Plato Probe
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PLATO | PROBE “It is now possible for a Langmuir probe to measure the uniformity of plasma characterisations in plasmas with high deposition rates, such as plasma enhanced chemical deposition (PECVD)”
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The Plato Probe is a process compatible plasma measurement system, designed to work in deposition plasmas when an insulating film is deposited on the probe surface. This probe can remain inside a plasma reactor while highly reactive insulating gasses are in use. The Plato Probe measures plasma parameters such as plasma density, ion current density and electron temperature in plasmas with high deposition rates, like plasma enhanced chemical vapour deposition (PECVD). The Plato Probe has the most advanced patented technology on the market using ultra-fast biasing to penetrate the deposited film to obtain accurate measurements of the real plasma parameters in a wide range of plasma applications. The Plato Probe is used to establish plasma process repeatability, even in reactive gas plasma. It is the perfect instrument to understand plasma changes and the impact on surface treatment. The Plato Probe is an essential plasma process diagnostic to understand the correlation between plasma inputs and the plasma state in environments with a high rate of deposition.
Transcript of Plato Probe
PLATO | PROBE
“It is now possible for a Langmuir probe to measure the uniformity of plasma
characterisations in plasmas with high deposition rates, such as plasma enhanced
chemical deposition (PECVD)”
PLATO | PROBE
The Plato Probe is a planar Langmuir Probe for deposition
plasma when an insulating film is deposited on the probe surface. The probe can remain inside a
plasma reactor while aggressive insulating gasses are in use.
The Plato Spatial Probe scans across the bulk of a plasma
using an automated linear drive and measures the parameters at
different locations even when depositing an insulating layer up
to 100 microns thick on the probe surface.
PLATO | PROBE
Plasma Diagnostics MeasuredPlasma Density • Ion Current Density
Electron Temperature
Measurement FunctionalityTime Averaged • Time Resolved • Time Trend
HardwareElectronics and Software
Voltage Scan Range: -40V to +40VCurrent Range: 10µA to 100mA
Time Resolution: 1µS
Probes300mm as standard (Custom available)
Chemically cleaned and replaceable
Spatial MovementAutomated linear drive with a 0.025mm step resolution
Vacuum FeedthroughAvailable with KF, CF or custom vacuum connectors
PLATO | PROBE
Installation Setup
Generator Match Plato Electronics
Plasma Reactor
Plato Probe Computer
PLATO | PROBE
How It Works
The probe is biased with an AC potential rather than the standard
DC potential
The AC bias couples through any deposited layer
When the potential is negative it collects ion current and when
positive it collects electron current
The AC current and voltage waveforms are measured and used
to calculate the standard IV characteristic
The IV characteristic is analysed in the normal way
PLATO | PROBE
Typical Results
CCP Argon / 2PaNe= 1.2x1015 m-3
Te= 2.3eVAs layer capacitance decreases,
RF voltage drop increases
-35 -30 -25 -20 -15 -10 -5 0 5 10 15
-0.00004
-0.00002
0
0.00002
0.00004
0.00006
0.00008
0.0001
0.00012
0.00014
0.00016
10 Micron Layer Solid Line 200kHz; Dashed Line
400kHz
PLATO | PROBE
Applications
As a probe for deposition plasmas, the Plato System assesses plasma characterisations such as plasma enhanced chemical vapour deposition
(PECVD), plasma density, ion current density, & electron temperature in the bulk of the plasma.
The Plato System can be used in the following applications:Dusty Plasma
Plasma EtchingHiPIMS Plasma
PECVD Space Plasma
Plasma Sputtering
PLATO | PROBE
For further information on the Plato Probe System visitimpedans.com/plato-spatial-probe
To request a quote visitwww.impedans.com/contact
Chase HouseCity Junction Business Park
Northern CrossMalahide Road
Dublin 17Ireland
Ph: +353 1 842 8826Fax: +353 1 891 6519
Web: www.impedans.comEmail: [email protected]
