4), perfluoroethane (C2F6), trifluoromethane (CHF3), perfluoropropane (C3F8), perfluorocyclobutane (C4F8), and perfluorocyclopentene (C5F8).
ABSORPTION SPECTRA OF PFC GASES
LIFE -TIME OF PFC GASESCompound Atmospheric
Lifetime (years)
Global warming potential
(100-years)
CO2variable 1
C2F610,000 12,200
CF450,000 7,390
SF63,200 22,800
NF3 740 17,200
CHF3270 11,700
C3F82,600 8,830
C-C4F83,200 10,300
CFC-11 55 3400
CFC-12 116 7100
May 1992: UN FCCC establishes framework for containing global warming.
Dec 1997: Following intense negotiations in Kyoto (Japan), a protocol is agreed upon by over 100 countries.
Feb 2005: 141 countries, including EU, Japan, Canada, and Russia sign the Kyoto Protocol and it gets ratified w.e.f. 16-Feb-05– The US remains a key non-signatory
The Kyoto Protocol sets legally binding targets for reducing green house gases (GHGs)
– Developed countries have a target to reduce GHG emissions by 5.2% below 1990 levels, by year 2012
– EU members committed to reduce their average emissions by 8 %
– India, China, and Brazil are classified as emerging countries and hence exempted from this protocol
KYOTO PROTOCAL
PartyTarget level and date(reductions from 1990)
Gas(es)covered
Date proposed
Brazil30% by 2020(differentiated)
CO2, CH4, N2O 28 May 1997
Canada3% by 2010,additional 5% by 2015
All GHGs 2 December 1997
Czech Republic5% by 2005,15% by 2010
CO2, CH4, N2O 27 March 1997
DemocraticRepublic of the Congo(Zaire)
10% by 2005,15% by 2010,20% by 2020
All GHGs 23 October 1996
EUat least 7.5% by 2005,15% by 2010
CO2, CH4, N2O19 June 1997,4 March 1997
France
7-10% inaverage per capitaemissions by 2010(differentiated)
All GHGs 6 December 1996
Germany10% by 2005,15-20% by 2010
CO2 26 March 1996
G-77 and Chinaat least 7.5% by 2005,15% by 2010,an additional 20% by 2020
CO2, CH4, N2O(gas-by-gas)
22 October 1997
Hungary et al.Stabilization by 2005plus pledging ofdifferentiated targets
CO2, CH4, N2O 27 March 1997
KYOTO PROTOCOL
PartyTarget level and date(reductions from 1990)
Gas(es)covered
Date proposed
Peru15% (CO2) by 2005,15-20% (all GHGs)by 2010
see previouscolumn
7 March 1997
Philippines20% by 2005,20% by 2010
All GHGs 25 March 1997
Russian Federation
Stabilization by 2010plus additionaldifferentiated targetsfor "Annex B" Parties
All GHGs 26 February 1997
Switzerland10% by 2010(differentiated)
All GHGs 29 November 1996
UK 5-10% by 2010 All GHGs 16 April 1996
USAReturn to 1990by 2008-2012
All GHGs 23 October 1997
REMEDIES (METHOD OF REDUCTION OF PFC GASES)
Process optimization-PFC gases can be reduced by using better optimization .better technology need for better optimization.
Substitution-search alternative of PFC gases. Capture and reuse-reuse the emitted gases
again in the manufacturing process. Abatement-abatement is the process in
which large plant are operate with substantially
reduced emission of PFC gases. by using carbon abatement process we can reduce the emission by 90%.
CONCLUSION
Semiconductor industries which are used various PFC gases in its different manufacturing process which are very dangerous and responsible for heating of earth ,result global warming .by using better optimization technique, better abatement method ,better substitution we can reduce these at optimum level.